公开(公告)号：US20180233320A1

公开(公告)日：2018-08-16

申请号：US15747847

申请日：2016-07-27

Applicant: Hitachi High-Technologies Corporation

Inventor： Akira IKEGAMI ,  Yuta KAWAMOTO ,  Hideto DOHI ,  Manabu YANO ,  Yutaka TANDAI ,  Hideyuki KAZUMI

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/21

CPC classification number: H01J37/147 ,  H01J37/04 ,  H01J37/21 ,  H01J37/248 ,  H01J37/28 ,  H01J2237/0473

Abstract: A purpose of the present invention is to provide a charged particle beam device that suppresses an off-axis amount when a field of view moves, said move causing an aberration, and allows large field of view moves to be carried out. In order to achieve the above-mentioned purpose, this charged particle beam device is provided with an objective lens and deflectors for field of view moves, said deflectors deflecting a charged particle beam, and is further provided with an accelerating tube positioned between the objective lens and the deflectors for field of view moves, a power source that applies a voltage to the accelerating tube, and a control device that controls the voltage to be applied to the power source in response to the deflection conditions of the deflectors for field of view moves.

公开(公告)号：US20140197313A1

公开(公告)日：2014-07-17

申请号：US14215209

申请日：2014-03-17

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Noritsugu TAKAHASHI ,  Muneyuki FUKUDA ,  Manabu YANO ,  Hirohiko KITSUKI ,  Kazunari ASAO ,  Tomoyasu SHOJO

IPC: H01J37/28 ,  H01J37/10

CPC classification number: H01J37/28 ,  H01J37/10 ,  H01J37/145 ,  H01J37/21 ,  H01J2237/2817

Abstract: A charged-particle-beam device is characterized in having a control value for an aligner coil (29) being determined by: a coil current and an electrode applied-voltage at a control value for objectives (30, 31), which is an electromagnetic-field superposition lens; a control value for image-shift coils (27, 28); and the acceleration voltage of the charged-particle-beam. By doing this, it has become possible to avoid image disturbances that occur on images to be displayed at boundaries between charged areas and non-charged areas, and provide a charged-particle-beam device that obtains clear images without any unevenness in brightness.

Abstract translation: 带电粒子束装置的特征在于具有对准线圈（29）的控制值，通过以下方式确定：线圈电流和用于物镜（30,31）的控制值的电极施加电压，其为电磁 场叠加透镜; 用于图像转换线圈（27,28）的控制值; 和带电粒子束的加速电压。 通过这样做，可以避免在充电区域和非充电区域之间的边界处显示图像上出现的图像干扰，并且提供获得清晰图像而没有任何亮度不均匀的带电粒子束装置。

公开(公告)号：US20190287754A1

公开(公告)日：2019-09-19

申请号：US16291090

申请日：2019-03-04

Applicant: Hitachi High-Technologies Corporation

Inventor： Akira IKEGAMI ,  Yuta KAWAMOTO ,  Naomasa SUZUKI ,  Manabu YANO ,  Yasushi EBIZUKA ,  Naoma BAN

IPC: H01J37/141 ,  H01J37/153 ,  H01J37/147 ,  H01J37/09 ,  H01J37/28

Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.