-
1.发明申请公开(公告)号：US20140141232A1
公开(公告)日：2014-05-22
申请号：US13891017
申请日：2013-05-09
Applicant: Industrial Technology Research Institute
Inventor： Ming-Tsung HONG , Yun-Ching LEE , Li-Chun LIANG , Wei-Ta YANG
CPC classification number: H01B13/30 , H05K1/0218 , H05K1/0393 , H05K3/281 , Y10T428/249958 , Y10T428/249982 , Y10T428/249985
Abstract: Provided is an electromagnetic wave shielding structure, including: a substrate; and a porous composite film formed on the substrate, wherein the porous composite film includes a continuous phase network fused from a plurality of metal nanoparticles, a first resin composition coated on a surface of the continuous phase network and a plurality of holes which are void spaces in the continuous phase network coated with the first resin composition.
Abstract translation: 提供一种电磁波屏蔽结构，包括：基板; 以及形成在所述基板上的多孔复合膜，其中所述多孔复合膜包括从多个金属纳米粒子熔合的连续相网络，涂覆在所述连续相网的表面上的第一树脂组合物和作为空隙空间的多个孔 在连续相网中涂覆有第一种树脂组合物。
-
公开(公告)号：US20170342199A1
公开(公告)日：2017-11-30
申请号：US15394457
申请日：2016-12-29
Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
Inventor： Wei-Ta YANG , Yen-Yi CHU , Ming-Tsung HONG , Li-Chun LIANG , Yun-Ching LEE , Meng-Song YIN
CPC classification number: C08G61/02 , C03C25/30 , C03C25/32 , C08F32/08 , C08F36/20 , C08F232/08 , C08G61/08 , C08G61/12 , C08G2261/122 , C08G2261/135 , C08G2261/1414 , C08G2261/224 , C08G2261/226 , C08G2261/228 , C08G2261/3324 , C08G2261/3327 , C08G2261/418 , C08G2261/64 , C08G2261/65 , C08G2261/76 , C08J5/04 , C08J5/24 , C08J2345/00 , C08J2365/00 , C08J2371/12 , C08J2453/02 , C08J2465/00 , C08L25/10 , C08L45/00 , C08L47/00 , C08L65/00 , C08L2203/20 , C09D125/10 , C09D171/12 , H05K1/024 , H05K1/0306 , H05K1/0313 , H05K1/0326 , H05K1/09
Abstract: An oligomer, composition, and composite material employing the same are provided. The oligomer has a structure represented by Formula (I) wherein R1 and R2 are independently hydrogen, C1-20 alkyl group, C2-20 alkenyl group, C6-12 aryl group, C6-12 alkylaryl group, C5-12 cycloalkyl group, C6-20 cycloalkylalkyl group, alkoxycarbonyl group, or alkylcarbonyloxy group; R1 is not hydrogen when R2 is hydrogen; a is 0 or 1; n≧0; m≧1; n:m is from 0:100 to 99:1; the oligomer has a number average molecular weight of less than or equal to 12,000; and the repeat unit and the repeat unit are arranged in a random or block fashion.
-
公开(公告)号：US20140322545A1
公开(公告)日：2014-10-30
申请号：US14266405
申请日：2014-04-30
Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
Inventor： Wei-Ta YANG , Li-Chun LIANG , I-Hong LIN , Chung-Cheng LIN
CPC classification number: H05K1/0366 , B29B7/90 , B29K2069/00 , H05K1/0326 , H05K2201/0209 , Y10T428/31681 , Y10T428/31725
Abstract: A disclosure provides a resin composition, a prepreg, and a substrate employing the same. According to an embodiment of the disclosure, the resin composition includes a polyphenylene ether compound, and a bismaleimide. The prepreg includes a cured product of the resin composition. The substrate includes a product fabricated by the resin composition or the prepreg.
Abstract translation: 公开内容提供了树脂组合物，预浸料和使用其的基材。 根据本公开的实施方案，树脂组合物包含聚苯醚化合物和双马来酰亚胺。 预浸料包括树脂组合物的固化产物。 基板包括由树脂组合物或预浸料制成的产品。
-
公开(公告)号：US20230063240A1
公开(公告)日：2023-03-02
申请号：US17871363
申请日：2022-07-22
Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
Inventor： Yen-Yi CHU , Yun-Ching LEE , Li-Chun LIANG , Wei-Ta YANG , Hsiang-Chin JUAN
IPC: C08F232/08 , C08F232/04 , C08F236/14
Abstract: A copolymer, a film composition and a composite material employing the same are provided. The copolymer is a copolymerization product of a composition, wherein the composition includes a monomer (a), a monomer (b) and a monomer (c). The monomer (a) is a compound having a structure represented by Formula (I), the monomer (b) is a compound having a structure represented by Formula (II), and the monomer (c) is a compound having a structure represented by Formula (III) wherein R1, R2, R3, R4, R5 and R6 are as defined in specification.
-
-
-
Search Results
4
records
(took 0.022 seconds)
