Tall DIMM Structural Retention
    1.
    发明申请

    公开(公告)号:US20250071924A1

    公开(公告)日:2025-02-27

    申请号:US18940819

    申请日:2024-11-07

    Abstract: Methods and apparatus relating to tall Dual Inline Memory Module (DIMM) structural retention are described. In one embodiment, a Dual In-Line Memory Module (DIMM) retention frame is coupled to a top portion of a tall (e.g., “two unit” or taller) DIMM. A plurality of fasteners physically attach the DIMM retention frame to a Printed Circuit Board (PCB). The DIMM retention frame reduces movement of the tall DIMM. Other embodiments are also claimed and disclosed.

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