公开(公告)号：US5849087A

公开(公告)日：1998-12-15

申请号：US886675

申请日：1997-07-01

申请人： Hermann Kloberdanz ,  Josef Hoffmann ,  Jurgen Henrich

发明人： Hermann Kloberdanz ,  Josef Hoffmann ,  Jurgen Henrich

IPC分类号： C23C14/56 ,  C23C14/00

CPC分类号： C23C14/566

摘要： In a vacuum treatment system for applying thin layers to substrates (2, 2', . . . ) such as headlight reflectors, with several treatment (8, 9, 10) and/or inward and outward transfer lock stations (20) supported on a stationary vacuum chamber wall (16, 16', . . . ) and with a rotatably supported internal cylinder (14), which is enclosed by the vacuum chamber wall and carries the substrate chambers (3-6), openings (24-27) are provided in the vacuum chamber wall (16, 16', . . . ), with which the substrate chambers (3-6) can be aligned and through which the treatment agents can be allowed to act on the substrates (2, 2', . . . ) and/or through which the substrates can be transferred in and out, where one of the substrate chambers, but at least the inward/outward transfer lock chamber (20), has as cover or a sealing flap (33), which allows direct access to the corresponding substrate chamber, and where the chamber (20) can be shifted (A, B) toward the internal cylinder (14) and pressed against the outside wall of the cylinder (14) or against the frame-like end surface of the substrate chamber (3).

摘要翻译： 在用于将薄层施加到诸如头灯反射器的基板（2,2'...）上的真空处理系统中，具有几个处理（8,9,10）和/或向内和向外转移的锁定站（20）支撑在 固定的真空室壁（16,16'，...）和可旋转地支撑的内筒（14），其被真空室壁包围并承载基板室（3-6），开口（24-27） ）设置在真空室壁（16,16'...）中，基板室（3-6）可以与基板室（3-6）对准，通过该真空室壁可以使处理剂作用在基板（2,2）上 （...）和/或可以将衬底输入和输出，其中一个衬底腔室至少内向/向外传送锁定室（20）具有盖或密封挡板（33） ），其允许直接进入相应的衬底室，并且其中腔室（20）可以朝向内部气缸（14）移动（A，B）并且被压缩的aga 将气缸（14）的外壁或衬底室（3）的框架状端面固定。

公开(公告)号：US20120052201A1

公开(公告)日：2012-03-01

申请号：US12876801

申请日：2010-09-07

申请人： Annemarie Flock ,  Andreas Sauer ,  Josef Hoffmann ,  Tobias Bergmann ,  Susanne Schlafer

发明人： Annemarie Flock ,  Andreas Sauer ,  Josef Hoffmann ,  Tobias Bergmann ,  Susanne Schlafer

IPC分类号： C23C14/22 ,  C23C14/24 ,  B25B11/00 ,  C23C14/34

CPC分类号： H01L21/67754

摘要： Pallets suited to accommodate thermal gradients during processing. In one aspect, a pallet includes a pair of elongate members, a fixed elongate lateral cross member fixedly coupled to each of the elongate members, and an elongate floating lateral cross member floatingly coupled to the elongate members. The floating lateral cross member displaced from the fixedly coupled lateral cross member to define a gap therebetween.

摘要翻译： 托盘适用于加工过程中的热梯度。 在一个方面，托盘包括一对细长构件，固定地连接到每个细长构件的细长横向横向构件以及与细长构件浮动连接的细长浮动横向横向构件。 浮动横向横向构件从固定联接的横向横向构件移位以限定其间的间隙。

公开(公告)号：US20120121816A1

公开(公告)日：2012-05-17

申请号：US12954007

申请日：2010-11-24

申请人： Josef Hoffmann ,  Tobias Bergmann ,  Soenke Groth ,  Horst Alt

发明人： Josef Hoffmann ,  Tobias Bergmann ,  Soenke Groth ,  Horst Alt

IPC分类号： B65D19/38 ,  C23C14/34

CPC分类号： H01L21/673 ,  H01L21/67748 ,  H01L21/67754

摘要： A generally planar substrate pallet having an front, a back, and pair of sides. The distance between the front and the back and the distance between the sides are significantly longer than the thickness of the substrate pallet. The ratio of vertical deflection of the substrate pallet to the distance between the sides at temperatures used in high temperature processing systems relative to room temperature is less than 1%.

摘要翻译： 具有前部，后部和一对侧面的大致平面的基板托盘。 前后的距离和两边之间的距离明显长于基板托盘的厚度。 在高温处理系统中使用的温度相对于室温的情况下，基板托盘的垂直偏转比与侧面之间的距离小于1％。

公开(公告)号：US06206975B1

公开(公告)日：2001-03-27

申请号：US09302491

申请日：1999-04-30

申请人： Alfred Rick ,  Josef Hoffmann ,  Klaus Michael

发明人： Alfred Rick ,  Josef Hoffmann ,  Klaus Michael

IPC分类号： C23C1600

CPC分类号： C23C14/56

摘要： Vacuum treatment system for application of thin layers onto substrates (36, 38, 40, 42) with a transfer chamber (5) and several treatment chambers (6, 8, 10, 12), said treatment chambers peripherally attached to the transfer chamber and being connected to said transfer chamber by means of a common opening (27, 29, 31, 33) for inlet and outlet of substrate (36, 38, 40, 42), and with a handling device (24) for transport of the substrate (36, 38, 40, 42) between the treatment chambers (6, 8, 10, 12), whereby the handling device (24) has at least one substrate holder (37, 39, 41, 43) with one pivot and/or rotating retaining part to hold the substrates (36, 38, 40, 42), by means of which the substrates (36, 38, 40, 42) can pivot and/or rotate in the treatment chambers (6, 8, 10, 12).

摘要翻译： 用于将薄层施加到具有传送室（5）和多个处理室（6,8,10,12）的基板（36,38,40,42）上的真空处理系统，所述处理室周边附接到传送室， 通过用于衬底（36,38,40,42）的入口和出口的公共开口（27,29,31,33）连接到所述传送室，以及用于传送衬底的处理装置（24） （36,88,40,42），其中处理室（6,8,10,12）具有至少一个具有一个枢轴和/或一个枢轴的衬底保持器（37,39,41,43） 或旋转保持部分以保持基板（36,38,40,42），通过该基板，基板（36,38,40,42）可以在处理室（6,8,10和42）中枢转和/或旋转， 12）。