公开(公告)号：US20050064321A1

公开(公告)日：2005-03-24

申请号：US10494486

申请日：2002-10-21

申请人： Hoon Kang ,  Joon-Yeon Cho ,  Dong-Min Kim ,  Seung-Uk Lee

发明人： Hoon Kang ,  Joon-Yeon Cho ,  Dong-Min Kim ,  Seung-Uk Lee

IPC分类号： G03F7/008 ,  G03F7/00 ,  G03F7/004 ,  G03F7/023 ,  H01L21/027 ,  G03C1/494

CPC分类号： G03F7/0236 ,  G03F7/0007

摘要： The present invention relates to an LCD circuit photoresist composition for manufacturing fine circuit patterns on liquid crystal display circuits or semiconductor integrated circuits, and more particularly, and LCD circuit photoresist composition including (a) mixed polymer resins comprising a novolak resin with a molecular weight ranging from 3,000 to 9,000 and a fractionated novolak resin with a molecular weight ranging from 3,500 to 10,000; (b) a diazide-type photosensitive compound; (c) a photosensitizer; and (d) organic solvents. An LCD circuit photoresist composition of the present invention has excellent photosensitivity, retention ratio, resolution, contrast, heat resistance, adhesion, and stripper solubility, thus this photoresist composition can be easily applied to industrial work places for better working environments.

摘要翻译： 本发明涉及用于在液晶显示电路或半导体集成电路上制造精细电路图案的LCD电路光致抗蚀剂组合物，更具体地说，涉及包括（a）包含分子量范围的酚醛清漆树脂的混合聚合物树脂的LCD电路光致抗蚀剂组合物 3,000至9,000份，分子量为3,500至10,000份的分级酚醛清漆树脂; （b）二叠氮型光敏化合物; （c）光敏剂; 和（d）有机溶剂。 本发明的LCD电路光阻组合物具有优异的光敏性，保留率，分辨率，对比度，耐热性，粘合性和剥离剂溶解性，因此该光致抗蚀剂组合物可以容易地应用于工业工作场所，从而达到更好的工作环境。

公开(公告)号：US07378230B2

公开(公告)日：2008-05-27

申请号：US10750845

申请日：2004-01-05

申请人： Sung-Chul Kang ,  Jin-Ho Ju ,  You-Kyoung Lee ,  Dong-Ki Lee ,  Hyo-Youl Kim ,  Hoon Kang ,  Seung-Uk Lee ,  Byung-Uk Kim

发明人： Sung-Chul Kang ,  Jin-Ho Ju ,  You-Kyoung Lee ,  Dong-Ki Lee ,  Hyo-Youl Kim ,  Hoon Kang ,  Seung-Uk Lee ,  Byung-Uk Kim

IPC分类号： G03F7/32 ,  G03F7/023

CPC分类号： G03F7/0236 ,  G03F7/0048

摘要： The present invention relates to a photoresist composition for an MMN (multi-micro nozzle) head coater, more particularly to a photoresist composition comprising a novolak resin with a molecular weight ranging from 2000 to 12,000, a diazide photoactive compound, an organic solvent, and a Si-based surfactant for use in liquid crystal display circuits.The photoresist composition for liquid crystal display circuits of the present invention solves the stain problem, which occurs in MMN head coaters used for large-scale substrate glass, and improves coating characteristics, so that it can be utilized industrially and is expected to significantly improve productivity.

摘要翻译： 本发明涉及一种用于MMN（多微喷嘴）喷涂机的光致抗蚀剂组合物，更具体地说涉及一种光致抗蚀剂组合物，其包含分子量范围为2000-12,000的酚醛清漆树脂，二叠氮光敏化合物，有机溶剂和 用于液晶显示电路的Si基表面活性剂。 本发明的液晶显示电路用光致抗蚀剂组合物解决了用于大规模基板玻璃的MMN头涂布机中发生的污渍问题，并且改善了涂布特性，从而可以在工业上得到利用并且预期显着提高生产率 。

公开(公告)号：US20060008728A1

公开(公告)日：2006-01-12

申请号：US11174872

申请日：2005-07-05

申请人： Hoon Kang ,  Seung-uk Lee ,  Woo-sik Jun ,  Dae-youn Park ,  Ju-hyuk Kim ,  Byung-uk Kim

发明人： Hoon Kang ,  Seung-uk Lee ,  Woo-sik Jun ,  Dae-youn Park ,  Ju-hyuk Kim ,  Byung-uk Kim

IPC分类号： G03C5/18

CPC分类号： G03F7/0048 ,  G03F7/0007 ,  G03F7/022

摘要： The present invention provides a photoresist composition and more particularly, a photoresist composition comprising a) a novolak resin, b) a diazide compound, and c) a solvent containing propylene glycol methyl ether acetate (PGMEA) and 2,2,4-triemthyl-1,3-penthanediolmonoisobutylate (TMPMB). The photoresist composition according to the invention has excellent coating uniformity and stain inhibitory properties after coating so that it can be easily applied to real industrial fields and it can improve working environments due to the reduction of amounts to be consumed, the decrease of time to be required for manufacture, etc. when manufactured on a large scale.

摘要翻译： 本发明提供一种光致抗蚀剂组合物，更具体地说，涉及一种光致抗蚀剂组合物，其包含：a）酚醛清漆树脂，b）二叠氮化合物，和c）含有丙二醇甲基醚乙酸酯（PGMEA）和2,2,4-三甲基 - 1,3-戊二醇单异丁酸酯（TMPMB）。 根据本发明的光致抗蚀剂组合物在涂布后具有优异的涂布均匀性和防污性，使得其可以容易地应用于实际工业领域，并且可以由于减少待消耗的量而减少工作环境，减少时间 制造时需要大规模制造。

公开(公告)号：US07195854B2

公开(公告)日：2007-03-27

申请号：US11174872

申请日：2005-07-05

申请人： Hoon Kang ,  Seung-uk Lee ,  Woo-sik Jun ,  Dae-youn Park ,  Ju-hyuk Kim ,  Byung-uk Kim

发明人： Hoon Kang ,  Seung-uk Lee ,  Woo-sik Jun ,  Dae-youn Park ,  Ju-hyuk Kim ,  Byung-uk Kim

IPC分类号： G03F7/023

CPC分类号： G03F7/0048 ,  G03F7/0007 ,  G03F7/022

摘要： The present invention provides a photoresist composition and more particularly, a photoresist composition comprising a) a novolak resin, b) a diazide compound, and c) a solvent containing propylene glycol methyl ether acetate (PGMEA) and 2,2,4-triemthyl-1,3-penthanediolmonoisobutylate (TMPMB). The photoresist composition according to the invention has excellent coating uniformity and stain inhibitory properties after coating so that it can be easily applied to real industrial fields and it can improve working environments due to the reduction of amounts to be consumed, the decrease of time to be required for manufacture, etc. when manufactured on a large scale.

摘要翻译： 本发明提供一种光致抗蚀剂组合物，更具体地说，涉及一种光致抗蚀剂组合物，其包含a）一种酚醛清漆树脂，b）一种重氮化合物，和c）含有丙二醇甲基醚乙酸酯（PGMEA）和2,2,4-三甲基 - 1,3-戊二醇单异丁酸酯（TMPMB）。 根据本发明的光致抗蚀剂组合物在涂布后具有优异的涂布均匀性和防污性，使得其可以容易地应用于实际工业领域，并且可以由于减少待消耗的量而减少工作环境，减少时间 制造时需要大规模制造。

公开(公告)号：US06893791B2

公开(公告)日：2005-05-17

申请号：US10259152

申请日：2002-09-27

申请人： You-Kyoung Lee ,  Sung-Chul Kang ,  Jin-Ho Ju ,  Dong-Ki Lee ,  Seung-Uk Lee ,  Hoon Kang

发明人： You-Kyoung Lee ,  Sung-Chul Kang ,  Jin-Ho Ju ,  Dong-Ki Lee ,  Seung-Uk Lee ,  Hoon Kang

IPC分类号： G03F7/004 ,  G02F1/13 ,  G03F7/008 ,  G03F7/022 ,  G03F7/023 ,  G03F7/40 ,  G03F7/30

CPC分类号： G03F7/0236 ,  G03F7/0226 ,  G03F7/40

摘要： Disclosed is a photoresist composition having a good sensitivity and residual layer characteristic and a method of forming a pattern using the same. The photoresist composition includes 5-30% by weight of a polymer resin, 2-10% by weight of a photosensitive compound, 0.1-10% by weight of a sensitivity enhancing agent, 0.1-10% by weight of a sensitivity restraining agent and 60-90% by weight of an organic solvent. A photoresist layer is formed by coating the photoresist composition on a substrate and then drying the coated photoresist composition. Then, thus obtained photoresist layer is exposed by using a mask having a predetermined pattern. Then, a photoresist pattern is formed by developing thus exposed photoresist layer. The photoresist pattern exhibits a uniform layer thickness and critical dimension.

摘要翻译： 公开了具有良好的灵敏度和残留层特性的光致抗蚀剂组合物和使用其形成图案的方法。 光致抗蚀剂组合物包含5-30重量％的聚合物树脂，2-10重量％的感光性化合物，0.1-10重量％的敏感性增强剂，0.1-10重量％的敏感性抑制剂和 60-90重量％的有机溶剂。 通过将光致抗蚀剂组合物涂覆在基材上，然后干燥涂覆的光致抗蚀剂组合物，形成光致抗蚀剂层 然后，通过使用具有预定图案的掩模曝光所得到的光致抗蚀剂层。 然后，通过显影这样曝光的光刻胶层形成光致抗蚀剂图案。 光致抗蚀剂图案具有均匀的层厚度和临界尺寸。

公开(公告)号：US09632339B2

公开(公告)日：2017-04-25

申请号：US12643267

申请日：2009-12-21

申请人： Insu Baik ,  Hoon Kang ,  Sudong Roh

发明人： Insu Baik ,  Hoon Kang ,  Sudong Roh

IPC分类号： G02F1/1333 ,  G02B27/22 ,  G02B27/26 ,  H04N13/04 ,  G02F1/1345

CPC分类号： G02F1/1333 ,  G02B27/2242 ,  G02B27/26 ,  G02F1/13452 ,  G02F2413/01 ,  H04N13/337

摘要： A three-dimensional (3D) image display device includes a display panel including an upper substrate and a lower substrate, the lower substrate having a pixel array area overlapped with the upper substrate and a pad area formed on at least one side of the lower substrate outside the pixel array area, wherein the display panel displays a left eye image and a right eye image; and a patterned retarder attached to the display panel and having retarder patterns to apply first and second polarizations to light from the display panel corresponding to the left eye image and the right eye image, respectively, wherein the pad area includes a first area in which data pads extending from data lines of the pixel array area are formed, and a second area in which gate pads extending from gate lines of the pixel array area are formed, and wherein the first area is exposed when the display panel and the patterned retarder are attached.

公开(公告)号：US08895439B2

公开(公告)日：2014-11-25

申请号：US13486858

申请日：2012-06-01

申请人： Woo-Seok Jeon ,  Jong Kwang Lee ,  Jin Ho Ju ,  Min Kang ,  Hoon Kang ,  Seung Bo Shim ,  Gwui-Hyun Park ,  Bong-Yeon Kim ,  Seon-II Kim

发明人： Woo-Seok Jeon ,  Jong Kwang Lee ,  Jin Ho Ju ,  Min Kang ,  Hoon Kang ,  Seung Bo Shim ,  Gwui-Hyun Park ,  Bong-Yeon Kim ,  Seon-II Kim

IPC分类号： H01L21/00 ,  G03F7/20

CPC分类号： G03F7/203 ,  G03F7/20 ,  G03F7/70466 ,  Y10S438/942

摘要： A method for forming a fine exposure pattern where a width and an interval of the pattern are each 1CD, by first exposing a photoresist by using an exposure mask where an interval ratio of a light shielding part and a light transmission part is 2CD:1CD to 4CD:1CD, and then second exposing the photoresist after the exposure mask is shifted at a predetermined interval, or second exposing the photoresist by using an exposure mask formed at a position where a light transmission part is shifted at a predetermined interval, and developing the photoresist, such that it is possible to form a display device having a pixel electrode including a plurality of fine branch electrodes having a smaller width and interval than a resolution of an exposure apparatus.

摘要翻译： 通过使用遮光部和光透射部的间隔比为2CD:1CD的曝光掩模，首先使光致抗蚀剂曝光，形成图案的宽度和间隔为1CD的微细曝光图案的方法， 4CD：1CD，然后在曝光掩模以预定间隔移动之后第二次曝光光致抗蚀剂，或者通过使用形成在光透射部分以预定间隔移动的位置处的曝光掩模来第二次曝光光致抗蚀剂， 光致抗蚀剂，使得可以形成具有像素电极的显示装置，该像素电极包括具有比曝光装置的分辨率更小的宽度和间隔的多个细分支电极。

公开(公告)号：US08519408B2

公开(公告)日：2013-08-27

申请号：US13599518

申请日：2012-08-30

申请人： Hoon Kang ,  Jae-sung Kim ,  Yang-ho Jung ,  Hi-kuk Lee

发明人： Hoon Kang ,  Jae-sung Kim ,  Yang-ho Jung ,  Hi-kuk Lee

IPC分类号： G03C1/72 ,  G03C7/00 ,  C08J3/28

CPC分类号： H01L27/1288 ,  H01L27/1214

摘要： Disclosed is a method of producing a thin film transistor substrate having high light sensitivity, heat-resistance, impact resistance, and a photosensitive composition used by the same, the method including forming data wires on an insulating substrate, forming an organic insulating film on the data wires by applying a photosensitive composition comprising a terpolymer, where the terpolymer is derived from monomers of an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride, or a mixture thereof, an unsaturated epoxy group-containing compound, and an olefinic compound.

摘要翻译： 公开了一种制造具有高光敏感性，耐热性，耐冲击性的光致变化薄膜晶体管基板的方法及使用该薄膜晶体管基板的方法，该方法包括：在绝缘基片上形成数据线，在其上形成有机绝缘膜 数据线通过应用包含三元共聚物的光敏组合物，其中三元共聚物衍生自不饱和羧酸，不饱和羧酸酐或其混合物，不饱和环氧基化合物和烯属化合物的单体。

公开(公告)号：US08387980B2

公开(公告)日：2013-03-05

申请号：US12274584

申请日：2008-11-20

申请人： Hoon Kang ,  Chun-seung Yang ,  Myung-song Jung ,  Jun-young Lee

发明人： Hoon Kang ,  Chun-seung Yang ,  Myung-song Jung ,  Jun-young Lee

IPC分类号： B65H39/10 ,  B65H5/00

CPC分类号： B41J13/009 ,  B41J13/106 ,  B65H29/58 ,  B65H2555/13 ,  B65H2601/525 ,  B65H2801/06

摘要： An image forming apparatus including: a plurality of medium trays to stack a print medium having an image formed thereon by an image forming unit; a driving source to momentarily apply a direction switching signal; a selector to select a carrying path of the print medium having the image formed thereon, the carrying path directing the print medium to one of the plurality of medium trays; and a switch unit connected to the driving source to set a position of the selector in order to direct the print medium along the carrying path according to the direction switching signal. Accordingly, power is only used momentarily to direct the print medium to a medium tray from among a plurality of medium trays.

摘要翻译： 一种图像形成装置，包括：多个介质托盘，用于堆叠具有通过图像形成单元在其上形成的图像的打印介质; 瞬时施加方向切换信号的驱动源; 选择器，用于选择其上形成有图像的打印介质的传送路径，所述传送路径将打印介质引导到多个介质托盘中的一个; 以及连接到驱动源的开关单元，以设置选择器的位置，以便根据方向切换信号沿着传送路径引导打印介质。 因此，仅仅使用功率来将打印介质从多个介质托盘中引导到介质托盘。

公开(公告)号：US20130043473A1

公开(公告)日：2013-02-21

申请号：US13440499

申请日：2012-04-05

申请人： Sung-Man Kim ,  Jun-Ho Song ,  Man-Hong Na ,  Young-Je Cho ,  Hoon Kang ,  Sung-Hoon Lim ,  Min-Chul Song ,  Soo-Jung Chae ,  Eu-Gene Lee

发明人： Sung-Man Kim ,  Jun-Ho Song ,  Man-Hong Na ,  Young-Je Cho ,  Hoon Kang ,  Sung-Hoon Lim ,  Min-Chul Song ,  Soo-Jung Chae ,  Eu-Gene Lee

IPC分类号： H01L29/786 ,  H01L21/336

CPC分类号： H01L27/1288 ,  G02F1/1345 ,  G02F1/13458 ,  G02F1/136227 ,  H01L27/124 ,  H01L29/41733

摘要： A display substrate includes a data line, a gate line and a fan-out line. The data line is disposed in a display area of a base substrate and transfers a data signal to a switching element electrically connected to a pixel electrode. The gate line is disposed in the display area and transfers a gate signal to the switching element. The fan-out line is disposed in a peripheral area of the base substrate surrounding the display area, electrically connected to at least one of the data line and the gate line, and includes a plurality of conductive layers making contact with each other through a contact hole.

摘要翻译： 显示基板包括数据线，栅极线和扇出线。 数据线设置在基板的显示区域中，并将数据信号传送到与像素电极电连接的开关元件。 栅极线设置在显示区域中，并将栅极信号传送到开关元件。 扇出线设置在围绕显示区域的基底基板的周边区域中，电连接到数据线和栅极线中的至少一个，并且包括通过触点彼此接触的多个导电层 孔。