PHOTOVOLTAIC DEVICE
    1.
    发明申请
    PHOTOVOLTAIC DEVICE 有权
    光电器件

    公开(公告)号:US20110048532A1

    公开(公告)日:2011-03-03

    申请号:US12940876

    申请日:2010-11-05

    摘要: Methods and apparatus are provided for converting electromagnetic radiation, such as solar energy, into electric energy with increased efficiency when compared to conventional solar cells. A photovoltaic (PV) unit, according to embodiments of the invention, may have a very thin absorber layer produced by epitaxial lift-off (ELO), all electrical contacts positioned on the back side of the PV device to avoid shadowing, and/or front side and back side light trapping employing a diffuser and a reflector to increase absorption of the photons impinging on the front side of the PV unit. Several PV units may be combined into PV banks, and an array of PV banks may be connected to form a PV module with thin strips of metal or conductive polymer applied at low temperature. Such innovations may allow for greater efficiency and flexibility in PV devices when compared to conventional solar cells.

    摘要翻译: 提供了与常规太阳能电池相比,用于将诸如太阳能的电磁辐射转换成电能的方法和装置,其效率提高。 根据本发明的实施例的光伏(PV)单元可以具有通过外延剥离(ELO)制造的非常薄的吸收层,所有电触点位于PV装置的背面以避免阴影,和/或 使用扩散器和反射器的前侧和后侧光捕获以增加入射到PV单元的前侧的光子的吸收。 可以将多个PV单元组合成PV组,并且可以将PV组阵列连接以形成具有在低温下施加的薄金属或导电聚合物的PV模块。 与常规太阳能电池相比,这样的创新可以允许PV装置的更高的效率和灵活性。

    PHOTOVOLTAIC DEVICE WITH INCREASED LIGHT TRAPPING
    2.
    发明申请
    PHOTOVOLTAIC DEVICE WITH INCREASED LIGHT TRAPPING 有权
    具有增加光束捕获的光伏器件

    公开(公告)号:US20110048519A1

    公开(公告)日:2011-03-03

    申请号:US12940966

    申请日:2010-11-05

    IPC分类号: H01L31/06

    摘要: Methods and apparatus are provided for converting electromagnetic radiation, such as solar energy, into electric energy with increased efficiency when compared to conventional solar cells. A photovoltaic (PV) device may incorporate front side and/or back side light trapping techniques in an effort to absorb as many of the photons incident on the front side of the PV device as possible in the absorber layer. The light trapping techniques may include a front side antireflective coating, multiple window layers, roughening or texturing on the front and/or the back sides, a back side diffuser for scattering the light, and/or a back side reflector for redirecting the light into the interior of the PV device. With such light trapping techniques, more light may be absorbed by the absorber layer for a given amount of incident light, thereby increasing the efficiency of the PV device.

    摘要翻译: 提供了与常规太阳能电池相比,用于将诸如太阳能的电磁辐射转换成电能的方法和装置,其效率提高。 光伏(PV)装置可以包括前侧和/或后侧光捕获技术,以尽量吸收在吸收层中尽可能多地入射到PV装置的前侧的光子。 光捕获技术可以包括前侧防反射涂层,多个窗口层,在前侧和/或后侧上的粗糙化或纹理化,用于散射光的后侧扩散器和/或用于将光重定向到的后侧反射器 PV设备的内部。 通过这种光捕获技术,对于给定量的入射光,更多的光可以被吸收层吸收,从而提高PV器件的效率。

    THIN ABSORBER LAYER OF A PHOTOVOLTAIC DEVICE
    3.
    发明申请
    THIN ABSORBER LAYER OF A PHOTOVOLTAIC DEVICE 有权
    一个光伏器件的薄膜层

    公开(公告)号:US20110041904A1

    公开(公告)日:2011-02-24

    申请号:US12940918

    申请日:2010-11-05

    IPC分类号: H01L31/06

    CPC分类号: H01L31/0735 Y02E10/544

    摘要: Methods and apparatus are provided for converting electromagnetic radiation, such as solar energy, into electric energy with increased efficiency when compared to conventional solar cells. In one embodiment of a photovoltaic (PV) device, the PV device generally includes an n-doped layer and a p+-doped layer adjacent to the n-doped layer to form a p-n layer such that electric energy is created when electromagnetic radiation is absorbed by the p-n layer. The n-doped layer and the p+-doped layer may compose an absorber layer having a thickness less than 500 nm. Such a thin absorber layer may allow for greater efficiency and flexibility in PV devices when compared to conventional solar cells.

    摘要翻译: 提供了与常规太阳能电池相比,用于将诸如太阳能的电磁辐射转换成电能的方法和装置,其效率提高。 在光伏(PV)器件的一个实施例中,PV器件通常包括与n掺杂层相邻的n掺杂层和p +掺杂层以形成pn层,使得当电磁辐射被吸收时产生电能 由pn层。 n掺杂层和p +掺杂层可以组成厚度小于500nm的吸收层。 与常规太阳能电池相比,这种薄的吸收层可以在PV器件中实现更高的效率和灵活性。

    SUPPORT STRUCTURES FOR VARIOUS APPARATUSES INCLUDING OPTO-ELECTRICAL APPARATUSES
    5.
    发明申请
    SUPPORT STRUCTURES FOR VARIOUS APPARATUSES INCLUDING OPTO-ELECTRICAL APPARATUSES 审中-公开
    支持各种设备的结构,包括光电装置

    公开(公告)号:US20120015163A1

    公开(公告)日:2012-01-19

    申请号:US13012741

    申请日:2011-01-24

    摘要: Present embodiments generally relate to support structures for thin film components and methods for fabricating the support structures. In one embodiment, an apparatus comprises a device structure including portions of an electronic device; a support structure coupled to the device structure; wherein the support structure supplements features of the device structure and the support structure includes: a metal component coupled to the device structure; and a non-metal component coupled to the metal component. The support component can supplement structural and mechanical integrity of the device structure and functional operations of the device structure. In one embodiment, the metal component includes at least one layer of metal material and the non-metal component includes at least one layer of non metal material (e.g., polymeric material, etc.). The metal component can have greater stiffness characteristics with respect to the device structure and the non-metal component can have greater flexibility characteristics with respect to the metal layer component. The support structure can be configured to reflect light towards the device structure. The support structure can also be configured to conduct electricity from the device structure.

    摘要翻译: 现有实施例一般涉及用于薄膜部件的支撑结构和用于制造支撑结构的方法。 在一个实施例中,一种设备包括包括电子设备的部分的设备结构; 耦合到所述装置结构的支撑结构; 其中所述支撑结构补充所述装置结构的特征,并且所述支撑结构包括:联接到所述装置结构的金属部件; 以及耦合到所述金属部件的非金属部件。 支撑部件可以补充装置结构的结构和机械完整性以及装置结构的功能操作。 在一个实施例中,金属部件包括至少一层金属材料,非金属部件包括至少一层非金属材料(例如,聚合材料等)。 金属部件相对于器件结构可以具有更大的刚度特性,并且非金属部件可以相对于金属层部件具有更大的柔性特性。 支撑结构可以被配置为将光反射到装置结构。 支撑结构也可以被配置成从设备结构传导电力。

    SUBSTRATE CLEAN SOLUTION FOR COPPER CONTAMINATION REMOVAL
    6.
    发明申请
    SUBSTRATE CLEAN SOLUTION FOR COPPER CONTAMINATION REMOVAL 有权
    用于铜污染去除的基板清洁解决方案

    公开(公告)号:US20110214697A1

    公开(公告)日:2011-09-08

    申请号:US13042379

    申请日:2011-03-07

    申请人: Melissa ARCHER

    发明人: Melissa ARCHER

    IPC分类号: B08B3/00

    摘要: Embodiments of the invention generally relate to a method for selectively etching or otherwise removing copper or other metallic contaminants from a substrate, such as a gallium arsenide wafer. In one embodiment, a method for selectively removing metallic contaminants from a substrate surface is provided which includes exposing a substrate to a peroxide clean solution, exposing the substrate to a hydroxide clean solution, and exposing the substrate to a selective etch solution containing potassium iodide, iodine, sulfuric acid, and water during a selective etch process. The substrate generally contains gallium arsenide material, such as crystalline gallium arsenide, and is usually a growth substrate for an epitaxial lift off (ELO) process. The copper or other metallic contaminants disposed on the substrate may be selectively etched at a rate of about 500 times, about 1,000 times, about 2,000 times, or about 4,000 times or greater than the gallium arsenide material.

    摘要翻译: 本发明的实施方案一般涉及一种用于选择性地蚀刻或以其它方式从诸如砷化镓晶片的衬底去除铜或其它金属污染物的方法。 在一个实施例中,提供了一种用于从衬底表面选择性地去除金属污染物的方法,其包括将衬底暴露于过氧化物清洁溶液,将衬底暴露于氢氧化物清洁溶液,以及将衬底暴露于含有碘化钾的选择性蚀刻溶液, 碘,硫酸和水。 衬底通常包含砷化镓材料,例如结晶砷化镓,并且通常是用于外延剥离(ELO)工艺的生长衬底。 布置在基板上的铜或其他金属污染物可以以砷化镓材料的约500倍,约1,000倍,约2,000倍或约4,000倍或更大的速率进行选择性蚀刻。