公开(公告)号：US09221071B2

公开(公告)日：2015-12-29

申请号：US13845621

申请日：2013-03-18

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Jau-Chyn Huang ,  Kong-Wei Cheng ,  Wen-Sheng Chang ,  Tai-Chou Lee ,  Ching-Chen Wu

IPC: B05C3/05 ,  C23C18/14 ,  H01L21/02 ,  H01L31/18

CPC classification number: B05C3/05 ,  C23C18/14 ,  H01L21/02568 ,  H01L21/02628 ,  H01L31/18

Abstract: A method and apparatus of growing a thin film are provided. The method comprises at least (a) providing a number of substrates; (b) cleaning the substrates; and (c) placing the substrates into a reaction liquid; (d) vibrating the reaction liquid by ultrasonic waves such that a thin film is grown on the substrates evenly.

Abstract translation: 提供了生长薄膜的方法和装置。 该方法至少包括（a）提供多个基底; （b）清洁基材; 和（c）将基材置于反应液中; （d）通过超声波使反应液振动，使得在基板上均匀地生长薄膜。

公开(公告)号：US20130247823A1

公开(公告)日：2013-09-26

申请号：US13845621

申请日：2013-03-18

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Jau-Chyn Huang ,  Kong-Wei Cheng ,  Wen-Sheng Chang ,  Tai-Chou Lee ,  Ching-Chen Wu

IPC: B05C3/05

CPC classification number: B05C3/05 ,  C23C18/14 ,  H01L21/02568 ,  H01L21/02628 ,  H01L31/18

Abstract: A method and apparatus of growing a thin film are provided. The method comprises at least (a) providing a number of substrates; (b) cleaning the substrates; and (c) placing the substrates into a reaction liquid; (d) vibrating the reaction liquid by ultrasonic waves such that a thin film is grown on the substrates evenly.

Abstract translation: 提供了生长薄膜的方法和装置。 该方法至少包括（a）提供多个基底; （b）清洁基材; 和（c）将基材置于反应液中; （d）通过超声波使反应液振动，使得在基板上均匀地生长薄膜。