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公开(公告)号：US20240132954A1
公开(公告)日：2024-04-25
申请号：US18400702
申请日：2023-12-29
Applicant: ILLUMINA, INC.
Inventor： Timothy J. Merkel , Wayne N. George , Andrew A. Brown , Audrey Zak , Gianluca Andrea Artioli , Julia Morrison , Nikolai Romanov , Lorenzo Berti , Graham Boud
IPC: C12Q1/6874 , C08G77/442 , C08L33/04 , C08L63/00 , C09D153/00 , C09D163/00 , C12Q1/6876
CPC classification number: C12Q1/6874 , C08G77/442 , C08L33/04 , C08L63/00 , C09D153/00 , C09D163/00 , C12Q1/6876
Abstract: An example of a resin composition includes a free radical curable resin matrix including an acrylate and a siloxane, and a free radical photoinitiator. When cured, the resin composition has low or no autofluorescence when exposed to blue excitation wavelengths ranging from about 380 nm to about 480 nm or green excitation wavelengths ranging from about 510 nm to about 560 nm.
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公开(公告)号：US11213976B2
公开(公告)日：2022-01-04
申请号：US15847150
申请日：2017-12-19
Applicant: Illumina, Inc. , Illumina Cambridge Limited
Inventor： Alexandre Richez , Andrew A. Brown , Julia Morrison , Wayne N. George , Timothy J. Merkel , Audrey Rose Zak
Abstract: An imprinting apparatus includes a silicon master having a plurality of nanofeatures defined therein. An anti-stick layer coats the silicon master, the anti-stick layer including a molecule having a cyclosiloxane with at least one silane functional group. A method includes forming a master template by: depositing a formulation on a silicon master including a plurality of nanofeatures defined therein, the formulation including a solvent and a molecule having a cyclosiloxane with at least one silane functional group; and curing the formulation, thereby forming an anti-stick layer on the silicon master, the anti-stick layer including the molecule. The method further includes depositing a silicon-based working stamp material on the anti-stick layer of the master template; curing the silicon-based working stamp material to form a working stamp including a negative replica of the plurality of nanofeatures; and releasing the working stamp from the master template.
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公开(公告)号：US11175127B2
公开(公告)日：2021-11-16
申请号：US16616843
申请日：2018-11-09
Applicant: ILLUMINA, INC.
Inventor： Alexander Fuhrmann , Timothy J. Merkel , Cyril Delattre
IPC: G01B11/06 , G01N21/3563 , G01N21/84 , G01B21/08
Abstract: Examples of a method include maintaining a large area thin film at a predetermined angle with respect to a spatially non-scanning infrared (IR) radiation source. The large area thin film reflects infrared radiation and at least a portion of the large area thin film is electrically conductive. The predetermined angle is selected from an angle ranging from about 0° to about 45°. Examples of the method include, while maintaining the large area thin film at the predetermined angle, directly illuminating the large area thin film with infrared radiation from the spatially non-scanning infrared radiation source, and thermal imaging reflected infrared radiation from the large area thin film by an infrared imaging system having an optical axis positioned at a fixed angle with respect to the large area thin film. The fixed angle is selected from an angle ranging from about 0° to about 45°.
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公开(公告)号：US20250114980A1
公开(公告)日：2025-04-10
申请号：US18964377
申请日：2024-11-30
Applicant: ILLUMINA, INC. , ILLUMINA CAMBRIDGE LIMITED
Inventor： Alexandre Richez , Andrew A. Brown , Julia Morrison , Wayne N. George , Timothy J. Merkel , Audrey Rose Zak
Abstract: An imprinting apparatus includes a silicon master having a plurality of nanofeatures defined therein. An anti-stick layer coats the silicon master, the anti-stick layer including a molecule having a cyclosiloxane with at least one silane functional group. A method includes forming a master template by: depositing a formulation on a silicon master including a plurality of nanofeatures defined therein, the formulation including a solvent and a molecule having a cyclosiloxane with at least one silane functional group; and curing the formulation, thereby forming an anti-stick layer on the silicon master, the anti-stick layer including the molecule. The method further includes depositing a silicon-based working stamp material on the anti-stick layer of the master template; curing the silicon-based working stamp material to form a working stamp including a negative replica of the plurality of nanofeatures; and releasing the working stamp from the master template.
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公开(公告)号：US12157252B2
公开(公告)日：2024-12-03
申请号：US17541089
申请日：2021-12-02
Applicant: Illumina, Inc. , Illumina Cambridge Limited
Inventor： Alexandre Richez , Andrew A. Brown , Julia Morrison , Wayne N. George , Timothy J. Merkel , Audrey Rose Zak
Abstract: An imprinting apparatus includes a silicon master having a plurality of nanofeatures defined therein. An anti-stick layer coats the silicon master, the anti-stick layer including a molecule having a cyclosiloxane with at least one silane functional group. A method includes forming a master template by: depositing a formulation on a silicon master including a plurality of nanofeatures defined therein, the formulation including a solvent and a molecule having a cyclosiloxane with at least one silane functional group; and curing the formulation, thereby forming an anti-stick layer on the silicon master, the anti-stick layer including the molecule. The method further includes depositing a silicon-based working stamp material on the anti-stick layer of the master template; curing the silicon-based working stamp material to form a working stamp including a negative replica of the plurality of nanofeatures; and releasing the working stamp from the master template.
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Patent Agency Ranking
公开(公告)号：US11884976B2
公开(公告)日：2024-01-30
申请号：US16515790
申请日：2019-07-18
Applicant: ILLUMINA, INC. , ILLUMINA CAMBRIDGE LIMITED
Inventor： Timothy J. Merkel , Wayne N. George , Andrew A. Brown , Audrey Zak , Gianluca Andrea Artioli , Julia Morrison , Nikolai Romanov , Lorenzo Berti , Graham Boud
IPC: C12Q1/6874 , C08G77/442 , C09D153/00 , C12Q1/6876 , C09D163/00 , C08L63/00 , C08L33/04
CPC classification number: C12Q1/6874 , C08G77/442 , C08L33/04 , C08L63/00 , C09D153/00 , C09D163/00 , C12Q1/6876
Abstract: An example of a resin composition includes a free radical curable resin matrix including an acrylate and a siloxane, and a free radical photoinitiator. When cured, the resin composition has low or no autofluorescence when exposed to blue excitation wavelengths ranging from about 380 nm to about 480 nm or green excitation wavelengths ranging from about 510 nm to about 560 nm.
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公开(公告)号：US20200024661A1
公开(公告)日：2020-01-23
申请号：US16515790
申请日：2019-07-18
Applicant: ILLUMINA, INC. , ILLUMINA CAMBRIDGE LIMITED
Inventor： Timothy J. Merkel , Wayne N. George , Andrew A. Brown , Audrey Zak , Gianluca Andrea Artioli , Julia Morrison , Nikolai Romanov , Lorenzo Berti , Graham Boud
IPC: C12Q1/6874 , C08G77/442 , C08L63/00 , C12Q1/6876 , C09D163/00 , C09D153/00
Abstract: An example of a resin composition includes a free radical curable resin matrix including an acrylate and a siloxane, and a free radical photoinitiator. When cured, the resin composition has low or no autofluorescence when exposed to blue excitation wavelengths ranging from about 380 nm to about 480 nm or green excitation wavelengths ranging from about 510 nm to about 560 nm.
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公开(公告)号：US12287574B2
公开(公告)日：2025-04-29
申请号：US17624216
申请日：2020-12-21
Applicant: ILLUMINA, INC.
Inventor： Yekaterina Rokhlenko , Timothy J. Merkel
IPC: G09F7/02 , G01N21/05 , G01N21/64 , G03F7/00 , G03F7/004 , G03F7/021 , G03F7/038 , G03F7/075 , B82Y40/00
Abstract: An example resin composition includes an epoxy resin matrix, a first photoacid generator, and a second photoacid generator. The first photoacid generator includes an anion having a molecular weight less than about 250 g/mol. The second photoacid generator includes an anion having a molecular weight greater than about 300 g/mol. In an example, i) a cation of the first photoacid generator has, or ii) a cation of the second photoacid generator has, or iii) the cations of the first and second photoacid generators have a mass attenuation coefficient of at least 0.1 L/(g*cm) at a wavelength of incident light to cure the resin composition.
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公开(公告)号：US12013330B2
公开(公告)日：2024-06-18
申请号：US16515849
申请日：2019-07-18
Applicant: ILLUMINA, INC. , ILLUMINA CAMBRIDGE LIMITED
Inventor： Timothy J. Merkel , Wayne N. George , Andrew A. Brown , Audrey Zak , Gianluca Andrea Artioli , Julia Morrison , Nikolai Romanov , Lorenzo Berti , Graham Boud
IPC: G03F7/00 , C08L63/00 , C08L83/12 , G01N15/1434
CPC classification number: G01N15/1436 , C08L63/00 , C08L83/12 , G03F7/0002
Abstract: An example of a resin composition includes an epoxy resin matrix, a free radical photoinitiator selected from the group consisting of 2-ethyl-9,10-dimethoxyanthracene, 2,2-dimethoxy-2-phenylacetophenone, 2-ethoxy-2-phenylacetophenone, and a phosphine oxide, and a photoacid generator. When cured, the resin composition has low or no autofluorescence when exposed to blue excitation wavelengths ranging from about 380 nm to about 480 nm or green excitation wavelengths ranging from about 510 nm to about 560 nm.
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公开(公告)号：US20220088834A1
公开(公告)日：2022-03-24
申请号：US17541089
申请日：2021-12-02
Applicant: Illumina, Inc. , Illumina Cambridge Limited
Inventor： Alexandre Richez , Andrew A. Brown , Julia Morrison , Wayne N. George , Timothy J. Merkel , Audrey Rose Zak
IPC: B29C33/38 , C09D133/26 , B29C59/02 , G03F7/00 , B29C33/40
Abstract: An imprinting apparatus includes a silicon master having a plurality of nanofeatures defined therein. An anti-stick layer coats the silicon master, the anti-stick layer including a molecule having a cyclosiloxane with at least one silane functional group. A method includes forming a master template by: depositing a formulation on a silicon master including a plurality of nanofeatures defined therein, the formulation including a solvent and a molecule having a cyclosiloxane with at least one silane functional group; and curing the formulation, thereby forming an anti-stick layer on the silicon master, the anti-stick layer including the molecule. The method further includes depositing a silicon-based working stamp material on the anti-stick layer of the master template; curing the silicon-based working stamp material to form a working stamp including a negative replica of the plurality of nanofeatures; and releasing the working stamp from the master template.
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