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公开(公告)号:US20240230171A1
公开(公告)日:2024-07-11
申请号:US18285899
申请日:2022-04-07
Applicant: President and Fellows of Harvard College
Inventor: Jarad A. MASON , Jinyoung SEO
IPC: F25B23/00 , C07C211/15 , C07C211/27 , C07C211/63 , C07C215/08 , C07C217/08 , C07C229/08
CPC classification number: F25B23/00 , C07C211/15 , C07C211/27 , C07C211/63 , C07C215/08 , C07C217/08 , C07C229/08
Abstract: The invention provides methods, compositions, and systems for barocaloric applications such as cooling, heating, and energy storage.
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公开(公告)号:US20240228428A1
公开(公告)日:2024-07-11
申请号:US18615802
申请日:2024-03-25
Applicant: TOKUYAMA CORPORATION
Inventor: Shoji TACHIBANA , Seiji TONO , Sumito ISHIZU , Yoshiaki YAMASHITA
IPC: C07C211/63
CPC classification number: C07C211/63
Abstract: A treatment liquid composition for semiconductor production including: a quaternary ammonium hydroxide; and a first organic solvent dissolving the quaternary ammonium hydroxide, the first organic solvent being a water-soluble organic solvent having a plurality of hydroxy groups, wherein a water content in the composition is no more than 1.0 mass % on the basis of the total mass of the composition; contents of Na, Mg, Al, K, Ca, Ti, Cr, Mn, Fe, Ni, Cu, and Zn in the composition are each no more than 100 mass ppb on the basis of the total mass of the composition; and a content of Cl in the composition is no more than 100 mass ppb on the basis of the total mass of the composition.
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公开(公告)号:US20240184199A1
公开(公告)日:2024-06-06
申请号:US18377117
申请日:2023-10-05
Applicant: SHIN-ETSU CHEMICAL CO., LTD.
Inventor: Masahiro FUKUSHIMA
IPC: G03F7/004 , C07C25/18 , C07C211/63 , C07C233/54 , C07C233/63 , C07C233/81 , C07C311/08 , C07C311/21 , C07C381/12 , C07D327/08 , C07D333/54 , C07D333/76
CPC classification number: G03F7/0045 , C07C25/18 , C07C211/63 , C07C233/54 , C07C233/63 , C07C233/81 , C07C311/08 , C07C311/21 , C07C381/12 , C07D327/08 , C07D333/54 , C07D333/76 , C07C2601/14 , C07C2603/74
Abstract: The present invention is an onium salt represented by the following general formula (1), where n1 represents an integer of 0 or 1; n2 represents an integer of 0 to 3; R1a represents a hydrocarbyl group having 1 to 20 carbon atoms and optionally containing a heteroatom; n3 represents an integer of 0 to 3; R1b represents a hydrocarbyl group having 1 to 36 carbon atoms and optionally containing a heteroatom; XA represents a carbonyl group that forms an amide bond together with an adjacent —NH or represents a sulfonyl group that forms a sulfonamide bond together with the adjacent —NH; n4 represents an integer of 1 or 2; and Z+ represents an onium cation. This provides: a resist composition in lithography that has high sensitivity and excellent resolution, can improve LWR and CDU, and can also suppress collapse of a resist pattern; and a novel onium salt to be used in the resist composition.
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公开(公告)号:US20240182404A1
公开(公告)日:2024-06-06
申请号:US18440134
申请日:2024-02-13
Applicant: TOKUYAMA CORPORATION
Inventor: Tomoaki Sato , Yuki Kikkawa , Takafumi Shimoda , Takayuki Negishi
IPC: C07C211/63 , H01L21/321 , H01L21/3213
CPC classification number: C07C211/63 , H01L21/3212 , H01L21/32134
Abstract: Provided are an inhibitor for RuO4 gas generation used in a manufacturing process of a semiconductor element, that inhibits a RuO4 gas generated when a semiconductor wafer containing ruthenium and a treatment liquid are brought into contact, and a method for inhibiting the RuO4 gas. Specifically, provided is an inhibitor for RuO4 gas generation for inhibiting a RuO4 gas generated when a semiconductor wafer containing ruthenium and a treatment liquid are brought into contact in semiconductor formation steps, wherein the inhibitor includes an onium salt consisting of an onium ion and a bromine-containing ion. Also provided is a method for inhibiting RuO4 gas generation by adding the inhibitor to a ruthenium treatment liquid or a ruthenium-containing liquid used in semiconductor formation steps.
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公开(公告)号:US11970590B2
公开(公告)日:2024-04-30
申请号:US18097986
申请日:2023-01-17
Applicant: Simon Fraser University
Inventor: Steven Holdcroft , Thomas J. G. Skalski , Michael Adamski , Benjamin Britton , Timothy J. Peckham
IPC: C08J5/22 , B01D69/02 , B01D71/82 , C07C211/63 , C07C309/44 , C08G61/10 , H01M8/10 , H01M8/1023
CPC classification number: C08J5/2256 , B01D69/02 , B01D71/82 , C07C211/63 , C07C309/44 , C08G61/10 , H01M8/1023 , B01D2325/42 , C08G2261/11 , C08G2261/1452 , C08G2261/148 , C08G2261/228 , C08G2261/312 , C08J2365/02 , H01M2008/1095
Abstract: Described herein are anionic phenylene oligomers and polymers, and devices including these materials. The oligomers and polymers can be prepared in a convenient and well-controlled manner, and can be used in cation exchange membranes. Also described is the controlled synthesis of anionic phenylene monomers and their use in synthesizing anionic oligomers and polymers, with precise control of the position and number of anionic groups.
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公开(公告)号:US20240051913A1
公开(公告)日:2024-02-15
申请号:US18274967
申请日:2023-02-15
Applicant: Nissan Chemical Corporation
Inventor: Jiahao LIU , Takuya FUKUOKA , Hiroaki SAKAIDA
IPC: C07C211/63 , C07C209/68 , C07C209/84
CPC classification number: C07C211/63 , C07C209/68 , C07C209/84 , C07B2200/13
Abstract: An object is to provide a cage silicate that can be industrially safely and simply produced by using an alkali silicate solution that does not generate alcohol as a Si raw material and using non-toxic quaternary ammonium, and a method for producing the same. The problem is solved by the following cage silicate:
A cage silicate consisting of anion component 1 represented by following formula (1), anion component 2 which is a mineral acid ion, cation component 1 represented by following formula (2), and cation component 2 which is an alkali ion, in which, to the mole number in terms of SiO2, a ratio of the mole number of water, (H2O/SiO2), is 0.7 to 30, a ratio of the mole number of alkali ions, (alkali ions/SiO2), is 1.0×10−7 to 1.0×10−2, and a ratio of the mole number of the mineral acid ions, (mineral acid ions/SiO2), is 1.0×10−7 to 1.0×10−3.
In formula (2), R represents an alkyl group having 2 to 20 carbon atoms.-
7.
公开(公告)号:US20240018020A1
公开(公告)日:2024-01-18
申请号:US18036043
申请日:2021-09-27
Applicant: ORGANO CORPORATION
Inventor: Noriko TAKADA , Kaoru NUKUI , Haruo YOKOTA
IPC: C02F1/42 , B01J39/05 , B01J49/53 , C07C211/63
CPC classification number: C02F1/42 , B01J39/05 , B01J49/53 , C07C211/63 , C02F2101/38
Abstract: The present invention provides a method for purifying a liquid to be treated, the method being capable of reducing the content of metal impurities in the liquid to be treated containing tetraalkylammonium ions, and further, being capable of suppressing cracking of the resin even when a strongly acidic cation exchange resin is used. The method includes: an impurity removal step of passing a liquid to be treated that contains tetraalkylammonium ions and metal impurities through a container filled with a cation exchange resin of a hydrogen ion form or a tetraalkylammonium ion form to reduce the content of the metal impurities in the liquid to be treated, wherein the degree of cross-linking of the cation exchange resin is from 16% to 24%.
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公开(公告)号:US11760765B2
公开(公告)日:2023-09-19
申请号:US16950906
申请日:2020-11-18
Applicant: Covestro Deutschland AG
Inventor: Thomas Rölle , Horst Berneth , Dennis Hönel , Friedrich-Karl Bruder , Jürgen Kintrup
IPC: C07F5/02 , C07F5/04 , C07C211/63 , C07C211/64 , C07C217/08 , C07C219/10 , C07C219/28 , C07C219/30 , C07C271/12 , C07C271/20 , C07C271/24 , C07D213/20 , C07D233/58 , C07D295/037 , C07D413/06 , C07F9/54 , G03F7/00 , C07C271/28 , C07D347/00 , C07D233/02 , C07D247/00 , C07D335/02 , C07C271/16 , C07D309/34
CPC classification number: C07F5/027 , C07C211/63 , C07C211/64 , C07C217/08 , C07C219/10 , C07C219/28 , C07C219/30 , C07C271/12 , C07C271/16 , C07C271/20 , C07C271/24 , C07C271/28 , C07D213/20 , C07D233/02 , C07D233/58 , C07D247/00 , C07D295/037 , C07D309/34 , C07D335/02 , C07D347/00 , C07D413/06 , C07F5/04 , C07F9/54 , C07F9/5407 , C07F9/5442 , G03F7/001 , C07C2601/14
Abstract: The invention relates to a process for preparing triaryl organoborates proceeding from organoboronic esters in the presence of an n-valent cation 1/n Kn+, comprising the anhydrous workup of the reaction mixture and the use of the triaryl organoborates obtained as co-initiator in photopolymer formulations, holographic media and holograms.
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公开(公告)号:US11702443B2
公开(公告)日:2023-07-18
申请号:US17533069
申请日:2021-11-22
Applicant: Pop Test Oncology LLC
Inventor: Randice Lisa Altschul , Neil David Theise , Andreas J. Kesel , Myron Rapkin , Rebecca O'Brien , Anthony R. Arment
IPC: C07J17/00 , A61K31/175 , C07D307/83 , C07H19/06 , C07C309/50 , C07C211/63 , C07C335/40 , A61K31/58 , A61K31/695 , A61K31/343 , A61K31/7068 , A61K31/655 , A61K31/567 , A61K31/137 , A61K31/14 , C07F7/08
CPC classification number: C07J17/00 , A61K31/137 , A61K31/14 , A61K31/175 , A61K31/343 , A61K31/567 , A61K31/58 , A61K31/655 , A61K31/695 , A61K31/7068 , C07C211/63 , C07C309/50 , C07C335/40 , C07D307/83 , C07F7/0812 , C07H19/06
Abstract: The invention provides glucocorticoid receptor antagonists for treatment of infection, neoplasia, and fatty liver disease.
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公开(公告)号:US20230159716A1
公开(公告)日:2023-05-25
申请号:US18097986
申请日:2023-01-17
Applicant: Simon Fraser University
Inventor: Steven Holdcroft , Thomas J.G. Skalski , Michael Adamski , Benjamin Britton , Timothy J. Peckham
IPC: C08J5/22 , B01D69/02 , B01D71/82 , C07C211/63 , C07C309/44 , C08G61/10 , H01M8/1023
CPC classification number: C08J5/2256 , B01D69/02 , B01D71/82 , C07C211/63 , C07C309/44 , C08G61/10 , H01M8/1023 , B01D2325/42 , C08G2261/11 , C08G2261/1452 , C08G2261/148 , C08G2261/228 , C08G2261/312 , C08J2365/02 , H01M2008/1095
Abstract: Described herein are anionic phenylene oligomers and polymers, and devices including these materials. The oligomers and polymers can be prepared in a convenient and well-controlled manner, and can be used in cation exchange membranes. Also described is the controlled synthesis of anionic phenylene monomers and their use in synthesizing anionic oligomers and polymers, with precise control of the position and number of anionic groups.
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