摘要:
A memory management and protection system for realizing a high speed execution and a proper and flexible memory access control for multiple programs sharing an identical logical address space. In the system, the memory access is permitted according to a segment identifier identifying a segment in the logical address space, and a memory protection information for a region in each segment including a target right permission to indicate assigned rights to make a memory access from the region to each of the segments, and an execution permission to indicate a type of the memory access permitted by the right permission. Alternatively, a memory access can be permitted by using an access control list to be attached to each address table entry, which stores a plurality of program numbers identifying programs which are permitted to make accesses to the logical address stored in each address table entry, among which one that matches with the current program number is to be searched. Also, it is preferable to allocate a plurality of programs within a limit of available memory protection capacity to an identical logical address space, without any overlap between adjacently allocated address regions.
摘要:
A memory management and protection system for realizing a high speed execution and a proper and flexible memory access control for multiple programs sharing an identical logical address space. In the system, the memory access is permitted according to a segment identifier identifying a segment in the logical address space, and a memory protection information for a region in each segment including a target right permission to indicate assigned rights to make a memory access from the region to each of the segments, and an execution permission to indicate a type of the memory access permitted by the right permission. Alternatively, a memory access can be permitted by using an access control list to be attached to each address table entry, which stores a plurality of program numbers identifying programs which are permitted to make accesses to the logical address stored in each address table entry, among which one that matches with the current program number is to be searched. Also, it is preferable to allocate a plurality of programs within a limit of available memory protection capacity to an identical logical address space, without any overlap between adjacently allocated address regions.
摘要:
A device according to an example of the invention comprises a section which accepts a write destination logical address and write target data from a processor, the write destination logical address indicating a write position to write the write target data into a composite memory which includes a first memory and a nonvolatile second memory, a section which determines a write destination physical address corresponding to the write destination logical address so that the number of times of access to the second memory is smaller than the number of times of access to the first memory, a section which stores, in a storage section, address conversion data associating the write destination logical address with the write destination physical address, and a section which writes the write target data into a position in the composite memory indicated by the write destination physical address.
摘要:
A device according to an example of the invention comprises a section which accepts a write destination logical address and write target data from a processor, the write destination logical address indicating a write position to write the write target data into a composite memory which includes a first memory and a nonvolatile second memory, a section which determines a write destination physical address corresponding to the write destination logical address so that the number of times of access to the second memory is smaller than the number of times of access to the first memory, a section which stores, in a storage section, address conversion data associating the write destination logical address with the write destination physical address, and a section which writes the write target data into a position in the composite memory indicated by the write destination physical address.
摘要:
There is provided a method of aligning a semiconductor substrate with a base stage on which the semiconductor substrate is placed, in the process of forming a circuit pattern directly onto the semiconductor substrate with electron beams, the method including the steps of (a) scanning across an alignment mark formed on a surface of the semiconductor substrate with electron beams with a scanning angle, defined as an angle between a direction of the electron beams and a reference direction, being varied, (b) calculating a width of the alignment mark along a scanning direction for each of scanning angles, and (c) determining a minimum width among widths calculated in the step (b), and defining a scanning angle associated with the minimum width as an angular gap between the semiconductor substrate and the base stage. In accordance with the above-mentioned method, it is possible to align a semiconductor substrate with an X-Y stage with the less number of movements of the X-Y stage, which ensures a higher efficiency in exposing a semiconductor substrate to electron beams.
摘要:
An electron-beam exposure mask that is able to realize the required pattern transfer accuracy independent of the deflection distortion and aberration of an electron beam. This mask includes a substrate with a first area and a second area, a first plurality of cell apertures formed in the first area of the substrate, and a second plurality of cell apertures formed in the second area of the substrate. The first area of the substrate is designed so that a charged-beam irradiated to the first area has a deflection angle less than a reference angle. The second area of the substrate is designed so that a charged-beam irradiated to the second area has a deflection angle equal to or greater than the reference angle. Each of the first plurality of cell apertures corresponds to fine patterns necessitating high pattern transfer accuracy. Each of the second plurality of cell apertures corresponds to rough patterns unnecessitating the high pattern transfer accuracy.
摘要:
It is an object of the present invention to effectively manufacture a charged-particle beam lithography mask, an X-ray lithography mask, or an extreme ultraviolet beam lithography mask by using, for example, an existing writer such as an electron beam writer for photomasks, while achieving improvement in processing accuracy of a mask pattern. A lithography mask (1) comprises a substrate (2) which has a lower surface provided substantially at the center thereof with an opening (3) and a self-supporting membrane (m) having a pattern region (4) substantially at the center of an upper surface of the substrate (2) corresponding to the opening (3). The self-supporting membrane (m) is provided with through-holes (h) of a mask pattern in it or an absorber or scatterer of a mask pattern on it, and the pattern region (4) and a peripheral region around the pattern region (5) are in one plane.
摘要:
The present invention consists in a method of creating an EB mask for electron beam image drawing, comprising: a step of extracting patterns for forming on an EB mask from design data stored in means for storage; a step of calculating an aperture area of an aperture section requested in an EB mask, using the design data contained in the extracted cell; a step of generating cell data for aperture creation using the value of this aperture area; and a step of forming a basic aperture pattern in an EB mask using this cell data for aperture creation.
摘要:
The aperture structure is for cell projection writing of patterns on a semiconductor substrate by an electron beam. The aperture structure includes a wafer, and a plurality of aperture patterns formed in the wafer. The aperture patterns are positioned and structured such that a thermal coefficient of a front side of the wafer and that of a back side of the wafer are the same as each other. The aperture patterns are positioned in a central portion and are symmetrically shaped in the depth direction of the base. For fabricating the aperture structure, the front side of the wafer is etched, or the front side and the back side of the wafer are etched, and the aperture patterns are formed in the etched portion or portions. The back side of the wafer is etched to the same depth as the front side. The aperture structure does not become warped, and the accuracy of generating patterns on a wafer with electron beams is greatly enhanced.
摘要:
In a wafer stepper for fabricating semiconductor ICs (Integrated Circuits), a glass substrate carries thereon a plurality of octagonal patterns formed of a transmissive material. With such a glass substrate, the stepper diffracts light not only in X and Y directions but also in 45.degree. directions and 135.degree. directions. A mask pattern is transferred to a wafer with enhanced resolution and depth of focus.