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公开(公告)号：US06264812B1
公开(公告)日：2001-07-24
申请号：US08559345
申请日：1995-11-15
IPC分类号： C23C1434
CPC分类号： H01J37/321 , H01J37/32165 , H01J37/32477
摘要： A method and apparatus for generating a plasma by inductively coupling electromagnetic energy into the plasma. In one embodiment, first and second antenna coils are disposed about the circumference of the plasma containment area. The first and second antenna coils are relatively spaced along the longitudinal axis of the plasma containment area. A current is generated in the first and second antenna coils. A phase shift regulating network establishes a difference between the phase of the current in the first antenna and the phase of the current in the second antenna. The phase difference corresponds to the phase difference required to launch a helicon wave in the plasma. In a second embodiment, a chamber shield is made of a conductive material and is coupled to the RF source such that the shield functions as an RF antenna. The shield may be coupled in series to a coil surrounding the shield to increase the resultant flux density.
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公开(公告)号：US06228229B1
公开(公告)日：2001-05-08
申请号：US09049839
申请日：1998-03-27
IPC分类号： C23C1434
CPC分类号： H01J37/321 , H01J37/32165 , H01J37/32477
摘要： A method and apparatus for generating a plasma by inductively coupling electromagnetic energy into the plasma. In one embodiment, first and second antenna coils are disposed about the circumference of the plasma containment area. The first and second antenna coils are relatively spaced along the longitudinal axis of the plasma containment area. A current is generated in the first and second antenna coils. A phase shift regulating network establishes a difference between the phase of the current in the first antenna and the phase of the current in the second antenna. The phase difference corresponds to the phase difference required to launch a helicon wave in the plasma. In a second embodiment, a chamber shield is made of a conductive material and is coupled to the RF source such that the shield functions as an RF antenna. The shield may be coupled in series to a coil surrounding the shield to increase the resultant flux density.
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3.发明授权Inductively coupled plasma reactor with top electrode for enhancing plasma ignition 失效具有顶部电极的电感耦合等离子体反应器，用于增强等离子体点火
公开(公告)号：US5685941A
公开(公告)日：1997-11-11
申请号：US561144
申请日：1995-11-21
IPC分类号： C23C16/50 , C23F4/00 , H01J37/32 , H01L21/205 , H01L21/302 , H01L21/3065 , H05H1/46 , H01L21/00 , C23C14/34
CPC分类号： H01J37/32091 , H01J37/321 , H05H1/46
摘要： A plasma reactor for carrying out plasma processing of a semiconductor substrate includes a vacuum chamber including apparatus for introducing a gas into the interior thereof, an induction coil encircling a region of the vacuum chamber, the coil being connected across an RF power source, and an electrode positioned adjacent the region and connected to the RF power source for capacitively coupling RF power to the gas in the interior of the vacuum chamber. The electrode has a surface area facing the region which is large enough to provide capacitive coupling of RF power to the gas in the region sufficient to facilitate igniting a plasma, but which is small enough so that, during steady-state maintenance of the plasma, most of the RF power coupled to the plasma from the RF power source is coupled inductively rather than capacitively.
摘要翻译： 用于进行半导体衬底的等离子体处理的等离子体反应器包括：真空室，包括用于将气体引入其内部的装置;环绕真空室的区域的感应线圈，所述线圈横跨RF电源连接， 电极位于该区域附近并连接到RF电源，用于将RF功率电容耦合到真空室内部的气体。 电极具有面对该区域的表面积，该表面积足够大以提供RF功率与该区域中的气体的电容耦合，足以促进点燃等离子体，但足够小，使得在等离子体的稳态维持期间， 耦合到来自RF电源的等离子体的大部分RF功率被电感地耦合而不是电容耦合。
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公开(公告)号：US06673724B2
公开(公告)日：2004-01-06
申请号：US10037018
申请日：2001-11-07
IPC分类号： H01L2131
CPC分类号： C23C14/345 , C23C14/046 , H01J37/32082 , H01J37/32431 , H01J37/3405 , H01L21/2855 , H01L21/76877
摘要： The present invention provides a method and apparatus for achieving conformal step coverage of one or more materials on a substrate using sputtered ionized material. A target provides a source of material to be sputtered by a plasma and then ionized by an inductive coil, thereby producing electrons and ions. In one embodiment, one or both of the signals to the substrate and the target are modulated. Preferably, the modulated signal to the substrate includes a negative voltage portion and a zero voltage portion.
摘要翻译： 本发明提供一种使用溅射电离材料在基板上实现一种或多种材料的适形步骤覆盖的方法和装置。 目标物提供由等离子体溅射的材料源，然后由感应线圈电离，从而产生电子和离子。 在一个实施例中，对衬底和靶的信号中的一个或两个进行调制。 优选地，到衬底的调制信号包括负电压部分和零电压部分。
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公开(公告)号：US06344419B1
公开(公告)日：2002-02-05
申请号：US09454355
申请日：1999-12-03
IPC分类号： H01L2130
CPC分类号： C23C14/345 , C23C14/046 , H01J37/32082 , H01J37/32431 , H01J37/3405 , H01L21/2855 , H01L21/76877
摘要： The present invention provides a method and apparatus for achieving conformal step coverage of one or more materials on a substrate using sputtered ionized material. A target provides a source of material to be sputtered by a plasma and then ionized by an inductive coil, thereby producing electrons and ions. In one embodiment, one or both of the signals to the substrate and the target are modulated. Preferably, the modulated signal to the substrate includes a negative voltage portion and a zero voltage portion.
摘要翻译： 本发明提供一种使用溅射电离材料在基板上实现一种或多种材料的适形步骤覆盖的方法和装置。 目标物提供由等离子体溅射的材料源，然后由感应线圈电离，从而产生电子和离子。 在一个实施例中，对衬底和靶的信号中的一个或两个进行调制。 优选地，到衬底的调制信号包括负电压部分和零电压部分。
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公开(公告)号：US06297595B1
公开(公告)日：2001-10-02
申请号：US09049276
申请日：1998-03-27
申请人： Bradley O. Stimson , John Forster
发明人： Bradley O. Stimson , John Forster
IPC分类号： H01J724
CPC分类号： H01J37/321 , H01J37/32165 , H01J37/32477
摘要： A method and apparatus for generating a plasma by inductively coupling electromagnetic energy into the plasma. In one embodiment, first and second antenna coils are disposed about the circumference of the plasma containment area. The first and second antenna coils are relatively spaced along the longitudinal axis of the plasma containment area. A current is generated in the first and second antenna coils. A phase shift regulating network establishes a difference between the phase of the current in the first antenna and the phase of the current in the second antenna. The phase difference corresponds to the phase difference required to launch a helicon wave in the plasma. In a second embodiment, a chamber shield is made of a conductive material and is coupled to the RF source such that the shield functions as an RF antenna. The shield may be coupled in series to a coil surrounding the shield to increase the resultant flux density.
摘要翻译： 一种用于通过将电磁能量感应耦合到等离子体中来产生等离子体的方法和装置。 在一个实施例中，第一和第二天线线圈围绕等离子体容纳区域的圆周设置。 第一和第二天线线圈沿着等离子体容纳区域的纵向轴线相对间隔开。 在第一和第二天线线圈中产生电流。 相移调节网络建立第一天线中的电流的相位与第二天线中的电流的相位之间的差。 相位差对应于在等离子体中发射螺旋波所需的相位差。 在第二实施例中，室屏蔽由导电材料制成并且耦合到RF源，使得屏蔽件用作RF天线。 屏蔽可以串联耦合到围绕屏蔽的线圈以增加合成的通量密度。
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7.发明授权Ganged scanning of multiple magnetrons, especially two level folded magnetrons 有权组合扫描多个磁控管，特别是两个级别的磁控管公开(公告)号：US08961756B2
公开(公告)日：2015-02-24
申请号：US11780757
申请日：2007-07-20
CPC分类号： H01J37/3408 , H01J37/3455
摘要： A magnetron assembly including one or more magnetrons each forming a closed plasma loop on the sputtering face of the target. The target may include multiple strip targets on which respective strip magnetrons roll and are partially supported on a common support plate through a spring mechanism. The strip magnetron may be a two-level folded magnetron in which each magnetron forms a folded plasma loop extending between lateral sides of the strip target and its ends meet in the middle of the target. The magnets forming the magnetron may be arranged in a pattern having generally uniform straight portions joined by curved portion in which extra magnet positions are available near the corners to steer the plasma track. Multiple magnetrons, possibly flexible, may be resiliently supported on a scanned support plate and individually partially supported by rollers on the back of one or more targets.
摘要翻译： 磁控管组件包括一个或多个磁控管，每个磁控管在靶的溅射面上形成封闭的等离子体环。 目标可以包括多个条带目标，相应的带状磁控管在其上滚动并且通过弹簧机构部分地支撑在公共支撑板上。 带状磁控管可以是两级折叠磁控管，其中每个磁控管形成在条带靶的侧面之间延伸的折叠等离子体环，并且其端部在目标的中间相遇。 形成磁控管的磁体可以布置成具有通过弯曲部分连接的具有大致均匀的直线部分的图案，其中在角附近提供额外的磁体位置以引导等离子体轨道。 多个可能是柔性的磁控管可以弹性地支撑在扫描的支撑板上，并且单独部分地由一个或多个靶的背面上的辊支撑。
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公开(公告)号：US20080011601A1
公开(公告)日：2008-01-17
申请号：US11771366
申请日：2007-06-29
IPC分类号： C23C14/35
CPC分类号： C23C14/35 , H01J37/32724 , H01J37/34 , H01J37/3438 , H01J37/3455
摘要： A physical vapor deposition (PVD) apparatus and a PVD method are disclosed. Extending an anode across the processing space between the target and the substrate may increase deposition uniformity on a substrate. The anode provides a path to ground for electrons that are excited in the plasma and may uniformly distribute the electrons within the plasma across the processing space rather than collect at the chamber walls. The uniform distribution of the electrons within the plasma may create a uniform deposition of material on the substrate. The anodes may be cooled with a cooling fluid to control the temperature of the anodes and reduce flaking. The anodes may be disposed across the process space perpendicular to the long side of a magnetron that may scan in two dimensions across the back of the sputtering target. The scanning magnetron may reduce localized heating of the anode.
摘要翻译： 公开了物理气相沉积（PVD）装置和PVD方法。 将阳极延伸穿过靶和衬底之间的处理空间可增加衬底上的沉积均匀性。 阳极为在等离子体中被激发的电子提供到地面的路径，并且可以将等离子体内的电子均匀地分布在处理空间中，而不是在室壁处收集。 电子在等离子体内的均匀分布可能会在衬底上产生均匀的材料沉积。 阳极可以用冷却流体冷却以控制阳极的温度并减少剥落。 阳极可以跨过垂直于磁控管的长边的处理空间，其可以跨过溅射靶的背面的二维扫描。 扫描磁控管可以减少阳极的局部加热。
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9.发明授权Method and apparatus for balancing an electrostatic force produced by an electrostatic chuck 有权用于平衡由静电卡盘产生的静电力的方法和装置公开(公告)号：US06625003B2
公开(公告)日：2003-09-23
申请号：US10286688
申请日：2002-11-01
申请人： David Loo , Jr-Jyan Chen , Kenny K. Ngan , Bradley O. Stimson
发明人： David Loo , Jr-Jyan Chen , Kenny K. Ngan , Bradley O. Stimson
IPC分类号： H01G300
CPC分类号： H01L21/6833 , H02N13/00
摘要： A bipolar electrostatic chuck containing apparatus, and a concomitant method, for balancing an electrostatic force that the bipolar electrostatic chuck imparts upon a workpiece. More specifically, the bipolar electrostatic chuck contains a chuck body having a pair of electrodes embedded therein, a primary power supply and an offset power supply. Each electrode within the bipolar electrostatic chuck is respectively connected to a terminal on the primary power. Based upon a voltage produced by the primary power supply and a bias voltage of the workpiece, an offset voltage is applied by the offset power supply to one of the terminals, thus balancing the electrostatic force applied to the workpiece.
摘要翻译： 一种用于平衡双极静电卡盘施加在工件上的静电力的双极静电夹盘装置和一种伴随方法。 更具体地说，双极性静电卡盘包括一对夹在其中的电极，主电源和偏置电源。 双极静电卡盘中的每个电极分别连接到主电源上的端子。 基于由主电源产生的电压和工件的偏置电压，通过偏移电源将偏移电压施加到端子之一，从而平衡施加到工件的静电力。
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公开(公告)号：US06345588B1
公开(公告)日：2002-02-12
申请号：US08908341
申请日：1997-08-07
申请人： Bradley O. Stimson
发明人： Bradley O. Stimson
IPC分类号： C23C1600
CPC分类号： C23C14/345 , C23C14/35 , C23C14/358 , H01J37/321 , H01J37/32174 , H01J37/34
摘要： In a plasma deposition system for depositing a film of sputtered target material on a substrate, the output of an RF generator coupled to a coil for generating a plasma can be varied during the deposition process so that heating and sputtering of the RF coil can be more uniform by “time-averaging” RF voltage distributions along the RF coil.
摘要翻译： 在用于在基板上沉积溅射的靶材料的等离子体沉积系统中，耦合到用于产生等离子体的线圈的RF发生器的输出可以在沉积过程中变化，使得RF线圈的加热和溅射可以更多 通过沿RF线圈的“时间平均”RF电压分布来统一。
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