公开(公告)号：US20190287754A1

公开(公告)日：2019-09-19

申请号：US16291090

申请日：2019-03-04

Applicant: Hitachi High-Technologies Corporation

Inventor： Akira IKEGAMI ,  Yuta KAWAMOTO ,  Naomasa SUZUKI ,  Manabu YANO ,  Yasushi EBIZUKA ,  Naoma BAN

IPC: H01J37/141 ,  H01J37/153 ,  H01J37/147 ,  H01J37/09 ,  H01J37/28

Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.

公开(公告)号：US20210398770A1

公开(公告)日：2021-12-23

申请号：US17462455

申请日：2021-08-31

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuta KAWAMOTO ,  Akira IKEGAMI ,  Yasushi EBIZUKA ,  Nobuo FUJINAGA

IPC: H01J37/153 ,  H01J37/10 ,  H01J37/147

Abstract: An object of the present disclosure is to provide a charged particle beam apparatus that can quickly find a correction condition for a new aberration that is generated in association with beam adjustment. In order to achieve the above object, the present disclosure proposes a charged particle beam apparatus configured to include an objective lens (7) configured to focus a beam emitted from a charged particle source and irradiate a specimen, a visual field movement deflector (5 and 6) configured to deflect an arrival position of the beam with respect to the specimen, and an aberration correction unit (3 and 4) disposed between the visual field movement deflector and the charged particle source, in which the aberration correction unit is configured to suppress a change in the arrival position of the beam irradiated under different beam irradiation conditions.

公开(公告)号：US20200294757A1

公开(公告)日：2020-09-17

申请号：US16782521

申请日：2020-02-05

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuta KAWAMOTO ,  Akira IKEGAMI ,  Yasushi EBIZUKA ,  Nobuo FUJINAGA

IPC: H01J37/153 ,  H01J37/10 ,  H01J37/147

Abstract: An object of the present disclosure is to provide a charged particle beam apparatus that can quickly find a correction condition for a new aberration that is generated in association with beam adjustment. In order to achieve the above object, the present disclosure proposes a charged particle beam apparatus configured to include an objective lens (7) configured to focus a beam emitted from a charged particle source and irradiate a specimen, a visual field movement deflector (5 and 6) configured to deflect an arrival position of the beam with respect to the specimen, and an aberration correction unit (3 and 4) disposed between the visual field movement deflector and the charged particle source, in which the aberration correction unit is configured to suppress a change in the arrival position of the beam irradiated under different beam irradiation conditions.

公开(公告)号：US20200185186A1

公开(公告)日：2020-06-11

申请号：US16664100

申请日：2019-10-25

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuta KAWAMOTO ,  Akira IKEGAMI ,  Masahiro FUKUTA

IPC: H01J37/147 ,  H01J37/12

Abstract: To provide a charged particle beam device capable of preventing generation of geometric aberration by aligning axes of electrostatic lenses with high accuracy even when center holes of respective electrodes which constitute the electrostatic lens are not disposed coaxially. The charged particle beam device according to the invention includes an electrostatic lens disposed between an acceleration electrode and an objective lens, wherein at least one of the electrodes which constitutes the electrostatic lens is formed of a magnetic body, and two or more magnetic field generating elements are disposed along an outer periphery of the electrode.

公开(公告)号：US20190393014A1

公开(公告)日：2019-12-26

申请号：US16471291

申请日：2017-01-12

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuta KAWAMOTO ,  Akira IKEGAMI ,  Yasushi EBIZUKA ,  Naoma BAN

IPC: H01J37/145 ,  H01J37/147 ,  H01J37/20 ,  H01J37/22 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28

Abstract: The objective of the present invention is to provide a charged-particle beam device capable of moving a field-of-view to an exact position even when moving the field-of-view above an actual sample. In order to attain this objective, a charged-particle beam device is proposed comprising an objective lens whereby a charged-particle beam is focused and irradiated onto a sample: a field-of-view moving deflector for deflecting the charged-particle beam; and a stage onto which the sample is placed. The charged-particle beam device is equipped with a control device which controls the lens conditions for the objective lens in such a manner that the charged-particle been focuses on the sample which is to be measured; moves the field-of-view via the field-of-view moving deflector while maintaining the lens conditions; acquires a plurality of images at each position among a reference pattern extending in a specified direction; and uses the plurality of acquired images to adjust the signal supplied to the field-of-view moving deflector.

公开(公告)号：US20180233320A1

公开(公告)日：2018-08-16

申请号：US15747847

申请日：2016-07-27

Applicant: Hitachi High-Technologies Corporation

Inventor： Akira IKEGAMI ,  Yuta KAWAMOTO ,  Hideto DOHI ,  Manabu YANO ,  Yutaka TANDAI ,  Hideyuki KAZUMI

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/21

CPC classification number: H01J37/147 ,  H01J37/04 ,  H01J37/21 ,  H01J37/248 ,  H01J37/28 ,  H01J2237/0473

Abstract: A purpose of the present invention is to provide a charged particle beam device that suppresses an off-axis amount when a field of view moves, said move causing an aberration, and allows large field of view moves to be carried out. In order to achieve the above-mentioned purpose, this charged particle beam device is provided with an objective lens and deflectors for field of view moves, said deflectors deflecting a charged particle beam, and is further provided with an accelerating tube positioned between the objective lens and the deflectors for field of view moves, a power source that applies a voltage to the accelerating tube, and a control device that controls the voltage to be applied to the power source in response to the deflection conditions of the deflectors for field of view moves.