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公开(公告)号：US06762826B2
公开(公告)日：2004-07-13
申请号：US10648479
申请日：2003-08-27
IPC分类号： G03B2758
CPC分类号： H01L21/6838 , G03F7/707 , G03F7/70708 , G03F9/7076
摘要： A substrate attracting and holding system includes a holding table for holding a substrate, a protrusion provided on the holding table, the protrusion being disposed to be placed in a predetermined positional relationship with a position of an alignment mark to be used for processing the substrate or a position with respect to which an alignment mark is to be produced.
摘要翻译： 基板吸附保持系统包括：用于保持基板的保持台，设置在保持台上的突起，突出部设置成与用于处理基板的对准标记的位置成预定的位置关系， 相对于要产生对准标记的位置。
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公开(公告)号：US07755740B2
公开(公告)日：2010-07-13
申请号：US12024332
申请日：2008-02-01
申请人： Izumi Tsukamoto , Hideki Nogawa
发明人： Izumi Tsukamoto , Hideki Nogawa
CPC分类号： G03F7/70341
摘要： An exposure apparatus exposing a plurality of shot areas on a substrate to light through a liquid includes a movable stage including a chuck configured to hold the substrate and a plate arranged around of the chuck, a projection optical system configured to project a light through an original onto the substrate held by the chuck, a first liquid supply nozzle arranged along a periphery of a final optical element of the projection optical system, and a plurality of second liquid supply nozzles arranged on the stage. The exposure apparatus supplies the liquid to a gap between the final optical element and the substrate through the first liquid supply nozzle. The exposure apparatus selects a nozzle for supplying the liquid from among the plurality of the second liquid supply nozzles based on a location of an exposure shot area on the substrate.
摘要翻译： 曝光基板上的多个照射区域通过液体进行光照射的曝光装置包括：可移动台，包括夹持基板的卡盘和布置在卡盘周围的板;投影光学系统，其配置成将光投射到原件 在由卡盘保持的基板上，沿着投影光学系统的最终光学元件的周边布置的第一液体供给喷嘴和布置在台架上的多个第二液体供应喷嘴。 曝光装置通过第一液体供给喷嘴将液体提供到最终光学元件和基板之间的间隙。 曝光装置基于基板上的曝光拍摄区域的位置，从多个第二液体供给喷嘴中选择用于供给液体的喷嘴。
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公开(公告)号：US06654096B1
公开(公告)日：2003-11-25
申请号：US09658462
申请日：2000-09-08
IPC分类号： G03B2768
CPC分类号： G03F9/7026 , G03B27/42 , G03F9/7034
摘要： An exposure apparatus for lithographically transferring a pattern of an original onto a substrate to be exposed includes a first detector for detecting a position of an alignment mark on an exposure shot formed on the substrate, a second detector for detecting a local tilt adjacent to the alignment mark, the position of which is detected by the first detector, and a third detector for detecting a tilt of the exposure shot.
摘要翻译： 用于将原稿的图案光刻转印到待曝光的基板上的曝光装置包括用于检测在基板上形成的曝光镜头上的对准标记的位置的第一检测器，用于检测与对准相邻的局部倾斜的第二检测器 标记，其位置由第一检测器检测;以及第三检测器，用于检测曝光镜头的倾斜。
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公开(公告)号：US20080187872A1
公开(公告)日：2008-08-07
申请号：US12024332
申请日：2008-02-01
申请人： Izumi Tsukamoto , Hideki Nogawa
发明人： Izumi Tsukamoto , Hideki Nogawa
CPC分类号： G03F7/70341
摘要： An exposure apparatus exposing a plurality of shot areas on a substrate to light through a liquid includes a movable stage including a chuck configured to hold the substrate and a plate arranged around of the chuck, a projection optical system configured to project a light through an original onto the substrate held by the chuck, a first liquid supply nozzle arranged along a periphery of a final optical element of the projection optical system, and a plurality of second liquid supply nozzles arranged on the stage. The exposure apparatus supplies the liquid to a gap between the final optical element and the substrate through the first liquid supply nozzle. The exposure apparatus selects a nozzle for supplying the liquid from among the plurality of the second liquid supply nozzles based on a location of an exposure shot area on the substrate.
摘要翻译： 曝光基板上的多个照射区域通过液体进行光照射的曝光装置包括：可移动台，包括夹持基板的卡盘和布置在卡盘周围的板;投影光学系统，其配置成将光投射到原件 在由卡盘保持的基板上，沿着投影光学系统的最终光学元件的周边布置的第一液体供给喷嘴和布置在台架上的多个第二液体供应喷嘴。 曝光装置通过第一液体供给喷嘴将液体提供到最终光学元件和基板之间的间隙。 曝光装置基于基板上的曝光拍摄区域的位置，从多个第二液体供给喷嘴中选择用于供给液体的喷嘴。
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公开(公告)号：US06809802B1
公开(公告)日：2004-10-26
申请号：US09640724
申请日：2000-08-18
IPC分类号： G03B2758
CPC分类号： H01L21/6838 , G03F7/707 , G03F7/70708 , G03F9/7076
摘要： A substrate attracting and holding method includes steps of supporting a substrate by use of a protrusion provided on a holding table for holding the substrate and reducing pressure between the holding table and the substrate to attract and hold the substrate. The protrusion is disposed to be placed in a predetermined positional relation, with respect to a direction along the surface of the substrate, with (i) a position of an alignment mark to be used for processing the substrate or (ii) a position to with respect to which an alignment mark is to be produced. The method also includes attracting and holding the substrate.
摘要翻译： 基板吸附保持方法包括以下步骤：通过使用设置在保持台上的用于保持基板并且减小保持台和基板之间的压力以吸引并保持基板的突起来支撑基板。 突起被设置为相对于沿着基板的表面的方向以预定的位置关系放置，（i）用于处理基板的对准标记的位置或（ii）相对于 要产生对准标记。 该方法还包括吸引和保持基底。
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公开(公告)号：US4538914A
公开(公告)日：1985-09-03
申请号：US450349
申请日：1982-12-16
申请人： Minoru Yomoda , Izumi Tsukamoto
发明人： Minoru Yomoda , Izumi Tsukamoto
IPC分类号： G03F9/00 , G03F9/02 , H01L21/027 , H01L21/30
CPC分类号： G03F9/7069 , H01L21/30
摘要： Disclosed is a transfer apparatus provided with a first body having a plurality of alignment marks, a second body having a plurality of alignment marks, a projection optical system for projecting the image of the first body upon the second body, a probing device for probing the alignment marks of the first body and probing the alignment marks of the second body through the projection optical system, an operation device electrically coupled to the probing device and deriving a transfer error from the alignment error of the alignment marks, and a compensation device coupled to the operation device for eliminating the transfer error and for compensating for the projection optical system.
摘要翻译： 公开了一种传送装置，其具有具有多个对准标记的第一主体，具有多个对准标记的第二主体，用于将第一主体的图像投影到第二主体上的投影光学系统，用于探测第二主体的探测装置 第一主体的对准标记，并且通过投影光学系统探测第二主体的对准标记，电耦合到探测装置并从对准标记的对准误差导出转印误差的操作装置，以及耦合到 用于消除传送误差并补偿投影光学系统的操作装置。
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公开(公告)号：US5760879A
公开(公告)日：1998-06-02
申请号：US498483
申请日：1995-07-05
摘要： A method of detecting coma of a projection optical system includes receiving an image of a pattern projected by the projection optical system, at at least one position along an optical axis of the projection optical system, detecting a position of at least one received pattern image, with respect to a plane perpendicular to the optical axis of the projection optical system, and determining coma of the projection optical system on the basis of the detection.
摘要翻译： 一种检测投影光学系统的彗差的方法包括：在沿着投影光学系统的光轴的至少一个位置处接收由投影光学系统投影的图案的图像，检测至少一个接收的图案图像的位置， 相对于垂直于投影光学系统的光轴的平面，并且基于检测确定投影光学系统的彗差。
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公开(公告)号：US06633390B2
公开(公告)日：2003-10-14
申请号：US09811420
申请日：2001-03-20
IPC分类号： G01B1100
CPC分类号： G03F9/7026
摘要： A method of detecting focus information about an image projecting optical system includes performing mark projection through the optical system, and, based on illumination lights having different chief ray incidence directions, the mark projection is carried out so that mark images formed by the illumination lights, respectively, are superposed one upon another approximately upon an imaging plane, and detecting focus information about the optical system on the basis of information related to a deviation between the mark images superposed.
摘要翻译： 检测关于图像投影光学系统的焦点信息的方法包括通过光学系统执行标记投影，并且基于具有不同的主光线入射方向的照明光，执行标记投影，使得由照明光， 分别叠加在成像平面上，并且基于与叠加的标记图像之间的偏差相关的信息来检测关于光学系统的聚焦信息。
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