Abstract:
A method and apparatus of growing a thin film are provided. The method comprises at least (a) providing a number of substrates; (b) cleaning the substrates; and (c) placing the substrates into a reaction liquid; (d) vibrating the reaction liquid by ultrasonic waves such that a thin film is grown on the substrates evenly.
Abstract:
The present invention provides a device and system for desorption and dehumidification, comprising a conductive electrode, a moisture absorber, and a power source. The conductive electrode comprises a first surface and a second surface opposite to the first surface, and the first surface has a plurality of protrusion elements. The moisture absorber comprises a third surface formed on the plurality of protrusions. The power source provides power to the conductive electrode such that a uniform and stable micro-discharge phenomenon is generated thereby forming a continuous charge flow. The continuous charge flow can further generate an electrical interruption for depolarizing the attraction between the moisture molecules and moisture absorber whereby the moisture molecules can be desorbed from the moisture absorber more easily.
Abstract:
An electrified desorption device, including a conductive water-absorbing material containing titanosilicates, wherein a ratio of silicon atoms to titanium atoms in the titanosilicates of the conductive water-absorbing material is 1 ≤ Si Ti ≤ 10 ; a conductive layer selected from the group consisting of a metal component, an alloy material, a conductive oxide component, and a mixture including either (a) more than one of the foregoing components or (b) the metal component, the alloy material, and graphite, attached to end surfaces at two sides of the water-absorbing material; a pair of electrode structures, coupled to two sides of the water-absorbing material respectively, and each having multiple sub-electrodes insulated from each other; and a voltage source, coupled to the pair of electrode structures.
Abstract:
A method and apparatus of growing a thin film are provided. The method comprises at least (a) providing a number of substrates; (b) cleaning the substrates; and (c) placing the substrates into a reaction liquid; (d) vibrating the reaction liquid by ultrasonic waves such that a thin film is grown on the substrates evenly.