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    Charged Particle Beam Apparatus
    1.
    发明申请
    Charged Particle Beam Apparatus 有权

    公开(公告)号：US20170110285A1

    公开(公告)日：2017-04-20

    申请号：US15292832

    申请日：2016-10-13

    申请人： Hitachi High-Technologies Corporation

    发明人： Muneyuki FUKUDA ,  Yoshinori MOMONOI ,  Akihiro MIURA ,  Fumihiro SASAJIMA ,  Hiroaki MITO

    IPC分类号： H01J37/22 ,  H01J37/28

    CPC分类号： H01J37/22 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/216 ,  H01J2237/2817

    摘要： The invention has an object to provide a charged particle beam device in which it is possible to perform proper beam adjustment while suppressing a decrease in MAM time, with a simple configuration without adding a lens, a sensor, or the like. In order to achieve the above object, according to the invention, there is provided a charged particle beam device including: an optical element which adjusts a charged particle beam emitted from a charged particle source; an adjustment element which adjusts an incidence condition of the charged particle beam with respect to the optical element; and a control device which controls the adjustment element, wherein the control device determines a difference between a first feature amount indicating a state of the optical element based on the condition setting of the optical element, and a second feature amount indicating a state where the optical element reaches based on the condition setting and executes adjustment by the adjustment element when the difference is greater than or equal to a predetermined value.

    Charged Particle Beam Apparatus
    2.
    发明申请
    Charged Particle Beam Apparatus 审中-公开

    公开(公告)号：US20180138010A1

    公开(公告)日：2018-05-17

    申请号：US15869460

    申请日：2018-01-12

    申请人： Hitachi High-Technologies Corporation

    发明人： Muneyuki FUKUDA ,  Yoshinori MOMONOI ,  Akihiro MIURA ,  Fumihiro SASAJIMA ,  Hiroaki MITO

    IPC分类号： H01J37/22 ,  H01J37/28

    CPC分类号： H01J37/22 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/216 ,  H01J2237/2817

    摘要： A charged particle beam device is provided that performs proper beam adjustment while suppressing a decrease in MAM time, with a simple configuration without adding a lens, a sensor, or the like. The charged particle beam device includes: an optical element which adjusts a charged particle beam emitted from a charged particle source; an adjustment element which adjusts an incidence condition of the charged particle beam with respect to the optical element; and a control device which controls the adjustment element, wherein the control device determines a difference between a first feature amount indicating a state of the optical element based on the condition setting of the optical element, and a second feature amount indicating a state where the optical element reaches based on the condition setting and executes adjustment by the adjustment element when the difference is greater than or equal to a predetermined value.

    CHARGED PARTICLE BEAM APPARATUS
    3.
    发明申请
    CHARGED PARTICLE BEAM APPARATUS 审中-公开
    充电颗粒光束装置

    公开(公告)号：US20170025251A1

    公开(公告)日：2017-01-26

    申请号：US15217460

    申请日：2016-07-22

    申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION

    发明人： Momoyo ENYAMA ,  Muneyuki FUKUDA ,  Hideyuki KAZUMI ,  Koichi HAMADA ,  Sayaka TANIMOTO

    IPC分类号： H01J37/26 ,  H01J37/22

    CPC分类号： H01J37/265 ,  H01J37/153 ,  H01J37/21 ,  H01J37/222 ,  H01J37/226 ,  H01J2237/049 ,  H01J2237/103 ,  H01J2237/1534 ,  H01J2237/223 ,  H01J2237/24542 ,  H01J2237/24592 ,  H01J2237/2801

    摘要： A charged particle beam apparatus with improved depth of focus and maintained/improved resolution has a charged particle source, an off-axis illumination aperture, a lens, a computer, and a memory unit. The apparatus acquires an image by detecting a signal generated by irradiating a sample with a charged particle beam caused from the charged particle source via the off-axis illumination aperture. The computer has a beam-computing-process unit to estimate a beam profile of the charged particle beam and an image-sharpening-process unit to sharpen the image using the estimated beam profile.

    摘要翻译： 具有改善的聚焦深度和分辨率的改进的带电粒子束装置具有带电粒子源，离轴照明孔径，透镜，计算机和存储单元。 该装置通过检测通过从带电粒子源经由离轴照射孔引起的带电粒子束照射样品而产生的信号来获取图像。 计算机具有用于估计带电粒子束的束轮廓的波束计算处理单元和使用估计波束轮廓来锐化图像的图像锐化处理单元。

    CHARGED-PARTICLE MICROSCOPE
    4.
    发明申请
    CHARGED-PARTICLE MICROSCOPE 有权
    充电颗粒显微镜

    公开(公告)号：US20140197313A1

    公开(公告)日：2014-07-17

    申请号：US14215209

    申请日：2014-03-17

    申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION

    发明人： Noritsugu TAKAHASHI ,  Muneyuki FUKUDA ,  Manabu YANO ,  Hirohiko KITSUKI ,  Kazunari ASAO ,  Tomoyasu SHOJO

    IPC分类号： H01J37/28 ,  H01J37/10

    CPC分类号： H01J37/28 ,  H01J37/10 ,  H01J37/145 ,  H01J37/21 ,  H01J2237/2817

    摘要： A charged-particle-beam device is characterized in having a control value for an aligner coil (29) being determined by: a coil current and an electrode applied-voltage at a control value for objectives (30, 31), which is an electromagnetic-field superposition lens; a control value for image-shift coils (27, 28); and the acceleration voltage of the charged-particle-beam. By doing this, it has become possible to avoid image disturbances that occur on images to be displayed at boundaries between charged areas and non-charged areas, and provide a charged-particle-beam device that obtains clear images without any unevenness in brightness.

    摘要翻译： 带电粒子束装置的特征在于具有对准线圈（29）的控制值，通过以下方式确定：线圈电流和用于物镜（30,31）的控制值的电极施加电压，其为电磁 场叠加透镜; 用于图像转换线圈（27,28）的控制值; 和带电粒子束的加速电压。 通过这样做，可以避免在充电区域和非充电区域之间的边界处显示图像上出现的图像干扰，并且提供获得清晰图像而没有任何亮度不均匀的带电粒子束装置。

    CHARGED PARTICLE BEAM DEVICE
    5.
    发明申请
    CHARGED PARTICLE BEAM DEVICE 审中-公开

    公开(公告)号：US20190051490A1

    公开(公告)日：2019-02-14

    申请号：US16088771

    申请日：2016-04-27

    申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION

    发明人： Natsuki TSUNO ,  Naomasa SUZUKI ,  Atsushi OKITA ,  Muneyuki FUKUDA

    IPC分类号： H01J37/28 ,  H01J37/26 ,  G01B15/04

    摘要： To provide a charged particle beam device which enables observation and evaluation of the surface and the inside of a sample with low damage to the sample, the charged particle beam device has: a charged particle beam source 2; a sample table 9 in which the sample 210 is placed; a charged particle beam optical system which pulsates a charged particle beam 100 and irradiates the charged particle beam to the sample at an acceleration voltage within a range of 0 kV to 5 kV; a split distance selector 125 for selecting a measurement object of the sample; and a split distance setting unit 124 for setting a split distance in one line scanning of the charged particle beam on the sample.

    CHARGED PARTICLE BEAM APPARATUS PERMITTING HIGH-RESOLUTION AND HIGH-CONTRAST OBSERVATION
    6.
    发明申请
    CHARGED PARTICLE BEAM APPARATUS PERMITTING HIGH-RESOLUTION AND HIGH-CONTRAST OBSERVATION 有权
    充电颗粒光束设备允许高分辨率和高对比度观察

    公开(公告)号：US20140326879A1

    公开(公告)日：2014-11-06

    申请号：US14334837

    申请日：2014-07-18

    申请人： Hitachi High-Technologies Corporation

    发明人： Muneyuki FUKUDA ,  Naomasa SUZUKI ,  Tomoyasu SHOJO ,  Noritsugu TAKAHASHI

    IPC分类号： H01J37/28

    CPC分类号： H01J37/28 ,  G01N23/225 ,  H01J37/145 ,  H01J2237/21 ,  H01J2237/28

    摘要： A lower pole piece of an electromagnetic superposition type objective lens is divided into an upper magnetic path and a lower magnetic path. A voltage nearly equal to a retarding voltage is applied to the lower magnetic path. An objective lens capable of acquiring an image with a higher resolution and a higher contrast than a conventional image is provided. An electromagnetic superposition type objective lens includes a magnetic path that encloses a coil, a cylindrical or conical booster magnetic path that surrounds an electron beam, a control magnetic path that is interposed between the coil and sample, an accelerating electric field control unit that accelerates the electron beam using a booster power supply, a decelerating electric field control unit that decelerates the electron beam using a stage power supply, and a suppression unit that suppresses electric discharge of the sample using a control magnetic path power supply.

    摘要翻译： 电磁叠加型物镜的下极片分为上磁路和下磁路。 几乎等于延迟电压的电压被施加到下磁路。 提供了能够获得具有比常规图像更高分辨率和更高对比度的图像的物镜。 电磁叠加型物镜包括包围线圈的磁路，围绕电子束的圆柱形或锥形增强器磁路，介于线圈和样品之间的控制磁路，加速电场控制单元，其加速 使用升压电源的电子束，使用级电源减速电子束的减速电场控制部，以及抑制使用控制磁路电源对样品进行放电的抑制部。

    Charged Particle Beam Apparatus
    7.
    发明申请
    Charged Particle Beam Apparatus 审中-公开

    公开(公告)号：US20190304740A1

    公开(公告)日：2019-10-03

    申请号：US16427698

    申请日：2019-05-31

    申请人： Hitachi High-Technologies Corporation

    发明人： Muneyuki FUKUDA ,  Yoshinori MOMONOI ,  Akihiro MIURA ,  Fumihiro SASAJIMA ,  Hiroaki MITO

    IPC分类号： H01J37/22 ,  H01J37/21 ,  H01J37/28

    摘要： A charged particle beam device is provided that performs proper beam adjustment while suppressing a decrease in MAM time, with a simple configuration without adding a lens, a sensor, or the like. The charged particle beam device includes: an optical element which adjusts a charged particle beam emitted from a charged particle source; an adjustment element which adjusts an incidence condition of the charged particle beam with respect to the optical element; and a control device which controls the adjustment element, wherein the control device determines a difference between a first feature amount indicating a state of the optical element based on the condition setting of the optical element, and a second feature amount indicating a state where the optical element reaches based on the condition setting and executes adjustment by the adjustment element when the difference is greater than or equal to a predetermined value.

    Height Measurement Device and Charged Particle Beam Device
    8.
    发明申请
    Height Measurement Device and Charged Particle Beam Device 审中-公开

    公开(公告)号：US20170343340A1

    公开(公告)日：2017-11-30

    申请号：US15533489

    申请日：2014-12-10

    申请人： Hitachi High-Technologies Corporation

    发明人： Hiroki KAWADA ,  Muneyuki FUKUDA ,  Yoshinori MOMONOI ,  Shou TAKAMI

    IPC分类号： G01B15/02 ,  H01J37/317

    CPC分类号： G01B15/02 ,  G01B15/00 ,  G01B2210/56 ,  H01J37/28 ,  H01J37/317 ,  H01J2237/2814 ,  H01J2237/31749

    摘要： The objective of the present invention is to provide a height measurement device capable of highly accurate measurement in the depth direction of a structure on a sample. To achieve this objective, proposed are a charged particle beam device and a height measurement device that is provided with a calculation device for determining the size of a structure on a sample on the basis of a detection signal obtained by irradiating the sample with a charged particle beam, wherein the calculation device calculates the distance from a first charged particle beam irradiation mark formed at a first height on the sample and a second charged particle beam irradiation mark formed at a second height on the sample and on the basis of this distance and the charged particle beam irradiation angle when the first charged particle beam irradiation mark and second charged particle beam irradiation mark were formed, calculates the distance between the first height and the second height.