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    Mirror for guiding a radiation bundle
    3.
    发明授权
    Mirror for guiding a radiation bundle 有权
    用于引导辐射束的镜子

    公开(公告)号：US08717531B2

    公开(公告)日：2014-05-06

    申请号：US12707783

    申请日：2010-02-18

    申请人： Severin Waldis ,  Florian Bach ,  Daniel Benz ,  Armin Werber ,  Wilfried Noell ,  Dirk Heinrich Ehm ,  Stefan Wiesner ,  Dieter Kraus

    发明人： Severin Waldis ,  Florian Bach ,  Daniel Benz ,  Armin Werber ,  Wilfried Noell ,  Dirk Heinrich Ehm ,  Stefan Wiesner ,  Dieter Kraus

    IPC分类号： G03B27/52

    CPC分类号： G02B7/1815 ,  G02B5/0808 ,  G02B5/0891 ,  G03F7/70825 ,  G03F7/70891

    摘要： A mirror serves for guiding a radiation bundle. The mirror has a basic body and a coating of a reflective surface of the basic body, the coating increasing the reflectivity of the mirror. A heat dissipating device serves for dissipating heat deposited in the coating. The heat dissipating device has at least one Peltier element. The coating is applied directly on the Peltier element. A temperature setting apparatus has at least one temperature sensor for a temperature of the reflective surface. A regulating device of the Temperature setting apparatus can be connected to the at least one Peltier element and is signal-connected to the at least one temperature sensor. The result is a mirror in which a heat dissipating capacity of the heat dissipating device is improved.

    摘要翻译： 反射镜用于引导辐射束。 反射镜具有基体和基体的反射表面的涂层，涂层增加了反射镜的反射率。 散热装置用于消散沉积在涂层中的热量。 散热装置具有至少一个珀耳帖元件。 涂层直接施加在珀耳帖元件上。 温度设定装置具有至少一个用于反射表面的温度的温度传感器。 温度设定装置的调节装置可以连接到至少一个珀耳帖元件，并且与至少一个温度传感器信号连接。 结果是提供了散热装置的散热能力的反射镜。

    Illumination system of a microlithographic projection exposure apparatus having a temperature control device
    4.
    发明授权
    Illumination system of a microlithographic projection exposure apparatus having a temperature control device 有权
    具有温度控制装置的微光刻投影曝光装置的照明系统

    公开(公告)号：US08797507B2

    公开(公告)日：2014-08-05

    申请号：US13044160

    申请日：2011-03-09

    申请人： Florian Bach ,  Daniel Benz ,  Severin Waldis ,  Armin Werber ,  Berndt Warm

    发明人： Florian Bach ,  Daniel Benz ,  Severin Waldis ,  Armin Werber ,  Berndt Warm

    IPC分类号： G03B27/52 ,  G03B27/54

    CPC分类号： G03F7/70058 ,  G03F7/70116 ,  G03F7/70141 ,  G03F7/70266 ,  G03F7/70291 ,  G03F7/70891

    摘要： An illumination system of a microlithographic projection exposure apparatus includes a primary light source, a system pupil surface and a mirror array. The mirror array is arranged between the primary light source and the system pupil surface. The mirror array includes a plurality of adaptive mirror elements. Each mirror element includes a mirror support and a reflective coating. Each mirror element is configured to direct light produced by the primary light source towards the system pupil surface. The mirror elements can be tiltably mounted with respect to a support structure. The mirror elements include structures having a different coefficient of thermal expansion and being fixedly attached to one another. A temperature control device is configured to variably modify the temperature distribution within the structures to change the shape of the mirror elements.

    摘要翻译： 微光刻投影曝光装置的照明系统包括主光源，系统光瞳表面和反射镜阵列。 镜阵列布置在主光源和系统光瞳表面之间。 镜阵列包括多个自适应镜元件。 每个镜子元件包括镜子支撑和反射涂层。 每个镜元件被构造成将由主光源产生的光引向系统光瞳表面。 反射镜元件可相对于支撑结构倾斜地安装。 反射镜元件包括具有不同热膨胀系数并且彼此固定地附接的结构。 温度控制装置被配置为可变地修改结构内的温度分布以改变反射镜元件的形状。

    MIRROR FOR GUIDING A RADIATION BUNDLE
    5.
    发明申请
    MIRROR FOR GUIDING A RADIATION BUNDLE 有权
    用于指导辐射器的镜子

    公开(公告)号：US20100261120A1

    公开(公告)日：2010-10-14

    申请号：US12707783

    申请日：2010-02-18

    申请人： Severin Waldis ,  Florian Bach ,  Daniel Benz ,  Armin Werber ,  Wilfried Noell ,  Dirk Heinrich Ehm ,  Stefan Wiesner ,  Dieter Kraus

    发明人： Severin Waldis ,  Florian Bach ,  Daniel Benz ,  Armin Werber ,  Wilfried Noell ,  Dirk Heinrich Ehm ,  Stefan Wiesner ,  Dieter Kraus

    IPC分类号： G03F7/20 ,  G03B27/72 ,  G02B7/192

    CPC分类号： G02B7/1815 ,  G02B5/0808 ,  G02B5/0891 ,  G03F7/70825 ,  G03F7/70891

    摘要： A mirror serves for guiding a radiation bundle. The mirror has a basic body and a coating of a reflective surface of the basic body, the coating increasing the reflectivity of the mirror. A heat dissipating device serves for dissipating heat deposited in the coating. The heat dissipating device has at least one Peltier element. The coating is applied directly on the Peltier element. A temperature setting apparatus has at least one temperature sensor for a temperature of the reflective surface. A regulating device of the Temperature setting apparatus can be connected to the at least one Peltier element and is signal-connected to the at least one temperature sensor. The result is a mirror in which a heat dissipating capacity of the heat dissipating device is improved.

    摘要翻译： 反射镜用于引导辐射束。 反射镜具有基体和基体的反射表面的涂层，涂层增加了反射镜的反射率。 散热装置用于消散沉积在涂层中的热量。 散热装置具有至少一个珀耳帖元件。 涂层直接施加在珀耳帖元件上。 温度设定装置具有至少一个用于反射表面的温度的温度传感器。 温度设定装置的调节装置可以连接到至少一个珀耳帖元件，并且与至少一个温度传感器信号连接。 结果是提供了散热装置的散热能力的反射镜。

    ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    6.
    发明申请
    ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
    微波投影曝光装置的照明系统

    公开(公告)号：US20110181850A1

    公开(公告)日：2011-07-28

    申请号：US13044160

    申请日：2011-03-09

    申请人： Florian Bach ,  Daniel Benz ,  Severin Waldis ,  Armin Werber ,  Berndt Warm

    发明人： Florian Bach ,  Daniel Benz ,  Severin Waldis ,  Armin Werber ,  Berndt Warm

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70058 ,  G03F7/70116 ,  G03F7/70141 ,  G03F7/70266 ,  G03F7/70291 ,  G03F7/70891

    摘要： An illumination system of a microlithographic projection exposure apparatus includes a primary light source, a system pupil surface and a mirror array. The mirror array is arranged between the primary light source and the system pupil surface. The mirror array includes a plurality of adaptive mirror elements. Each mirror element includes a mirror support and a reflective coating. Each mirror element is configured to direct light produced by the primary light source towards the system pupil surface. The mirror elements can be tiltably mounted with respect to a support structure. The mirror elements include structures having a different coefficient of thermal expansion and being fixedly attached to one another. A temperature control device is configured to variably modify the temperature distribution within the structures to change the shape of the mirror elements.

    摘要翻译： 微光刻投影曝光装置的照明系统包括主光源，系统光瞳表面和反射镜阵列。 镜阵列布置在主光源和系统光瞳表面之间。 镜阵列包括多个自适应镜元件。 每个镜子元件包括镜子支撑和反射涂层。 每个镜元件被构造成将由主光源产生的光引向系统光瞳表面。 反射镜元件可相对于支撑结构倾斜地安装。 反射镜元件包括具有不同热膨胀系数并且彼此固定地附接的结构。 温度控制装置被配置为可变地修改结构内的温度分布以改变反射镜元件的形状。

    ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY AND RELATED SYSTEM AND APPARATUS
    7.
    发明申请
    ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY AND RELATED SYSTEM AND APPARATUS 有权
    EUV微观照相和相关系统和装置的照明光学

    公开(公告)号：US20110063598A1

    公开(公告)日：2011-03-17

    申请号：US12915785

    申请日：2010-10-29

    申请人： Damian Fiolka ,  Berndt Warm ,  Christian Steigerwald ,  Martin Endres ,  Ralf Stuetzle ,  Jens Ossmann ,  Ralf Scharnweber ,  Markus Hauf ,  Udo Dinger ,  Severin Waldis ,  Marc Kirch ,  Joachim Hartjes

    发明人： Damian Fiolka ,  Berndt Warm ,  Christian Steigerwald ,  Martin Endres ,  Ralf Stuetzle ,  Jens Ossmann ,  Ralf Scharnweber ,  Markus Hauf ,  Udo Dinger ,  Severin Waldis ,  Marc Kirch ,  Joachim Hartjes

    IPC分类号： G03B27/72

    CPC分类号： G03F7/70191 ,  G03F7/70083

    摘要： An illumination optics for EUV microlithography guides an illumination light bundle from a radiation source to an object field with an extension ratio between a longer field dimension and a shorter field dimension, where the ratio is considerably greater than 1. A field facet mirror has a plurality of field facets that set defined illumination conditions in the object field. A following optics downstream of the field facet mirror transmits the illumination light into the object field. The following optics includes a pupil facet mirror with a plurality of pupil facets. The field facets are in each case individually allocated to the pupil facets so that portions of the illumination light bundle impinging upon in each case one of the field facets are guided on to the object field via the associated pupil facet. The field facet mirror not only includes a plurality of basic illumination field facets which provide a basic illumination of the object field via associated basic illumination pupil facets, but also includes a plurality of correction illumination field facets which provide for a correction of the illumination of the object field via associated correction illumination pupil facets. The result is an illumination optics which allows unwanted variations of illumination parameters, for instance an illumination intensity distribution or an illumination angle distribution, to be corrected across the object field.

    摘要翻译： 用于EUV微光刻的照明光学器件将照射光束从辐射源引导到物场，其具有在较大场尺寸和较短场尺寸之间的延伸比，其中该比率远大于1.场分面镜具有多个 的场面在场景中设置定义的照明条件。 在场面反射镜下游的以下光学器件将照明光透射到物体场中。 以下光学器件包括具有多个光瞳面的光瞳小面镜。 场分面在每种情况下分别被分配给光瞳面，使得在各种情况下照射的照明光束的一部分通过相关联的光瞳小面被引导到物场。 场面镜不仅包括多个基本照明场面，它们通过相关联的基本照明光瞳面提供物场的基本照明，而且还包括多个校正照明场面，其提供对照射的照明的校正 通过相关联的校正照明光瞳面进行物体场。 结果是照明光学元件允许在整个对象场校正照明参数的不期望的变化，例如照明强度分布或照明角度分布。

    OPTICAL MODULE FOR GUIDING A RADIATION BEAM
    8.
    发明申请
    OPTICAL MODULE FOR GUIDING A RADIATION BEAM 审中-公开
    用于引导辐射束的光学模块

    公开(公告)号：US20120044474A1

    公开(公告)日：2012-02-23

    申请号：US13075929

    申请日：2011-03-30

    申请人： Markus Hauf ,  Severin Waldis ,  Wilfried Noell ,  Yves Petremend ,  Marco Jassman ,  Lothar Kulzer ,  Caglar Ataman

    发明人： Markus Hauf ,  Severin Waldis ,  Wilfried Noell ,  Yves Petremend ,  Marco Jassman ,  Lothar Kulzer ,  Caglar Ataman

    IPC分类号： G03B27/54 ,  G03B27/32 ,  G02B7/182

    CPC分类号： G03F7/7015 ,  G02B7/1815 ,  G02B26/0816 ,  G02B26/0833 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/70291 ,  G03F7/70891

    摘要： An optical module is used to guide an EUV radiation beam. The optical module has a chamber that can be evacuated and at least one mirror accommodated in the chamber. The mirror has a plurality of individual mirrors, the reflection faces of which complement one another to form an overall mirror reflection face. A support structure is in each case mechanically connected via a thermally conductive portion to a mirror body of the respective individual mirror. At least some of the mirror bodies have an associated actuator for the predetermined displacement of the mirror body relative to the support structure in at least one degree of freedom. The thermally conductive portions are configured to dissipate a thermal power density of at least 1 kW/m2 absorbed by the mirror bodies to the support structure. In one aspect of the optical module, an integrated electronic displacement circuit is associated with each of the displaceable individual mirrors in spatial proximity, and a central control device has a signal connection with the integrated electronic displacement circuits of the displaceable individual mirrors. The result is an optical module, with which an illumination optical system can be constructed, which, even with a non-negligible thermal load on the individual mirrors, ensures a high EUV radiation throughput.

    摘要翻译： 光学模块用于引导EUV辐射束。 光学模块具有能够抽真空的腔室和容纳在腔室中的至少一个反射镜。 反射镜具有多个单独的反射镜，其反射面相互补充以形成整体的镜面反射面。 在每种情况下，支撑结构通过导热部分机械连接到各个反射镜的镜体。 至少一些镜体具有相关联的致动器，用于在至少一个自由度中相对于支撑结构预定位移镜体。 导热部分被配置为将由镜体吸收的至少1kW / m 2的热功率密度消散到支撑结构。 在光学模块的一个方面，集成电子位移电路与空间接近的每个可移动的独立反射镜相关联，并且中央控制装置具有与可移动的各个反射镜的集成电子位移电路的信号连接。 结果是可以构造照明光学系统的光学模块，其甚至在各个反射镜上具有不可忽视的热负载，确保高的EUV辐射通量。