公开(公告)号：US20150198882A9

公开(公告)日：2015-07-16

申请号：US14290744

申请日：2014-05-29

Applicant: JSR CORPORATION

Inventor： Shin-ya NAKAFUJI ,  Satoru MURAKAMI ,  Yoshio TAKIMOTO ,  Kazuhiko KOMURA ,  Masayuki MOTONARI ,  Katsuhisa MIZOGUCHI

IPC: G03F7/038 ,  B05D3/02

CPC classification number: G03F7/0384 ,  B05D3/0254 ,  C08G65/4006 ,  G03F7/094 ,  G03F7/11

Abstract: A composition for forming a resist underlayer film includes a polymer having a structural unit represented by a formula (1). Ar1, Ar2, Ar3 and Ar4 each independently represent a divalent aromatic hydrocarbon group or a divalent heteroaromatic group. A part or all of hydrogen atoms included in the divalent aromatic hydrocarbon group and the divalent heteroaromatic group represented by Ar1, Ar2, Ar3 or Ar4 may be substituted. R1 represents a single bond or a divalent hydrocarbon group having 1 to 20 carbon atoms. A part or all of hydrogen atoms included in the divalent hydrocarbon group represented by R1 may be substituted. The divalent hydrocarbon group represented by R1 may have an ester group, an ether group or a carbonyl group in a structure thereof. Y represents a carbonyl group or a sulfonyl group. m is 0 or 1. n is 0 or 1.

Abstract translation: 用于形成抗蚀剂下层膜的组合物包括具有由式（1）表示的结构单元的聚合物。 Ar 1，Ar 2，Ar 3和Ar 4各自独立地表示二价芳香族烃基或二价杂芳基。 包含在二价芳族烃基中的一部分或全部氢原子和由Ar 1，Ar 2，Ar 3或Ar 4表示的二价杂芳基可以被取代。 R1表示单键或碳原子数1〜20的二价烃基。 包含在由R1表示的二价烃基中的一部分或全部氢原子可以被取代。 由R 1表示的二价烃基的结构可以具有酯基，醚基或羰基。 Y表示羰基或磺酰基。 m为0或1. n为0或1。

公开(公告)号：US20160011512A1

公开(公告)日：2016-01-14

申请号：US14862352

申请日：2015-09-23

Applicant: JSR CORPORATION

Inventor： Shin-ya NAKAFUJI ,  Fumihiro TOYOKAWA ,  Gouji WAKAMATSU ,  Yoshio TAKIMOTO ,  Katsuhisa MIZOGUCHI ,  Takashi OKADA ,  Takaaki UNO ,  Takeshi ENDO ,  Masaki MORITSUGU

IPC: G03F7/11 ,  G03F7/36 ,  H01L21/02 ,  C08G65/38 ,  C09D171/00 ,  G03F7/16 ,  C07C255/54

CPC classification number: G03F7/11 ,  C07C255/54 ,  C07D493/10 ,  C08G65/38 ,  C08G65/40 ,  C09D171/00 ,  C09D171/10 ,  G03F7/094 ,  G03F7/16 ,  G03F7/36 ,  H01L21/02118

Abstract: A composition includes a compound including a partial structure represented by formula (1), and solvent. In the formula (1), X1 and X2 each independently represent a substituted or unsubstituted ring structure having 4 to 10 ring atoms constituted taken together with the spiro carbon atom and the carbon atoms of the aromatic ring adjacent to X1 or X2; n1 and n2 are each independently an integer of 0 to 2; and the sum of k1 and k2 are each independently an integer of 1 to 8, wherein the sum of k1 and k2 is no less than 2 and no greater than 16. The compound is preferably represented by formula (2). The sum of k1 and k2 in the formula (1) is preferably no less than 3.

Abstract translation: 组合物包括包含由式（1）表示的部分结构的化合物和溶剂。 在式（1）中，X 1和X 2各自独立地表示与X 1或X 2相邻的与环碳原子一起构成的具有4〜10个环原子的取代或未取代的环结构。 n1和n2各自独立地为0〜2的整数， k1和k2的和各自独立地为1〜8的整数，其中k1和k2之和不小于2且不大于16.该化合物优选由式（2）表示。 式（1）中的k1和k2之和优选为3以上。

公开(公告)号：US20130153535A1

公开(公告)日：2013-06-20

申请号：US13714406

申请日：2012-12-14

Applicant: JSR Corporation

Inventor： Shin-ya NAKAFUJI ,  Satoru MURAKAMI ,  Kazuhiko KOUMURA ,  Yuushi MATSUMURA ,  Masayuki MOTONARI ,  Katsuhisa MIZOGUCHI

IPC: G03F7/11

CPC classification number: G03F7/11 ,  G03F7/091 ,  H01L21/0276

Abstract: A resin composition for forming a resist underlayer film includes a resin that includes an aromatic ring, and a crosslinking agent having a partial structure represented by a following formula (i). X represents an oxygen atom, a sulfur atom, *—COO— or —NRA—. R1 represents a hydrogen atom or a C1-30 monovalent hydrocarbon group. R2 represents a hydroxy group, a sulfanil group, a cyano group, a nitro group, a C1-30 monovalent hydrocarbon group, a C1-30 monovalent oxyhydrocarbon group or a C1-30 monovalent sulfanilhydrocarbon group. p is an integer of 1 to 3.

Abstract translation: 用于形成抗蚀剂下层膜的树脂组合物包括具有芳环的树脂和具有由下式（i）表示的部分结构的交联剂。 X表示氧原子，硫原子，* -COO-或-NRA-。 R1表示氢原子或C1-30一价烃基。 R2表示羟基，磺胺基，氰基，硝基，C1-30一价烃基，C1-30一价羟基烃基或C1-30一价硫代烃基。 p为1〜3的整数。

公开(公告)号：US20140272722A1

公开(公告)日：2014-09-18

申请号：US14290744

申请日：2014-05-29

Applicant: JSR CORPORATION

Inventor： Shin-ya NAKAFUJI ,  Satoru MURAKAMI ,  Yoshio TAKIMOTO ,  Kazuhiko KOMURA ,  Masayuki MOTONARI ,  Katsuhisa MIZOGUCHI

IPC: G03F7/038 ,  B05D3/02

CPC classification number: G03F7/0384 ,  B05D3/0254 ,  C08G65/4006 ,  G03F7/094 ,  G03F7/11

Abstract: A composition for forming a resist underlayer film includes a polymer having a structural unit represented by a formula (1). Ar1, Ar2, Ar3 and Ar4 each independently represent a divalent aromatic hydrocarbon group or a divalent heteroaromatic group. A part or all of hydrogen atoms included in the divalent aromatic hydrocarbon group and the divalent heteroaromatic group represented by Ar1, Ar2, Ar3 or Ar4 may be substituted. R1 represents a single bond or a divalent hydrocarbon group having 1 to 20 carbon atoms. A part or all of hydrogen atoms included in the divalent hydrocarbon group represented by R1 may be substituted. The divalent hydrocarbon group represented by R1 may have an ester group, an ether group or a carbonyl group in a structure thereof. Y represents a carbonyl group or a sulfonyl group. m is 0 or 1. n is 0 or 1.

Abstract translation: 用于形成抗蚀剂下层膜的组合物包括具有由式（1）表示的结构单元的聚合物。 Ar 1，Ar 2，Ar 3和Ar 4各自独立地表示二价芳香族烃基或二价杂芳基。 包含在二价芳族烃基中的一部分或全部氢原子和由Ar 1，Ar 2，Ar 3或Ar 4表示的二价杂芳基可以被取代。 R1表示单键或碳原子数1〜20的二价烃基。 包含在由R1表示的二价烃基中的一部分或全部氢原子可以被取代。 由R 1表示的二价烃基的结构可以具有酯基，醚基或羰基。 Y表示羰基或磺酰基。 m为0或1. n为0或1。

公开(公告)号：US20140014620A9

公开(公告)日：2014-01-16

申请号：US13714406

申请日：2012-12-14

Applicant: JSR CORPORATION

Inventor： Shin-ya NAKAFUJI ,  Satoru MURAKAMI ,  Kazuhiko KOUMURA ,  Yuushi MATSUMURA ,  Masayuki MOTONARI ,  Katsuhisa MIZOGUCHI

IPC: G03F7/11

CPC classification number: G03F7/11 ,  G03F7/091 ,  H01L21/0276

Abstract: A resin composition for forming a resist underlayer film includes a resin that includes an aromatic ring, and a crosslinking agent having a partial structure represented by a following formula (i). X represents an oxygen atom, a sulfur atom, *—COO— or —NRA—. R1 represents a hydrogen atom or a C1-30 monovalent hydrocarbon group. R2 represents a hydroxy group, a sulfanil group, a cyano group, a nitro group, a C1-30 monovalent hydrocarbon group, a C1-30 monovalent oxyhydrocarbon group or a C1-30 monovalent sulfanilhydrocarbon group. p is an integer of 1 to 3.

Abstract translation: 用于形成抗蚀剂下层膜的树脂组合物包括具有芳环的树脂和具有由下式（i）表示的部分结构的交联剂。 X表示氧原子，硫原子，* -COO-或-NRA-。 R1表示氢原子或C1-30一价烃基。 R2表示羟基，磺胺基，氰基，硝基，C1-30一价烃基，C1-30一价羟基烃基或C1-30一价硫代烃基。 p为1〜3的整数。