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28 条记录 (耗时 0.027 秒)

    Power splitter for plasma device
    1.
    发明授权
    Power splitter for plasma device 有权
    等离子装置功率分配器

    公开(公告)号：US06727656B1

    公开(公告)日：2004-04-27

    申请号：US10088326

    申请日：2002-06-18

    申请人： Jacques Pelletier ,  Ana Lacoste ,  Thierry Léon Lagarde ,  Michel Moisan ,  Yves Alban-Marie Arnal ,  Zenon Zakrzewski

    发明人： Jacques Pelletier ,  Ana Lacoste ,  Thierry Léon Lagarde ,  Michel Moisan ,  Yves Alban-Marie Arnal ,  Zenon Zakrzewski

    IPC分类号： H01J724

    CPC分类号： H01J37/32211 ,  H01J37/32192 ,  H01J37/32311 ,  H01P5/16

    摘要： The invention concerns a system including a microwave generator and a rectangular guide connected with the generator. The system is adapted to operate in fundamental (H10) or transverse electrical (TE10) mode, and associated with means providing a standing wave pattern. The system also includes many power connectors arranged in the guide at zones of maximum amplitude for one of the components of the electromagnetic field for splitting the generator power. The power connectors are adjusted so that the sum of their reduced admittance levels brought to the splitter input formed by the guide is in a single unit and many sources, respectively connected to a connector of the guide, via insulating means ensuring a power transmission of the connector to the source without reflecting towards the connector and a device adapting impedance of each source, located downstream of the insulating means, between the latter and associated source.

    摘要翻译： 本发明涉及一种包括微波发生器和与发生器连接的矩形导向器的系统。 该系统适于在基本（H10）或横向电（TE10）模式下操作，并且与提供驻波模式的装置相关联。 该系统还包括布置在引导件中的最大振幅区域的许多电力连接器，用于分离发电机功率的电磁场的部件之一。 电源连接器被调节，使得其被引导到由引导件形成的分离器输入的降低的导纳水平的总和是分别连接到引导件的连接器的单个单元和许多源，经由绝缘装置确保 连接器到源，而不向连接器反射，并且设备适应位于绝缘装置下游的源的阻抗，在后者和相关源之间。

    Microwave Plasma Generating Plasma and Plasma Torches
    2.
    发明申请
    Microwave Plasma Generating Plasma and Plasma Torches 审中-公开
    微波等离子体发生等离子体和等离子体手电筒

    公开(公告)号：US20120018410A1

    公开(公告)日：2012-01-26

    申请号：US12679231

    申请日：2008-09-16

    申请人： Zenon Zakrzewski ,  Michel Moisan ,  Daniel Guerin ,  Jean-Christophe Rostaing

    发明人： Zenon Zakrzewski ,  Michel Moisan ,  Daniel Guerin ,  Jean-Christophe Rostaing

    IPC分类号： B23K9/00 ,  H05H1/46

    CPC分类号： B23K10/00 ,  H01P5/085 ,  H05H1/2406 ,  H05H1/46 ,  H05H2001/4607

    摘要： The invention relates to a plasma generating device that comprises at least one very high frequency source (>100 MHz) connected via an impedance adaptation device to an elongated conductor attached on a dielectric substrate, at least one means for cooling said conductor, and at least one gas supply in the vicinity of the dielectric substrate on a side opposite to that bearing the conductor. The invention also relates to plasma torches using said device.

    摘要翻译： 本发明涉及一种等离子体产生装置，其包括至少一个通过阻抗适配装置连接到连接在电介质基底上的细长导体的非常高频源（> 100MHz），至少一个用于冷却所述导体的装置，至少 在与承载导体的那一侧相反的一侧在电介质基板附近的一个气体供应。 本发明还涉及使用所述装置的等离子体炬。

    Device for exciting a gas by a surface wave plasma
    4.
    发明授权
    Device for exciting a gas by a surface wave plasma 有权
    用于通过表面波等离子体激发气体的装置

    公开(公告)号：US06298806B1

    公开(公告)日：2001-10-09

    申请号：US09446980

    申请日：2000-02-29

    申请人： Michel Moisan ,  Zenon Zakrzewski ,  Roxane Etemadi ,  Jean-Christophe Rostaing

    发明人： Michel Moisan ,  Zenon Zakrzewski ,  Roxane Etemadi ,  Jean-Christophe Rostaing

    IPC分类号： C23C1600

    CPC分类号： H01J37/32192 ,  H01J37/32229 ,  H05H1/46

    摘要： The invention concerns a device for exciting a gas comprising a hollow structure (24) forming a waveguide to be connected to a microwave generator and means for circulating a gas through the structure. The gas circulating means comprise an assembly of at least two hollow tubes (46, 48) made of dielectric material respectively passing through said structure (24) in the zones wherein the amplitude of the electric field associated with the incident wave is substantially the same.

    摘要翻译： 本发明涉及一种用于激发气体的装置，该装置包括形成要连接到微波发生器的波导管的中空结构（24）和用于使气体循环通过结构的装置。 气体循环装置包括由介电材料制成的至少两个中空管（46,48）的组件，分别穿过所述结构（24），其中与入射波相关联的电场的振幅基本相同。

    Process for the plasma sterilization of dielectric objects comprising a hollow part
    5.
    发明申请
    Process for the plasma sterilization of dielectric objects comprising a hollow part 审中-公开
    包括中空部分的介质物体的等离子体灭菌方法

    公开(公告)号：US20050269199A1

    公开(公告)日：2005-12-08

    申请号：US11142904

    申请日：2005-06-01

    申请人： Jerome Pollak ,  Michel Moisan ,  Bachir Saoudi ,  Zenon Zakrzewski

    发明人： Jerome Pollak ,  Michel Moisan ,  Bachir Saoudi ,  Zenon Zakrzewski

    IPC分类号： A61L2/14 ,  B01J19/08 ,  B01J19/12

    CPC分类号： A61L2/14

    摘要： There is provided a process for sterilizing a dielectric contaminated object having at least one hollow part. The process comprises (a) producing a plasma by submitting a gas or a mixture of gases to an electromagnetic field; (b) treating the exterior of the object by means of an after-glow of the plasma; and (c) treating the at least one hollow part of the object by means of a discharge of the plasma, the discharge being produced inside the at least one hollow part. Step (c) is carried out before or after step (b). This process is particularly useful for sterilizing various medical or dental instruments. There is also provided a device for carrying such a process.

    摘要翻译： 提供了一种用于对具有至少一个中空部分的电介质污染物体进行灭菌的方法。 该方法包括（a）通过将气体或气体混合物提供给电磁场来产生等离子体; （b）通过等离子体的余辉处理物体的外部; 和（c）通过排出等离子体来处理物体的至少一个中空部分，在至少一个中空部分内部产生排放物。 步骤（c）在步骤（b）之前或之后进行。 该方法对于消毒各种医疗或牙科器械特别有用。 还提供了用于承载这种过程的装置。

    Surface wave launchers to produce plasma columns and means for producing plasma of different shapes
    6.
    发明授权
    Surface wave launchers to produce plasma columns and means for producing plasma of different shapes 失效
    表面波发射器产生等离子体柱和产生不同形状的等离子体的装置

    公开(公告)号：US4810933A

    公开(公告)日：1989-03-07

    申请号：US903519

    申请日：1986-07-02

    申请人： Michel Moisan ,  Zenon Zakrzewski

    发明人： Michel Moisan ,  Zenon Zakrzewski

    IPC分类号： H05H1/46 ,  H01J11/04 ,  H01J65/04 ,  H01P1/20

    CPC分类号： H05H1/46

    摘要： The present invention relates to a device for generating plasma (ionizing gas) by a propagating surface wave. The device comprises a wave launching structure mounted on a plasma vessel and connected to an impedance matching network. The latter comprises a coupler and a tuner which is either formed by a section of a transmission line or is of the lumped circuitry type. The launching structure may either generate an azimuthally symmetric or a non symmetric propagating wave. This invention also relates to a method and a device for shaping plasma which comprises a plasma vessel receiving a surface wave generator and having a serviceable portion of a size and/or shape substantially different from the shape and/or size of the portion of the plasma vessel receiving the wave generator.

    摘要翻译： 本发明涉及通过传播表面波产生等离子体（电离气体）的装置。 该装置包括安装在等离子体容器上并连接到阻抗匹配网络的波浪发射结构。 后者包括耦合器和调谐器，其由传输线的一部分形成或者是集总电路类型。 发射结构可以产生方位角对称或非对称传播波。 本发明还涉及用于形成等离子体的方法和装置，其包括接收表面波发生器的等离子体容器，其具有与等离子体部分的形状和/或尺寸基本不同的尺寸和/或形状的可使用部分 容器接收波发生器。

    Low temperature plasma sterilising system and method
    7.
    发明授权
    Low temperature plasma sterilising system and method 失效
    低温等离子灭菌系统及方法

    公开(公告)号：US06707254B1

    公开(公告)日：2004-03-16

    申请号：US09926638

    申请日：2002-03-19

    申请人： Michel Moisan ,  Stéphane Moreau ,  Maryam Tabrizian ,  Jacques Pelletier ,  Jean Barbeau ,  L'Hocine Yahia

    发明人： Michel Moisan ,  Stéphane Moreau ,  Maryam Tabrizian ,  Jacques Pelletier ,  Jean Barbeau ,  L'Hocine Yahia

    IPC分类号： H01J1722

    CPC分类号： A61L2/10 ,  A61L2/14

    摘要： A system and a method for sterilizing objects, in particular medical instruments and accessories, using gas plasma, also called ionized gas. The gases used to form the plasma do not require to exhibit an intrinsic sterilizing activity. The sterilizing properties result from the passage through an electric field generating the plasma, an electric field which is provided by microwaves, a gas stream including oxygen in molecular form (O2) or as a gas element, and atomic or molecular species capable of emitting UV radiation once they have been energized. The system and method provide the advantage of making it possible to treat heat-sensitive and thermolabile objects at temperatures less than 50° C. using gases presenting no risks for the operator.

    摘要翻译： 一种使用气体等离子体（也称为电离气体）对物体特别是医疗仪器和附件进行消毒的系统和方法。 用于形成等离子体的气体不需要表现出固有的灭菌活性。 灭菌特性是由于产生等离子体的电场通过，由微波提供的电场，包含分子形式（O 2）的氧气或气体元素的气流以及能够发射紫外线的原子或分子物质 辐射一旦被激活。 该系统和方法提供了使得可以在低于50℃的温度下处理热敏和不耐热物体的优点，使用对操作者没有风险的气体。

    Method for producing a high adhesion thin film of diamond on a Fe-based substrate
    10.
    发明授权
    Method for producing a high adhesion thin film of diamond on a Fe-based substrate 失效
    在Fe基基板上制造金刚石高附着性薄膜的方法

    公开(公告)号：US5759623A

    公开(公告)日：1998-06-02

    申请号：US527900

    申请日：1995-09-14

    申请人： Carlos Fernando De Mello Borges ,  Michel Moisan ,  Francois Roy

    发明人： Carlos Fernando De Mello Borges ,  Michel Moisan ,  Francois Roy

    IPC分类号： C23C8/80 ,  C23C16/02 ,  C23C16/27 ,  C23C26/00 ,  C23C16/26 ,  B05D3/00

    CPC分类号： C23C16/275 ,  C23C16/0218 ,  C23C26/00 ,  C23C8/80

    摘要： A method for depositing a thin film of diamond on the surface of a Fe-based substrate comprises the step of pre-treating the surface of the Fe-based substrate prior to the deposition consisting of nucleating carbon atoms on the Fe-based substrate to grow the thin film of diamond. The pre-treatment consists of supersaturating the surface of the Fe-based substrate with carbon atoms and heating it to form a diffusion barrier layer. During the pre-treatment, at least a portion of the carbon atoms are diffused into the Fe-based substrate. During the deposition process, carbon atoms are prevented by the diffusion barrier layer previously formed to diffuse into the Fe-based substrate whereby these carbon atoms remain available for the nucleation and growth of the thin film of diamond. A portion of the carbon atoms diffused into the Fe-based substrate during the pre-treatment are nucleated during the deposition process and act as anchors to provide a high adhesion between the thin film of diamond and the surface of the Fe-based substrate.

    摘要翻译： 用于在Fe基基材的表面上沉积金刚石薄膜的方法包括在沉积前由Fe基基底上的成核碳原子预处理Fe基基底的表面以生长的步骤 金刚石薄膜。 预处理包括使具有碳原子的Fe基衬底的表面过饱和并加热以形成扩散阻挡层。 在预处理期间，至少一部分碳原子扩散到Fe基底物中。 在沉积过程中，通过预先形成的扩散阻挡层来阻止碳原子扩散到Fe基衬底中，由此这些碳原子可用于金刚石薄膜的成核和生长。 在预处理期间扩散到Fe基底物中的一部分碳原子在沉积过程中成核，并且作为锚点，以在金刚石薄膜和Fe基底材的表面之间提供高粘合性。