公开(公告)号：US20210233738A1

公开(公告)日：2021-07-29

申请号：US17230650

申请日：2021-04-14

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuta Kawamoto ,  Akira IKEGAMI ,  Yasushi EBIZUKA ,  Nobuo FUJINAGA

IPC: H01J37/153 ,  H01J37/10 ,  H01J37/147

Abstract: An object of the present disclosure is to provide a charged particle beam apparatus that can quickly find a correction condition for a new aberration that is generated in association with beam adjustment. In order to achieve the above object, the present disclosure proposes a charged particle beam apparatus configured to include an objective lens (7) configured to focus a beam emitted from a charged particle source and irradiate a specimen, a visual field movement deflector (5 and 6) configured to deflect an arrival position of the beam with respect to the specimen, and an aberration correction unit (3 and 4) disposed between the visual field movement deflector and the charged particle source, in which the aberration correction unit is configured to suppress a change in the arrival position of the beam irradiated under different beam irradiation conditions.

公开(公告)号：US20190287754A1

公开(公告)日：2019-09-19

申请号：US16291090

申请日：2019-03-04

Applicant: Hitachi High-Technologies Corporation

Inventor： Akira IKEGAMI ,  Yuta KAWAMOTO ,  Naomasa SUZUKI ,  Manabu YANO ,  Yasushi EBIZUKA ,  Naoma BAN

IPC: H01J37/141 ,  H01J37/153 ,  H01J37/147 ,  H01J37/09 ,  H01J37/28

Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.

公开(公告)号：US20150262857A1

公开(公告)日：2015-09-17

申请号：US14626116

申请日：2015-02-19

Applicant: Hitachi High-Technologies Corporation

Inventor： Yasushi EBIZUKA ,  Seiichiro KANNO ,  Masaya YASUKOCHI ,  Masakazu TAKAHASHI ,  Naoya ISHIGAKI ,  Go MIYA

IPC: H01L21/683 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01L21/6833 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/004 ,  H01J2237/2007 ,  H01J2237/28

Abstract: Proposed are an electrostatic chuck mechanism and a charged particle beam apparatus including a first plane that is a plane of a side in which a sample is adsorbed, a first electrode to which a voltage for generating an adsorptive power between the first plane and the sample is applied, and a second electrode that is arranged in a position relatively separated from the sample toward the first plane and through which a virtual line that is perpendicular to the first plane and contacts an edge of the sample passes, wherein the first plane is formed so that a size in a plane direction of the first plane is smaller than that of the sample.

Abstract translation: 提出了一种静电卡盘机构和带电粒子束装置，其包括作为吸附样品的一侧的平面的第一平面，在第一平面和样品之间产生吸附力的电压为第一电极 以及第二电极，其布置在与所述样品相对分离的位置朝向所述第一平面，并且通过所述第二电极垂直于所述第一平面并接触所述样品的边缘的虚拟线通过，其中所述第一平面形成为 第一平面的平面方向的尺寸小于样品的尺寸。

公开(公告)号：US20210398770A1

公开(公告)日：2021-12-23

申请号：US17462455

申请日：2021-08-31

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuta KAWAMOTO ,  Akira IKEGAMI ,  Yasushi EBIZUKA ,  Nobuo FUJINAGA

IPC: H01J37/153 ,  H01J37/10 ,  H01J37/147

Abstract: An object of the present disclosure is to provide a charged particle beam apparatus that can quickly find a correction condition for a new aberration that is generated in association with beam adjustment. In order to achieve the above object, the present disclosure proposes a charged particle beam apparatus configured to include an objective lens (7) configured to focus a beam emitted from a charged particle source and irradiate a specimen, a visual field movement deflector (5 and 6) configured to deflect an arrival position of the beam with respect to the specimen, and an aberration correction unit (3 and 4) disposed between the visual field movement deflector and the charged particle source, in which the aberration correction unit is configured to suppress a change in the arrival position of the beam irradiated under different beam irradiation conditions.

公开(公告)号：US20200294757A1

公开(公告)日：2020-09-17

申请号：US16782521

申请日：2020-02-05

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuta KAWAMOTO ,  Akira IKEGAMI ,  Yasushi EBIZUKA ,  Nobuo FUJINAGA

IPC: H01J37/153 ,  H01J37/10 ,  H01J37/147

Abstract: An object of the present disclosure is to provide a charged particle beam apparatus that can quickly find a correction condition for a new aberration that is generated in association with beam adjustment. In order to achieve the above object, the present disclosure proposes a charged particle beam apparatus configured to include an objective lens (7) configured to focus a beam emitted from a charged particle source and irradiate a specimen, a visual field movement deflector (5 and 6) configured to deflect an arrival position of the beam with respect to the specimen, and an aberration correction unit (3 and 4) disposed between the visual field movement deflector and the charged particle source, in which the aberration correction unit is configured to suppress a change in the arrival position of the beam irradiated under different beam irradiation conditions.

公开(公告)号：US20190393014A1

公开(公告)日：2019-12-26

申请号：US16471291

申请日：2017-01-12

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuta KAWAMOTO ,  Akira IKEGAMI ,  Yasushi EBIZUKA ,  Naoma BAN

IPC: H01J37/145 ,  H01J37/147 ,  H01J37/20 ,  H01J37/22 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28

Abstract: The objective of the present invention is to provide a charged-particle beam device capable of moving a field-of-view to an exact position even when moving the field-of-view above an actual sample. In order to attain this objective, a charged-particle beam device is proposed comprising an objective lens whereby a charged-particle beam is focused and irradiated onto a sample: a field-of-view moving deflector for deflecting the charged-particle beam; and a stage onto which the sample is placed. The charged-particle beam device is equipped with a control device which controls the lens conditions for the objective lens in such a manner that the charged-particle been focuses on the sample which is to be measured; moves the field-of-view via the field-of-view moving deflector while maintaining the lens conditions; acquires a plurality of images at each position among a reference pattern extending in a specified direction; and uses the plurality of acquired images to adjust the signal supplied to the field-of-view moving deflector.

公开(公告)号：US20160013010A1

公开(公告)日：2016-01-14

申请号：US14796113

申请日：2015-07-10

Applicant: Hitachi High-Technologies Corporation

Inventor： Seiichiro KANNO ,  Yasushi EBIZUKA ,  Go MIYA ,  Takafumi MIWA

IPC: H01J37/02 ,  H01J37/21 ,  H01J37/24 ,  H01J37/20

CPC classification number: H01J37/21 ,  H01J2237/0044 ,  H01J2237/2007

Abstract: In a charged particle beam apparatus that applies a retarding voltage to a sample through a contact terminal and executes measurement or inspection of a surface of the sample, potential variation of the sample when changing the retarding voltage applied to the contact terminal is measured by a surface potential meter, a time constant of the potential variation of the sample is obtained, and it is determined whether execution of measurement or inspection by a charged particle beam continues or stops based on the time constant, or a conduction ensuring process between the sample and the contact terminal is executed.

Abstract translation: 在通过接触端子向样品施加延迟电压并执行样品表面的测量或检查的带电粒子束装置中，通过表面测量改变施加到接触端子的延迟电压时样品的电位变化 电位计，获得样品的电位变化的时间常数，并且基于时间常数确定带电粒子束的测量或检查的执行是否继续或停止，或者样品与样品之间的导通确保过程 接线端子被执行。

公开(公告)号：US20150357156A1

公开(公告)日：2015-12-10

申请号：US14759241

申请日：2014-01-10

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yasushi EBIZUKA ,  Seiichiro KANNO ,  Naoya ISHIGAKI ,  Masashi FUJITA

IPC: H01J37/20 ,  H01J37/02 ,  H01J37/28

CPC classification number: H01J37/20 ,  H01J37/026 ,  H01J37/09 ,  H01J37/28 ,  H01J2237/2007

Abstract: The present invention explains a charged-particle beam device for the purpose of highly accurately measuring electrostatic charge of a sample in a held state by an electrostatic chuck (105). In order to attain the object, according to the present invention, there is proposed a charged-particle beam device including an electrostatic chuck (105) for holding a sample on which a charged particle beam is irradiated and a sample chamber (102) in which the electrostatic chuck (105) is set. The charged-particle beam device includes a potential measuring device that measures potential on a side of an attraction surface for the sample of the electrostatic chuck (105) and a control device that performs potential measurement by the potential measuring device in a state in which the sample is attracted by the electrostatic chuck (105).

Abstract translation: 本发明解释了一种带电粒子束装置，用于通过静电卡盘（105）高度准确地测量处于保持状态的样品的静电荷。 为了达到上述目的，本发明提出一种带电粒子束装置，其特征在于，包括：静电卡盘（105），用于保持照射有带电粒子束的样品和样品室（102），所述样品室 静电吸盘（105）被设定。 带电粒子束装置包括：电位测量装置，其测量用于静电卡盘（105）的样本的吸引表面的电位;以及控制装置，其通过电位测量装置进行电位测量，其中， 样品被静电吸盘（105）吸引。