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公开(公告)号：US20200251304A1
公开(公告)日：2020-08-06
申请号：US16641870
申请日：2017-09-04
IPC分类号： H01J37/28 , H01J37/20 , H01J37/141 , H01J37/244
摘要： The present invention provides a charged particle beam apparatus capable of efficiently reducing the effect of a residual magnetic field when SEM observation is performed. The charged particle beam apparatus according to the present invention includes a first mode for passing a direct current to a second coil after turning off a first coil, and a second mode for passing an alternating current to the second coil after turning off the first coil.
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公开(公告)号：US20190385810A1
公开(公告)日：2019-12-19
申请号：US16487566
申请日：2017-02-22
IPC分类号： H01J37/244 , H01J37/28
摘要： The charged particle beam device includes a charged particle beam source which emits a primary charged particle beam, an objective lens which focuses the primary charged particle beam on a sample, a passage electrode which is formed of a metal material and is disposed between the charged particle beam source and a tip end of the objective lens, a detector which detects a secondary charged particle emitted from the sample, and an electrostatic field electrode which is electrically insulated from the passage electrode. The passage electrode is formed such that the primary charged particle beam passes through the inside of the passage electrode. The electrostatic field electrode is formed to cover an outer periphery of the passage electrode.
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公开(公告)号：US20170040139A1
公开(公告)日：2017-02-09
申请号：US15303282
申请日：2015-04-22
IPC分类号： H01J37/04 , H01J37/14 , H01J37/145 , H01J37/28 , H01J37/12 , H01J37/065 , H01J37/244
CPC分类号： H01J37/04 , H01J37/065 , H01J37/09 , H01J37/12 , H01J37/14 , H01J37/141 , H01J37/145 , H01J37/244 , H01J37/28 , H01J2237/04756 , H01J2237/14
摘要： The present invention provides an electron beam device that achieves high spatial resolution and high luminance, while remaining insusceptible to the effects of external disturbance. The present invention relates to an electron beam device, wherein, between, e.g., an electron source for generating an electron beam and an objective lens for focusing the electron beam onto a sample, a high voltage beam tube is disposed close to the electron source and a low voltage beam tube is disposed close to the objective lens. This makes it possible to achieve high luminance while maintaining spatial resolution, even with an SEM that is provided with a type of objective lens that actively leaks a magnetic field onto a sample.
摘要翻译： 本发明提供一种实现高空间分辨率和高亮度的电子束装置，同时不受外部干扰的影响。 电子束装置技术领域本发明涉及一种电子束装置，其中，在例如用于产生电子束的电子源和用于将电子束聚焦到样品上的物镜之间，高压束管靠近电子源设置， 低压射束管靠近物镜设置。 这使得即使使用设置有主动地将磁场泄漏到样品上的物镜的类型的SEM，也可以在保持空间分辨率的同时实现高亮度。
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公开(公告)号：US20200090903A1
公开(公告)日：2020-03-19
申请号：US16494595
申请日：2017-03-29
IPC分类号： H01J37/28 , H01J37/12 , H01J37/145 , H01J37/153
摘要： A charged particle beam device includes: a charged particle source that emits a charged particle beam; a boosting electrode disposed between the charged particle source and a sample to form a path of the charged particle beam and to accelerate and decelerate the charged particle beam; a first pole piece that covers the boosting electrode; a second pole piece that covers the first pole piece; a first lens coil disposed outside the first pole piece and inside the second pole piece to form a first lens; a second lens coil disposed outside the second pole piece to form a second lens; and a control electrode formed between a distal end portion of the first pole piece and a distal end portion of the second pole piece to control an electric field formed between the sample and the distal end portion of the second pole piece.
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5.发明申请公开(公告)号：US20170358421A1
公开(公告)日：2017-12-14
申请号：US15671472
申请日：2017-08-08
IPC分类号： H01J37/28 , G01T1/20 , H01J37/30 , H01J37/244 , H01J37/22 , H01J37/24 , H01J37/147 , H01J37/10
CPC分类号： H01J37/28 , G01T1/20 , H01J37/10 , H01J37/147 , H01J37/22 , H01J37/24 , H01J37/244 , H01J37/30 , H01J37/3178
摘要： A composite charged particle beam apparatus modulates an irradiation condition of a charged particle beam at high speed and detects a signal in synchronization with a modulation period to extract a signal arising from a particular charged particle beam when a sample is irradiated with a plurality of charged particle beams simultaneously. Light emitted from two or more kinds of scintillators having different light emitting properties is dispersed, signal strength is detected, and a signal is processed based on a ratio of first signal strength when the sample is irradiated with a first charged particle beam alone to second signal strength when the sample is irradiated with a second charged particle beam alone. The apparatus can extract only a signal arising from a desired charged particle beam even when the sample is irradiated with the plurality of charged particle beams simultaneously.
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公开(公告)号：US20200219697A1
公开(公告)日：2020-07-09
申请号：US16641035
申请日：2017-09-04
IPC分类号： H01J37/28 , H01J37/30 , H01J37/141 , H01J37/20
摘要： The present invention realizes a composite charged particle beam apparatus capable of suppressing a leakage magnetic field from a pole piece forming an objective lens of an SEM with a simple structure. The charged particle beam apparatus according to the present invention obtains an ion beam observation image while passing a current to a first coil constituting the objective lens, and performs an operation of reducing the image shift by passing a current to a second coil with a plurality of current values, and determines a current to be passed to the second coil based on a difference between the operations.
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公开(公告)号：US20200211815A1
公开(公告)日：2020-07-02
申请号：US16616097
申请日：2017-06-02
IPC分类号： H01J37/244 , H01J37/10 , H01J37/09 , H01J37/147
摘要： Signal electrons with high energy that pass near an optical axis, for example, backscattered electrons or secondary electrons in a booster optical system, can be detected. Therefore, there is provided a charged particle beam device including: a charged particle beam source configured to generate a charged particle beam; an objective lens configured to focus the charged particle beam to a sample; and a first charged particle detecting element disposed between the charged particle beam source and the objective lens and configured to detect charged particles generated by an interaction between the charged particle beam and the sample, in which a detection surface of the first charged particle detecting element is disposed on a center axis of the objective lens.
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8.发明申请Composite Charged Particle Beam Detector, Charged Particle Beam Device, and Charged Particle Beam Detector 有权复合带电粒子束检测器，带电粒子束装置和带电粒子束检测器公开(公告)号：US20150364296A1
公开(公告)日：2015-12-17
申请号：US14761963
申请日：2014-01-10
IPC分类号： H01J37/28 , G01T1/20 , H01J37/147 , H01J37/244 , H01J37/10 , H01J37/30
CPC分类号： H01J37/28 , G01T1/20 , H01J37/10 , H01J37/147 , H01J37/22 , H01J37/24 , H01J37/244 , H01J37/30 , H01J37/3178
摘要： The present invention relates to modulating an irradiation condition of a charged particle beam at high speed and detecting a signal in synchronization with a modulation period for the purpose of extracting a signal arising from a certain charged particle beam when a sample is irradiated with a plurality of charged particle beams simultaneously or, for example, for the purpose of separating a secondary electron signal arising from ion beam irradiation and a secondary electron signal arising from electron beam irradiation in an FIB-SEM system. The present invention further relates to dispersing light emitted from two or more kinds of scintillators having different light emitting properties, detecting each signal strength, and processing a signal on the basis of a ratio of first signal strength when the sample is irradiated with a first charged particle beam alone to second signal strength when the sample is irradiated with a second charged particle beam alone, the ratio being set by a mechanism. The present invention enables extraction of only a signal arising from a desired charged particle beam even when the sample is irradiated with the plurality of charged particle beams simultaneously. The SEM observation can be performed in the middle of the FIB processing using the secondary electron in the FIB-SEM system, for example.
摘要翻译： 本发明涉及以高速度调制带电粒子束的照射条件，并且与调制周期同步地检测信号，以便在样品被多个照射时提取由某个带电粒子束产生的信号 或者例如为了分离由离子束照射产生的二次电子信号和在FIB-SEM系统中从电子束照射引起的二次电子信号。 本发明还涉及分散具有不同发光特性的两种或更多种闪烁体发射的光，检测每种信号强度，并且基于当样品被照射第一个带电量时的第一信号强度的比例来处理信号 当单独用第二带电粒子束照射样品时，粒子束单独到第二信号强度，该比例由机构设定。 即使当同时对多个带电粒子束照射样品时，本发明仅能够提取由期望的带电粒子束产生的信号。 例如，可以使用FIB-SEM系统中的二次电子在FIB处理的中间进行SEM观察。
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