PHOTOSENSITIVE COMPOSITION AND PHOTORESIST
    1.
    发明申请
    PHOTOSENSITIVE COMPOSITION AND PHOTORESIST 有权
    光敏组合物和光电子

    公开(公告)号:US20150056556A1

    公开(公告)日:2015-02-26

    申请号:US14141091

    申请日:2013-12-26

    IPC分类号: G03F7/033

    摘要: A photosensitive composition and a photoresist are provided. The photoresist is formed by compounding a photosensitive composition. The photosensitive composition includes a binder agent, a first photomonomer, and a photo initiator. The first photomonomer has at least a lactic oligomer and at least two unsaturated acrylic functional groups, wherein the first photomonomer has an amount of about 25-95 parts by weight relative to 100 parts by weight of a solid content of the binder agent. The photoinitiator has an amount of about 0.5-15 parts by weight relative to 100 parts by weight of the solid content of the binder agent.

    摘要翻译: 提供感光组合物和光致抗蚀剂。 光致抗蚀剂通过配合感光组合物形成。 光敏组合物包括粘合剂,第一光单体和光引发剂。 第一单体单体具有至少一种乳酸低聚物和至少两种不饱和丙烯酸官能团,其中第一单体单体相对于100重量份固体含量的粘合剂为约25-95重量份。 相对于100重量份的粘合剂的固体含量,光引发剂的量为约0.5-15重量份。