公开(公告)号：US20070112183A1

公开(公告)日：2007-05-17

申请号：US10555384

申请日：2004-05-06

申请人： Hisao Kitano ,  Hiroshi Shimizu ,  Masakatsu Nozaki ,  Fumio Tanimoto ,  Hirohisa Kikuyama ,  Masahide Waki ,  Kanenori Ito ,  Shinji Hashiguchi

发明人： Hisao Kitano ,  Hiroshi Shimizu ,  Masakatsu Nozaki ,  Fumio Tanimoto ,  Hirohisa Kikuyama ,  Masahide Waki ,  Kanenori Ito ,  Shinji Hashiguchi

IPC分类号： C08B37/08

CPC分类号： C07H5/06 ,  A23K10/20 ,  A23K20/163 ,  A23K20/24 ,  A23K50/80 ,  C08B37/003

摘要： This invention aims to develop a chitin oligomer composition and/or a chitosan oligomer composition wherein the content of an oligomer from a trimer to a decamer is 60% or more, and to develop a process for preparing the above-mentioned oligomer composition. The object of the invention can be achieved by mixing hydrofluoric acid or hydrohalogenated acid other than hydrofluoric acid and hydrofluoric acid with a chitin-based material and/or a chitosan-based material.

摘要翻译： 本发明的目的在于开发几丁质低聚物组合物和/或壳聚糖低聚物组合物，其中从三聚体到十聚体的低聚物的含量为60％以上，并且开发制备上述低聚物组合物的方法。 本发明的目的可以通过将除氢氟酸和氢氟酸之外的氢氟酸或氢卤酸与几丁质基材料和/或壳聚糖基材料混合来实现。

公开(公告)号：US20080029487A1

公开(公告)日：2008-02-07

申请号：US11722120

申请日：2005-12-19

申请人： Hirohisa Kikuyama ,  Masahide Waki ,  Kanenori Ito ,  Takanobu Kujime ,  Keiichi Nii ,  Rui Hasebe ,  Hitoshi Tsurumaru ,  Hideki Nakashima

发明人： Hirohisa Kikuyama ,  Masahide Waki ,  Kanenori Ito ,  Takanobu Kujime ,  Keiichi Nii ,  Rui Hasebe ,  Hitoshi Tsurumaru ,  Hideki Nakashima

IPC分类号： H01L21/306 ,  C23F1/26

CPC分类号： H01L21/32134 ,  C23F1/26 ,  H01L27/124

摘要： A fine treatment agent according to the present invention is a fine treatment agent for the fine treatment of a multilayer film, including a tungsten film and a silicon oxide film comprising at least one from among hydrogen fluoride, nitric acid, ammonium fluoride and ammonium chloride. Thus, a fine treatment agent which makes fine treatment on a multilayer film, including a tungsten film and a silicon oxide film, possible by controlling the etching rate and a fine treatment method using the same can be provided.

摘要翻译： 根据本发明的精细处理剂是用于精细处理包括钨膜和包含氟化氢，硝酸，氟化铵和氯化铵中的至少一种的氧化硅膜的多层膜的精细处理剂。 因此，可以提供通过控制蚀刻速率和使用其的精细处理方法对包括钨膜和氧化硅膜在内的多层膜进行精细处理的精细处理剂。

公开(公告)号：US07727415B2

公开(公告)日：2010-06-01

申请号：US11722120

申请日：2005-12-19

申请人： Hirohisa Kikuyama ,  Masahide Waki ,  Kanenori Ito ,  Takanobu Kujime ,  Keiichi Nii ,  Rui Hasebe ,  Hitoshi Tsurumaru ,  Hideki Nakashima

发明人： Hirohisa Kikuyama ,  Masahide Waki ,  Kanenori Ito ,  Takanobu Kujime ,  Keiichi Nii ,  Rui Hasebe ,  Hitoshi Tsurumaru ,  Hideki Nakashima

IPC分类号： C09K13/00 ,  C09K13/04 ,  C09K13/02

CPC分类号： H01L21/32134 ,  C23F1/26 ,  H01L27/124

摘要： A fine treatment agent according to the present invention is a fine treatment agent for the fine treatment of a multilayer film, including a tungsten film and a silicon oxide film comprising at least one from among hydrogen fluoride, nitric acid, ammonium fluoride and ammonium chloride. Thus, a fine treatment agent which makes fine treatment on a multilayer film, including a tungsten film and a silicon oxide film, possible by controlling the etching rate and a fine treatment method using the same can be provided.

摘要翻译： 根据本发明的精细处理剂是用于精细处理包括钨膜和包含氟化氢，硝酸，氟化铵和氯化铵中的至少一种的氧化硅膜的多层膜的精细处理剂。 因此，可以提供通过控制蚀刻速率和使用其的精细处理方法对包括钨膜和氧化硅膜在内的多层膜进行精细处理的精细处理剂。

公开(公告)号：US07175823B2

公开(公告)日：2007-02-13

申请号：US10505802

申请日：2003-02-27

申请人： Hirohisa Kikuyama ,  Masahide Waki ,  Hiroto Izumi ,  Hirofumi Yazaki ,  Kenji Aoki ,  Shinji Hashiguchi ,  Masatsugu Kawawaki ,  Yuko Murakami

发明人： Hirohisa Kikuyama ,  Masahide Waki ,  Hiroto Izumi ,  Hirofumi Yazaki ,  Kenji Aoki ,  Shinji Hashiguchi ,  Masatsugu Kawawaki ,  Yuko Murakami

IPC分类号： C01G33/00 ,  C01G35/00

CPC分类号： C01G33/003 ,  C01G33/00 ,  C01G35/00 ,  C01G35/003 ,  C01P2006/80 ,  C22B3/20 ,  C22B3/22 ,  C22B3/44 ,  C22B34/24 ,  Y02P10/234

摘要： The present invention provides a method enabling the high purification of a niobium compound and/or tantalum compound in a simplified manner at a low cost. This is accomplished by providing a method enabling the high purification of a niobium compound and/or tantalum compound comprising the steps of preparing a solution containing niobium and/or tantalum, allowing a precipitate comprising niobium and/or tantalum to develop, separating the precipitate by filtration from the filtrate, converting the precipitate to a liquid melt or taking the filtrate, and separating a niobium compound from a tantalum compound or vice versa by utilizing the difference in solubility to the solvent between the niobium compound and the tantalum compound.

摘要翻译： 本发明提供了一种能够以低成本简便地进行铌化合物和/或钽化合物的高纯化的方法。 这是通过提供一种能够高效纯化铌化合物和/或钽化合物的方法实现的，包括以下步骤：制备含有铌和/或钽的溶液，使包含铌和/或钽的沉淀物显影，分离沉淀物 从滤液过滤，将沉淀物转化为液体熔融物或取出滤液，并通过利用铌化合物和钽化合物之间的溶剂的溶解度差异将钽铌化合物与钽化合物分离，反之亦然。

公开(公告)号：US07268256B2

公开(公告)日：2007-09-11

申请号：US10514192

申请日：2003-04-17

申请人： Hirohisa Kikuyama ,  Masahide Waki ,  Shinji Hashiguchi ,  Tetsuo Nishida ,  Yasutaka Tashiro ,  Kenji Aoki

发明人： Hirohisa Kikuyama ,  Masahide Waki ,  Shinji Hashiguchi ,  Tetsuo Nishida ,  Yasutaka Tashiro ,  Kenji Aoki

IPC分类号： C07C211/62 ,  C07C209/84

CPC分类号： H01G9/038 ,  C07C209/84 ,  H01G11/62 ,  H01M6/166 ,  H01M10/0568 ,  H01M2300/0025 ,  Y02E60/13 ,  C07C211/63

摘要： Provided is a method for purifying a quaternary alkyl ammonium salt enabling the obtainment of a particulate quaternary alkyl ammonium salt having a low water content at a high yield which is suitably used as an electrolyte in an electrolytic solution.The method for the purification of a quaternary alkyl ammonium salt comprises dispersing a quaternary alkyl ammonium salt to be purified into an organic solvent to allow it to form a suspension there. The alkyl groups constituting the quaternary alkyl ammonium salt have 1 to 5 carbon atoms each. The quaternary alkyl ammonium salt to be purified is dispersed into the organic solvent to make a suspension, and then the particles are washed with an alcohol solvent.

摘要翻译： 本发明提供一种纯化季铵烷基铵盐的方法，其能够以高收率获得低水含量的季铵烷基铵盐，其适合用作电解液中的电解质。 纯化季烷基铵盐的方法包括将要纯化的季烷基铵盐分散在有机溶剂中以使其在那里形成悬浮液。 构成季烷基铵盐的烷基各有1〜5个碳原子。 将要纯化的季烷基铵盐分散在有机溶剂中以制成悬浮液，然后用醇溶剂洗涤颗粒。

公开(公告)号：US20070178040A1

公开(公告)日：2007-08-02

申请号：US10592360

申请日：2005-03-11

申请人： Hirohisa Kikuyama ,  Masahide Waki ,  Shinji Hashiguchi ,  Kenji Aoki

发明人： Hirohisa Kikuyama ,  Masahide Waki ,  Shinji Hashiguchi ,  Kenji Aoki

IPC分类号： C01G31/02

CPC分类号： C01G33/00 ,  C01G35/00 ,  C01P2004/03 ,  C01P2004/10

摘要： A method for preparing tantalum oxide and/or niobium oxide, characterized in that it comprises adding a basic aqueous solution to an aqueous solution of tantalum fluoride salt and/or niobium fluoride salt, to form tantalum hydroxide and/or niobium hydroxide, and then firing said tantalum hydroxide and/or niobium hydroxide. The above method allows the preparation of the tantalum oxide and/or niobium oxide in the state of a needle crystal or columnar crystal, not of a spherical crystal or an assemblage form.

摘要翻译： 一种氧化钽和/或氧化铌的制备方法，其特征在于，包括向氟化钽盐和/或氟化铌盐水溶液中添加碱性水溶液，形成氢氧化钽和/或氢氧化铌，然后进行烧成 所述氢氧化钽和/或氢氧化铌。 上述方法允许以针状晶体或柱状晶体的状态制备氧化钽和/或氧化铌，而不是球形晶体或组合形式。

公开(公告)号：US20070189957A1

公开(公告)日：2007-08-16

申请号：US10592372

申请日：2005-03-11

申请人： Hirohisa Kikuyama ,  Masahide Waki ,  Shinji Hashiguchi ,  Kenji Aoki

发明人： Hirohisa Kikuyama ,  Masahide Waki ,  Shinji Hashiguchi ,  Kenji Aoki

IPC分类号： C01G31/02 ,  C01G33/00

CPC分类号： C01G33/00 ,  C01G35/00

摘要： The object of the invention is to provide tantalum oxide and/or niobium oxide in the form of hollow particles. Disclosed is a method comprising adding hydrazine or an aqueous solution of hydrazine to (1) an aqueous solution of a tantalum compound and/or a niobium compound, to (2) an aqueous solution of fluorotantalic acid and/or fluoroniobic acid, or to (3) a solution obtained by dissolving crystallized fluorotantalic acid and/or crystallized fluoroniobic acid in water, to produce tantalum hydroxide and/or niobium hydroxide, and firing the tantalum hydroxide and/or niobium hydroxide.

摘要翻译： 本发明的目的是提供中空颗粒形式的氧化钽和/或氧化铌。 公开了一种方法，其包括向（1）钽化合物和/或铌化合物的水溶液中加入肼或肼的水溶液，加入（2）氟代花青酸和/或氟铌酸的水溶液或（ 3）通过将结晶的氟代花青酸和/或结晶的氟铌酸溶解在水中而制得的氢氧化钽和/或氢氧化铌获得的溶液，以及氢氧化钽和/或氢氧化铌的烧制。

公开(公告)号：US07214362B2

公开(公告)日：2007-05-08

申请号：US10505803

申请日：2003-02-27

申请人： Hirohisa Kikuyama ,  Masahide Waki ,  Hiroto Izumi ,  Hirofumi Yazaki ,  Kenji Aoki ,  Shinji Hashiguchi ,  Masatsugu Kawawaki ,  Yuko Murakami

发明人： Hirohisa Kikuyama ,  Masahide Waki ,  Hiroto Izumi ,  Hirofumi Yazaki ,  Kenji Aoki ,  Shinji Hashiguchi ,  Masatsugu Kawawaki ,  Yuko Murakami

IPC分类号： C01G35/00 ,  C01G33/00

CPC分类号： C22B3/0005 ,  C01G33/00 ,  C01G33/003 ,  C01G35/00 ,  C01G35/003 ,  C22B34/24 ,  Y02P10/234

摘要： An object of the present invention is to provide a method for purifying a highly pure niobium compound and/or tantalum compound, the method enabling the purification of a highly pure niobium compound and tantalum compound in a simplified manner at a low cost. The object is met by providing a method comprising adding an organic solvent to an aqueous solution containing a niobium compound and/or tantalum compound together with impurities, and then performing extraction via the solution. A niobium compound and/or tantalum compound dissolved in a solution is allowed to precipitate, and said aqueous solution is obtained by dissolving the precipitate in water.

摘要翻译： 本发明的目的是提供一种纯化铌化合物和/或钽化合物的纯化方法，该方法能够以低成本简便地纯化铌化合物和钽化合物。 通过提供一种包括向含有铌化合物和/或钽化合物以及杂质的水溶液中加入有机溶剂，然后通过溶液进行萃取的方法来满足目的。 溶解在溶液中的铌化合物和/或钽化合物析出，所述水溶液通过将沉淀物溶解在水中得到。

公开(公告)号：US20060020147A1

公开(公告)日：2006-01-26

申请号：US10514192

申请日：2003-04-17

申请人： Hirohisa Kikuyama ,  Masahide Waki ,  Shinji Hashiguchi ,  Tetsuo Nishida ,  Yasutaka Tashiro ,  Kenji Aoki

发明人： Hirohisa Kikuyama ,  Masahide Waki ,  Shinji Hashiguchi ,  Tetsuo Nishida ,  Yasutaka Tashiro ,  Kenji Aoki

IPC分类号： C07C209/84

CPC分类号： H01G9/038 ,  C07C209/84 ,  H01G11/62 ,  H01M6/166 ,  H01M10/0568 ,  H01M2300/0025 ,  Y02E60/13 ,  C07C211/63

摘要： Provided is a method for purifying a quaternary alkyl ammonium salt enabling the obtainment of a particulate quaternary alkyl ammonium salt having a low water content at a high yield which is suitably used as an electrolyte in an electrolytic solution. The method for the purification of a quaternary alkyl ammonium salt comprises dispersing a quaternary alkyl ammonium salt to be purified into an organic solvent to allow it to form a suspension there. The alkyl groups constituting the quaternary alkyl ammonium salt have 1 to 5 carbon atoms each. The quaternary alkyl ammonium salt to be purified is dispersed into the organic solvent to make a suspension, and then the particles are washed with an alcohol solvent.

摘要翻译： 本发明提供一种纯化季铵烷基铵盐的方法，其能够以高收率获得低水含量的季铵烷基铵盐，其适合用作电解液中的电解质。 纯化季烷基铵盐的方法包括将要纯化的季烷基铵盐分散在有机溶剂中以使其在那里形成悬浮液。 构成季烷基铵盐的烷基各有1〜5个碳原子。 将要纯化的季烷基铵盐分散在有机溶剂中以制成悬浮液，然后用醇溶剂洗涤颗粒。

公开(公告)号：US20050255035A1

公开(公告)日：2005-11-17

申请号：US10505802

申请日：2003-02-27

申请人： Hirohisa Kikuyama ,  Masahide Waki ,  Hiroto Izumi ,  Hirofumi Yazaki ,  Kenji Aoki ,  Shinji Hashiguchi ,  Masatsugu Kawawaki ,  Yuko Murakami

发明人： Hirohisa Kikuyama ,  Masahide Waki ,  Hiroto Izumi ,  Hirofumi Yazaki ,  Kenji Aoki ,  Shinji Hashiguchi ,  Masatsugu Kawawaki ,  Yuko Murakami

IPC分类号： C01G33/00 ,  C01G35/00 ,  C22B3/20 ,  C22B3/22 ,  C22B3/44 ,  C22B34/24

CPC分类号： C01G33/003 ,  C01G33/00 ,  C01G35/00 ,  C01G35/003 ,  C01P2006/80 ,  C22B3/20 ,  C22B3/22 ,  C22B3/44 ,  C22B34/24 ,  Y02P10/234

摘要： The present invention provides a method enabling the high purification of a niobium compound and/or tantalum compound in a simplified manner at a low cost. This is accomplished by providing a method enabling the high purification of a niobium compound and/or tantalum compound comprising the steps of preparing a solution containing niobium and/or tantalum, allowing a precipitate comprising niobium and/or tantalum to develop, separating the precipitate by filtration from the filtrate, converting the precipitate to a liquid melt or taking the filtrate, and separating a niobium compound from a tantalum compound or vice versa by utilizing the difference in solubility to the solvent between the niobium compound and the tantalum compound.

摘要翻译： 本发明提供了一种能够以低成本简便地进行铌化合物和/或钽化合物的高纯化的方法。 这是通过提供一种能够高效纯化铌化合物和/或钽化合物的方法实现的，包括以下步骤：制备含有铌和/或钽的溶液，使包含铌和/或钽的沉淀物显影，分离沉淀物 从滤液过滤，将沉淀物转化为液体熔融物或取出滤液，并通过利用铌化合物和钽化合物之间的溶剂的溶解度差异将钽铌化合物与钽化合物分离，反之亦然。