公开(公告)号：US10466181B2

公开(公告)日：2019-11-05

申请号：US16085890

申请日：2016-03-30

申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION

发明人： Toshifumi Honda ,  Takahiro Urano ,  Mamoru Kobayashi ,  Hisashi Hatano ,  Hironori Sakurai

IPC分类号： G01N21/00 ,  G01N21/956 ,  G01N21/88 ,  G05B19/418 ,  H01L21/66

摘要： The present invention aims at providing a defect inspection technique capable of setting parameters used for detecting a defect with a less burden to a user. A defect inspection device according to the present invention receives multiple reference values input by the user and calculates a defect extraction condition so as to optimize an evaluation value calculated with the use of the reference values, the number of actual reports, and the number of false reports (refer to FIG. 8).

公开(公告)号：US09964500B2

公开(公告)日：2018-05-08

申请号：US15531066

申请日：2014-12-08

申请人： Hitachi High-Technologies Corporation

发明人： Hisashi Hatano ,  Koichi Nagoya ,  Mamoru Kobayashi

IPC分类号： G01N23/00 ,  G01N23/225 ,  G01N21/47 ,  G01N21/95 ,  G01N21/956 ,  G01N21/84

CPC分类号： G01N23/2251 ,  G01N21/47 ,  G01N21/9501 ,  G01N21/95607 ,  G01N2021/845 ,  G01N2021/8854 ,  G01N2021/8858 ,  G01N2021/8861 ,  G01N2021/8864 ,  G01N2021/888 ,  G01N2223/302 ,  G01N2223/6116 ,  G01N2223/643 ,  G01N2223/6466 ,  H01J37/24 ,  H01J37/28

摘要： A defect inspection device is provided with an illumination optical system that irradiates light or an electron beam onto a sample, a detector that detects a signal obtained from the sample through the irradiation of the light or electron beam, a defect detection unit that detects a defect candidate on the sample through the comparison of a signal output by the detector and a prescribed threshold, and a display unit that displays a setting screen for setting the threshold. The setting screen is a two-dimensional distribution map that represents the distribution of the defect candidates in a three dimensional feature space having three features as the axes thereof and includes the axes of the three features and the threshold, which is represented in one dimension.

公开(公告)号：US20200057003A1

公开(公告)日：2020-02-20

申请号：US16661305

申请日：2019-10-23

申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION

发明人： Toshifumi Honda ,  Takahiro Urano ,  Mamoru Kobayashi ,  Hisashi Hatano ,  Hironori Sakurai

IPC分类号： G01N21/956 ,  G01N21/88 ,  G05B19/418 ,  H01L21/66

摘要： The present invention aims at providing a defect inspection technique capable of setting parameters used for detecting a defect with a less burden to a user. A defect inspection device according to the present invention receives multiple reference values input by the user and calculates a defect extraction condition so as to optimize an evaluation value calculated with the use of the reference values, the number of actual reports, and the number of false reports (refer to FIG. 8).