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    Mirror for guiding a radiation bundle
    1.
    发明授权
    Mirror for guiding a radiation bundle 有权
    用于引导辐射束的镜子

    公开(公告)号：US08717531B2

    公开(公告)日：2014-05-06

    申请号：US12707783

    申请日：2010-02-18

    申请人： Severin Waldis ,  Florian Bach ,  Daniel Benz ,  Armin Werber ,  Wilfried Noell ,  Dirk Heinrich Ehm ,  Stefan Wiesner ,  Dieter Kraus

    发明人： Severin Waldis ,  Florian Bach ,  Daniel Benz ,  Armin Werber ,  Wilfried Noell ,  Dirk Heinrich Ehm ,  Stefan Wiesner ,  Dieter Kraus

    IPC分类号： G03B27/52

    CPC分类号： G02B7/1815 ,  G02B5/0808 ,  G02B5/0891 ,  G03F7/70825 ,  G03F7/70891

    摘要： A mirror serves for guiding a radiation bundle. The mirror has a basic body and a coating of a reflective surface of the basic body, the coating increasing the reflectivity of the mirror. A heat dissipating device serves for dissipating heat deposited in the coating. The heat dissipating device has at least one Peltier element. The coating is applied directly on the Peltier element. A temperature setting apparatus has at least one temperature sensor for a temperature of the reflective surface. A regulating device of the Temperature setting apparatus can be connected to the at least one Peltier element and is signal-connected to the at least one temperature sensor. The result is a mirror in which a heat dissipating capacity of the heat dissipating device is improved.

    摘要翻译： 反射镜用于引导辐射束。 反射镜具有基体和基体的反射表面的涂层，涂层增加了反射镜的反射率。 散热装置用于消散沉积在涂层中的热量。 散热装置具有至少一个珀耳帖元件。 涂层直接施加在珀耳帖元件上。 温度设定装置具有至少一个用于反射表面的温度的温度传感器。 温度设定装置的调节装置可以连接到至少一个珀耳帖元件，并且与至少一个温度传感器信号连接。 结果是提供了散热装置的散热能力的反射镜。

    MIRROR FOR GUIDING A RADIATION BUNDLE
    2.
    发明申请
    MIRROR FOR GUIDING A RADIATION BUNDLE 有权
    用于指导辐射器的镜子

    公开(公告)号：US20100261120A1

    公开(公告)日：2010-10-14

    申请号：US12707783

    申请日：2010-02-18

    申请人： Severin Waldis ,  Florian Bach ,  Daniel Benz ,  Armin Werber ,  Wilfried Noell ,  Dirk Heinrich Ehm ,  Stefan Wiesner ,  Dieter Kraus

    发明人： Severin Waldis ,  Florian Bach ,  Daniel Benz ,  Armin Werber ,  Wilfried Noell ,  Dirk Heinrich Ehm ,  Stefan Wiesner ,  Dieter Kraus

    IPC分类号： G03F7/20 ,  G03B27/72 ,  G02B7/192

    CPC分类号： G02B7/1815 ,  G02B5/0808 ,  G02B5/0891 ,  G03F7/70825 ,  G03F7/70891

    摘要： A mirror serves for guiding a radiation bundle. The mirror has a basic body and a coating of a reflective surface of the basic body, the coating increasing the reflectivity of the mirror. A heat dissipating device serves for dissipating heat deposited in the coating. The heat dissipating device has at least one Peltier element. The coating is applied directly on the Peltier element. A temperature setting apparatus has at least one temperature sensor for a temperature of the reflective surface. A regulating device of the Temperature setting apparatus can be connected to the at least one Peltier element and is signal-connected to the at least one temperature sensor. The result is a mirror in which a heat dissipating capacity of the heat dissipating device is improved.

    摘要翻译： 反射镜用于引导辐射束。 反射镜具有基体和基体的反射表面的涂层，涂层增加了反射镜的反射率。 散热装置用于消散沉积在涂层中的热量。 散热装置具有至少一个珀耳帖元件。 涂层直接施加在珀耳帖元件上。 温度设定装置具有至少一个用于反射表面的温度的温度传感器。 温度设定装置的调节装置可以连接到至少一个珀耳帖元件，并且与至少一个温度传感器信号连接。 结果是提供了散热装置的散热能力的反射镜。

    CLEANING MODULE AND EUV LITHOGRAPHY DEVICE WITH CLEANING MODULE
    6.
    发明申请
    CLEANING MODULE AND EUV LITHOGRAPHY DEVICE WITH CLEANING MODULE 审中-公开
    清洁模块和具有清洁模块的EUV光刻设备

    公开(公告)号：US20110058147A1

    公开(公告)日：2011-03-10

    申请号：US12893762

    申请日：2010-09-29

    申请人： Dirk Heinrich Ehm ,  Julian Kaller ,  Stefan Schmidt ,  Dieter Kraus ,  Stefan Wiesner ,  Almut Czap ,  Hin-Yiu Anthony Chung ,  Stefan Koehler

    发明人： Dirk Heinrich Ehm ,  Julian Kaller ,  Stefan Schmidt ,  Dieter Kraus ,  Stefan Wiesner ,  Almut Czap ,  Hin-Yiu Anthony Chung ,  Stefan Koehler

    IPC分类号： G03B27/52 ,  C23F1/08

    CPC分类号： G03F7/70925 ,  B08B7/0035

    摘要： A cleaning module for an EUV lithography device with a supply (206) for molecular hydrogen, a heating filament (210) and a line (212) for atomic and/or molecular hydrogen. The line (212) has at least one bend with a bending angle of less than 120 degrees, and has a material on its inner surface which has a low recombination rate for atomic hydrogen. The supply (206) is of flared shape at its end, which faces the heating filament (210). A gentler cleaning of optical elements is achieved with such a cleaning module, or also by exciting a cleaning gas with a cold cathode or a plasma, or by filtering out charged particles via of electrical and/or magnetic fields.

    摘要翻译： 一种用于EUV光刻设备的清洁模块，其具有用于分子氢的供应（206），用于原子和/或分子氢的加热丝（210）和线（212）。 线（212）具有弯曲角度小于120度的至少一个弯曲部，并且在其内表面上具有原子氢复合率低的材料。 电源（206）在其端部处具有扩口形状，其面向加热丝（210）。 通过这种清洁模块或者通过用冷阴极或等离子体激发清洁气体，或者通过电场和/或磁场过滤掉带电粒子，实现对光学元件的温和清洁。

    Method for cleaning an EUV lithography device, method for measuring the residual gas atmosphere and the contamination and EUV lithography device
    8.
    发明授权
    Method for cleaning an EUV lithography device, method for measuring the residual gas atmosphere and the contamination and EUV lithography device 有权
    用于清洁EUV光刻设备的方法，用于测量残余气体气氛的方法以及污染物和EUV光刻设备

    公开(公告)号：US07911598B2

    公开(公告)日：2011-03-22

    申请号：US12555620

    申请日：2009-09-08

    申请人： Dieter Kraus ,  Dirk Heinrich Ehm ,  Thomas Stein ,  Harald Woelfle ,  Stefan-Wolfgang Schmidt

    发明人： Dieter Kraus ,  Dirk Heinrich Ehm ,  Thomas Stein ,  Harald Woelfle ,  Stefan-Wolfgang Schmidt

    IPC分类号： G01N21/73

    CPC分类号： G01N21/67 ,  G01N21/94 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70925

    摘要： Components (30) in the interior of an EUV lithography device for extreme ultraviolet and soft X-ray wavelength range are cleaned by igniting a plasma, adjacent to the component (30) to be cleaned, using electrodes (29), wherein the electrodes (29) are adapted to the form of the component (30) to be cleaned. The residual gas atmosphere is measured spectroscopically on the basis of the plasma. An emission spectrum is preferably recorded in order to monitor the degree of cleaning. An optical fiber cable (31) with a coupling-in optical unit (32) is advantageously used for this purpose. Moreover, in order to monitor the contamination in the gas phase within the vacuum chambers during the operation of an EUV lithography device, it is proposed to provide modules configured to initiate a gas discharge and to detect radiation emitted on account of the gas discharge. The contamination in the gas phase can be deduced from the analysis of the measured spectrum.

    摘要翻译： 用于极紫外和软X射线波长范围的EUV光刻设备内部的部件（30）通过使用电极（29）点燃邻近被清洁部件（30）的等离子体来清洁，其中电极 29）适于被清洁的部件（30）的形式。 在等离子体的基础上光谱测量残留气体气氛。 优选记录发射光谱以监测清洁程度。 具有耦合入光学单元（32）的光纤电缆（31）有利地用于此目的。 此外，为了在EUV光刻设备的操作期间监测真空室内的气相中的污染，建议提供被配置为启动气体放电并且检测由于气体放电而发射的辐射的模块。 气相中的污染可以从测量光谱的分析推导出来。

    METHOD FOR CLEANING AN EUV LITHOGRAPHY DEVICE, METHOD FOR MEASURING THE RESIDUAL GAS ATMOSPHERE AND THE CONTAMINATION AND EUV LITHOGRAPHY DEVICE
    9.
    发明申请
    METHOD FOR CLEANING AN EUV LITHOGRAPHY DEVICE, METHOD FOR MEASURING THE RESIDUAL GAS ATMOSPHERE AND THE CONTAMINATION AND EUV LITHOGRAPHY DEVICE 有权
    用于清洁EUV光刻设备的方法，用于测量残余气体大气和污染物和EUV光刻设备的方法

    公开(公告)号：US20100034349A1

    公开(公告)日：2010-02-11

    申请号：US12555620

    申请日：2009-09-08

    申请人： Dieter KRAUS ,  Dirk Heinrich Ehm ,  Thomas Stein ,  Harald Woelfle ,  Stefan-Wolfgang Schmidt

    发明人： Dieter KRAUS ,  Dirk Heinrich Ehm ,  Thomas Stein ,  Harald Woelfle ,  Stefan-Wolfgang Schmidt

    IPC分类号： A61B6/02

    CPC分类号： G01N21/67 ,  G01N21/94 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70925

    摘要： Components (30) in the interior of an EUV lithography device for extreme ultraviolet and soft X-ray wavelength range are cleaned by igniting a plasma, adjacent to the component (30) to be cleaned, using electrodes (29), wherein the electrodes (29) are adapted to the form of the component (30) to be cleaned. The residual gas atmosphere is measured spectroscopically on the basis of the plasma. An emission spectrum is preferably recorded in order to monitor the degree of cleaning. An optical fiber cable (31) with a coupling-in optical unit (32) is advantageously used for this purpose. Moreover, in order to monitor the contamination in the gas phase within the vacuum chambers during the operation of an EUV lithography device, it is proposed to provide modules configured to initiate a gas discharge and to detect radiation emitted on account of the gas discharge. The contamination in the gas phase can be deduced from the analysis of the measured spectrum.

    摘要翻译： 用于极紫外和软X射线波长范围的EUV光刻设备内部的部件（30）通过使用电极（29）点燃邻近被清洁部件（30）的等离子体来清洁，其中电极 29）适于被清洁的部件（30）的形式。 在等离子体的基础上光谱测量残留气体气氛。 优选记录发射光谱以监测清洁程度。 具有耦合入光学单元（32）的光纤电缆（31）有利地用于此目的。 此外，为了在EUV光刻设备的操作期间监测真空室内的气相中的污染，建议提供被配置为启动气体放电并且检测由于气体放电而发射的辐射的模块。 气相中的污染可以从测量光谱的分析推导出来。