公开(公告)号：US20200303159A1

公开(公告)日：2020-09-24

申请号：US16810246

申请日：2020-03-05

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Koichi HAMADA ,  Kei SAKAI ,  Satoru YAMAGUCHI

IPC: H01J37/22 ,  H04N5/349 ,  H04N7/18 ,  H01J37/28

Abstract: To acquire a correction image by performing a sub-pixel shift process for shifting an image using a pixel interpolation filter by a pixel shift amount between pixels and a frequency correction process for correcting a frequency characteristic of the image after shifted.

公开(公告)号：US20170025251A1

公开(公告)日：2017-01-26

申请号：US15217460

申请日：2016-07-22

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Momoyo ENYAMA ,  Muneyuki FUKUDA ,  Hideyuki KAZUMI ,  Koichi HAMADA ,  Sayaka TANIMOTO

IPC: H01J37/26 ,  H01J37/22

CPC classification number: H01J37/265 ,  H01J37/153 ,  H01J37/21 ,  H01J37/222 ,  H01J37/226 ,  H01J2237/049 ,  H01J2237/103 ,  H01J2237/1534 ,  H01J2237/223 ,  H01J2237/24542 ,  H01J2237/24592 ,  H01J2237/2801

Abstract: A charged particle beam apparatus with improved depth of focus and maintained/improved resolution has a charged particle source, an off-axis illumination aperture, a lens, a computer, and a memory unit. The apparatus acquires an image by detecting a signal generated by irradiating a sample with a charged particle beam caused from the charged particle source via the off-axis illumination aperture. The computer has a beam-computing-process unit to estimate a beam profile of the charged particle beam and an image-sharpening-process unit to sharpen the image using the estimated beam profile.

Abstract translation: 具有改善的聚焦深度和分辨率的改进的带电粒子束装置具有带电粒子源，离轴照明孔径，透镜，计算机和存储单元。 该装置通过检测通过从带电粒子源经由离轴照射孔引起的带电粒子束照射样品而产生的信号来获取图像。 计算机具有用于估计带电粒子束的束轮廓的波束计算处理单元和使用估计波束轮廓来锐化图像的图像锐化处理单元。

公开(公告)号：US20210125806A1

公开(公告)日：2021-04-29

申请号：US16617319

申请日：2018-03-30

Applicant: Hitachi High-Technologies Corporation

Inventor： Koichi HAMADA ,  Megumi KIMURA ,  Momoyo ENYAMA ,  Ryou YUMIBA ,  Makoto SAKAKIBARA ,  Kei SAKAI ,  Satoru YAMAGUCHI ,  Katsumi SETOGUCHI

IPC: H01J37/22 ,  H01J37/10

Abstract: Provided is an electron beam observation device that includes: an electron source; an objective lens concentrating an electron beam emitted from the electron source; and a control unit configured to perform control such that a plurality of images is generated by capturing images of a reference sample having a specific pattern, and a frequency characteristic is calculated for each of the plurality of images, in which an image is generated based on a secondary signal generated from a sample due to irradiation of the sample with the electron beam, and the control unit holds the plurality of frequency characteristics.