公开(公告)号：US20120210077A1

公开(公告)日：2012-08-16

申请号：US13366417

申请日：2012-02-06

申请人： Hiromasa HOSHINO ,  Daisuke HAYASHI ,  Hidefumi MURAOKA

发明人： Hiromasa HOSHINO ,  Daisuke HAYASHI ,  Hidefumi MURAOKA

IPC分类号： G06F12/00

CPC分类号： G11B20/10527 ,  G11B20/1883 ,  G11B2020/1062 ,  G11B2020/10953 ,  G11B2220/41 ,  G11B2220/60 ,  H04N5/772 ,  H04N5/907

摘要： A recording system includes a controller configured to write content data on at least first and second storage media, in parallel with each other. If there is a period in which the content data has failed to be written on the first storage medium but has been written successfully on the second storage medium, the controller finds, on the first storage medium, a storage space, of which the size is equal to or greater than that of partial data that is the content data that has been written successfully on the second storage medium during the period, and writes recovery information on one or more storage media other than the first storage medium. The recovery information includes some pieces of information to identify the first storage medium, to specify the storage space, and to define an area on the second storage medium on which the partial data has been written.

摘要翻译： 记录系统包括被配置为在至少第一和第二存储介质上彼此并行地写入内容数据的控制器。 如果存在内容数据未能写入第一存储介质但已被成功写入第二存储介质的时段，则控制器在第一存储介质上找到尺寸为 等于或大于在该周期期间已经在第二存储介质上成功写入的内容数据的部分数据的数据，并将恢复信息写入到除了第一存储介质之外的一个或多个存储介质上。 恢复信息包括用于识别第一存储介质的一些信息，以指定存储空间，并且在其上写有部分数据的第二存储介质上定义区域。

公开(公告)号：US20080273153A1

公开(公告)日：2008-11-06

申请号：US12113515

申请日：2008-05-01

申请人： Kentarou TAKEDA ,  Takeharu KITAGAWA ,  Daisuke HAYASHI ,  Hideki ISHIDA ,  Nao MURAKAMI ,  Junichi NAGASE

发明人： Kentarou TAKEDA ,  Takeharu KITAGAWA ,  Daisuke HAYASHI ,  Hideki ISHIDA ,  Nao MURAKAMI ,  Junichi NAGASE

IPC分类号： G02F1/13363

CPC分类号： G02F1/133634 ,  G02F1/1393 ,  G02F2001/133635 ,  G02F2413/02

摘要： The liquid crystal panel according to an embodiment of the present invention includes, in the stated order from a viewer side: a first polarizer; a first optical compensation layer; a liquid crystal cell; a second optical compensation layer; and a second polarizer, wherein: the first optical compensation layer has an absolute value of a photoelastic coefficient of 40×10−12 (m2/N) or less, has an in-plane retardation Δnd of 90 nm to 200 nm, has relationships of the following Expressions (1) and (2), and functions as a protective layer on a liquid crystal cell side of the first polarizer; and the second optical compensation layer has relationships of the following Expressions (3) and (4), Δnd(380)=Δnd(550)=Δnd(780)   (1) nx>ny>nz   (2) Rth(380)>Rth(550)>Rth(780)   (3) nx=ny>nz.   (4)

摘要翻译： 根据本发明实施例的液晶面板按照从观察者侧的顺序包括：第一偏振器; 第一光学补偿层; 液晶单元; 第二光学补偿层; 和第二偏振器，其中：所述第一光学补偿层的光弹性系数的绝对值为40×12 -12（m 2 / N 2 / N）以下，具有in 平面延迟90nm〜200nm的色差具有以下表达式（1）和（2）的关系，并且用作第一偏振器的液晶单元侧的保护层; 并且第二光学补偿层具有以下表达式（3）和（4）的关系：<？in-line-formula description =“In-line Formulas”end =“lead”？> Deltand（380）= Deltand（550 ）= Deltand（780）（1）<？in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line-formula description =“In-line Formulas”end =“lead “？> nx> ny> nz（2）<？in-line-formula description =”In-line Formulas“end =”tail“？> <？in-line-formula description =”In-line Formulas“end = “lead”→Rth（380）> Rth（550）> Rth（780）（3）<？in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line- 公式description =“在线公式”end =“lead”？> nx = ny> nz。 （4）<？in-line-formula description =“In-line Formulas”end =“tail”？>

公开(公告)号：US20080181825A1

公开(公告)日：2008-07-31

申请号：US12020881

申请日：2008-01-28

申请人： Daisuke HAYASHI

发明人： Daisuke HAYASHI

IPC分类号： G05D23/19

CPC分类号： H01L21/67103 ,  H01L21/67248 ,  H01L21/68785 ,  H01L21/68792

摘要： A substrate mounting structure that can maintain the temperature uniformity of a substrate mounted on a mounting stage. The substrate mounting structure disposed in a pressure reduced space has a base portion, a pillar portion mounted in a standing manner on the base portion and having an internal space, and a mounting stage supported on the pillar portion and having a substrate mounted thereon. The mounting stage has a heating element that heats the mounted substrate, and a thermal breaking unit that mechanically breaks an electrical power supply line connected to the heating element depending on the temperature of the substrate. The pillar portion is comprised of a thin-walled cylinder. The thermal breaking unit is disposed on the pillar portion's internal space side in the mounting stage, and the pressure in the internal space is reduced.

摘要翻译： 可以保持安装在安装台上的基板的温度均匀性的基板安装结构。 设置在减压空间中的基板安装结构具有底座部分，立柱安装在基部上并具有内部空间的支柱部分，以及支撑在支柱部分上并安装有基板的安装台。 安装台具有加热安装的基板的加热元件和根据基板的温度机械地断开连接到加热元件的电源线的热断裂单元。 柱部分由薄壁圆筒构成。 热分断单元设置在安装台的柱部内部空间侧，内部空间内的压力降低。

公开(公告)号：US20110074973A1

公开(公告)日：2011-03-31

申请号：US12893769

申请日：2010-09-29

申请人： Daisuke HAYASHI

发明人： Daisuke HAYASHI

IPC分类号： H04N5/228

CPC分类号： H04N5/232 ,  H04N5/23219

摘要： An image captured with an imaging section is thinned out to generate a low resolution image. A face detection section obtains the low resolution image. The face detection section detects a face image from the low resolution image. A still state detector judges whether the face image is in a still state. The still state detector counts the number of frames which has been judged still by the still state detector. When the number of frames judged still reaches a predetermined value during half-pressing of a release button, a CPU automatically records the low resolution image as a substitute for a still image.

摘要翻译： 用成像部分拍摄的图像被稀疏以产生低分辨率图像。 脸部检测部分获得低分辨率图像。 脸部检测部从低分辨率图像检测脸部图像。 静止状态检测器判断脸部图像是否处于静止状态。 静止状态检测器对静止状态检测器判断的帧数进行计数。 当在释放按钮的半按压期间判断的帧数仍达到预定值时，CPU自动记录低分辨率图像作为静止图像的替代。

公开(公告)号：US20100265419A1

公开(公告)日：2010-10-21

申请号：US12762710

申请日：2010-04-19

申请人： Daisuke HAYASHI ,  Kunihisa Nakamura ,  Takeshi Utagawa

发明人： Daisuke HAYASHI ,  Kunihisa Nakamura ,  Takeshi Utagawa

IPC分类号： G02F1/1335 ,  G03B3/00

CPC分类号： G02F1/1313 ,  G02B7/008 ,  G03B3/00 ,  H04N9/3144 ,  H04N9/317 ,  H04N9/3197

摘要： A projector includes: a display device which modulates illumination light; a projection lens which projects modulation light produced by the display device; and a holding device which has a holder member supporting the display device, a frame member supporting the projection lens and functions as a base capable of supporting the holder member, and an expanding and contracting member disposed between the frame member and the display device, wherein a temperature coefficient for the expansion and contraction of the expanding and contracting member in the direction of the optical axis of the projection lens corresponds to a temperature coefficient for the increase and decrease of the focal distance of the projection lens.

摘要翻译： 投影仪包括：调制照明光的显示装置; 投影透镜，投射由显示装置产生的调制光; 以及保持装置，其具有支撑显示装置的保持构件，支撑投影透镜的框架构件，并且用作能够支撑保持构件的基座，以及布置在框架构件和显示装置之间的伸缩构件，其中 膨胀收缩构件在投影透镜的光轴方向上的膨胀和收缩的温度系数对应于投影透镜的焦距的增加和减小的温度系数。

公开(公告)号：US20090159587A1

公开(公告)日：2009-06-25

申请号：US12270094

申请日：2008-11-13

申请人： Kazuhiko SHIMANUKI ,  Daisuke HAYASHI

发明人： Kazuhiko SHIMANUKI ,  Daisuke HAYASHI

IPC分类号： H05B3/68

CPC分类号： H01L21/67103 ,  H05B3/143

摘要： A planar heater 1 in which a power supply terminal unit 108 which supplies an electric power is arranged on a central portion on a lower surface of a silica glass plate-like member 102. The power supply terminal unit includes small-diameter silica glass tubes 105a and 106a, which contain a connection line which supplies an electric power to a carbon heat generator and a large-diameter silica glass tube 2 which contains the small-diameter silica glass tubes 105a and 106a. A flange portion 2a is formed on a lower end of the large-diameter silica glass tube 2, and a bent portion 2b having different diameters is formed between an upper end of the large-diameter silica glass and the flange portion 2a, and the first heat shielding plates 19, 20 and 21 configured by metal plates or opaque silica glass plates are contained in the large-diameter silica glass tube below the bent portion.

摘要翻译： 在石英玻璃板状构件102的下表面的中央部配置有供电端子单元108供给电力的平面加热器1.电源端子单元包括小直径石英玻璃管105a 和106a，其包含向碳发生器供给电力的连接线和包含小直径石英玻璃管105a和106a的大直径石英玻璃管2。 在大直径石英玻璃管2的下端形成有凸缘部2a，在大直径石英玻璃的上端和凸缘部2a之间形成具有不同直径的弯曲部2b， 由金属板或不透明石英玻璃板构成的隔热板19,20和21包含在弯曲部分下方的大直径石英玻璃管中。

公开(公告)号：US20090084502A1

公开(公告)日：2009-04-02

申请号：US12202658

申请日：2008-09-02

申请人： Daisuke HAYASHI

发明人： Daisuke HAYASHI

IPC分类号： C23F1/08

CPC分类号： H01J37/32623 ,  H01J37/32357

摘要： A plasma processing apparatus includes a barrier wall member disposed between a plasma generation chamber and a processing chamber to separate the plasma generation chamber from the processing chamber. The barrier wall member assumes a fin structure achieved by disposing in a radial pattern numerous plate-like fin members extending from a central area thereof toward a peripheral edge. An upper end portion of each fin member overlaps a lower end portion of an adjacent fin member. The fin members are disposed with gaps formed between them and are made to range upward with a tilt along the circumferential direction.

摘要翻译： 等离子体处理装置包括设置在等离子体产生室和处理室之间的隔离壁构件，以将等离子体产生室与处理室分离。 阻挡壁构件呈现翅片结构，其通过以径向图案布置多个从其中心区域延伸到周边边缘的板状翅片构件。 每个翅片构件的上端部与相邻翅片构件的下端部重叠。 翅片构件以它们之间形成的间隙设置，并且沿着圆周方向倾斜地向上范围。

公开(公告)号：US20080149598A1

公开(公告)日：2008-06-26

申请号：US11950773

申请日：2007-12-05

申请人： Daisuke HAYASHI ,  Kazuya Nagaseki

发明人： Daisuke HAYASHI ,  Kazuya Nagaseki

IPC分类号： C23F1/00 ,  C23F1/08 ,  H05B6/38

CPC分类号： H01L21/68735 ,  H01J37/32522 ,  H01J37/32642 ,  H01J37/32706 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/6831 ,  H05B6/105

摘要： A substrate processing apparatus that can accurately control the temperature of a focus ring without causing abnormal electric discharge and the back-flow of radio frequency electrical power during the application of radio frequency electrical power. A wafer is mounted on a mounting stage disposed in a housing chamber. An annular focus ring is mounted on the mounting stage in such a manner as to surround the peripheral portion of the mounted wafer. The pressure in the housing chamber is reduced, radio frequency electrical power is applied to the mounting stage, and the focus ring generates heat by itself.

摘要翻译： 一种基板处理装置，其可以在施加射频电力的同时，不会引起异常放电和射频电力的反向流动而精确地控制聚焦环的温度。 晶片安装在设置在容纳室中的安装台上。 环形聚焦环以围绕安装晶片的周边部分的方式安装在安装台上。 容纳室中的压力减小，射频电力施加到安装台，并且聚焦环自身产生热量。

公开(公告)号：US20080099440A1

公开(公告)日：2008-05-01

申请号：US11869151

申请日：2007-10-09

申请人： Daisuke HAYASHI

发明人： Daisuke HAYASHI

IPC分类号： C23F1/00 ,  C23F1/08

CPC分类号： H01L21/02057 ,  H01L21/31116 ,  H01L21/67207

摘要： A substrate processing method capable of preventing a reduction in productivity of the fabrication of a semiconductor device from a substrate. An HF gas is supplied toward a wafer having a thermally-oxidized film, a BPSG film, and a deposit film, to thereby selectively etch the BPSG film and the deposit film using fluorinated acid. A residual matter of H2SiF6 produced at the time of etching is decomposed into HF and SiF4 by being heated.

摘要翻译： 一种能够防止从衬底制造半导体器件的生产率降低的衬底处理方法。 向具有热氧化膜，BPSG膜和沉积膜的晶片供给HF气体，从而使用氟化酸选择性地蚀刻BPSG膜和沉积膜。 通过加热将蚀刻时产生的H 2 SiO 2 SiF 6 N残留物分解成HF和SiF 4。

公开(公告)号：US20110162799A1

公开(公告)日：2011-07-07

申请号：US12979837

申请日：2010-12-28

申请人： Daisuke HAYASHI

发明人： Daisuke HAYASHI

IPC分类号： C23F1/08 ,  H05H1/24 ,  H01J1/00

CPC分类号： H01L21/67069 ,  H01J37/32091 ,  H01J37/3255

摘要： A plasma processing apparatus includes a depressurizable processing chamber; an electrode provided in the processing chamber; and a high frequency power supply for supplying a high frequency power into the processing chamber to thereby generating a plasma. Further, the electrode includes a base formed of a dielectric material; a dielectric body buried in the base and formed of the same dielectric material as the base; and a conductive adhesive layer provided in a bonding portion between the base and the dielectric body, the conductive adhesive layer bonding together and fixing the base and the dielectric body to each other.

摘要翻译： 等离子体处理装置包括可减压处理室; 设置在处理室中的电极; 以及用于向处理室提供高频电力从而产生等离子体的高频电源。 此外，电极包括由介电材料形成的基座; 埋在基底内并由与基底相同的电介质材料形成的绝缘体; 以及导电性粘合剂层，其设置在基体和电介质体的接合部中，导电性粘合剂层粘合在一起并将基体和电介质体彼此固定。