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公开(公告)号：US08345184B2
公开(公告)日：2013-01-01
申请号：US12663731
申请日：2008-06-10
申请人： Masayuki Shinohara , Yasuhiro Tanoue , Kazuhide Hirota , Koichi Takemura , Takuma Iwase , Takako Ishikawa , Yoshihiro Ueno , Morihisa Ota , Jun Kishimoto , Gouo Kurata , Yukihiro Takahashi , Hiroyuki Miyamoto
发明人： Masayuki Shinohara , Yasuhiro Tanoue , Kazuhide Hirota , Koichi Takemura , Takuma Iwase , Takako Ishikawa , Yoshihiro Ueno , Morihisa Ota , Jun Kishimoto , Gouo Kurata , Yukihiro Takahashi , Hiroyuki Miyamoto
IPC分类号： G02F1/1335 , F21V7/04
CPC分类号： G02B6/0035 , G02B6/0016 , G02B6/0018 , G02B6/002 , G02B6/0036 , G02B6/0038
摘要： A light guide plate (63) includes a light introducing section (65), which is at a position facing a point light source (62), for confining light from the point light source, and a light guide plate main body (64), which has a thickness smaller than a thickness at an end of the light introducing section on the point light source side, for outputting the confined light to an outside from a light outputting surface by light outputting means (70). The light introducing section (65) has an inclined surface (67), which is inclined from a surface of the light introducing section towards a surface of the light guide plate main body (64). The inclined surface (67) has a directivity converting pattern (68) for converting a directivity expansion in a thickness direction of the light guide plate of the light entered to the light introducing section (65) to directivity characteristics tilted towards a direction parallel to a surface direction of the light guide plate. The directivity converting pattern (68) has a structure in which a plurality of V-shaped groove structures (68a) are lined.
摘要翻译： 导光板（63）包括位于与点光源（62）相对的位置的用于限制来自点光源的光的光导入部（65）和导光板主体（64）， 其厚度小于点光源侧的光导入部分的端部的厚度，用于通过光输出装置（70）从光输出表面将限制的光输出到外部。 光导入部65具有从导光部的表面朝向导光板主体64的表面倾斜的倾斜面67。 倾斜面（67）具有指向性转换图案（68），用于将入射到光导入部（65）的光的导光板的厚度方向的方向性扩展转换成朝向与 导光板的表面方向。 方向转换图案（68）具有多个V形槽结构（68a）被排列的结构。
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公开(公告)号：US20110216267A1
公开(公告)日：2011-09-08
申请号：US13035180
申请日：2011-02-25
IPC分类号： G02F1/13357 , F21V7/22
CPC分类号： F21V7/22
摘要： An area light source device has a light guide plate having a light incident surface and a light exit surface, wherein the light guide plate spreads light introduced from the light incident surface to substantially the entire light exit surface, and exits the light to outside from the light exit surface, and a linear light source arranged facing the light incident surface of the light guide plate. A diffusion pattern diffuses and reflects the light in the light guide plate within a surface parallel to the light incident surface is formed on the light exit surface of the light guide plate. A deflection pattern reflects the light in the light guide plate within a plane perpendicular to the light incident surface and the light exit surface to deflect the light in a direction perpendicular to the light exit surface little by little, and diffuses and reflects the light in the light guide plate within a surface parallel to at least the light incident surface is formed on a surface on the side opposite to the light exit surface of the light guide plate.
摘要翻译： 区域光源装置具有具有光入射面和光出射面的导光板，其中，导光板将从光入射面导入的光扩散到大致整个光出射面，并将光从 光出射面和面对导光板的光入射面的线状光源。 在导光板的光出射面上形成扩散图案，使漫射面和与光入射面平行的面内的导光板反射。 偏转图案反射在与光入射面和光出射面垂直的平面内的导光板中的光，以使光沿垂直于光出射面的方向一点一点地偏转光，并使光在 在与导光板的光出射面相反的一侧的表面上形成有至少与光入射面平行的表面内的导光板。
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公开(公告)号：US20100195019A1
公开(公告)日：2010-08-05
申请号：US12663731
申请日：2008-06-10
申请人： Masayuki Shinohara , Yasuhiro Tanoue , Kazuhide Hirota , Koichi Takemura , Takuma Iwase , Takako Ishikawa , Yoshihiro Ueno , Morihisa Ota , Jun Kishimoto , Gouo Kurata , Yukihiro Takahashi , Hiroyuki Miyamoto
发明人： Masayuki Shinohara , Yasuhiro Tanoue , Kazuhide Hirota , Koichi Takemura , Takuma Iwase , Takako Ishikawa , Yoshihiro Ueno , Morihisa Ota , Jun Kishimoto , Gouo Kurata , Yukihiro Takahashi , Hiroyuki Miyamoto
IPC分类号： G02F1/1335 , F21V7/04
CPC分类号： G02B6/0035 , G02B6/0016 , G02B6/0018 , G02B6/002 , G02B6/0036 , G02B6/0038
摘要： A light guide plate (63) includes a light introducing section (65), which is at a position facing a point light source (62), for confining light from the point light source, and a light guide plate main body (64), which has a thickness smaller than a thickness at an end of the light introducing section on the point light source side, for outputting the confined light to an outside from a light outputting surface by light outputting means (70). The light introducing section (65) has an inclined surface (67), which is inclined from a surface of the light introducing section towards a surface of the light guide plate main body (64). The inclined surface (67) has a directivity converting pattern (68) for converting a directivity expansion in a thickness direction of the light guide plate of the light entered to the light introducing section (65) to directivity characteristics tilted towards a direction parallel to a surface direction of the light guide plate. The directivity converting pattern (68) has a structure in which a plurality of V-shaped groove structures (68a) are lined.
摘要翻译： 导光板（63）包括位于与点光源（62）相对的位置的用于限制来自点光源的光的光导入部（65）和导光板主体（64）， 其厚度小于点光源侧的光导入部分的端部的厚度，用于通过光输出装置（70）从光输出表面将限制的光输出到外部。 光导入部65具有从导光部的表面朝向导光板主体64的表面倾斜的倾斜面67。 倾斜面（67）具有指向性转换图案（68），用于将入射到光导入部（65）的光的导光板的厚度方向的方向性扩展转换成朝向与 导光板的表面方向。 方向转换图案（68）具有多个V形槽结构（68a）被排列的结构。
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公开(公告)号：US20080200996A1
公开(公告)日：2008-08-21
申请号：US12031185
申请日：2008-02-14
申请人： Hiroyuki Miyamoto , Takashi Sasaki
发明人： Hiroyuki Miyamoto , Takashi Sasaki
IPC分类号： G05B19/18
CPC分类号： G05B13/045
摘要： A process control apparatus for controlling a control target includes, but is not limited to, first and second control units. The first control unit is designed in a design environment unspecifying any period of disturbance. The first control unit performs a feedback control to the control target by using a setting value of the control target and a measured value of the control target. The first control unit is included in a feedback loop. The second control unit is also included in the feedback loop. The second control unit is designed by using an internal model principle. The second control unit rejects the disturbance, which is applied to the feedback loop, by using the measured value of the control target.
摘要翻译： 用于控制控制目标的过程控制装置包括但不限于第一和第二控制单元。 第一个控制单元设计在设计环境中，不指定任何干扰周期。 第一控制单元通过使用控制对象的设定值和控制对象的测定值对控制对象进行反馈控制。 第一个控制单元包含在反馈回路中。 第二控制单元也包括在反馈回路中。 第二个控制单元是通过使用内部模型原理设计的。 第二控制单元通过使用控制目标的测量值来拒绝施加到反馈回路的扰动。
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公开(公告)号：USD548698S1
公开(公告)日：2007-08-14
申请号：US29238545
申请日：2005-09-15
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公开(公告)号：US20070156913A1
公开(公告)日：2007-07-05
申请号：US11322670
申请日：2005-12-30
申请人： Hiroyuki Miyamoto , Sami Shalabi
发明人： Hiroyuki Miyamoto , Sami Shalabi
IPC分类号： G06F15/16
CPC分类号： G06F9/44526 , G06F9/44505
摘要： Methods and software are described which provide the ability to use plug-ins to extend functionality for J2EE applications. The methods involve use of an application deployment package including a plug-in manifest file containing plug-in meta-data, a unique identifier for the plug-in and interconnection data representing interconnections to other plug-in packages. An extension registry service uses the plug-in package to provide extensibility to the application by locating plug-ins and determining the interconnections between them based on the interconnection data. The extension registry service collects plug-in packages dynamically as J2EE modules are loaded by the J2EE platform and maintains the unique identifiers for all extension point(s) and extension(s) defined in the plug-in packages. The extension registry is used to find the associated extensions when the application executes an extension point. Identified extensions can then be invoked by extension point code.
摘要翻译： 描述了提供使用插件扩展J2EE应用程序功能的方法和软件。 该方法涉及使用包括包含插件元数据的插件清单文件，插件的唯一标识符和表示与其他插件包的互连的互连数据的应用程序部署包。 扩展注册表服务使用插件包通过定位插件并根据互连数据确定它们之间的互连来为应用程序提供可扩展性。 扩展注册表服务由J2EE平台加载的J2EE模块动态收集插件包，并维护插件包中定义的所有扩展点和扩展名的唯一标识符。 当应用程序执行扩展点时，扩展注册表用于查找关联的扩展。 标识的扩展可以由扩展点代码调用。
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公开(公告)号：US07197814B2
公开(公告)日：2007-04-03
申请号：US11150211
申请日：2005-06-13
CPC分类号： G11B5/3116 , G11B5/3133 , G11B5/3163 , Y10T29/49021 , Y10T29/49032 , Y10T29/49036 , Y10T29/49041 , Y10T29/49046 , Y10T29/49048 , Y10T29/4905 , Y10T29/49052 , Y10T29/49078
摘要： A writing magnetic pole portion composed of a first magnetic film and a second magnetic film formed on the first magnetic film via a gap film is fabricated on a given wafer. Then, the writing magnetic pole portion is swung forward and backward around a rotation standard axis parallel to a center line of the writing magnetic pole portion in a direction parallel to a surface of the. Then, the writing magnetic pole portion is milled during the swing of the writing magnetic pole portion to define the width of the writing magnetic pole portion.
摘要翻译： 在给定的晶片上制造由通过间隙膜形成在第一磁性膜上的第一磁性膜和第二磁性膜构成的写入磁极部。 然后，写入磁极部分在平行于书写磁极部分的中心线的旋转标准轴上沿与该表面平行的方向向前和向后摆动。 然后，在书写磁极部分的摆动期间，书写磁极部分被铣削以限定书写磁极部分的宽度。
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公开(公告)号：US07175972B2
公开(公告)日：2007-02-13
申请号：US10844400
申请日：2004-05-13
申请人： Kenji Takeo , Hiroyuki Miyamoto
发明人： Kenji Takeo , Hiroyuki Miyamoto
IPC分类号： G03F7/26
CPC分类号： G11B5/6005
摘要： A plating underlayer is formed on an insulating film. An anti-reflection film is formed on the plating underlayer. A photoresist is formed over the antireflection film 62. The photoresist and the antireflection film are exposed and developed to form a resistframe made thereof. A second magnetic layer is formed within an inner pattern enclosed by the resistframe. The anti-reflection film is made of a material soluble for a developer through exposure.
摘要翻译： 在绝缘膜上形成电镀底层。 在镀层底层上形成防反射膜。 在抗反射膜62上形成光致抗蚀剂。光致抗蚀剂和抗反射膜被曝光和显影以形成由其制成的抗蚀剂框架。 在由抗蚀剂框包围的内部图案中形成第二磁性层。 防反射膜由通过曝光可溶于显影剂的材料制成。
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公开(公告)号：US06848625B2
公开(公告)日：2005-02-01
申请号：US10388357
申请日：2003-03-14
申请人： Takashi Takekuma , Toshinobu Furusho , Takeshi Ohto , Hiroyuki Miyamoto , Kousuke Yoshihara , Shinya Hori , Hiroyuki Hara
发明人： Takashi Takekuma , Toshinobu Furusho , Takeshi Ohto , Hiroyuki Miyamoto , Kousuke Yoshihara , Shinya Hori , Hiroyuki Hara
CPC分类号： H01L21/67253 , H01L21/6715
摘要： A process liquid supply mechanism for supplying a process liquid comprises a process liquid supply source for supplying a process liquid, a process liquid discharging nozzle for discharging the process liquid, a pipe connecting the process liquid supply source to the process liquid discharging nozzle, a pump mounted to the pipe for allowing the process liquid to be discharged from the process liquid discharging nozzle, a pressure sensor for detecting the pressure of the process liquid at a prescribed position intermediate between the pump and the process liquid discharging nozzle, and a controller for controlling the inner pressure of the pump based on the pressure value detected by the pressure sensor and the relationship obtained in advance between the pressure and the discharging rate of the process liquid such that the process liquid is discharged at a prescribed discharging rate.
摘要翻译： 一种用于提供处理液的处理液供给机构包括：用于供给处理液的处理液供给源，用于排出处理液的处理液排出喷嘴，将处理液供给源与处理液排出喷嘴连接的管，泵 安装到管道上以允许处理液体从处理液体排放喷嘴排出;压力传感器，用于检测在泵和处理液体排放喷嘴之间的预定位置处的处理液体的压力;以及控制器，用于控制 基于由压力传感器检测到的压力值的泵的内部压力以及预处理液体的压力和排出速率之间获得的关系，使得处理液体以规定的排出速率排出。
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公开(公告)号：US06559582B2
公开(公告)日：2003-05-06
申请号：US09971226
申请日：2001-10-03
申请人： Hiroyuki Miyamoto , Misao Iseki , Manabu Arai , Hideaki Tamai , Chikao Kimura
发明人： Hiroyuki Miyamoto , Misao Iseki , Manabu Arai , Hideaki Tamai , Chikao Kimura
IPC分类号： H01J114
CPC分类号： H01J1/144
摘要： There is provided a cathode which is easily operable, harmless, and stable at high temperature at least 1,400° C. as well as excellent in electron emission characteristics at the same time, and the process for preparing the same. The cathode of the present invention comprises a polycrystalline substance or a polycrystalline porous substance of high-melting point metal material and an emitter material dispersed into said polycrystalline substance or polycrystalline porous substance in an amount of 0.1 to 30% by weight in the cathode, wherein the emitter material comprises at least one selected from the group consisting of hafnium oxide, zirconium oxide, lanthanum oxide, cerium oxide and titanium oxide.
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