公开(公告)号：US20180207983A1

公开(公告)日：2018-07-26

申请号：US15742735

申请日：2016-07-21

申请人： JSR CORPORATION

发明人： Takumi ADACHI ,  Ryoji TANAKA ,  Takaomi MATSUMOTO ,  Fumihiro TOYOKAWA ,  Naoya NOSAKA

IPC分类号： B60C1/00 ,  C08F8/04 ,  C08F236/10 ,  C08F297/04 ,  C08L9/06

CPC分类号： B60C1/0016 ,  B60C1/0025 ,  C08C19/02 ,  C08F8/04 ,  C08F236/10 ,  C08F297/04 ,  C08F2800/20 ,  C08K3/06 ,  C08K3/36 ,  C08K5/47 ,  C08K5/548 ,  C08L9/06 ,  C08F236/06 ,  C08F212/08 ,  C08L15/00

摘要： Provided is a hydrogenated conjugated diene polymer which is a hydrogenated product of a conjugated diene polymer comprising a structural unit derived from a conjugated diene compound and a structural unit derived from an aromatic vinyl compound, wherein the conjugated diene compound includes butadiene, the hydrogenated conjugated diene polymer is obtained by hydrogenating a polymer in which a vinyl bond content in the structural unit derived from butadiene is 50 mol % or less, an amount of the structural unit derived from the aromatic vinyl compound is 5 to 25 mass % with respect to entire structural units derived from monomers of the polymer, and a hydrogenation rate of the structural unit derived from butadiene is 91% to 99%.

公开(公告)号：US20160259247A1

公开(公告)日：2016-09-08

申请号：US15159054

申请日：2016-05-19

申请人： JSR CORPORATION

发明人： Fumihiro TOYOKAWA ,  Shin-ya NAKAFUJI ,  Gouji WAKAMATSU

IPC分类号： G03F7/11 ,  H01L21/3105 ,  H01L21/3065 ,  H01L21/308 ,  G03F7/26 ,  H01L21/027

CPC分类号： G03F7/11 ,  C07C217/18 ,  C07C279/08 ,  C07C2603/92 ,  C08G8/04 ,  C08G8/20 ,  C08L61/06 ,  G03F7/094 ,  G03F7/26 ,  G03F7/40 ,  H01L21/02057 ,  H01L21/0273 ,  H01L21/0274 ,  H01L21/30604 ,  H01L21/3065 ,  H01L21/3081 ,  H01L21/3086 ,  H01L21/31058 ,  C08L61/12

摘要： A composition for forming a resist underlayer film is provided, which contains: a calixarene-based compound obtained from a calixarene by substituting at least a part of hydrogen atoms each on phenolic hydroxyl groups comprised in the calixarene, with a monovalent organic group having 1 to 30 carbon atoms; and an organic solvent. The monovalent organic group preferably includes a crosslinkable group. A part of hydrogen atoms each on phenolic hydroxyl groups of the calixarene-based compound is preferably substituted. The ratio of the number of substituted phenolic hydroxyl groups to the number of unsubstituted phenolic hydroxyl groups in the calixarene-based compound is preferably no less than 30/70 and no greater than 99/1.

公开(公告)号：US20160085152A1

公开(公告)日：2016-03-24

申请号：US14959223

申请日：2015-12-04

申请人： JSR CORPORATION

发明人： Shin-ya NAKAFUJI ,  Fumihiro TOYOKAWA ,  Goji WAKAMATSU ,  Shingo TAKASUGI ,  Tooru KIMURA

IPC分类号： G03F7/11 ,  G03F7/36 ,  C07C15/14 ,  C07C211/50 ,  C07C15/18 ,  G03F7/16 ,  C07C33/28

CPC分类号： G03F7/11 ,  C07C15/14 ,  C07C15/18 ,  C07C15/50 ,  C07C15/54 ,  C07C15/58 ,  C07C25/24 ,  C07C33/28 ,  C07C33/38 ,  C07C39/21 ,  C07C43/215 ,  C07C211/50 ,  C07C211/58 ,  C08F38/00 ,  G03F7/094 ,  G03F7/168 ,  G03F7/36 ,  H01L21/0271

摘要： A composition for film formation includes a compound represented by formula (1) and a solvent. In the formula (1), R1, R2 and R3 each independently represent a group represented by the formula (a). In the formula (a), RA represents a hydrogen atom, an aryl group, or an alkyl group unsubstituted or substituted with at least one of a hydroxy group and an aryl group. RB represents a single bond or an arylene group. A part or all of hydrogen atoms on an aromatic ring of the aryl group and the arylene group may be substituted with a halogen atom, a hydroxy group, an amino group, a sulfanyl group, or a monovalent organic group having 1 to 20 carbon atoms and not including an aromatic ring.

摘要翻译： 用于成膜的组合物包括由式（1）表示的化合物和溶剂。 在式（1）中，R 1，R 2和R 3各自独立地表示由式（a）表示的基团。 在式（a）中，RA表示氢原子，芳基或未被取代或被羟基和芳基中的至少一个取代的烷基。 RB表示单键或亚芳基。 芳基和亚芳基的芳环上的一部分或全部氢原子可以被卤素原子，羟基，氨基，硫烷基或碳原子数为1〜20的一价有机基团取代 而不包括芳环。

公开(公告)号：US20190062539A1

公开(公告)日：2019-02-28

申请号：US16081633

申请日：2017-03-01

申请人： JSR CORPORATION

发明人： Takumi ADACHI ,  Hirofumi SENGA ,  Fumihiro TOYOKAWA

IPC分类号： C08L15/00 ,  C08K3/04 ,  C08K3/36 ,  C08L91/00 ,  B60C1/00

摘要： There is provided a hydrogenated conjugated diene-based rubber which can give a crosslinked rubber having high strength and excellent low fuel consumption performance and can give a rubber composition having excellent formability. A hydrogenated conjugated diene-based rubber having a hydrogenation rate of butadiene unit of 90% or more, wherein, in the molecular weight distribution of the hydrogenated conjugated diene-based rubber as determined by a gel permeation chromatographic method, when a peak area of a molecular weight of 1,000 to 250,000 is taken as AL and a peak area of a molecular weight of 250,000 or more is taken as AH, the ratio of AL to the total area of AL and AH is 0.5% to 20%.

公开(公告)号：US20180201066A1

公开(公告)日：2018-07-19

申请号：US15744225

申请日：2016-07-21

申请人： JSR CORPORATION

发明人： Takumi ADACHI ,  Ryoji TANAKA ,  Takaomi MATSUMOTO ,  Fumihiro TOYOKAWA ,  Naoya NOSAKA

IPC分类号： B60C1/00 ,  C08K3/011 ,  C08K3/34 ,  C08K5/00 ,  C08L9/06 ,  C08F236/10 ,  C08F8/04 ,  C08F297/04

CPC分类号： B60C1/0016 ,  B60C1/00 ,  B60C1/0025 ,  C08C19/02 ,  C08F8/04 ,  C08F236/10 ,  C08F297/04 ,  C08F2800/20 ,  C08K3/011 ,  C08K3/06 ,  C08K3/34 ,  C08K3/36 ,  C08K5/0025 ,  C08K5/47 ,  C08K5/548 ,  C08L9/06 ,  C08F236/06 ,  C08F212/08 ,  C08L15/00

摘要： Provided is a hydrogenated conjugated diene polymer which is a hydrogenated product of a conjugated diene polymer having a structural unit derived from a conjugated diene compound and a structural unit derived from an aromatic vinyl compound, wherein the conjugated diene compound includes butadiene, an amount of the structural unit derived from the aromatic vinyl compound is 30 mass % or more with respect to entire structural units derived from monomers of the polymer, and a hydrogenation rate of the structural unit derived from butadiene is 80% to 99%.

公开(公告)号：US20180251576A1

公开(公告)日：2018-09-06

申请号：US15759425

申请日：2016-09-06

申请人： JSR CORPORATION

发明人： Takumi ADACHI ,  Hirofumi SENGA ,  Fumihiro TOYOKAWA ,  Naoya NOSAKA ,  Takaomi MATSUMOTO ,  Ryoji TANAKA

IPC分类号： C08C19/02 ,  C08K3/36 ,  C08K5/548 ,  B60C1/00

CPC分类号： C08C19/02 ,  B60C1/00 ,  B60C1/0016 ,  B60C1/0025 ,  C08F8/04 ,  C08K3/36 ,  C08K5/548

摘要： Provided is a rubber material that is well-balanced in terms of tensile strength, low hysteresis loss property, wet grip property, and abrasion resistance. A hydrogenated conjugated diene-based polymer which is a hydrogenation product of a conjugated diene-based polymer including butadiene-derived structural units is produced by a method comprising a step of preparing a conjugated diene-based polymer having, at a side chain moiety thereof, a functional group capable of interacting with silica; and a step of hydrogenating the conjugated diene-based polymer so as to achieve a hydrogenation rate of 80 to 99% of butadiene-derived structural units included in the conjugated diene-based polymer.

公开(公告)号：US20180201065A1

公开(公告)日：2018-07-19

申请号：US15744165

申请日：2016-07-21

申请人： JSR CORPORATION

发明人： Takumi ADACHI ,  Ryoji TANAKA ,  Takaomi MATSUMOTO ,  Fumihiro TOYOKAWA ,  Naoya NOSAKA

IPC分类号： B60C1/00 ,  C08K3/011 ,  C08K3/34 ,  C08K5/00 ,  C08L9/06 ,  C08F236/10 ,  C08F8/04 ,  C08F297/04

CPC分类号： B60C1/0016 ,  B60C1/0025 ,  C08C19/02 ,  C08F8/04 ,  C08F236/10 ,  C08F297/04 ,  C08K3/011 ,  C08K3/34 ,  C08K3/36 ,  C08K5/0025 ,  C08L9/06 ,  C08L15/00

摘要： Provided is a hydrogenated conjugated diene polymer which is a hydrogenated product of a conjugated diene polymer comprising a structural unit derived from a conjugated diene compound and a structural unit derived from an aromatic vinyl compound, wherein the conjugated diene compound includes butadiene, the hydrogenated conjugated diene polymer is obtained by hydrogenating a polymer in which a vinyl bond content in structural unit derived from butadiene is 55 mol % or more, and a hydrogenation rate of the structural unit derived from butadiene is 91% to 99%.

公开(公告)号：US20160011512A1

公开(公告)日：2016-01-14

申请号：US14862352

申请日：2015-09-23

申请人： JSR CORPORATION

发明人： Shin-ya NAKAFUJI ,  Fumihiro TOYOKAWA ,  Gouji WAKAMATSU ,  Yoshio TAKIMOTO ,  Katsuhisa MIZOGUCHI ,  Takashi OKADA ,  Takaaki UNO ,  Takeshi ENDO ,  Masaki MORITSUGU

IPC分类号： G03F7/11 ,  G03F7/36 ,  H01L21/02 ,  C08G65/38 ,  C09D171/00 ,  G03F7/16 ,  C07C255/54

CPC分类号： G03F7/11 ,  C07C255/54 ,  C07D493/10 ,  C08G65/38 ,  C08G65/40 ,  C09D171/00 ,  C09D171/10 ,  G03F7/094 ,  G03F7/16 ,  G03F7/36 ,  H01L21/02118

摘要： A composition includes a compound including a partial structure represented by formula (1), and solvent. In the formula (1), X1 and X2 each independently represent a substituted or unsubstituted ring structure having 4 to 10 ring atoms constituted taken together with the spiro carbon atom and the carbon atoms of the aromatic ring adjacent to X1 or X2; n1 and n2 are each independently an integer of 0 to 2; and the sum of k1 and k2 are each independently an integer of 1 to 8, wherein the sum of k1 and k2 is no less than 2 and no greater than 16. The compound is preferably represented by formula (2). The sum of k1 and k2 in the formula (1) is preferably no less than 3.

摘要翻译： 组合物包括包含由式（1）表示的部分结构的化合物和溶剂。 在式（1）中，X 1和X 2各自独立地表示与X 1或X 2相邻的与环碳原子一起构成的具有4〜10个环原子的取代或未取代的环结构。 n1和n2各自独立地为0〜2的整数， k1和k2的和各自独立地为1〜8的整数，其中k1和k2之和不小于2且不大于16.该化合物优选由式（2）表示。 式（1）中的k1和k2之和优选为3以上。

公开(公告)号：US20150185613A1

公开(公告)日：2015-07-02

申请号：US14642857

申请日：2015-03-10

申请人： JSR CORPORATION

发明人： Fumihiro TOYOKAWA ,  Shin-ya Nakafuji ,  Gouji Wakamatsu

IPC分类号： G03F7/11 ,  H01L21/027 ,  H01L21/02 ,  H01L21/306 ,  H01L21/308

CPC分类号： G03F7/11 ,  C07C217/18 ,  C07C279/08 ,  C07C2603/92 ,  C08G8/04 ,  C08G8/20 ,  C08L61/06 ,  G03F7/094 ,  G03F7/26 ,  G03F7/40 ,  H01L21/02057 ,  H01L21/0273 ,  H01L21/0274 ,  H01L21/30604 ,  H01L21/3065 ,  H01L21/3081 ,  H01L21/3086 ,  H01L21/31058 ,  C08L61/12

摘要： A composition for forming a resist underlayer film is provided, which contains: a calixarene-based compound obtained from a calixarene by substituting at least a part of hydrogen atoms each on phenolic hydroxyl groups comprised in the calixarene, with a monovalent organic group having 1 to 30 carbon atoms; and an organic solvent. The monovalent organic group preferably includes a crosslinkable group. A part of hydrogen atoms each on phenolic hydroxyl groups of the calixarene-based compound is preferably substituted. The ratio of the number of substituted phenolic hydroxyl groups to the number of unsubstituted phenolic hydroxyl groups in the calixarene-based compound is preferably no less than 30/70 and no greater than 99/1.

摘要翻译： 提供了一种用于形成抗蚀剂下层膜的组合物，其包含：由杯芳烃获得的杯芳烃类化合物，其通过用杯芳烃中的酚羟基取代至少一部分氢原子， 30个碳原子; 和有机溶剂。 一价有机基团优选包括可交联基团。 杯芳烃类化合物的酚羟基上的氢原子的一部分优选被取代。 取代酚羟基数与杯芳烃类化合物中未取代的酚羟基数之比优选不小于30/70且不大于99/1。

公开(公告)号：US20130233826A1

公开(公告)日：2013-09-12

申请号：US13785466

申请日：2013-03-05

申请人： JSR CORPORATION

发明人： Tomoaki SEKO ,  Fumihiro TOYOKAWA ,  Yuushi MATSUMURA ,  Tooru KIMURA

IPC分类号： G03F7/11

CPC分类号： G03F7/11 ,  G03F7/0752 ,  G03F7/091 ,  G03F7/094

摘要： A composition for forming a resist underlayer film includes a polysiloxane, and an organic solvent composition. The organic solvent composition includes an alkylene glycol monoalkyl ether acetate having a standard boiling point of less than 150.0° C., and an organic solvent having a standard boiling point of no less than 150.0° C. In the organic solvent composition, a content of the alkylene glycol monoalkyl ether acetate is no less than 50% by mass and no greater than 99% by mass, and a content of the organic solvent is no less than 1% by mass and no greater than 50% by mass.

摘要翻译： 用于形成抗蚀剂下层膜的组合物包括聚硅氧烷和有机溶剂组合物。 有机溶剂组合物包括标准沸点小于150.0℃的亚烷基二醇单烷基醚乙酸酯和标准沸点不低于150.0℃的有机溶剂。在有机溶剂组合物中， 亚烷基二醇单烷基醚乙酸酯的含量为50质量％以上且99质量％以下，有机溶剂的含量为1质量％以上且50质量％以下。