Automatic intelligent yield improving and process parameter multivariate system and the analysis method thereof
    1.
    发明授权
    Automatic intelligent yield improving and process parameter multivariate system and the analysis method thereof 失效
    自动智能产量提高和过程参数多变量系统及其分析方法

    公开(公告)号:US07079677B2

    公开(公告)日:2006-07-18

    申请号:US10249148

    申请日:2003-03-19

    Abstract: An automatic intelligent yield improving and process parameter multivariate analysis system and the analysis method thereof. The system is applied to a computer to set up analysis procedures for analyzing process parameters obtained from each measuring machine in semiconductor testing process by utilizing data mining technology. The system includes a plurality of semiconductor processing nodes having different functions. The system links each of the semiconductor processing node to another semiconductor processing node by a logic means so that the computer can process the semiconductor processing nodes sequentially. The system also links the semiconductor processing nodes by a data connection means to allow microprocessors to load necessary parameter data or wafer lot numbers from corresponding semiconductor processing nodes by a data connection means.

    Abstract translation: 一种自动智能产量提高和过程参数多变量分析系统及其分析方法。 该系统应用于计算机,通过利用数据挖掘技术,在半导体测试过程中设置分析从每台测量机获得的工艺参数的分析程序。 该系统包括具有不同功能的多个半导体处理节点。 该系统通过逻辑装置将每个半导体处理节点连接到另一个半导体处理节点,使得计算机可以顺序地处理半导体处理节点。 该系统还通过数据连接装置连接半导体处理节点,以允许微处理器通过数据连接装置从相应的半导体处理节点加载必要的参数数据或晶片批号。

    METHOD AND RELATED SYSTEM FOR SEMICONDUCTOR EQUIPMENT PREVENTION MAINTENANCE MANAGEMENT
    2.
    发明申请
    METHOD AND RELATED SYSTEM FOR SEMICONDUCTOR EQUIPMENT PREVENTION MAINTENANCE MANAGEMENT 有权
    半导体设备预防维护管理方法与相关系统

    公开(公告)号:US20050203858A1

    公开(公告)日:2005-09-15

    申请号:US10708572

    申请日:2004-03-11

    CPC classification number: H01L22/20 G05B19/41875 G06Q30/0283 Y02P90/22

    Abstract: A method and related system for semiconductor equipment prevention maintenance management. The method includes recording process parameters of each piece of equipment, recording equipment parameters when each piece of equipment is processing, evaluating and recording time and cost of prevention maintenance after each piece of equipment runs prevention maintenance, evaluating the quality of semiconductor products, and analyzing a relationship between the corresponding process parameter, the corresponding equipment parameters, prevention maintenance cost, and semiconductor products of each piece of equipment.

    Abstract translation: 一种半导体设备预防维护管理方法及相关系统。 该方法包括记录每件设备的工艺参数,每台设备的加工记录设备参数,每台设备运行后的预防维护的评估和记录时间和成本预防维护,半导体产品的质量评估和分析 相应的过程参数,相应的设备参数,预防维护成本以及每件设备的半导体产品之间的关系。

    Method of managing wafer defects
    3.
    发明授权
    Method of managing wafer defects 有权
    晶圆缺陷管理方法

    公开(公告)号:US07412090B2

    公开(公告)日:2008-08-12

    申请号:US10711310

    申请日:2004-09-09

    CPC classification number: G01N21/9501

    Abstract: A method of managing wafer defects includes inspecting each chip in a wafer to generate a unit of wafer defect raw data, using a server to integrate the unit of wafer defect raw data to generate a unit of wafer defect distribution data for recording positions, types, and sizes of defects, using the server to generate a corresponding drawing file according to the unit wafer defect distribution data to show all kinds of defect distributions, and transmitting the drawing file to a terminal such that terminal users can view the defect distributions without receiving the unit of wafer defect raw data.

    Abstract translation: 管理晶片缺陷的方法包括检查晶片中的每个芯片以产生晶片缺陷原始数据的单元,使用服务器来整合晶片缺陷原始数据的单元以产生用于记录位置,类型的晶片缺陷分布数据的单元, 和尺寸的缺陷,使用服务器根据单位晶片缺陷分布数据生成相应的图形文件以显示各种缺陷分布,并将绘图文件发送到终端,使得终端用户可以在不接收到缺陷分布的情况下查看缺陷分布 晶圆缺陷原始数据单位。

    SEMICONDUCTOR PROCESS AND YIELD ANALYSIS INTEGRATED REAL-TIME MANAGEMENT METHOD
    4.
    发明申请
    SEMICONDUCTOR PROCESS AND YIELD ANALYSIS INTEGRATED REAL-TIME MANAGEMENT METHOD 失效
    半导体工艺和分析实时管理方法

    公开(公告)号:US20050187648A1

    公开(公告)日:2005-08-25

    申请号:US10708277

    申请日:2004-02-20

    CPC classification number: H01L22/20 G05B2219/32191 Y02P90/22

    Abstract: A semiconductor process and yield analysis integrated real-time management method comprises inspecting a plurality of semiconductor products with a plurality of items to generate and record a plurality of inspecting results during semiconductor process, classifying the semiconductor products as a plurality of groups with a default rule to generate and record an initial data in a database, indexing a plurality of semiconductor product groups and the corresponding initial data from the database by a default product rule and parameter to calculate a corresponding analysis result, and displaying the analysis result according to the indexed semiconductor product groups and the initial data.

    Abstract translation: 集成实时管理方法的半导体工艺和成品率分析包括在半导体处理期间检查多个半导体产品以产生并记录多个检查结果,并将半导体产品作为具有默认规则的多个组进行分类 在数据库中生成和记录初始数据,通过默认产品规则和参数从数据库索引多个半导体产品组和相应的初始数据,以计算相应的分析结果,并根据索引的半导体显示分析结果 产品组和初始数据。

    Method of Managing Wafer Defects
    5.
    发明申请
    Method of Managing Wafer Defects 有权
    晶圆缺陷管理方法

    公开(公告)号:US20060050950A1

    公开(公告)日:2006-03-09

    申请号:US10711310

    申请日:2004-09-09

    CPC classification number: G01N21/9501

    Abstract: A method of managing wafer defects includes inspecting each chip in a wafer to generate a unit of wafer defect raw data, using a server to integrate the unit of wafer defect raw data to generate a unit of wafer defect distribution data for recording positions, types, and sizes of defects, using the server to generate a corresponding drawing file according to the unit wafer defect distribution data to show all kinds of defect distributions, and transmitting the drawing file to a terminal such that terminal users can view the defect distributions without receiving the unit of wafer defect raw data.

    Abstract translation: 管理晶片缺陷的方法包括检查晶片中的每个芯片以产生晶片缺陷原始数据的单元,使用服务器来整合晶片缺陷原始数据的单元以产生用于记录位置,类型的晶片缺陷分布数据的单元, 和尺寸的缺陷,使用服务器根据单位晶片缺陷分布数据生成相应的图形文件以显示各种缺陷分布,并将绘图文件发送到终端,使得终端用户可以在不接收到缺陷分布的情况下查看缺陷分布 晶圆缺陷原始数据单位。

    Semiconductor process and yield analysis integrated real-time management method
    6.
    发明授权
    Semiconductor process and yield analysis integrated real-time management method 失效
    半导体工艺和产量分析集成实时管理方法

    公开(公告)号:US07099729B2

    公开(公告)日:2006-08-29

    申请号:US10708277

    申请日:2004-02-20

    CPC classification number: H01L22/20 G05B2219/32191 Y02P90/22

    Abstract: A semiconductor process and yield analysis integrated real-time management method comprises inspecting a plurality of semiconductor products with a plurality of items to generate and record a plurality of inspecting results during semiconductor process, classifying the semiconductor products as a plurality of groups with a default rule to generate and record an initial data in a database, indexing a plurality of semiconductor product groups and the corresponding initial data from the database by a default product rule and parameter to calculate a corresponding analysis result, and displaying the analysis result according to the indexed semiconductor product groups and the initial data.

    Abstract translation: 集成实时管理方法的半导体工艺和成品率分析包括在半导体处理期间检查多个半导体产品以产生并记录多个检查结果,并将半导体产品作为具有默认规则的多个组进行分类 在数据库中生成和记录初始数据,通过默认产品规则和参数从数据库索引多个半导体产品组和相应的初始数据,以计算相应的分析结果,并根据索引的半导体显示分析结果 产品组和初始数据。

    Method and related system for semiconductor equipment early warning management
    7.
    发明授权
    Method and related system for semiconductor equipment early warning management 失效
    半导体设备预警管理方法及相关系统

    公开(公告)号:US06999897B2

    公开(公告)日:2006-02-14

    申请号:US10708573

    申请日:2004-03-11

    CPC classification number: G05B19/41875 Y02P90/22

    Abstract: A method and related system for semiconductor equipment early warning management. The method includes recording process parameters of each piece of equipment, recording equipment parameters when each piece of equipment is processing, evaluating and recording the quality of semiconductor products and corresponding testing parameters, and analyzing a relationship between the corresponding process parameters, the corresponding equipment parameters, and the quality of semiconductor products of each piece of equipment.

    Abstract translation: 一种半导体设备预警管理方法及相关系统。 该方法包括记录每件设备的处理参数,每台设备处理时记录设备参数,评估和记录半导体产品的质量和相应的测试参数,分析相应工艺参数,相应设备参数之间的关系 ,以及每件设备的半导体产品的质量。

    Method and related system for semiconductor equipment prevention maintenance management
    8.
    发明授权
    Method and related system for semiconductor equipment prevention maintenance management 有权
    半导体设备预防维护管理方法及相关系统

    公开(公告)号:US06950783B1

    公开(公告)日:2005-09-27

    申请号:US10708572

    申请日:2004-03-11

    CPC classification number: H01L22/20 G05B19/41875 G06Q30/0283 Y02P90/22

    Abstract: A method and related system for semiconductor equipment prevention maintenance management. The method includes recording process parameters of each piece of equipment, recording equipment parameters when each piece of equipment is processing, evaluating and recording time and cost of prevention maintenance after each piece of equipment runs prevention maintenance, evaluating the quality of semiconductor products, and analyzing a relationship between the corresponding process parameter, the corresponding equipment parameters, prevention maintenance cost, and semiconductor products of each piece of equipment.

    Abstract translation: 一种半导体设备预防维护管理方法及相关系统。 该方法包括记录每件设备的工艺参数,每台设备的加工记录设备参数,每台设备运行后的预防维护的评估和记录时间和成本预防维护,半导体产品的质量评估和分析 相应的过程参数,相应的设备参数,预防维护成本以及每件设备的半导体产品之间的关系。

    METHOD AND RELATED SYSTEM FOR SEMICONDUCTOR EQUIPMENT EARLY WARNING MANAGEMENT
    9.
    发明申请
    METHOD AND RELATED SYSTEM FOR SEMICONDUCTOR EQUIPMENT EARLY WARNING MANAGEMENT 失效
    用于半导体设备的方法和相关系统早期警告管理

    公开(公告)号:US20050203715A1

    公开(公告)日:2005-09-15

    申请号:US10708573

    申请日:2004-03-11

    CPC classification number: G05B19/41875 Y02P90/22

    Abstract: A method and related system for semiconductor equipment early warning management. The method includes recording process parameters of each piece of equipment, recording equipment parameters when each piece of equipment is processing, evaluating and recording the quality of semiconductor products and corresponding testing parameters, and analyzing a relationship between the corresponding process parameters, the corresponding equipment parameters, and the quality of semiconductor products of each piece of equipment.

    Abstract translation: 一种半导体设备预警管理方法及相关系统。 该方法包括记录每件设备的处理参数,每台设备处理时记录设备参数,评估和记录半导体产品的质量和相应的测试参数,分析相应工艺参数,相应设备参数之间的关系 ,以及每件设备的半导体产品的质量。

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