摘要:
The present invention relates to an apparatus and a method for investigating surface properties of different materials, which make it possible to carry out atomic force microscopy with a simplified and faster shear force method. The apparatus according to the invention is characterized by perpendicular orientation of the measuring tip of a self-actuated cantilever with respect to the surface of the sample. A piezoresistive sensor and a bimorph actuator are preferably DC-isolated. The measuring tip is in the form of a carbon nanotube, in particular. A plurality of cantilevers can be arranged in the form of a cantilever array which is characterized by a comb-like arrangement of individual pre-bent cantilevers. The method according to the invention is distinguished by a fast feedback signal on account of the distance between the measuring tip and the surface to be investigated being regulated using the change in a DC signal which supplies the actuator.
摘要:
The present invention relates to an apparatus and a method for investigating surface properties of different materials, which make it possible to carry out atomic force microscopy with a simplified and faster shear force method. The apparatus according to the invention is characterized by perpendicular orientation of the measuring tip of a self-actuated cantilever with respect to the surface of the sample. A piezoresistive sensor and a bimorph actuator are preferably DC-isolated. The measuring tip is in the form of a carbon nanotube, in particular. A plurality of cantilevers can be arranged in the form of a cantilever array which is characterized by a comb-like arrangement of individual pre-bent cantilevers. The method according to the invention is distinguished by a fast feedback signal on account of the distance between the measuring tip and the surface to be investigated being regulated using the change in a DC signal which supplies the actuator.
摘要:
The invention relates to a device and a method for the micromechanical positioning and handling of an object. The aim of the invention is to provide a device and an associated method for the micromechanical positioning and handling of objects by means of which the scanning speed can be increased and the positional accuracy be improved so that real time images or video rate images (ca. 25 images per second) having a lateral and vertical resolution in the nanometer range can be achieved. According to the invention, a monolithic component, preferably made of silicon, comprises a support element, an object carrier, a plurality of guide elements and elements for transmitting the movement, the preferably piezoresistive drive elements and the preferably piezoresistive position detectors being integrated into said monolithic component; Said micromechanical positioning device can be used, for example, in scanning probe microscopy and in nanopositioning and nanomanipulation technology.
摘要:
The invention relates to a device and a method for the micromechanical positioning and handling of an object. The aim of the invention is to provide a device and an associated method for the micromechanical positioning and handling of objects by means of which the scanning speed can be increased and the positional accuracy be improved so that real time images or video rate images (ca. 25 images per second) having a lateral and vertical resolution in the nanometer range can be achieved. According to the invention, a monolithic component, preferably made of silicon, comprises a support element, an object carrier, a plurality of guide elements and elements for transmitting the movement, the preferably piezoresistive drive elements and the preferably piezoresistive position detectors being integrated into said monolithic component; Said micromechanical positioning device can be used, for example, in scanning probe microscopy and in nanopositioning and nanomanipulation technology.
摘要:
A device and a method for positionally accurate implantation of individual particles in a substrate surface (1a) are described. A diaphragm for a particle beam to be directed onto the substrate surface (1a) and a detector provided thereon in the form of a p-n junction for determining a secondary electron flow produced upon impact of a particle onto the substrate surface (1a) are provided on a tip (4) which is formed on a free end portion of a flexible arm (2) to be mounted on one side. The device is part of a scanning device operating according to the AFM method.
摘要:
The invention relates to a device for an atomic force microscope (AFM) for the study and/or modification of surface properties. The device comprises a cantilever (flexible bar) having an integrated, piezoresistive sensor, an integrated bimorphic actuator, and a measuring tip. The measuring tip carries at least two metal electrodes, which can be activated via electrical terminals. The measuring tip and/or the cantilever have at least one nanoscopic hole through which synchrotron radiation or laser light is directed onto the material surface to be studied. Furthermore, the invention relates to a method for the study and modification of surface properties and surface-proximal properties, which can be executed using such a device. To this end, atomic force microscopy (AFM), surface enhanced Raman scattering (SERS), photo emission spectroscopy (XPS, XAS), and material modification by local exposure are executed in sequence or simultaneously using the same device.
摘要:
The invention relates to a device for an atomic force microscope (AFM) for the study and/or modification of surface properties. The device comprises a cantilever (flexible bar) having an integrated, piezoresistive sensor, an integrated bimorphic actuator, and a measuring tip. The measuring tip carries at least two metal electrodes, which can be activated via electrical terminals. The measuring tip and/or the cantilever have at least one nanoscopic hole through which synchrotron radiation or laser light is directed onto the material surface to be studied. Furthermore, the invention relates to a method for the study and modification of surface properties and surface-proximal properties, which can be executed using such a device. To this end, atomic force microscopy (AFM), surface enhanced Raman scattering (SERS), photo emission spectroscopy (XPS, XAS), and material modification by local exposure are executed in sequence or simultaneously using the same device.