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公开(公告)号:US20120045901A1
公开(公告)日:2012-02-23
申请号:US13212349
申请日:2011-08-18
申请人: JONG-HYUK KIM , Keon-Soo Kim , Kwang-Shik Shin , Hyun-Chul Back , Seong-Soon Cho , Young-Bae Yoon , Jung-Hwan Park
发明人: JONG-HYUK KIM , Keon-Soo Kim , Kwang-Shik Shin , Hyun-Chul Back , Seong-Soon Cho , Young-Bae Yoon , Jung-Hwan Park
IPC分类号: H01L21/311
CPC分类号: H01L21/31144 , H01L21/0337 , H01L21/0338 , H01L21/3086 , H01L21/3088 , H01L21/76816
摘要: In a method of forming a pattern structure, a cut-off portion of the node-separated line of a semiconductor device is formed by a double patterning process by using a connection portion of the sacrificial mask pattern and the mask pattern to thereby improve alignment margin. The alignment margin between the mask pattern and the sacrificial mask pattern is increased to an amount of the length of the connection portion of the sacrificial mask pattern. The lines adjacent to the node-separated line include a protrusion portion protruding toward the cut-off portion of the separated line.
摘要翻译: 在形成图案结构的方法中,通过使用牺牲掩模图案和掩模图案的连接部分的双重图案化工艺来形成半导体器件的节点分离线的截止部分,从而改善对准边缘 。 掩模图案和牺牲掩模图案之间的对准边缘增加到牺牲掩模图案的连接部分的长度的量。 与节点分离线相邻的线包括向分离线的截止部分突出的突出部分。