公开(公告)号：US20220283498A1

公开(公告)日：2022-09-08

申请号：US17669577

申请日：2022-02-11

Applicant: JSR CORPORATION

Inventor： Katsuaki NISHIKORI ,  Kazuya Kiriyama ,  Natsuko Kinoshita ,  Takuhiro Taniguchi

IPC: G03F7/039 ,  G03F7/038 ,  C08F220/18

Abstract: A radiation-sensitive resin composition includes: a resin having a polystyrene-equivalent weight-average molecular weight of 8,000 or less; a radiation-sensitive acid generator; and a solvent. The resin includes: a structural unit A represented by formula (1); a structural unit B having a phenolic hydroxyl group; and a structural unit C having an acid-dissociable group. The structural unit B is other than the structural unit A; and the structural unit C is other than the structural unit A or B. In the formula (1), RX is a hydrogen atom or a methyl group; and Ar is a monovalent aromatic hydrocarbon group having a substituent represented by —ORY. The substituent is bonded to a carbon atom next to a carbon atom bonded to a main chain of the resin. RY is a hydrogen atom or a protective group to be deprotected by action of an acid.

公开(公告)号：US11592746B2

公开(公告)日：2023-02-28

申请号：US16815075

申请日：2020-03-11

Applicant: JSR CORPORATION

Inventor： Kazuya Kiriyama ,  Katsuaki Nishikori ,  Takuhiro Taniguchi ,  Ken Maruyama

IPC: C07C309/06 ,  G03F7/039 ,  G03F7/004 ,  C08L25/06 ,  C08L33/06 ,  C07C309/12

Abstract: A radiation-sensitive resin composition contains: a polymer that includes a structural unit including an acid-labile group; and a radiation-sensitive acid generating agent. The radiation-sensitive acid generating agent includes a sulfonate anion and a radiation-sensitive cation. The sulfonate anion includes two or more rings, and an iodine atom and a monovalent group having 0 to 10 carbon atoms which includes at least one of an oxygen atom and a nitrogen atom bond to at least one of the two or more rings. The ring is preferably an aromatic ring. The radiation-sensitive acid generating agent is preferably a compound represented by formula (1). In the formula (1), A1 represents a group obtained from a compound which includes a ring having 3 to 20 ring atoms by removing (p+q+r+1) hydrogen atoms on the ring.

公开(公告)号：US11966161B2

公开(公告)日：2024-04-23

申请号：US17854048

申请日：2022-06-30

Applicant: JSR CORPORATION

Inventor： Takuhiro Taniguchi ,  Katsuaki Nishikori ,  Hayato Namai ,  Kazuya Kiriyama ,  Ken Maruyama

IPC: G03F7/004 ,  C07C303/32 ,  C07C381/12 ,  C08G75/20 ,  G03F7/039

CPC classification number: G03F7/0045 ,  C07C303/32 ,  C07C381/12 ,  C08G75/20 ,  G03F7/0392 ,  G03F7/0397

Abstract: A radiation-sensitive resin composition includes: a polymer including a structural unit including an acid-labile group; and a compound represented by formula (1). R1, R2, and R3 each independently represent a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms; X1, X2, and X3 each independently represent a group represented by formula (2); a sum of d, e, and f is no less than 1; R4 represents a hydrocarbon group having 1 to 20 carbon atoms and R5 represents a hydrocarbon group having 1 to 20 carbon atoms, or R4 and R5 taken together represent a heterocyclic structure having 4 to 20 ring atoms, together with the sulfur atom to which R4 and R5 bond; n is 0 or 1; A− represents a monovalent sulfonic acid anion; and Y represents —COO—, —OCO—, or —N(R7)CO—.

公开(公告)号：US11609495B2

公开(公告)日：2023-03-21

申请号：US17081000

申请日：2020-10-27

Applicant: JSR CORPORATION

Inventor： Katsuaki Nishikori ,  Kazuya Kiriyama ,  Takuhiro Taniguchi ,  Ken Maruyama

IPC: G03F7/004 ,  G03F7/039 ,  C08F220/18 ,  C07D317/70 ,  C07C381/12 ,  C07C309/17 ,  C07D327/04 ,  C07C309/12 ,  C07C65/10 ,  C07C59/115 ,  C07C69/63 ,  C07C65/05

Abstract: A radiation-sensitive resin composition includes a polymer including a phenolic hydroxyl group, a compound represented by formula (1-1) or formula (1-2), and a compound represented by formula (2). In the formula (1-1), a sum of a, b, and c is no less than 1; at least one of R1, R2, and R3 represents a fluorine atom or the like; and R4 and R5 each independently represent a hydrogen atom, a fluorine atom, or the like. In the formula (1-2), in a case in which d is 1, R6 represents a fluorine atom or the like, and in a case in which d is no less than 2, at least one of the plurality of R6s represents a fluorine atom or the like; and R8 represents a single bond or a divalent organic group having 1 to 20 carbon atoms.

公开(公告)号：US12092957B2

公开(公告)日：2024-09-17

申请号：US17508191

申请日：2021-10-22

Applicant: JSR CORPORATION

Inventor： Kazuya Kiriyama ,  Katsuaki Nishikori ,  Takuhiro Taniguchi ,  Ryuichi Nemoto ,  Ken Maruyama

IPC: G03F7/039 ,  C07C31/13 ,  C07C69/608 ,  G03F7/20 ,  G03F7/32

CPC classification number: G03F7/0392 ,  C07C31/13 ,  C07C69/608 ,  G03F7/2006 ,  G03F7/327

Abstract: A radiation-sensitive resin composition includes a resin having a partial structure represented by formula (1). R1 and R2 each independently represent a substituted or unsubstituted chain aliphatic hydrocarbon group having 1 to 6 carbon atoms or a substituted or unsubstituted alicyclic hydrocarbon group having 3 to 6 carbon atoms, or R1 and R2 are bonded to each other to form a part of a 3- to 6-membered cyclic structure together with the carbon atom to which R1 and R2 are bonded; R3 represents a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms and containing a fluorine atom. No fluorine atom is bonded to carbon atoms located at α-, β- and γ-positions of the carbon atom to which R1 and R2 are bonded; and No fluorine atom is bonded to carbon atoms located at α- and β-positions of the carbon atom to which R3 is bonded.