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    Luminescent material and organic electroluminescent device using the same
    6.
    发明申请
    Luminescent material and organic electroluminescent device using the same 审中-公开
    发光材料及使用其的有机电致发光器件

    公开(公告)号：US20100025661A1

    公开(公告)日：2010-02-04

    申请号：US11631421

    申请日：2005-06-24

    申请人： Guofang Wang ,  Manabu Uchida ,  Youhei Ono

    发明人： Guofang Wang ,  Manabu Uchida ,  Youhei Ono

    IPC分类号： H01L51/54 ,  C07D333/50 ,  C07C15/30 ,  C07C15/28 ,  C07D209/86 ,  C07D333/10 ,  C07D401/04 ,  C07D215/04 ,  C07D211/80

    CPC分类号： H01L51/0052 ,  C09K11/06 ,  C09K2211/1007 ,  C09K2211/1011 ,  C09K2211/1029 ,  C09K2211/1092 ,  C09K2211/185 ,  H01L51/0054 ,  H01L51/0058 ,  H01L51/0067 ,  H01L51/0068 ,  H01L51/0071 ,  H01L51/0072 ,  H01L51/0074 ,  H01L51/0085 ,  H01L51/0087 ,  H01L51/5012 ,  H05B33/14

    摘要： The subject of the present invention is to provide an emission material which contributes to high emission efficiency, low drive voltage, excellent heat resistance and long life in an organic electroluminescent device, particularly an emission material which is excellent in emission of blue color. Further, the subject is to provide an organic electroluminescent device using the above emission material. The above subjects can be achieved by an emission material represented by Formula (1) and an organic electroluminescent device comprising the same. wherein R1 to R7 are independently hydrogen, alkyl or cycloalkyl; Ar1 is one selected from the group consisting of non-condensed aryl having 6 to 50 carbon atoms, 2-naphthyl, 9-phenanthryl, 6-chrysenyl, 2-triphenylenyl, 2-fluorenyl, 9-carbazolyl, 2-thienyl and 2-benzothienyl; and Ar2 and Ar3 are independently non-condensed aryl having 6 to 50 carbon atoms, condensed aryl having 10 to 50 carbon atoms or heteroaryl having 2 to 50 carbon atoms.

    摘要翻译： 本发明的主题是提供一种在有机电致发光器件，特别是发射蓝色优异的发射材料中有助于高发光效率，低驱动电压，优异的耐热性和长寿命的发射材料。 此外，本发明提供使用上述发射材料的有机电致发光器件。 上述受试者可以通过由式（1）表示的发射材料和包含其的有机电致发光器件来实现。 其中R 1至R 7独立地为氢，烷基或环烷基; Ar1是选自具有6至50个碳原子的非缩合芳基，2-萘基，9-菲基，6-辛基，2-三苯基，2-芴基，9-咔唑基，2-噻吩基和2- 苯并噻吩基; Ar 2和Ar 3分别为碳原子数6〜50的非缩合芳基，碳原子数为10〜50的缩合芳基或碳原子数2〜50的杂芳基。

    VACUUM PROCESSING APPARATUS AND VACUUM PROCESSING METHOD
    8.
    发明申请
    VACUUM PROCESSING APPARATUS AND VACUUM PROCESSING METHOD 审中-公开
    真空加工设备和真空加工方法

    公开(公告)号：US20120156887A1

    公开(公告)日：2012-06-21

    申请号：US13392010

    申请日：2010-08-24

    申请人： Youhei Ono ,  Masaaki Kawana ,  Yutaka Miura

    发明人： Youhei Ono ,  Masaaki Kawana ,  Yutaka Miura

    IPC分类号： H01L21/306 ,  H01L21/3065

    CPC分类号： H01J37/32422 ,  H01J37/32357 ,  H01J37/3244 ,  H01J37/32449 ,  H01L21/02046 ,  H01L21/02063 ,  H01L21/76814

    摘要： A vacuum processing apparatus, comprising: a processing chamber 3 in which an object to be processed is placed and a predetermined vacuum state is formed; a first processing gas introducing means 12 for converting a first processing gas into a radical state and introducing the resulting first processing gas in the radical state into the processing chamber through first processing gas introducing ports which open to the interior of the processing chamber; a second processing gas introducing means 15 for introducing a second processing gas, which is reactive with the first processing gas in the radical state, into the processing chamber through second processing gas introducing ports which open to the interior of the processing chamber; a temperature controlling means for controlling the temperature within the processing chamber 3 to a first temperature-controlled state, in which the first processing gas in the radical state and the second processing gas process the surface of the object to be processed, thereby producing a reaction product, and to a second temperature-controlled state in which the resulting reaction product is sublimated and removed; and an inert gas introducing means for introducing an inert gas into the processing chamber 3 through the processing gas introducing ports 12 when the temperature controlling means controls the temperature within the processing chamber to the second temperature-controlled state.

    摘要翻译： 一种真空处理装置，包括：处理室3，其中放置有待加工物体并形成预定的真空状态; 第一处理气体引入装置12，用于将第一处理气体转化为自由基状态，并将所得到的自由基状态的第一处理气体通过向处理室的内部开放的第一处理气体导入口引入处理室; 第二处理气体引入装置15，用于将通过自由基状态的第一处理气体反应的第二处理气体通过向处理室内部开放的第二处理气体导入口引入处理室; 温度控制装置，用于将处理室3内的温度控制到第一温度控制状态，其中自由基状态的第一处理气体和第二处理气体处理待处理物体的表面，从而产生反应 产物和第二温度控制状态，其中所得反应产物升华和除去; 以及惰性气体引入装置，当温度控制装置将处理室内的温度控制到第二温度控制状态时，通过处理气体导入口12将惰性气体引入处理室3。