公开(公告)号：US20250010291A1

公开(公告)日：2025-01-09

申请号：US18753229

申请日：2024-06-25

Applicant: Illumina, Inc.

Inventor： Daniel Wright ,  Alexandra Szemjonov ,  Wayne N. George ,  Francesca Patel-Burrows

IPC: B01L3/00

Abstract: Embodiments of the present disclosure relate to patterned substrates with functionalized surface such as flow cells, as well as methods of fabricating the patterned substrate. In particular, patterned substrates of the present disclosure may be prepared using two or more imprint resin layers, one of which acts as a photomask for the photoresist during substrate patterning, without the need of any metallic photomask. Embodiments of the patterned substrate may be used for simultaneous paired-end sequencing methods.

公开(公告)号：US20240219835A1

公开(公告)日：2024-07-04

申请号：US18530025

申请日：2023-12-05

Applicant: Illumina, Inc.

Inventor： Tanmay Ghonge ,  David Prescott ,  Daniel Wright ,  Yekaterina Rokhlenko ,  Alexandra Szemjonov ,  Francesca Patel-Burrows ,  Gavriela Moskowitz

IPC: G03F7/11 ,  B01J19/00 ,  B01L3/00 ,  G03F7/038

CPC classification number: G03F7/11 ,  B01J19/0046 ,  B01L3/502707 ,  G03F7/038 ,  B01J2219/00722 ,  B01L2200/12

Abstract: Examples of flow cells include substrates. Embodiments of the present disclosure also relate to methods of fabricating flow cell substrates. Some example workflows exploit light blocking properties of an imprint layer such that the process does not include etch steps. Such processes may be used to create substrates compatible with simultaneous paired-end sequencing methods.

公开(公告)号：US11886110B2

公开(公告)日：2024-01-30

申请号：US17209814

申请日：2021-03-23

Applicant: ILLUMINA, INC.

Inventor： Timothy J. Merkel ,  Ruibo Wang ,  Daniel Wright ,  Danny Yuan Chan ,  Avishek Aiyar ,  Tanmay Ghonge ,  Neil Brahma ,  Arthur Pitera

IPC: G03F7/00 ,  B29C59/02 ,  C09D183/14 ,  G03F7/16 ,  B29K83/00 ,  B29K105/00

CPC classification number: G03F7/0002 ,  B29C59/022 ,  C09D183/14 ,  G03F7/162 ,  G03F7/168 ,  B29K2083/00 ,  B29K2105/0002

Abstract: An imprinting apparatus includes a silicon master and an anti-stick layer coating the silicon master. The silicon master includes a plurality of features positioned at an average pitch of less than about 425 nm, each of the plurality of features comprises a depression having an opening with its largest opening dimension being less than about 300 nm. The anti-stick layer includes a crosslinked silane polymer network.

公开(公告)号：US20210302832A1

公开(公告)日：2021-09-30

申请号：US17209814

申请日：2021-03-23

Applicant: ILLUMINA, INC.

Inventor： Timothy J. Merkel ,  Ruibo Wang ,  Daniel Wright ,  Danny Yuan Chan ,  Avishek Aiyar ,  Tanmay Ghonge ,  Neil Brahma ,  Arthur Pitera

IPC: G03F7/00 ,  C09D183/14 ,  B29C59/02 ,  G03F7/16

Abstract: An imprinting apparatus includes a silicon master and an anti-stick layer coating the silicon master. The silicon master includes a plurality of features positioned at an average pitch of less than about 425 nm, each of the plurality of features comprises a depression having an opening with its largest opening dimension being less than about 300 nm. The anti-stick layer includes a crosslinked silane polymer network.