公开(公告)号：US11886110B2

公开(公告)日：2024-01-30

申请号：US17209814

申请日：2021-03-23

Applicant: ILLUMINA, INC.

Inventor： Timothy J. Merkel ,  Ruibo Wang ,  Daniel Wright ,  Danny Yuan Chan ,  Avishek Aiyar ,  Tanmay Ghonge ,  Neil Brahma ,  Arthur Pitera

IPC: G03F7/00 ,  B29C59/02 ,  C09D183/14 ,  G03F7/16 ,  B29K83/00 ,  B29K105/00

CPC classification number: G03F7/0002 ,  B29C59/022 ,  C09D183/14 ,  G03F7/162 ,  G03F7/168 ,  B29K2083/00 ,  B29K2105/0002

Abstract: An imprinting apparatus includes a silicon master and an anti-stick layer coating the silicon master. The silicon master includes a plurality of features positioned at an average pitch of less than about 425 nm, each of the plurality of features comprises a depression having an opening with its largest opening dimension being less than about 300 nm. The anti-stick layer includes a crosslinked silane polymer network.

公开(公告)号：US20210302832A1

公开(公告)日：2021-09-30

申请号：US17209814

申请日：2021-03-23

Applicant: ILLUMINA, INC.

Inventor： Timothy J. Merkel ,  Ruibo Wang ,  Daniel Wright ,  Danny Yuan Chan ,  Avishek Aiyar ,  Tanmay Ghonge ,  Neil Brahma ,  Arthur Pitera

IPC: G03F7/00 ,  C09D183/14 ,  B29C59/02 ,  G03F7/16

Abstract: An imprinting apparatus includes a silicon master and an anti-stick layer coating the silicon master. The silicon master includes a plurality of features positioned at an average pitch of less than about 425 nm, each of the plurality of features comprises a depression having an opening with its largest opening dimension being less than about 300 nm. The anti-stick layer includes a crosslinked silane polymer network.