公开(公告)号：US06709791B1

公开(公告)日：2004-03-23

申请号：US09807276

申请日：2001-04-10

申请人： Hiroshi Mohri ,  Toshiaki Motonaga ,  Chiaki Hatsuta ,  Norihito Ito ,  Naoya Hayashi ,  Toshio Onodera ,  Takahiro Matsuo ,  Toru Ogawa ,  Keisuke Nakazawa

发明人： Hiroshi Mohri ,  Toshiaki Motonaga ,  Chiaki Hatsuta ,  Norihito Ito ,  Naoya Hayashi ,  Toshio Onodera ,  Takahiro Matsuo ,  Toru Ogawa ,  Keisuke Nakazawa

IPC分类号： G03F900

CPC分类号： G03F1/32 ,  G03F1/26 ,  G03F1/34

摘要： The invention relates to a halftone phase shift photomask whose transmittance and phase angle remain unchanged even when irradiated with an excimer laser used for exposure over an extended period of time, and a blank therefor, and provides a halftone phase shift mask 108 comprising a pattern of halftone phase shift film 102 containing at least chromium and fluorine on a transparent substrate 101, wherein optical characteristic changes upon irradiation with an exposure excimer laser have been reduced by patterning a film irradiated with light 109 having a wavelength substantially absorbed by halftone phase shift film 102.

摘要翻译： 本发明涉及一种半色调相移光掩模，其透射率和相位角即使在用于长时间曝光的受激准分子激光器照射时也保持不变，并且提供了一种空白，并提供了一种半色调相移掩模108，其包括 在透明基板101上含有至少铬和氟的半色调相移膜102，其中通过曝光准分子激光器照射时的光学特性变化已经减少了通过半色调相移膜102基本吸收的波长的光109照射的图案 。

公开(公告)号：US06780547B2

公开(公告)日：2004-08-24

申请号：US09825578

申请日：2001-04-03

申请人： Toshiaki Motonaga ,  Norihito Ito ,  Chiaki Hatsuta ,  Junji Fujikawa ,  Naoya Hayashi ,  Toshio Onodera ,  Takahiro Matsuo ,  Toru Ogawa ,  Keisuke Nakazawa

发明人： Toshiaki Motonaga ,  Norihito Ito ,  Chiaki Hatsuta ,  Junji Fujikawa ,  Naoya Hayashi ,  Toshio Onodera ,  Takahiro Matsuo ,  Toru Ogawa ,  Keisuke Nakazawa

IPC分类号： G03F900

CPC分类号： G03F1/32

摘要： In a halftone phase shifting photomask 108, having a pattern of halftone phase shifting film 102 containing at least chromium and fluorine, the halftone phase shifting film is heat-treated at a temperature between 250° C. and 500° C. so that a change of the optical property of the film produced by the application of excimer laser for exposure to the film is decreased.

摘要翻译： 在具有至少包含铬和氟的半色调相移膜102的图案的半色调相移光掩模108中，半色调相移膜在250℃和500℃之间的温度下进行热处理，从而改变 通过施加用于暴露于膜的准分子激光器制造的膜的光学性能降低。

公开(公告)号：US5916712A

公开(公告)日：1999-06-29

申请号：US6587

申请日：1998-01-13

申请人： Hiroyuki Miyashita ,  Hiroshi Mohri ,  Masahiro Takahashi ,  Naoya Hayashi

发明人： Hiroyuki Miyashita ,  Hiroshi Mohri ,  Masahiro Takahashi ,  Naoya Hayashi

IPC分类号： G03F1/00 ,  G03F9/00

CPC分类号： G03F1/32 ,  G03F1/26

摘要： A halftone phase shift photomask having a sufficiently high transmittance for light of short wavelength and usable for high-resolution lithography effected by exposure using deep-ultraviolet+radiation, e.g., krypton fluoride excimer laser light. The halftone phase shift photomask has on a transparent substrate a halftone phase shift layer which includes at least one layer composed mainly of a chromium compound. The chromium compound contains at least fluorine atoms in addition to chromium atoms. A transmittance higher than a predetermined level can be obtained even in exposure carried out a relatively short wavelength. The photomask can be used for exposure using deep-ultraviolet+radiation, e.g., krypton fluoride excimer laser light (wavelength: 248 nm). Thus, high-resolution lithography can be realized. Since the photomask can be formed by approximately the same method as in the case of the conventional photomasks, it is possible to improve the yield and reduce the cost.

摘要翻译： 对于短波长的光具有足够高透射率的半色调相移光掩模，可用于通过使用深紫外线+辐射的曝光（例如，氪氟化物准分子激光）进行的高分辨率光刻。 半色调相移光掩模在透明基板上具有半色调相移层，其包括至少一层主要由铬化合物组成的层。 除铬原子以外，铬化合物至少含有氟原子。 即使在相对短的波长下进行曝光，也可以获得高于预定水平的透射率。 光掩模可以用于使用深紫外线+辐射的曝光，例如氟化氪激光准分子激光（波长：248nm）。 因此，可以实现高分辨率光刻。 由于光掩模可以通过与常规光掩模的情况大致相同的方法形成，所以可以提高成品率并降低成本。

公开(公告)号：US5738959A

公开(公告)日：1998-04-14

申请号：US722439

申请日：1996-10-17

申请人： Hiroyuki Miyashita ,  Hiroshi Mohri ,  Masahiro Takahashi ,  Naoya Hayashi

发明人： Hiroyuki Miyashita ,  Hiroshi Mohri ,  Masahiro Takahashi ,  Naoya Hayashi

IPC分类号： G03F1/00 ,  G03F9/00

CPC分类号： G03F1/32 ,  G03F1/26

摘要： A halftone phase shift photomask having a sufficiently high transmittance for light of short wavelength and usable for high-resolution lithography effected by exposure using deep-ultraviolet+radiation, e.g., krypton fluoride excimer laser light. The halftone phase shift photomask has on a transparent substrate a halftone phase shift layer which includes at least one layer composed mainly of a chromium compound. The chromium compound contains at least fluorine atoms in addition to chromium atoms. A transmittance higher than a predetermined level can be obtained even in exposure carried out at a relatively short wavelength. The photomask can be used for exposure using deep-ultraviolet+radiation, e.g., krypton fluoride excimer laser light (wavelength: 248 nm). Thus, high-resolution lithography can be realized. Since the photomask can be formed by approximately the same method as in the case of the conventional photomasks, it is possible to improve the yield and reduce the cost.

摘要翻译： 对于短波长的光具有足够高透射率的半色调相移光掩模，可用于通过使用深紫外线+辐射的曝光（例如，氪氟化物准分子激光）进行的高分辨率光刻。 半色调相移光掩模在透明基板上具有半色调相移层，其包括至少一层主要由铬化合物组成的层。 除铬原子以外，铬化合物至少含有氟原子。 即使在相对短的波长下进行曝光，也可以获得高于预定水平的透射率。 光掩模可以用于使用深紫外线+辐射的曝光，例如氟化氪激光准分子激光（波长：248nm）。 因此，可以实现高分辨率光刻。 由于光掩模可以通过与常规光掩模的情况大致相同的方法形成，所以可以提高成品率并降低成本。

公开(公告)号：US20100224465A1

公开(公告)日：2010-09-09

申请号：US12681580

申请日：2008-09-30

申请人： Naoya Hayashi ,  Kou Sasaki ,  Junichi Kiyohara

发明人： Naoya Hayashi ,  Kou Sasaki ,  Junichi Kiyohara

IPC分类号： H01H9/00

CPC分类号： B60R21/2037 ,  B60Q5/003 ,  H01H1/06 ,  H01H13/06 ,  H01H13/08

摘要： In a switch device, such as a horn switch device attached to a steering wheel, a water column is prevented from being formed between contact sections of a pair of contact points facing each other.A movable member (30) and a fixed member (40) of a horn switch device (20) are disposed in an opposed manner such that the movable member (30) on an upper side can be moved toward and away from the fixed member (40) on a lower side and such that it is urged upward by urging means (50). Furthermore, at least a pair of protruding contact points (35) and (45) are formed on the movable member (30) and the fixed member (40), at positions facing each other. By bringing them into contact with each other, the members (30) and (40) are electrically connected, closing a horn circuit. A rivet (46), serving as a contact section, is attached to a tip portion of the fixed contact point (45) on the lower side, and an opening portion (36) is provided in the movable contact point (35) on the upper side, the outer peripheral side of which is made to serve as a contact section to be brought into contact with the rivet (46).

摘要翻译： 在连接在方向盘上的喇叭开关装置等开关装置中，防止在相互面对的一对接点的接触部之间形成水柱。 喇叭开关装置（20）的可动构件（30）和固定构件（40）以相对的方式设置，使得上侧的可动构件（30）能够朝向和远离固定构件移动 40），并且通过推动装置（50）被向上推动。 此外，在可动构件（30）和固定构件（40）上，在彼此相对的位置处，至少形成有一对突出接触点（35）和（45）。 通过使它们彼此接触，构件（30）和（40）电连接，闭合喇叭电路。 作为接触部的铆钉（46）在下侧安装在固定接触点（45）的前端部，开口部（36）设置在可动接触点（35）上 上侧，其外周侧用作与铆钉（46）接触的接触部分。

公开(公告)号：US06690729B2

公开(公告)日：2004-02-10

申请号：US09731370

申请日：2000-12-06

申请人： Naoya Hayashi

发明人： Naoya Hayashi

IPC分类号： H04N712

CPC分类号： H04N5/145 ,  H04N19/533

摘要： The object of the present invention is to realize a motion vector search apparatus and method that is able to perform highly accurate motion vector searching even in images containing discontinuous motion relative to encoded images immediately before. According to the present invention, global motion vector search unit searches for a global motion vector by evaluating differences between pixels at the same location of an input image and an NR reference image in the form of an input image input one frame earlier that is held in original image memory. CPU then determines the motion vector search area based on the results of this global motion vector search, and sets that range in motion vector search unit. Motion vector search unit then searches for and determines a motion vector from previously encoded reference images held in frame memory that are the same as the encoded image held in frame memory over the motion vector search area set by CPU.

摘要翻译： 本发明的目的是实现一种运动矢量搜索装置和方法，即使在紧邻之前的编码图像中，即使在包含不连续运动的图像中也能执行高精度运动矢量检索。 根据本发明，全局运动矢量搜索单元通过评估输入图像的相同位置处的像素与以前一帧输入的输入图像的形式的NR参考图像之间的差异来搜索全局运动矢量 原始图像存储器 CPU然后基于该全局运动矢量搜索的结果确定运动矢量搜索区域，并将该范围设置在运动矢量搜索单元中。 运动矢量搜索单元然后从由CPU设置的运动矢量搜索区域搜索并确定保持在帧存储器中的先前编码的参考图像与保存在帧存储器中的编码图像相同的运动矢量。

公开(公告)号：US5717462A

公开(公告)日：1998-02-10

申请号：US361652

申请日：1994-12-22

申请人： Naoya Hayashi

发明人： Naoya Hayashi

IPC分类号： H04N19/50 ,  G06T1/00 ,  G06T7/00 ,  G06T9/00 ,  H04N1/41 ,  H04N5/14 ,  H04N19/103 ,  H04N19/107 ,  H04N19/137 ,  H04N19/14 ,  H04N19/196 ,  H04N19/423 ,  H04N19/436 ,  H04N19/51 ,  H04N19/513 ,  H04N19/57 ,  H04N19/577 ,  H04N7/18

CPC分类号： H04N19/433 ,  H04N19/51 ,  H04N5/145

摘要： In the motion prediction processor outputting the encoding type designating the inter-frame or intra-frame prediction coding and the motion vector in case of performing the inter-frame prediction coding, the coordinate values of the currently processed block are outputted and an offset is supplied to the address for reading out the reference region from the reference frame memory. The evaluation data for estimating the coding quantity in case of performing the inter-frame prediction coding is also outputted. An n number of the motion prediction processors are arranged and respectively associated with reference frame memories. The reference regions different from the same block are supplied to the n motion prediction processors and the motion prediction processor with the least evaluation data is selected from among the motion prediction processors whose reference regions are comprised within the picture. The motion vector outputted by the thus selected processor is corrected and outputted.

摘要翻译： 在执行帧间预测编码的情况下，输出指定帧间或帧内预测编码的编码类型的运动预测处理器和运动矢量，输出当前处理块的坐标值，并提供偏移 到从参考帧存储器读出参考区域的地址。 还输出用于在执行帧间预测编码的情况下用于估计编码量的评估数据。 n个运动预测处理器被布置并分别与参考帧存储器相关联。 将不同于相同块的参考区域提供给n个运动预测处理器，并且从其参考区域包括在图像内的运动预测处理器中选择具有最少评估数据的运动预测处理器。 由这样选择的处理器输出的运动矢量被校正和输出。

公开(公告)号：US20090068929A1

公开(公告)日：2009-03-12

申请号：US12282597

申请日：2007-04-02

申请人： Koji Funazaki ,  Hisatomi Kojima ,  Naoya Hayashi ,  Masayuki Yokoi

发明人： Koji Funazaki ,  Hisatomi Kojima ,  Naoya Hayashi ,  Masayuki Yokoi

IPC分类号： B32B5/00 ,  B29C47/00 ,  B24B1/00

CPC分类号： H01L21/304 ,  B32B27/32 ,  C09J7/243 ,  C09J7/29 ,  C09J2201/162 ,  C09J2201/622 ,  C09J2203/326 ,  C09J2205/114 ,  C09J2423/046 ,  C09J2431/006 ,  C09J2433/006 ,  H01L21/67132 ,  H01L21/6836 ,  H01L2221/68327 ,  H01L2221/6834 ,  Y10T428/24355

摘要： The present invention provides a surface-protection tape for semiconductor wafers having an even thickness accuracy, excellent surface smoothness, and excellent surface sliding properties such as freedom from blocking, etc., and a substrate film for the surface-protection tape. The substrate film for the surface-protection tape for semiconductor wafers has at least one layer containing a polyethylene-based resin and satisfies the following requirements:(1) the back and front surfaces of the substrate film have a surface roughness Ra measured based on JIS B0601 of not more than 0.8 μm, and at least one surface thereof has a surface roughness Ra of not less than 0.05 μm; and(2) the difference between the maximum and minimum thicknesses of the substrate film is not more than 4 μm.The present invention also provides a surface-protection tape for semiconductor wafers comprising the substrate film and an adhesive layer.

摘要翻译： 本发明提供了一种用于半导体晶片的表面保护带，其具有均匀的厚度精度，优异的表面平滑度和优异的表面滑动性能，例如无阻挡等，以及用于表面保护带的基片膜。 用于半导体晶片的表面保护带的基材膜具有至少一层含有聚乙烯类树脂的层，并满足以下要求：（1）基材膜的背面和表面的表面粗糙度Ra为JIS B0601不大于0.8μm，并且其至少一个表面的表面粗糙度Ra不小于0.05μm; 和（2）基底膜的最大和最小厚度之差不大于4μm。 本发明还提供了一种用于半导体晶片的表面保护带，其包括基底膜和粘合剂层。

公开(公告)号：US08210565B2

公开(公告)日：2012-07-03

申请号：US12993606

申请日：2009-05-12

申请人： Naoya Hayashi

发明人： Naoya Hayashi

IPC分类号： B60R21/203

CPC分类号： B60R21/21656 ,  B60R13/005 ,  B60R2021/21543

摘要： A decorative member can be readily attached to an airbag cover of an airbag device and attaching workability is enhanced. A decorative member 10 is attached to an attaching part 3 of an airbag cover 1, and engaging projections 13 of the decorative member 10 pass through through-holes in the airbag cover 1 to the back face 1B of the airbag cover 1. A holding member 20 is bent and pressed against the airbag cover 1 side, so that the engaging sections 21 are moved from a state where they are approached to each other between the engaging projections 13, to the direction in which the engaging sections 21 separate from each other. Consequently, the engaging sections 21 are inserted to engaging holes 13K to be engaged with the engaging projections 13. The holding member 20 allows the decorative member 10 to be attached to the airbag cover 1 through the engaging projections 13.

摘要翻译： 装饰构件可以容易地附接到安全气囊装置的安全气囊盖，并且附着可加工性得到提高。 装饰构件10安装在安全气囊盖1的安装部3上，装饰构件10的卡合突起13通过气囊盖1的贯通孔到达安全气囊盖1的背面1B。保持构件 20被弯曲并压靠在安全气囊盖1侧，使得接合部21从接合突起13之间彼此接近的状态移动到接合部21彼此分离的方向。 因此，接合部21被插入到与接合突起13接合的接合孔13K中。保持构件20允许装饰构件10通过接合突起13附接到安全气囊盖1。

公开(公告)号：US07988189B2

公开(公告)日：2011-08-02

申请号：US12532771

申请日：2008-04-09

申请人： Naoya Hayashi ,  Tadaaki Sekino

发明人： Naoya Hayashi ,  Tadaaki Sekino

IPC分类号： B60R21/16

CPC分类号： B60R21/21656 ,  B60R2021/21543

摘要： An air bag cover or air bag device that secures the escape path of an air bag in an upper part of a steering wheel. Developing lines are formed in an air bag cover. When the air bag is inflated and developed, the air bag cover is divided into an upper open portion, left open portion, right open portion, and lower open portion so as to be opened. A decorative part is formed on the left open portion, and the upper open portion is difficult to be caught on a wheel part of the steering wheel.

摘要翻译： 一种安全气囊盖或气囊装置，其将安全气囊的逸出路径固定在方向盘的上部。 显影线形成在气囊盖中。 当气囊膨胀和展开时，气囊盖被分成上开口部分，左开口部分，右开口部分和下开口部分，以便打开。 装饰部分形成在左开口部分上，并且上开口部难以被卡在方向盘的轮部上。