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1.发明申请公开(公告)号：US20050004298A1
公开(公告)日：2005-01-06
申请号：US10901955
申请日：2004-07-30
申请人： Hiroyuki Tanaka , Masanori Hasegawa , Tsuyoshi Noguchi , Katsuhiko Higashino , Yosuke Nishimura
发明人： Hiroyuki Tanaka , Masanori Hasegawa , Tsuyoshi Noguchi , Katsuhiko Higashino , Yosuke Nishimura
CPC分类号： C08K9/06 , C08K9/02 , H01L23/293 , H01L2924/0002 , H01L2924/00
摘要： To provide a crosslinkable elastomer composition which is excellent in mechanical properties, ensures a small amount of outgas such as DOP and is suitable as a very clean material for molded article for semiconductor production apparatuses. The composition comprises a crosslinkable elastomer component and ultra fine powders of silicon oxide, in which the ultra fine powders of silicon oxide have 100×1019 or less hydroxyl groups per gram on surfaces thereof, dioctylphthalate adsorption of not more than 8 μg per 1 g of silicon oxide and an average particle size of not more than 0.5 μm.
摘要翻译： 为了提供机械特性优异的交联性弹性体组合物，可以确保少量的DOP等排气，适合作为半导体制造装置的成型品的非常干净的材料。 该组合物包含可交联弹性体组分和氧化硅超细粉末，其中氧化硅的超细粉末在其表面上具有每克表面100×10 19或更少的羟基，邻苯二甲酸二辛酯吸附量不超过8gug / g 的氧化硅，平均粒径为0.5μm以下。
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2.发明申请公开(公告)号：US20050090598A1
公开(公告)日：2005-04-28
申请号：US10995107
申请日：2004-11-24
CPC分类号： H01L23/293 , C08K3/36 , H01L2924/0002 , C08L27/12 , H01L2924/00
摘要： To provide a very clean elastomer molded article excellent in plasma resistance, having excellent property of metal-elution inhibition and is used suitably as a material for molded article for a semiconductor or liquid crystal manufacturing equipment. The molded article is obtained by crosslinking a crosslinkable elastomer composition comprising an elastomer component and a metal oxide filler comprising a silicon oxide filler containing impurity metals other than silicon in an amount of not more than 100 ppm. The molded article has an impurity metal content of not more than 100 ppm, and an increasing rate of particles generated by irradiating oxygen plasma to the article is not more than 1,000% or an amount of impurity metals other than silicon which is extracted with a 50% aqueous solution of HF is not more than 200 ppb.
摘要翻译： 为了提供耐溶剂性优异的非常干净的弹性体成型体，具有优异的金属洗脱性能，适用于半导体或液晶制造装置的成型品的材料。 模制品通过使包含弹性体组分的交联性弹性体组合物和包含不超过100ppm的含硅杂质金属的氧化硅填料的金属氧化物填料交联而获得。 模制品的杂质金属含量不大于100ppm，通过向制品照射氧等离子体而产生的颗粒的增加速率不超过1000％，或者以50被提取的除了硅以外的杂质金属的量 HF的％水溶液不超过200ppb。
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公开(公告)号：US06515064B1
公开(公告)日：2003-02-04
申请号：US09889009
申请日：2001-07-06
IPC分类号： C08K304
CPC分类号： C08J5/00 , C08J2321/00 , C08K3/04 , C08L21/00
摘要： To provide an elastomer molded article for a semiconductor manufacturing equipment which not only has cleanliness required but also has an excellent plasma resistance and an excellent property of metal-elution inhibition. The elastomer molded article is obtained by crosslinking a crosslinkable elastomer composition comprising a crosslinkable elastomer component and a carbon black filler having an average particle size of not more than 700 &mgr;m and an impurity metal content measured by an ashing analysis method of not more than 300 ppm and has an impurity metal content measured by an ashing analysis method of not more than 100 ppm. An increasing rate of particles generated by irradiating oxygen plasma to the article is not more than 500% or an amount of impurity metals extracted from the article with a 50% aqueous solution of HF is not more than 500 ppb.
摘要翻译： 为了提供一种用于半导体制造设备的弹性体模塑制品，其不仅需要清洁度，而且具有优异的等离子体电阻和优异的金属洗脱抑制性能。 弹性体成型体是将包含交联性弹性体成分和平均粒径为700μm以下的炭黑填料的交联性弹性体组合物和通过灰化分析法测定的杂质金属含量为300ppm以下， 并且通过灰化分析方法测定的不大于100ppm的杂质金属含量。 通过向制品照射氧等离子体而产生的颗粒的增加率不大于500％，或者用50％的HF水溶液从制品中提取的杂质金属的量不超过500ppb。
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4.发明授权Elastomer molded article and crosslinkable fluorine-containing elastomer composition for semi-conductor production apparatuses 有权用于半导体生产设备的弹性体模制品和可交联的含氟弹性体组合物公开(公告)号：US06803402B2
公开(公告)日：2004-10-12
申请号：US09959516
申请日：2001-10-29
IPC分类号： C08K318
CPC分类号： C08K3/22 , C08K2003/2227 , C08L27/12
摘要： Elastomer molded article for semiconductor production apparatuses which is obtained by crosslinking and molding a crosslinkable fluorine-containing elastomer composition comprising a crosslinkable fluorine-containing elastomer component and fine particles of aluminum oxide having an average particle size of not more than 0.5 &mgr;m. The elastomer molded article is excellent in plasma resistance and an amount of micro particles generated after irradiation of plasma is very small and therefore a very clean molded article for semiconductor production apparatuses, particularly a sealing material to be used in an environment of plasma irradiation is provided.
摘要翻译： 用于半导体制造装置的弹性体成型体，其通过交联和成型包含交联性含氟弹性体组分的交联性含氟弹性体组合物和平均粒径不大于0.5μm的氧化铝微粒而获得。 弹性体成形体的耐等离子体性优异，等离子体照射后产生的微粒子量非常小，因此提供了用于半导体制造装置的非常干净的成型体，特别是在等离子体照射的环境中使用的密封材料 。
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公开(公告)号：US06946513B2
公开(公告)日：2005-09-20
申请号：US10275685
申请日：2001-04-27
CPC分类号： C08F214/18 , H01L23/293 , H01L2924/0002 , H01L2924/12044 , H01L2924/00
摘要： There is provided an elastomer composition which is prepared by using a very clean filler reduced in both of an amount of moisture generation and an amount of organic outgas generation and is suitable as a molding material for semiconductor production apparatuses and there is provided a molded article. The composition is a crosslinkable composition comprising a high molecular weight polymer, particularly a crosslinkable fluorine-containing elastomer and a filler which has a weight reduction ratio per unit surface area of not more than 2.5×10−5% by weight/m2 when heating at 200° C. for two hours and a total amount of organic gas generated of not more than 2.5 ppm when heating at 200° C. for 15 minutes. The molded article is produced from the crosslinkable composition.
摘要翻译： 提供一种弹性体组合物，其通过使用在水分产生量和有机废气产生量中减少的非常干净的填料制备，并且适合作为半导体制造装置的成型材料，并且提供了模制品。 该组合物是包含高分子量聚合物，特别是可交联的含氟弹性体和填料的交联组合物，其每单位表面积的重量减少率不超过2.5×10 -5％ 在200℃下加热2小时，并且在200℃下加热15分钟时产生的有机气体总量不超过2.5ppm的总重量/ m 2。 模制品由可交联组合物制备。
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6.发明授权公开(公告)号：US07495046B2
公开(公告)日：2009-02-24
申请号：US10498939
申请日：2002-12-13
申请人： Hirofumi Nishibayashi , Takafumi Yamato , Katsuhiko Higashino , Hiroyuki Tanaka , Tsuyoshi Noguchi
发明人： Hirofumi Nishibayashi , Takafumi Yamato , Katsuhiko Higashino , Hiroyuki Tanaka , Tsuyoshi Noguchi
IPC分类号： C08L1/00
CPC分类号： C08L27/18 , C08G73/101 , C08L79/08 , C08L101/00 , C08L2666/14 , C08L2666/02
摘要： The present invention provides a crosslinkable elastomer composition, in which generation of HF under high temperature conditions is reduced, the decrease in weight to both NF3 plasma treatment and O3 treatment in the semiconductor manufacturing process is small and generation of foreign substances (particles) in these treatments is suppressed significantly. Specifically, the present invention relates to a crosslinkable elastomer composition comprising a crosslinkable elastomer and a filler having a specific surface area of at least 0.5 m2/g and containing a synthetic polymer having a thermally and chemically stable aromatic ring in the main chain, a crosslinkable elastomer composition comprising a crosslinkable elastomer and nonoxide ceramics and a crosslinkable elastomer composition wherein the decrease in weight by NF3 plasma irradiation is at most 0.20%.
摘要翻译： 本发明提供了一种可交联弹性体组合物，其中在高温条件下产生HF，在半导体制造过程中，NF3等离子体处理和O 3处理两者的重量减少很小，并且在这些中产生异物（颗粒） 治疗显着抑制。 具体地说，本发明涉及可交联弹性体组合物，其包含可交联弹性体和比表面积至少为0.5m 2 / g的填料，并且含有在主链中具有热和化学稳定的芳环的合成聚合物，可交联的 包含可交联弹性体和非氧化物陶瓷的弹性体组合物和可交联弹性体组合物，其中NF 3等离子体照射的重量减少至多0.20％。
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公开(公告)号：US20090076197A1
公开(公告)日：2009-03-19
申请号：US12264089
申请日：2008-11-03
申请人： Hirofumi Nishibayashi , Takafumi Yamato , Katsuhiko Higashino , Hiroyuki Tanaka , Tsuyoshi Noguchi
发明人： Hirofumi Nishibayashi , Takafumi Yamato , Katsuhiko Higashino , Hiroyuki Tanaka , Tsuyoshi Noguchi
IPC分类号： C08K3/00
CPC分类号： C08L27/18 , C08G73/101 , C08L79/08 , C08L101/00 , C08L2666/14 , C08L2666/02
摘要： The present invention provides a crosslinkable elastomer composition, in which generation of HF under high temperature conditions is reduced, the decrease in weight to both NF3 plasma treatment and O3 treatment in the semiconductor manufacturing process is small and generation of foreign substances (particles) in these treatments is suppressed significantly. Specifically, the present invention relates to a crosslinkable elastomer composition comprising a crosslinkable elastomer and a filler having a specific surface area of at least 0.5 m2/g and containing a synthetic polymer having a thermally and chemically stable aromatic ring in the main chain, a crosslinkable elastomer composition comprising a crosslinkable elastomer and nonoxide ceramics and a crosslinkable elastomer composition wherein the decrease in weight by NF3 plasma irradiation is at most 0.20%.
摘要翻译： 本发明提供了一种可交联弹性体组合物，其中在高温条件下产生HF，在半导体制造过程中，NF3等离子体处理和O 3处理两者的重量减少很小，并且在这些中产生异物（颗粒） 治疗显着抑制。 具体地说，本发明涉及可交联弹性体组合物，其包含可交联弹性体和比表面积至少为0.5m 2 / g的填料，并且含有在主链中具有热和化学稳定的芳环的合成聚合物，可交联的 包含可交联弹性体和非氧化物陶瓷的弹性体组合物和可交联弹性体组合物，其中NF 3等离子体照射的重量减少至多0.20％。
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公开(公告)号：US20070098978A1
公开(公告)日：2007-05-03
申请号：US10580110
申请日：2004-11-17
CPC分类号： F16J15/128 , C09K3/10 , G02F1/1339 , Y10T428/265 , Y10T428/3154 , Y10T428/31678
摘要： The present invention relates to a surface coated sealing material and provides a sealing material that enhances chemical resistance, plasma resistance, and non-sticking while keeping strength, hardness, and sealing property of a rubber substrate. It is a sealing material that comprises a coating film comprising one kind or more of metal or metallic compound selected from the group of metals, metal oxides, metal nitrides, metal carbides and compounds thereof on the whole or a part of the surface of the substrate which comprises a soft material of Shore D hardness of at most 75 and Shore A hardness of 40 to 100.
摘要翻译： 本发明涉及一种表面涂覆的密封材料，并提供一种在保持橡胶基材的强度，硬度和密封性能的同时提高耐化学性，耐等离子体性和不粘附性的密封材料。 它是一种密封材料，其包括在基材的整个或一部分表面上包含一种或多种选自金属，金属氧化物，金属氮化物，金属碳化物及其化合物的金属或金属化合物的涂膜 其包括肖氏D硬度至多为75的软质材料和40至100的肖氏A硬度。
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公开(公告)号：US07125598B2
公开(公告)日：2006-10-24
申请号：US10258066
申请日：2001-04-19
IPC分类号： D06N7/04
CPC分类号： C08J7/123 , C08J2327/12 , Y10T428/24355 , Y10T428/24802
摘要： There is provided a fluorine-containing elastomer molded article which is obtained by irradiating the fluorine-containing elastomer molded article with a plasma and has a center line average roughness of not less than 0.65 μm or a fluorine-containing elastomer molded article which is obtained by applying a resin coating layer on a fluorine-containing elastomer substrate, has a small peeling strength and a small etching rate at the irradiation of plasma and is excellent in detachability and whiteness. There is provided particularly a molded article suitable as various sealing materials for semiconductor production apparatuses.
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10.发明申请公开(公告)号：US20050070637A1
公开(公告)日：2005-03-31
申请号：US10498939
申请日：2002-12-13
申请人： Hirofumi Nishibayashi , Takafumi Yamato , Katsuhiko Higashino , Hiroyuki Tanaka , Tsuyoshi Noguchi
发明人： Hirofumi Nishibayashi , Takafumi Yamato , Katsuhiko Higashino , Hiroyuki Tanaka , Tsuyoshi Noguchi
IPC分类号： C08G73/10 , C08L79/08 , C08L101/00 , C08L1/00
CPC分类号： C08L27/18 , C08G73/101 , C08L79/08 , C08L101/00 , C08L2666/14 , C08L2666/02
摘要： The present invention provides a crosslinkable elastomer composition, in which generation of HF under high temperature conditions is reduced, the decrease in weight to both NF3 plasma treatment and O3 treatment in the semiconductor manufacturing process is small and generation of foreign substances (particles) in these treatments is suppressed significantly. Specifically, the present invention relates to a crosslinkable elastomer composition comprising a crosslinkable elastomer and a filler having a specific surface area of at least 0.5 m2/g and containing a synthetic polymer having a thermally and chemically stable aromatic ring in the main chain, a crosslinkable elastomer composition comprising a crosslinkable elastomer and nonoxide ceramics and a crosslinkable elastomer composition wherein the decrease in weight by NF3 plasma irradiation is at most 0.20%.
摘要翻译： 本发明提供了一种可交联弹性体组合物，其中在高温条件下产生HF，在半导体制造过程中，NF3等离子体处理和O 3处理两者的重量减少很小，并且在这些中产生异物（颗粒） 治疗显着抑制。 具体地说，本发明涉及包含交联性弹性体和比表面积至少为0.5m 2 / g的填料的交联性弹性体组合物，其含有在主链中具有热和化学稳定的芳环的合成聚合物 包含可交联弹性体和非氧化物陶瓷的可交联弹性体组合物和可交联弹性体组合物，其中NF 3等离子体照射的重量减少至多0.20％。
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