摘要:
A developer for use with a lithographic photo-sensitive medium of a polyether resin, comprising a compound of the formula:RO--CH.sub.2 --CH.sub.2 --O--.sub.k R.sup.1orROCH.sub.2 CH.sub.2 OR.sup.2(wherein R represents an alkyl group with carbon number of 1 to 4, R.sup.1 represents hydrogen or an acyl group, R.sup.2 represents an acyl group with a carbon number of 2 to 5, and k represents an integer of 2 to 3).
摘要:
A photosensitive composition is prepared from a mixture of a photosensitive resin containing radicals having the formula ##STR1## wherein X and Y represent hydrogen, halogen, cyano or nitro, Ar represents an aryl radical or a substituted aryl radical, and n represents 1 or 2, and a solvent having the formula ##STR2## wherein R and R" represent a lower alkyl radical and R' represents a lower alkylene radical.
摘要:
Disclosed herein is a positive photoresist composition containing (a) a photosensitizer of 1,2-napthtoquinone diazides photosensitive-material comprising an ester of 2,3,4,4'-tetrahydroxybenzophenone in which on the average, not less than two hydroxyl groups of 2,3,4,4'-tetrahydroxybenzophenone have been esterified by 1,2-naphthoquinonediazide-5-sulfonic acid and (b) a novolak resin obtained by condensing a mixture of m-cresol, p-cresol and 2,5-xylenol with formaldehyde.
摘要:
Disclosed herein is a positive photosensitive composition comprising a 1,2-naphthoquinone diazide compound and a binder resin comprising a novolak resin containing as condensation components .beta.-naphthol, or .alpha.-naphthol and p-cresol.
摘要:
A monoazo compound of the general formula ##STR1## wherein; Y is hydrogen, methyl, methoxy, acetylamino, or nitro, or Y, cojointly with the carbon atom located in the benzene ring B at the 3-position with respect to the N.dbd.N group, may form a benzene ring; X is acetyl, benzoyl, p-toluenesulfonyl, or 4-chloro-6-hydroxy-1,3,5-triazine-2-yl; and M.sup.1, M.sup.2 and M.sup.3 each are a base selected from alkali metal atom, ammonium cation and amine salt cation. A recording liquid comprising a coloring matter, which is an image-forming component, and a liquid medium for dissolving or dispersing the coloring matter, said recording liquid being characterized by containing as coloring matter the above-mentioned monoazo compound.
摘要:
Disclosed herein is an antistatic photo-resist containing an antistatic agent. Since antistatic photo-resist according to the present invention is hardly charged, it can be suitably used as a mask in implanting ions into semiconductor substrate.
摘要:
A liquid crystal display device of the type in which thermo-writing is performed by means of irradiation of laser beams, the display device including a laser-sensitive liquid crystal composition exhibiting a maximum absorption at or near the wavelength of the impinging laser beam with which the display device is to be used. The specific improvement of the present invention comprises including in the liquid crystal composition at least two types of laser-responsive dyes, each being present in an amount less than its solubility limit in the liquid crystal composition, and each of the dyes evidencing a maximum absorption at or near the wavelength of the laser beam. In an embodiment, the dyes are chosen from the class of squarilium dyes.
摘要:
A polarizing film which comprises a film base having thereon an anthraquinone dye of general formula (I): ##STR1## wherein R.sup.1 and R.sup.2 each represents a hydrogen atom, an alkyl group, an alkoxy group, an aralkyloxy group, an aryl group, a cyclohexyl group, a 4-alkylcyclohexyl group, a carboxylic acid ester group, a carboxylic acid amide group, a halogen atom, ##STR2## X represents an oxygen atom, a sulfur atom or an amino group.
摘要:
A squarilium compound represented by the following formula (I) and a liquid crystal composition containing the same are disclosed: ##STR1## wherein X and Y each represents ##STR2## wherein R.sup.1 represents a hydrogen atom, an alkyl group, a substituted or unsubstituted aryl group or a substituted or unsubstituted aralkyl group; R.sup.2, R.sup.3 and R.sup.4 each represents a hydrogen atom, an alkyl group or a substituted or unsubstituted alkoxy group; R.sup.5 represents a hydrogen atom, an alkyl group, an aralkyl group or an aryl group; ring A represents a cyclic alkylene; ring B represents a substituted or unsubstituted aromatic ring; and ring C represents a heterocyclic ring containing one or two of a nitrogen atom, an oxygen atom and a sulfur atom; with proviso that X and Y are not the same when either one of them represents ##STR3## and a liquid crystal composition containing the squarilium compound of the formula (I). The squarilium compound (I) are soluble in a wide variety of solvents and resistant to light, and their maximum absorption wavelengths in these solvents are in the ranges of from 700 to 900 nm.