公开(公告)号：US20200012194A1

公开(公告)日：2020-01-09

申请号：US16445267

申请日：2019-06-19

Applicant: JSR CORPORATION

Inventor： Motohiro SHIRATANI ,  Natsuko Kinoshita ,  Ken Maruyama

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/20 ,  C08L33/14 ,  C08L25/18

Abstract: Provided are a radiation-sensitive resin composition, a resist pattern-forming method and a polymer component. The radiation-sensitive resin composition contains: a polymer component having a first structural unit that includes a phenolic hydroxyl group and a second structural unit that includes an acid-labile group; and a radiation-sensitive acid generator, wherein, the polymer component satisfies inequality (A), wherein, in the inequality (A), X1 represents a proportion (mol %) of the first structural unit comprised with respect to total structural units constituting the polymer component included in a fraction eluted until a retention time at which a cumulative area accounts for 1% of a total area on a gel permeation chromatography (GPC) elution curve of the polymer component detected by a differential refractometer; and X2 represents a proportion (mol %) of the first structural unit comprised with respect to total structural units constituting the polymer component. X1

公开(公告)号：US11300877B2

公开(公告)日：2022-04-12

申请号：US16030227

申请日：2018-07-09

Applicant: JSR CORPORATION

Inventor： Natsuko Kinoshita

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/30 ,  G03F7/38 ,  C07D233/64 ,  C07D235/02 ,  C07D235/18 ,  G03F7/038 ,  C08F220/16 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  C08F220/28 ,  C08F220/18 ,  C08F220/22

Abstract: A radiation-sensitive resin composition includes: a first polymer having a first structural unit that includes an acid-labile group; a radiation-sensitive acid generator; and a first compound capable of forming a salt through a structural change in a molecule thereof upon irradiation with a radioactive ray. Basicity of the first compound preferably changes upon irradiation with a radioactive ray. The first compound preferably generates an acid upon irradiation with a radioactive ray. The first compound is preferably represented by formula (1). In formula (1), Ar1 represents a substituted or unsubstituted heteroarenediyl group having 4 to 30 ring atoms and having at least one nitrogen atom as a ring-constituting atom.

公开(公告)号：US20210284773A1

公开(公告)日：2021-09-16

申请号：US17192928

申请日：2021-03-05

Applicant: JSR CORPORATION

Inventor： Natsuko Kinoshita

IPC: C08F220/14 ,  G03F7/039 ,  G03F7/004

Abstract: A radiation-sensitive resin composition includes: a resin containing a structural unit A represented by formula (1); at least one radiation-sensitive acid generator selected from the group consisting of a radiation-sensitive acid generator represented by formula (2-1) and a radiation-sensitive acid generator represented formula (2-2); and a solvent. At least one R3 is an acid-dissociable group; and R41 is a hydrogen atom or a protective group to be deprotected by action of an acid. At least one of Rf1 and Rf2 is a fluorine atom or a fluoroalkyl group; R5a is a monovalent organic group having a cyclic structure; X1+ is a monovalent onium cation; R5b is a monovalent organic group, and X2+ is a monovalent onium cation whose atom having a positive charge is not an atom forming a cyclic structure.

公开(公告)号：US20220413385A1

公开(公告)日：2022-12-29

申请号：US17829432

申请日：2022-06-01

Applicant: JSR CORPORATION

Inventor： Kazuya KIRIYAMA ,  Takuhiro Taniguchi ,  Katsuaki Nishikori ,  Natsuko Kinoshita

IPC: G03F7/038 ,  G03F7/20 ,  G03F7/32

Abstract: The radiation-sensitive resin composition contains: a polymer, solubility of which in a developer solution is capable of being altered by an action of an acid, and which has a structural unit represented by the following formula (1); and a radiation-sensitive acid generating agent. L represents a single bond, —COO—, —O—, or —CONH—. X represents a single bond, —O—, -G-O—, —CH2—, —S—, —SO2—, —NRA—, or —CONH—, wherein G represents a divalent aliphatic hydrocarbon group having 1 to 20 carbon atoms, and RA represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms. R2 and R3 each independently represent a halogen atom, a hydroxy group, a sulfanyl group, or an organic group having 1 to 20 carbon atoms.

公开(公告)号：US20220283498A1

公开(公告)日：2022-09-08

申请号：US17669577

申请日：2022-02-11

Applicant: JSR CORPORATION

Inventor： Katsuaki NISHIKORI ,  Kazuya Kiriyama ,  Natsuko Kinoshita ,  Takuhiro Taniguchi

IPC: G03F7/039 ,  G03F7/038 ,  C08F220/18

Abstract: A radiation-sensitive resin composition includes: a resin having a polystyrene-equivalent weight-average molecular weight of 8,000 or less; a radiation-sensitive acid generator; and a solvent. The resin includes: a structural unit A represented by formula (1); a structural unit B having a phenolic hydroxyl group; and a structural unit C having an acid-dissociable group. The structural unit B is other than the structural unit A; and the structural unit C is other than the structural unit A or B. In the formula (1), RX is a hydrogen atom or a methyl group; and Ar is a monovalent aromatic hydrocarbon group having a substituent represented by —ORY. The substituent is bonded to a carbon atom next to a carbon atom bonded to a main chain of the resin. RY is a hydrogen atom or a protective group to be deprotected by action of an acid.

公开(公告)号：US11709428B2

公开(公告)日：2023-07-25

申请号：US17192928

申请日：2021-03-05

Applicant: JSR CORPORATION

Inventor： Natsuko Kinoshita

IPC: G03F7/039 ,  G03F7/30 ,  C08F212/00 ,  C08F220/14 ,  G03F7/004 ,  C08F220/22 ,  C08F220/16

CPC classification number: G03F7/0392 ,  C08F212/00 ,  C08F220/14 ,  C08F220/16 ,  C08F220/22 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/30

Abstract: A radiation-sensitive resin composition includes: a resin containing a structural unit A represented by formula (1); at least one radiation-sensitive acid generator selected from the group consisting of a radiation-sensitive acid generator represented by formula (2-1) and a radiation-sensitive acid generator represented formula (2-2); and a solvent. At least one R3 is an acid-dissociable group; and R41 is a hydrogen atom or a protective group to be deprotected by action of an acid. At least one of Rf1 and Rf2 is a fluorine atom or a fluoroalkyl group; R5a is a monovalent organic group having a cyclic structure; X1+ is a monovalent onium cation; R5b is a monovalent organic group, and X2+ is a monovalent onium cation whose atom having a positive charge is not an atom forming a cyclic structure.