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公开(公告)号：US06965308B2
公开(公告)日：2005-11-15
申请号：US09815265
申请日：2001-03-23
申请人： Hiroshi Fukuda , Toshihiko Tanaka , Toshio Fujiwara , Kanetoshi Nara , Jin Murata , Toshihiro Yamada
发明人： Hiroshi Fukuda , Toshihiko Tanaka , Toshio Fujiwara , Kanetoshi Nara , Jin Murata , Toshihiro Yamada
CPC分类号： G05B23/027 , G05B23/0272 , Y04S10/522
摘要： A system for operating a plurality of power generation stations. The system comprises: a general control device for monitoring a plurality of power generation stations, each of the stations including at least one electric power generation unit; a plurality of unit control devices, each of which monitoring each of the generation units, the unit control devices producing alarm data; and communication means for exchanging data between the general control device and each of the unit control devices. Only part of the alarm data produced in the unit control devices are displayed at the general control device.
摘要翻译： 一种用于操作多个发电站的系统。 该系统包括：用于监视多个发电站的通用控制装置，每个站包括至少一个发电单元; 多个单元控制装置，每个单元控制装置监视每个生成单元，单元控制装置产生报警数据; 以及用于在一般控制装置和每个单元控制装置之间交换数据的通信装置。 在单位控制装置中仅生成的部分报警数据显示在通用控制装置上。
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公开(公告)号：US07110863B2
公开(公告)日：2006-09-19
申请号：US10508535
申请日：2003-03-28
申请人： Toshihiko Tanaka , Hiroshi Fukuda , Jin Murata , Toshihiro Yamada
发明人： Toshihiko Tanaka , Hiroshi Fukuda , Jin Murata , Toshihiro Yamada
IPC分类号： G05D11/00
CPC分类号： H02J13/001 , Y02E60/74 , Y04S10/30 , Y04S10/40
摘要： A generation unit general monitor-control system for generally monitoring and controlling electric power generation units (A-3 etc.), the general monitor-control system allocating relations between the electric power generation units and interface devices (11) for monitoring and controlling the generation units. The monitor-control system includes: a unit database (13) storing process data and operation signals; process input-output means (14) for reading out the data from this unit database and outputting the data to the generation units; unit database input-output portion (12) for receiving demands from the interface devices, detecting addresses of the generation units allotted to the interface devices, and referring to data corresponding to the addresses; interface device designating means (22) for designating interface devices; and an interface-device-unit-relation rewriting device (18) for rewriting the allocation relation between the generation unit and the interface devices based upon command from the interface device designating means.
摘要翻译： 一般监视和控制发电机组（A-3等）的发电机组通用监视控制系统，分配发电机组和接口装置（11）之间关系的一般监视控制系统，用于监控和控制 一代单位。 监视器控制系统包括：存储过程数据和操作信号的单元数据库（13）; 过程输入输出装置（14），用于从该单元数据库读出数据并将数据输出到生成单元; 单元数据库输入输出部分（12），用于从接口设备接收需求，检测分配给接口设备的生成单元的地址，并参考对应于该地址的数据; 接口装置指定装置（22），用于指定接口装置; 以及用于根据来自接口设备指定装置的命令重写生成单元和接口设备之间的分配关系的接口设备单元关系重写设备（18）。
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公开(公告)号：US20050159826A1
公开(公告)日：2005-07-21
申请号：US10508535
申请日：2003-03-28
申请人： Toshihiko Tanaka , Hiroshi Fukuda , Jin Murata , Toshihiro Yamada
发明人： Toshihiko Tanaka , Hiroshi Fukuda , Jin Murata , Toshihiro Yamada
CPC分类号： H02J13/001 , Y02E60/74 , Y04S10/30 , Y04S10/40
摘要： A generation unit general monitor-control system for generally monitoring and controlling electric power generation units (A-3 etc.), the general monitor-control system allocating relations between the electric power generation units and interface devices (11) for monitoring and controlling the generation units. The monitor-control system includes: a unit database (13) storing process data and operation signals; process input-output means (14) for reading out the data from this unit database and outputting the data to the generation units; unit database input-output portion (12) for receiving demands from the interface devices, detecting addresses of the generation units allotted to the interface devices, and referring to data corresponding to the addresses; interface device designating means (22) for designating interface devices; and an interface-device-unit-relation rewriting device (18) for rewriting the allocation relation between the generation unit and the interface devices based upon command from the interface device designating means.
摘要翻译： 一般监视和控制发电机组（A-3等）的发电机组通用监视控制系统，分配发电机组和接口装置（11）之间关系的一般监视控制系统，用于监控和控制 一代单位。 监视器控制系统包括：存储过程数据和操作信号的单元数据库（13）; 过程输入输出装置（14），用于从该单元数据库读出数据并将数据输出到生成单元; 单元数据库输入输出部分（12），用于从接口设备接收需求，检测分配给接口设备的生成单元的地址，并参考对应于该地址的数据; 接口装置指定装置（22），用于指定接口装置; 以及用于根据来自接口设备指定装置的命令重写生成单元和接口设备之间的分配关系的接口设备单元关系重写设备（18）。
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公开(公告)号：US20050228545A1
公开(公告)日：2005-10-13
申请号：US10508545
申请日：2003-03-28
申请人： Toshihiko Tanaka , Hiroshi Fukuda , Jin Murata , Toshihiro Yamada
发明人： Toshihiko Tanaka , Hiroshi Fukuda , Jin Murata , Toshihiro Yamada
CPC分类号： G05B15/02 , Y10T307/25 , Y10T307/461 , Y10T307/747
摘要： An electric power plant general control system for controlling power generating units. A generating unit (GU2) can operate part of the auxiliaries based on an automation command outputted from a unit computer (UC2) having a sequence function portion. The generating unit operates the remaining part of the auxiliaries based on an operation command outputted from an operation board (OB2) without a sequence function portion, the operation board disposed separately from the unit computer. A general automation computer (GAC) is connected with an upper system of the unit computer, and an operator command is inputted from an interactive apparatus (I/F4). The general control system is provided with a mock-up portion (Moc) equivalent to the sequence function portion disposed on the side of the auxiliaries controlled by the automation command outputted from the unit computer. The operation signal from the general automation computer is outputted to the unit computer and the operation board.
摘要翻译： 一种用于控制发电机组的电力设备通用控制系统。 基于从具有序列功能部分的单元计算机（UC 2> 2）输出的自动化命令，生成单元（GU <2> 2）可以对辅助部件的一部分进行操作。 生成单元基于从操作板（OB＆lt; 2＆gt;）输出的没有顺序功能部分的操作命令来操作辅助设备的剩余部分，操作板与单元计算机分开设置。 通用自动化计算机（GAC）与单元计算机的上部系统连接，并且从交互式装置输入操作员命令（I / F <4>）。 通用控制系统设置有与由从单元计算机输出的自动化命令控制的辅助设备侧相对应的顺序功能部分的模拟部分（Moc）。 来自通用自动化计算机的操作信号输出到单元计算机和操作板。
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公开(公告)号：US07146257B2
公开(公告)日：2006-12-05
申请号：US10508545
申请日：2003-03-28
申请人： Toshihiko Tanaka , Hiroshi Fukuda , Jin Murata , Toshihiro Yamada
发明人： Toshihiko Tanaka , Hiroshi Fukuda , Jin Murata , Toshihiro Yamada
CPC分类号： G05B15/02 , Y10T307/25 , Y10T307/461 , Y10T307/747
摘要： An electric power plant general control system for controlling power generating units. A generating unit (GU2) can operate part of the auxiliaries based on an automation command outputted from a unit computer (UC2) having a sequence function portion. The generating unit operates the remaining part of the auxiliaries based on an operation command outputted from an operation board (OB2) without a sequence function portion, the operation board disposed separately from the unit computer. A general automation computer (GAC) is connected with an upper system of the unit computer, and an operator command is inputted from an interactive apparatus (I/F4). The general control system is provided with a mock-up portion (Moc) equivalent to the sequence function portion disposed on the side of the auxiliaries controlled by the automation command outputted from the unit computer. The operation signal from the general automation computer is outputted to the unit computer and the operation board.
摘要翻译： 一种用于控制发电机组的电力设备通用控制系统。 基于从具有序列功能部分的单元计算机（UC 2> 2）输出的自动化命令，生成单元（GU <2> 2）可以对辅助部件的一部分进行操作。 生成单元基于从操作板（OB＆lt; 2＆gt;）输出的没有顺序功能部分的操作命令来操作辅助设备的剩余部分，操作板与单元计算机分开设置。 通用自动化计算机（GAC）与单元计算机的上部系统连接，并且从交互式装置输入操作员命令（I / F <4>）。 通用控制系统设置有与由从单元计算机输出的自动化命令控制的辅助设备侧相对应的顺序功能部分的模拟部分（Moc）。 来自通用自动化计算机的操作信号输出到单元计算机和操作板。
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公开(公告)号：US06580952B2
公开(公告)日：2003-06-17
申请号：US09827331
申请日：2001-04-06
申请人： Hiroshi Fukuda , Toshihiko Tanaka , Masao Isshiki , Yuuichi Shibata , Kanetoshi Nara , Naomi Hattori
发明人： Hiroshi Fukuda , Toshihiko Tanaka , Masao Isshiki , Yuuichi Shibata , Kanetoshi Nara , Naomi Hattori
IPC分类号： G05B1500
CPC分类号： G05B15/02
摘要： A system for controlling a plurality of power generation plants. The system comprises at least three display-input means for displaying process data of the power plants and for inputting signals for operating the power plants based on the displayed process data, and the display-input means are disposed in a central control room. The system also comprises allocation means for allocating at least one of the display-input means to each one of the power generation plants, based on operation phases of the power generation plants. The system also comprises moving means for moving at least one of the display-input means so that a plurality of groups of the display-input means are formed, and the display-input means of a same group be arranged closer to each other than the display-input means of different groups.
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公开(公告)号：US06780781B2
公开(公告)日：2004-08-24
申请号：US10445068
申请日：2003-05-27
IPC分类号： H01L21302
CPC分类号： G03F1/32 , G03F1/56 , G03F7/405 , H01L21/76802 , Y10S438/942 , Y10S438/945 , Y10S438/947 , Y10S438/948 , Y10S438/949
摘要： A method for manufacturing an electronic device is provided. In one example of the method, the method prevents deformation of a resist mask caused by the irradiation of exposure light. The resist mask has a resist as an opaque element, and can afford mask patterns undergoing little change even with an increase in the number of wafers subjected to exposure processing. The resist mask maintains a high dimensional accuracy. A photomask pattern is formed using as an opaque element a resist comprising a base resin and Si incorporated therein or a resist with a metal such as Si incorporated thereby by a silylation process, to improve the resistance to active oxygen. The deformation of a resist opaque pattern in a photomask is prevented. The dimensional accuracy of patterns transferred onto a Si wafer is improved in repeated use of the photomask.
摘要翻译： 提供了一种用于制造电子设备的方法。 在该方法的一个示例中，该方法防止由曝光光的照射引起的抗蚀剂掩模的变形。 抗蚀剂掩模具有作为不透明元素的抗蚀剂，并且即使随着经受曝光处理的晶片数量的增加，也可以提供几乎没有变化的掩模图案。 抗蚀剂掩模保持高尺寸精度。 使用作为不透明元件的抗蚀剂形成光掩模图案，该抗蚀剂包含掺入其中的基础树脂和Si，或通过甲硅烷基化方法掺入其中的诸如Si的金属的抗蚀剂，以提高对活性氧的耐受性。 防止光掩模中的抗蚀剂不透明图案的变形。 转移到Si晶片上的图案的尺寸精度在光掩模的重复使用中得到改善。
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8.再颁专利
公开(公告)号：USRE36731E
公开(公告)日：2000-06-13
申请号：US190580
申请日：1994-02-02
CPC分类号： G03F7/70575 , G03F7/2022 , G03F7/70241 , G03F7/70333 , G03F7/70858
摘要： An area on a photoresist film which is formed on a substrate surface having a topography, is exposed a plurality of times in such a manner that the image plane of a mask pattern is formed at a plurality of positions which are spaced apart from a reference plane in the substrate in the direction of an optical axis, and then the photoresist film is developed to form a resist pattern. According to the above method, the effective focal depth of the projection aligner used is enhanced, and moreover the reduction of the image contrast at the photoresist film is very small by the plural exposure operations. Accordingly, a fine pattern can be formed accurately on the substrate surface having the topography.
摘要翻译： 在具有形貌的基板表面上形成的光致抗蚀剂膜上的区域被曝光多次，使得掩模图案的像面形成在与参考平面间隔开的多个位置 在光轴方向上的基板中，然后使光致抗蚀剂膜显影以形成抗蚀剂图案。 根据上述方法，增强了所使用的投影对准器的有效焦深，并且通过多次曝光操作，光致抗蚀剂膜的图像对比度的降低非常小。 因此，可以在具有形貌的基板表面上精确地形成精细图案。
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公开(公告)号：US5656397A
公开(公告)日：1997-08-12
申请号：US282543
申请日：1994-07-29
申请人： Akira Imai , Norio Hasegawa , Hiroshi Fukuda , Toshihiko Tanaka
发明人： Akira Imai , Norio Hasegawa , Hiroshi Fukuda , Toshihiko Tanaka
摘要： There is disclosed a mask which includes a first phase shifter layer and a second phase shifter layer formed on the first phase shifter layer and has a structure capable of easily effecting highly precise control of the phase of exposure light and correction for a defect in the phase shifter layers. There are also disclosed a method of manufacturing the mask and a method of forming by use of the mask a pattern which has a smaller local error in pattern dimension and is free of a defect.
摘要翻译： 公开了一种掩模，其包括形成在第一移相器层上的第一移相器层和第二移相器层，并且具有能够容易地实现对曝光光的相位的高度精确控制和对相的缺陷进行校正的结构 移位层。 还公开了一种制造掩模的方法以及通过使用掩模形成图案的图案尺寸较小的局部误差并且没有缺陷的图案的方法。
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公开(公告)号：US5328807A
公开(公告)日：1994-07-12
申请号：US711954
申请日：1991-06-07
申请人： Toshihiko Tanaka , Norio Hasegawa , Toshiaki Yamanaka , Akira Imai , Hiroshi Shiraishi , Takumi Ueno , Hiroshi Fukuda
发明人： Toshihiko Tanaka , Norio Hasegawa , Toshiaki Yamanaka , Akira Imai , Hiroshi Shiraishi , Takumi Ueno , Hiroshi Fukuda
CPC分类号： G03F1/34 , G03F7/2022
摘要： A comb-like or dot-like phase shifter pattern is added to a phase shifter used in phase shifting mask technology, which is then exposed onto a wafer. This enables the formation of extremely fine line patterns or space patterns having widths different from each other simultaneously. Further, when two reticles are disposed such that phase shifter patterns disposed therein intersect each other and are exposed consecutively onto a wafer, a fine hole pattern or dot pattern can be formed at a position where the phase shifter patterns intersect each other.
摘要翻译： 将梳状或点状移相器图案添加到用于相移掩模技术的移相器中，然后将其暴露在晶片上。 这使得能够同时形成彼此宽度不同的极细线图案或空间图案。 此外，当两个掩模版被布置成使得设置在其中的移相器图案彼此相交并且连续地暴露在晶片上时，可以在移相器图案彼此相交的位置处形成细孔图案或点图案。
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