摘要:
An antireflection film comprises: at least one layer containing fine pores; and an antistatic layer, wherein the antistatic layer and one of said at least one layer containing fine pores are the same or different; and wherein, when a surface of the antireflection film is brought into contact with water for 15 minutes, a wiped portion of the surface shows a chromaticity change, ΔE, of 0.45 or less in the CIE 1976 L*a*b* color space measured under a standard illuminant D65.
摘要翻译:防反射膜包括:至少一层含有细孔的层; 和抗静电层,其中所述抗静电层和所述至少一层含有细孔的层之一相同或不同; 并且其中,当防反射膜的表面与水接触15分钟时,表面的擦拭部分在CIE 1976 L * a * b *颜色中显示色度变化,Dgr; E为0.45以下 在标准光源D65下测量的空间。
摘要:
An antireflection film comprising a support and a low refractive index layer made from a coating composition containing: a fluorine-containing polymer containing at least one fluorine-containing vinyl monomer polymerization unit and at least one hydroxyl group-containing vinyl monomer polymerization unit; and a particle having a conductive metal oxide-coated layer.
摘要:
An optical film, which comprises: a support; and a layer containing an electrically-conductive particulate material, in which an interior of the electrically-conductive particulate material is porous or hollow, wherein the optical film comprises a fluorine-containing silane compound.
摘要:
An antireflection film comprising a support and a low refractive index layer prepared by coating a coating composition containing the following components: (A) a fluorine-containing polymer, a principal chain of which is made of only carbon atoms and which contains at least one fluorine-containing vinyl monomer polymerization unit and at least one hydroxyl group-containing vinyl monomer polymerization unit, wherein a content of the hydroxyl group-containing vinyl monomer polymerization unit exceeds 20% by mole, provided that the polymer does not have a polysiloxane structure in the principal chain; (B) a crosslinking agent capable of reacting with a hydroxyl group; and (C) a compound containing two or more (meth)acryloyl groups in one molecule thereof.
摘要:
An inorganic fine particle-containing composition comprising a silylation-treated inorganic oxide fine particle, which comprises 1.4 or more silyl groups per a surface area of 1 nm2 of the inorganic oxide fine particle.
摘要:
An antireflection film comprises: at least one layer containing fine pores; and an antistatic layer, wherein the antistatic layer and one of said at least one layer containing fine pores are the same or different; and wherein, when a surface of the antireflection film is brought into contact with water for 15 minutes, a wiped portion of the surface shows a chromaticity change, ΔE, of 0.45 or less in the CIE 1976 L*a*b* color space measured under a standard illuminant D65.
摘要翻译:防反射膜包括:至少一层含有细孔的层; 和抗静电层,其中所述抗静电层和所述至少一层含有细孔的层之一相同或不同; 并且其中当所述防反射膜的表面与水接触15分钟时,所述表面的擦拭部分在测量的CIE 1976 L * a * b *颜色空间中显示出0.45以下的色度变化DeltaE 在标准光源D65下。
摘要:
An antireflection film comprises: at least one layer containing fine pores; and an antistatic layer, wherein the antistatic layer and one of said at least one layer containing fine pores are the same or different; and wherein, when a surface of the antireflection film is brought into contact with water for 15 minutes, a wiped portion of the surface shows a chromaticity change, ΔE, of 0.45 or less in the CIE 1976 L*a*b* color space measured under a standard illuminant D65.
摘要:
An inorganic fine particle-containing composition comprising a silylation-treated inorganic oxide fine particle, which comprises 1.4 or more silyl groups per a surface area of 1 nm2 of the inorganic oxide fine particle.
摘要:
An antireflection film comprises: a support; and at least one low refractive index layer including a first low refractive index layer, the first low refractive index layer being located most distant from the support, wherein the first low refractive index layer comprises: a resin curable upon irradiation with ionizing radiation; and a compound having a polysiloxane partial structure, and wherein the ratio Si(a)/Si(b) of a photoelectron spectral intensity {Si(a)} of silicon atom on the outermost surface of the first low refractive index layer to a photoelectron spectral intensity {Si(b)} of silicon atom in a deeper position at a depth corresponding to 80% of a thickness of the first low refractive index layer from the outermost surface is 5.0 or more.
摘要:
An antireflective film is provided and including: a support; and a layer formed from a composition containing inorganic particles and at least one salt. The at least one salt contains an acid and an organic base, the conjugate acid of the organic base having pKa of 5.0 to 11.0.