公开(公告)号：US06450181B1

公开(公告)日：2002-09-17

申请号：US09542305

申请日：2000-04-04

申请人： Hiroshi Morita ,  Tetsuo Mizuniwa ,  Junichi Ida

发明人： Hiroshi Morita ,  Tetsuo Mizuniwa ,  Junichi Ida

IPC分类号： H01L21306

CPC分类号： H01L21/02052 ,  C11D3/0042 ,  C11D3/3947 ,  C11D7/06 ,  C11D11/0047 ,  H05K3/26 ,  H05K2201/0761 ,  H05K2203/0793 ,  H05K2203/0796

摘要： A cleaning solution for electronic materials contains dissolved oxygen gas at a concentration greater than atmospheric saturation concentration, 0.1-10,000 mg/liter of ammonia, and 0.1-10,000 mg/liter of hydrogen peroxide in water. Alternatively, the cleaning solution contains dissolved reducing agents, 0.1-10,000 mg/liter of ammonia, and 0.1-10,000 mg/liter of hydrogen peroxide in water. A method for making the cleaning solution of the present invention is provided. A method for cleaning electronic materials using the cleaning solution of the present invention is also provided.

公开(公告)号：US06372699B1

公开(公告)日：2002-04-16

申请号：US09215872

申请日：1998-12-18

申请人： Hiroshi Morita ,  Tetsuo Mizuniwa ,  Junichi Ida

发明人： Hiroshi Morita ,  Tetsuo Mizuniwa ,  Junichi Ida

IPC分类号： C11D1310

CPC分类号： H01L21/02052 ,  C11D3/0042 ,  C11D3/3947 ,  C11D7/06 ,  C11D11/0047 ,  H05K3/26 ,  H05K2201/0761 ,  H05K2203/0793 ,  H05K2203/0796

摘要： A cleaning solution for electronic materials contains dissolved oxygen gas at a concentration greater than atmospheric saturation concentration, 0.1-10,000 mg/liter of ammonia, and 0.1-10,000 mg/liter of hydrogen peroxide in water. Alternatively, the cleaning solution contains dissolved reducing agents, 0.1-10,000 mg/liter of ammonia, and 0.1-10,000 mg/liter of hydrogen peroxide in water. A method for making the cleaning solution of the present invention is provided. A method for cleaning electronic materials using the cleaning solution of the present invention is also provided.

摘要翻译： 用于电子材料的清洁溶液含有浓度大于大气饱和浓度的溶解氧气，0.1-10,000mg /升氨和0.1-10,000mg /升过氧化氢水溶液。 或者，清洁溶液含有溶解的还原剂，0.1-10,000mg /升氨和0.1-10,000mg /升过氧化氢在水中。 提供了制造本发明的清洗溶液的方法。 还提供了使用本发明的清洁溶液清洁电子材料的方法。

公开(公告)号：US06409918B1

公开(公告)日：2002-06-25

申请号：US09185836

申请日：1998-11-04

申请人： Hiroshi Morita ,  Tetsuo Mizuniwa ,  Junichi Ida

发明人： Hiroshi Morita ,  Tetsuo Mizuniwa ,  Junichi Ida

IPC分类号： C02F178

CPC分类号： C02F1/78 ,  C02F2103/04 ,  Y10S210/90

摘要： An ozonated ultrapure water supply system that prevents reduction of the dissolved ozone concentration in the supply pipe system and maintains the dissolved ozone at points of use along the supply system at desired concentrations. This permits the system to supply ozonated water in long pipes. The system includes a sequential arrangement of a circulatory main pipe 3 for supplying ultrapure water, an ozonated gas supplying device 4, and at least two output branch lines 8 each having a gas/liquid separation device 9 and an ultimate point of use 7. The output branch lines are spaced downstream from the ozonated gas supplying device such that the ozone concentration in the ultrapure water has increased to a stable level and the ozonated ultrapure water at each output branch line is at this same stable ozone concentration.

摘要翻译： 一种臭氧化的超纯水供应系统，其防止降低供应管系统中的溶解臭氧浓度，并在所需浓度下沿供应系统的使用点维持溶解的臭氧。 这允许系统在长管道中提供臭氧水。 该系统包括用于提供超纯水的循环主管3，臭氧化气体供应装置4和至少两个输出分支管线8的顺序排列，每个输出分支管线8具有气/液分离装置9和最终使用点7。 输出分支管线与臭氧化气体供给装置的下游隔开，使得超纯水中的臭氧浓度增加到稳定水平，并且每个输出分支管线处的臭氧化超纯水处于相同的稳定的臭氧浓度。

公开(公告)号：US06346505B1

公开(公告)日：2002-02-12

申请号：US09229877

申请日：1999-01-14

申请人： Hiroshi Morita ,  Tetsuo Mizuniwa ,  Junichi Ida

发明人： Hiroshi Morita ,  Tetsuo Mizuniwa ,  Junichi Ida

IPC分类号： H01L21306

CPC分类号： C11D3/3947 ,  C11D7/08 ,  C11D11/0047 ,  H05K3/26

摘要： A cleaning solution for electromaterials including hydrogen fluoride and either oxygen or hydrogen gas dissolved in water. The cleaning solution may alternatively include hydrogen fluoride, hydrochloric acid or nitric acid, and hydrogen or oxygen gas dissolved in water. Alternatively, the cleaning solution includes hydrogen fluoride, hydrogen peroxide and oxygen gas dissolved in water. The present invention also provides a method for cleaning electromaterials including applying an ultrasonic vibration to cleaning solution applied to electromaterials.

摘要翻译： 用于包括氟化氢和溶解在水中的氧气或氢气的电子材料的清洁溶液。 清洁溶液可以替代地包括氟化氢，盐酸或硝酸，以及溶解在水中的氢或氧气。 或者，清洁溶液包括溶解在水中的氟化氢，过氧化氢和氧气。 本发明还提供了一种清洁电子材料的方法，包括对施加到电子材料上的清洁溶液施加超声波振动。

公开(公告)号：US20070114682A1

公开(公告)日：2007-05-24

申请号：US11653664

申请日：2007-01-16

申请人： Hiroshi Morita ,  Junichi Ida ,  Kazumi Tsukamoto

发明人： Hiroshi Morita ,  Junichi Ida ,  Kazumi Tsukamoto

IPC分类号： B01D47/00

CPC分类号： B01F15/0412 ,  B01F3/0446 ,  B01F3/04985 ,  B01F15/00123 ,  B01F15/00136 ,  B01F15/00344 ,  B01F15/0479 ,  B01F2201/01 ,  B01F2215/0036 ,  B01F2215/0096 ,  C02F2103/346

摘要： An apparatus for supplying water containing dissolved gas comprising a flowmeter for measuring a flowrate of pure or ultra-pure water and a mechanism for controlling a flowrate, a means for adjusting an amount of water which adjusts an amount of the pure or ultra-pure water supplied to the apparatus for dissolving a gas, a tank which receives the water containing dissolved gas in an excessive amount which is not used at a point of use, a piping system through which the water containing dissolved gas glows from the tank towards the point of use and the water containing dissolved gas in an excessive amount returns to the tank, a piping system for supplying the water containing dissolved gas to the tank, and a controlling means for adjusting an amount of water based on a water level in the tank.

摘要翻译： 一种用于供给含有溶解气体的水的装置，包括用于测量纯净水或超纯水的流量的流量计和用于控制流量的机构，用于调节调节纯水或超纯水量的水量的装置 供给到用于溶解气体的装置，容纳含有溶解气体的水的罐，其中过量的水在未使用的点上被使用;管道系统，其中含有溶解气体的水从罐发出朝向 并且含有过量的溶解气体的水返回到罐中，用于将含有溶解气体的水供给到罐中的管道系统，以及用于基于罐中的水位调节水量的控制装置。

公开(公告)号：US20090014028A1

公开(公告)日：2009-01-15

申请号：US12170823

申请日：2008-07-10

申请人： Yusaku Hirota ,  Itaru Kanno ,  Hiroshi Morita ,  Junichi Ida

发明人： Yusaku Hirota ,  Itaru Kanno ,  Hiroshi Morita ,  Junichi Ida

IPC分类号： B08B3/10 ,  B08B3/12 ,  B08B3/08

CPC分类号： H01L21/67086 ,  H01L21/6708

摘要： There is provided a method of efficiently cleaning substrates without damaging a fine pattern formed thereon. It is a method of cleaning one or more substrates in a system processing one or more substrates as one batch by dipping one or more substrates as one batch, including the steps of: immersing one or more substrates as one batch in a wet etching solution; ultrasonically cleaning one or more substrates as one batch; and drying one or more substrates as one batch. The step of ultrasonically cleaning employs a cleaning solution having a gas dissolved therein to have a degree of saturation of 60% to 100% at an atmospheric pressure, and an ultrasonic wave having a frequency of at least 500 kHz and an energy of 0.02 W/cm2 to 0.5 W/cm2.

摘要翻译： 提供了一种有效地清洁基板而不损害其上形成的精细图案的方法。 它是通过一次浸渍一个或多个基材来清洗一个或多个基材作为一个批次的系统中的一个或多个基材的方法，包括以下步骤：将一个或多个基材作为一批在一个湿蚀刻溶液中浸渍; 超声波清洗一个或多个基材作为一批; 并将一个或多个基材作为一批干燥。 超声波清洗的步骤使用溶解有气体的清洗液在大气压下具有60〜100％的饱和度，超声波的频率至少为500kHz，能量为0.02W / cm2〜0.5W / cm 2。

公开(公告)号：US07329312B2

公开(公告)日：2008-02-12

申请号：US11653664

申请日：2007-01-16

申请人： Hiroshi Morita ,  Junichi Ida ,  Kazumi Tsukamoto

发明人： Hiroshi Morita ,  Junichi Ida ,  Kazumi Tsukamoto

IPC分类号： B01D19/00 ,  B01F1/00 ,  C02F1/20

CPC分类号： B01F15/0412 ,  B01F3/0446 ,  B01F3/04985 ,  B01F15/00123 ,  B01F15/00136 ,  B01F15/00344 ,  B01F15/0479 ,  B01F2201/01 ,  B01F2215/0036 ,  B01F2215/0096 ,  C02F2103/346

摘要： An apparatus for supplying water containing dissolved gas comprising a flowmeter for measuring a flowrate of pure or ultra-pure water and a mechanism for controlling a flowrate, a means for adjusting an amount of water which adjusts an amount of the pure or ultra-pure water supplied to the apparatus for dissolving a gas, a tank which receives the water containing dissolved gas in an excessive amount which is not used at a point of use, a piping system through which the water containing dissolved gas glows from the tank towards the point of use and the water containing dissolved gas in an excessive amount returns to the tank, a piping system for supplying the water containing dissolved gas to the tank, and a controlling means for adjusting an amount of water based on a water level in the tank.

摘要翻译： 一种用于供给含有溶解气体的水的装置，包括用于测量纯净水或超纯水的流量的流量计和用于控制流量的机构，用于调节调节纯水或超纯水量的水量的装置 供给到用于溶解气体的装置，容纳含有溶解气体的水的罐，其中过量的水在未使用的点上被使用;管道系统，其中含有溶解气体的水从罐发出朝向 并且含有过量的溶解气体的水返回到罐中，用于将含有溶解气体的水供给到罐的管道系统，以及用于基于罐中的水位调节水量的控制装置。

公开(公告)号：US06431186B1

公开(公告)日：2002-08-13

申请号：US09415488

申请日：1999-10-12

申请人： Hiroshi Morita ,  Junichi Ida

发明人： Hiroshi Morita ,  Junichi Ida

IPC分类号： B08B704

CPC分类号： H01L21/02052

摘要： A simple cleaning method which can remove metal, organic and fine particle contaminants on the surface of electronic components, and especially those on silicon bases, and also suppress an increase in the roughness of base surface on the order of atoms during cleaning processes, is provided by cleaning with an oxidizing cleaning fluid, followed by cleaning with a reducing cleaning fluid with the application of ultrasonic vibrations.

摘要翻译： 提供了一种简单的清洁方法，其可以去除电子部件表面上的金属，有机和细颗粒污染物，特别是在硅基底上的污染物，并且还可以抑制在清洁过程中原子数量级的基底表面粗糙度的增加。 通过用氧化性清洗液清洗，然后用减震清洗液进行超声波振动清洗。

公开(公告)号：US20050093182A1

公开(公告)日：2005-05-05

申请号：US10507539

申请日：2003-03-18

申请人： Hiroshi Morita ,  Junichi Ida ,  Kazumi Tsukamoto

发明人： Hiroshi Morita ,  Junichi Ida ,  Kazumi Tsukamoto

IPC分类号： C02F1/00 ,  B01F1/00 ,  B01F3/04 ,  B01F3/08 ,  B01F15/00 ,  B01F15/04 ,  C02F1/68 ,  H01L21/304 ,  B01D47/00

CPC分类号： B01F15/0412 ,  B01F3/0446 ,  B01F3/04985 ,  B01F15/00123 ,  B01F15/00136 ,  B01F15/00344 ,  B01F15/0479 ,  B01F2201/01 ,  B01F2215/0036 ,  B01F2215/0096 ,  C02F2103/346

摘要： An apparatus for continuous dissolution comprising a dissolution portion for dissolving a gas into a main stream liquid, which comprises a flow meter measuring the flow rate of the main stream liquid and outputting a signal of the value obtained by the measurement and a mechanism for controlling the flow rate which controls the amount of supply of the gas based on the input signal; and a process for continuously dissolving a gas into the main stream liquid, wherein the amount of the gas is controlled based on the flow rate of the main stream liquid. Since a solution having a constant concentration can be obtained with stability even when the flow rate of the main stream liquid changes, cleaning water or surface treatment water used for electronic materials which particularly require a precisely clean surface can be supplied without loss.

摘要翻译： 一种用于连续溶解的装置，包括用于将气体溶解到主流液体中的溶解部分，其包括测量主流体液体的流量并输出通过测量获得的值的信号的流量计，以及用于控制 基于输入信号控制气体供给量的流量; 以及将气体连续地溶解到主流液体中的方法，其中基于主流体液体的流量来控制气体的量。 由于即使主流液体的流量变化，也可以稳定地获得具有恒定浓度的溶液，因此可以不损失地提供用于特别需要精确清洁表面的电子材料的清洗水或表面处理水。

公开(公告)号：US4975542A

公开(公告)日：1990-12-04

申请号：US354025

申请日：1989-05-19

申请人： Chuichi Hirayama ,  Hirotaka Ihara ,  Junichi Ida

发明人： Chuichi Hirayama ,  Hirotaka Ihara ,  Junichi Ida

IPC分类号： B01J20/24 ,  C08B37/08 ,  C08J3/14

CPC分类号： C08J3/14 ,  B01J20/24 ,  C08B37/003 ,  C08J2305/08

摘要： A method for preparing granular porous chitosan which comprises dispersing an acidic aqueous solution of chitosan in a hydrophobic dispersing medium; and, evaporating water off while stirring the resulting dispersion.