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公开(公告)号：US5993637A
公开(公告)日：1999-11-30
申请号：US984046
申请日：1997-12-03
申请人： Masaya Hisamatsu , Akio Hasebe , Tsutomu Murakami , Hirofumi Ichinose , Satoshi Shinkura , Yukie Ueno
发明人： Masaya Hisamatsu , Akio Hasebe , Tsutomu Murakami , Hirofumi Ichinose , Satoshi Shinkura , Yukie Ueno
CPC分类号： H01L31/076 , C25F3/12 , C25F7/00 , H01L31/1884 , Y02E10/548
摘要： An electrode structure is constituted by a first electrode, and at least one second electrode providing a pair of opposite portions with a prescribed spacing therebetween at which the first electrode is disposed. The electrode structure is suitably used for electrolytic etching and is effective in providing an accurate etching pattern without damaging the surface of an etching object.
摘要翻译： 电极结构由第一电极和至少一个第二电极构成，所述至少一个第二电极提供一对相对的部分，其间设置有第一电极。 电极结构适合用于电解蚀刻，并且在提供精确的蚀刻图案而不损坏蚀刻对象的表面的情况下是有效的。
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2.发明授权Etching method and process for producing a semiconductor element using said etching method 失效蚀刻方法和使用所述蚀刻方法制造半导体元件的方法
公开(公告)号：US5863412A
公开(公告)日：1999-01-26
申请号：US731663
申请日：1996-10-17
申请人： Hirofumi Ichinose , Ippei Sawayama , Akio Hasebe , Tsutomu Murakami , Masaya Hisamatsu , Satoshi Shinkura , Yukie Ueno
发明人： Hirofumi Ichinose , Ippei Sawayama , Akio Hasebe , Tsutomu Murakami , Masaya Hisamatsu , Satoshi Shinkura , Yukie Ueno
CPC分类号： C25F3/14 , C25F3/12 , H01L31/186 , H01L31/1884 , H01L31/208 , Y02E10/50 , Y02P70/521
摘要： A method for etching an object having a portion to be etched on the surface thereof, comprising a step of immersing said object in an electrolyte solution such that said object serves as a negative electrode; a step of arranging a counter electrode having a pattern corresponding to a desired etching pattern to be formed at said portion to be etched of said object in said electrolyte solution so as to maintain a predetermined interval between said counter electrode and said object, and a step of applying a direct current or a pulse current between said object and said counter electrode to etch said portion to be etched of said object into a pattern corresponding to said pattern of said counter electrode.
摘要翻译： 一种在其表面上蚀刻具有待蚀刻部分的物体的方法，包括将所述物体浸入电解质溶液中以使所述物体用作负极的步骤; 在所述电解质溶液中，在所述物体的被蚀刻部分上形成具有对应于期望蚀刻图案的图案的对电极，以保持所述对置电极与所述物体之间的预定间隔的步骤;以及步骤 在所述物体和所述对电极之间施加直流电流或脉冲电流，以将所述物体的待蚀刻部分刻蚀成与所述对电极的所述图案对应的图案。
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公开(公告)号：US6051116A
公开(公告)日：2000-04-18
申请号：US163546
申请日：1998-09-30
申请人： Hirofumi Ichinose , Ippei Sawayama , Akio Hasebe , Tsutomu Murakami , Masaya Hisamatsu , Satoshi Shinkura , Yukie Ueno
发明人： Hirofumi Ichinose , Ippei Sawayama , Akio Hasebe , Tsutomu Murakami , Masaya Hisamatsu , Satoshi Shinkura , Yukie Ueno
CPC分类号： C25F3/14 , C25F3/12 , H01L31/186 , H01L31/1884 , H01L31/208 , Y02E10/50 , Y02P70/521
摘要： An etching apparatus is described comprising a substrate holding segment for holding a substrate with a portion to be etched, an electrolytic bath for maintaining an electrolyte solution therein, a locomotive mechanism for moving the substrate holding segment in order to immerse the substrate held on the substrate holding segment in the electrolyte solution maintained in the electrolytic bath, and a counter electrode holding segment for holding a counter electrode having a pattern corresponding a desired etching pattern to be formed at the portion to be etched of the substrate. The counter electrode is positioned to oppose the substrate held on the substrate holding segment.
摘要翻译： 描述了一种蚀刻装置，其包括用于保持具有待蚀刻部分的基板的基板保持段，用于在其中维持电解质溶液的电解槽，用于移动基板保持段以便将保持在基板上的基板浸没的机车机构 保持在电解液中的电解液中的保持段，以及用于保持对置电极的对电极保持段，该对电极具有对应于待蚀刻部分的所需蚀刻图案的图案。 相对电极被定位成与保持在基板保持段上的基板相对。
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公开(公告)号：US5759291A
公开(公告)日：1998-06-02
申请号：US671329
申请日：1996-06-27
IPC分类号： H01L31/04 , H01L31/0224 , H01L31/048 , H01L31/18
CPC分类号： H01L31/048 , H01L31/022425 , Y02B10/12 , Y02E10/50
摘要： A photovoltaic device comprising a semiconductor layer, a current collecting electrode on said semiconductor layer, and a bus bar electrically connected to the current collecting electrode. The current collecting electrode comprises a metal wire. A part of the current collecting electrode is positioned between the bus bar and the semiconductor layer.
摘要翻译： 一种光电器件，包括半导体层，所述半导体层上的集电电极以及与集电极电连接的汇流条。 集电极包括金属线。 集电极的一部分位于母线和半导体层之间。
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5.发明授权
公开(公告)号：US6051778A
公开(公告)日：2000-04-18
申请号：US988967
申请日：1997-12-11
IPC分类号： H01L21/28 , H01L31/0224 , H01L31/04 , H01L31/048 , H01L31/075 , H01L31/18
CPC分类号： H01L31/076 , H01L31/022425 , H01L31/048 , Y02E10/548
摘要： An electrode structure is formed by superposing a bar-shaped or linear metal member on an electroconductive layer comprising a polymeric resin and an electroconductive filler dispersed therein. The electroconductive layer may be formed as an electroconductive sheet in advance and patterned before it is superposed with the metal member, followed by heat and pressure application to provide an electrode structure showing a low resistivity, a large adhesion even to an elevation and a high reliability. The electrode structure is suitably used for providing a collector electrode structure on a photo-electricity generating device.
摘要翻译： 通过将棒状或线状金属构件叠加在包含聚合物树脂和分散在其中的导电填料的导电层上而形成电极结构。 导电层可以预先形成为导电片，并在与金属构件重叠之前形成图案，然后进行热和压力施加，以提供显示低电阻率的电极结构，甚至高程度的大粘附性和高可靠性 。 电极结构适合用于在光电产生装置上提供集电极结构。
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公开(公告)号：US6008451A
公开(公告)日：1999-12-28
申请号：US907076
申请日：1997-08-06
IPC分类号： H01L31/04 , H01L31/0224 , H01L31/075 , H01L31/00
CPC分类号： H01L31/076 , H01L31/022425 , H01L31/075 , Y02E10/548
摘要： A photovoltaic device is provided which comprises a semiconductor layer, and an electrode comprising an electrode member and an conductive resin layer, wherein the electrode member has a constitution of a complex of a core and a periphery, and the periphery contains no particle with a particle size larger than 2 .mu.m. The electrode of this photovoltaic device exhibits high current collecting efficiency and is reliable in long use term.
摘要翻译： 提供了一种光电器件，其包括半导体层，以及包括电极构件和导电树脂层的电极，其中电极构件具有芯和周围的复合体的结构，并且周边不含有颗粒的颗粒 尺寸大于2亩。 该光电器件的电极具有高的集电效率，并且在长期使用期间是可靠的。
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公开(公告)号：US5861324A
公开(公告)日：1999-01-19
申请号：US764301
申请日：1996-12-12
IPC分类号： H01L31/04 , H01L31/0224 , H01L31/075
CPC分类号： H01L31/076 , H01L31/022425 , H01L31/022466 , H01L31/075 , Y02E10/548
摘要： A photovoltaic element comprising an electrode comprising an electrically conductive core member which is coated with a conductive adhesive fixed on the light incident surface of a photoactive semiconductor layer, via the conductive adhesive, is disclosed.The conductive adhesive is composed of at least two layers. The softening point of the conductive adhesive layer nearer to the core member is higher than the highest temperature encountered in the manufacture of the photovoltaic element.
摘要翻译： 公开了一种光电元件，其包括通过导电粘合剂包括固定在光活性半导体层的光入射表面上的导电粘合剂的导电芯体的电极。 导电粘合剂由至少两层组成。 导电粘合剂层更靠近核心部件的软化点高于制造光电元件时遇到的最高温度。
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公开(公告)号：US5859397A
公开(公告)日：1999-01-12
申请号：US857905
申请日：1997-05-16
IPC分类号： H01L31/0392 , H01L31/076 , H01L31/20 , C07C1/00 , C23F13/00 , C25F1/00 , C30B30/02
CPC分类号： H01L31/076 , H01L31/03921 , H01L31/208 , Y02E10/548 , Y02P70/521
摘要： A process for producing a photovoltaic element, said process comprising the steps of: providing a photovoltaic element comprising a lower electrode layer comprising a metallic layer comprising aluminum or an aluminum compound and a transparent and electrically conductive layer, a photoelectric conversion semiconductor layer, and a transparent electrode layer stacked in the named order on an electrically conductive surface of a substrate, and immersing said photovoltaic element in an electrolyte solution to passivate an short-circuited current path defect present in said photovoltaic element by the action of an electric field, wherein said electrolyte solution has a chlorine ion content of 0.03 mol/l or less.
摘要翻译： 一种制造光伏元件的方法，所述方法包括以下步骤：提供包括下电极层的光电元件，该下电极层包括由铝或铝化合物构成的金属层和透明导电层，光电转换半导体层和 透明电极层按照所述顺序层叠在基板的导电表面上，并将所述光电元件浸入电解液中，以通过电场的作用钝化存在于所述光电元件中的短路电流路径缺陷，其中所述 电解质溶液的氯离子含量为0.03mol / l以下。
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9.发明授权Electrolytic etching method, method for producing photovoltaic element, and method for treating defect of photovoltaic element 失效电解蚀刻方法，光电元件的制造方法以及光电元件的缺陷处理方法公开(公告)号：US06491808B2
公开(公告)日：2002-12-10
申请号：US09149280
申请日：1998-09-09
IPC分类号： B23H1100
CPC分类号： C25F3/02
摘要： An electrolytic etching method for etching treating an object to be etched by an electrochemical reaction through an electrolyte between the object to be etched and an etching electrode, where the contact angle of the electrolyte to the object to be etched is not more than 70°. This electrolytic etching method can etch the object in a non-contact manner, can reduce the cost, number of steps, and processing time, and can enhance the patterning accuracy.
摘要翻译： 一种电解腐蚀方法，用于通过电化学反应通过待蚀刻对象物和蚀刻电极之间的电解质蚀刻处理待蚀刻的物体，其中电解质与待蚀刻物体的接触角不大于70°。 这种电解蚀刻方法可以以非接触的方式蚀刻物体，可以降低成本，步数和处理时间，并且可以提高图案精度。
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公开(公告)号：US06472594B1
公开(公告)日：2002-10-29
申请号：US08893623
申请日：1997-07-11
IPC分类号： H01L310216
CPC分类号： H01L31/076 , H01L31/022425 , H01L31/022466 , H01L31/022475 , H01L31/022483 , H01L31/075 , Y02E10/548
摘要： A photovoltaic element comprising an electrode comprising an electrically conductive core member which is coated with a conductive adhesive fixed on the light incident surface of a photoactive semiconductor layer, via the conductive adhesive, is disclosed. The conductive adhesive is composed of at least two layers. The softening point of the conductive adhesive layer nearer to the core member is higher than the highest temperature encountered in the manufacture of the photovoltaic element.
摘要翻译： 公开了一种光电元件，其包括通过导电粘合剂包括固定在光活性半导体层的光入射表面上的导电粘合剂的导电芯体的电极。导电粘合剂由至少两层组成。 导电粘合剂层更靠近核心部件的软化点高于制造光电元件时遇到的最高温度。
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