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16 条记录 (耗时 0.019 秒)

    Microwave Plasma Generating Plasma and Plasma Torches
    4.
    发明申请
    Microwave Plasma Generating Plasma and Plasma Torches 审中-公开
    微波等离子体发生等离子体和等离子体手电筒

    公开(公告)号：US20120018410A1

    公开(公告)日：2012-01-26

    申请号：US12679231

    申请日：2008-09-16

    申请人： Zenon Zakrzewski ,  Michel Moisan ,  Daniel Guerin ,  Jean-Christophe Rostaing

    发明人： Zenon Zakrzewski ,  Michel Moisan ,  Daniel Guerin ,  Jean-Christophe Rostaing

    IPC分类号： B23K9/00 ,  H05H1/46

    CPC分类号： B23K10/00 ,  H01P5/085 ,  H05H1/2406 ,  H05H1/46 ,  H05H2001/4607

    摘要： The invention relates to a plasma generating device that comprises at least one very high frequency source (>100 MHz) connected via an impedance adaptation device to an elongated conductor attached on a dielectric substrate, at least one means for cooling said conductor, and at least one gas supply in the vicinity of the dielectric substrate on a side opposite to that bearing the conductor. The invention also relates to plasma torches using said device.

    摘要翻译： 本发明涉及一种等离子体产生装置，其包括至少一个通过阻抗适配装置连接到连接在电介质基底上的细长导体的非常高频源（> 100MHz），至少一个用于冷却所述导体的装置，至少 在与承载导体的那一侧相反的一侧在电介质基板附近的一个气体供应。 本发明还涉及使用所述装置的等离子体炬。

    Device for feeding a gas-mixture laser apparatus, and laser apparatus equipped with such a device
    8.
    发明授权
    Device for feeding a gas-mixture laser apparatus, and laser apparatus equipped with such a device 失效
    用于供给气体混合激光装置的装置以及配备有这种装置的激光装置

    公开(公告)号：US5799031A

    公开(公告)日：1998-08-25

    申请号：US592509

    申请日：1996-01-26

    申请人： Bruno Marie ,  Daniel Guerin ,  Christian Larquet ,  Antoine Willemot

    发明人： Bruno Marie ,  Daniel Guerin ,  Christian Larquet ,  Antoine Willemot

    IPC分类号： H01S3/036 ,  H01S3/22 ,  H01S3/223

    CPC分类号： H01S3/036

    摘要： The gas mixture leaving the laser apparatus (1) is recycled to a permeator (45) which separates it into two flows. The discharge from the permeator is expanded in an expansion turbine (27) coupled to a compressor (35) for exerting suction on the recycled mixture, which makes it possible to obtain the desired reduced pressure in the laser apparatus. Applications to power laser apparatuses with nitrogen/carbon dioxide mixture, intended for cutting materials.

    摘要翻译： 离开激光装置（1）的气体混合物被再循环到渗透器（45），其将其分成两个流。 来自渗透器的排放物在耦合到压缩机（35）的膨胀涡轮机（27）中膨胀，用于在再循环混合物上施加吸力，这使得可以在激光设备中获得期望的减压。 应用于用于切割材料的氮/二氧化碳混合物的激光设备。

    Process and apparatus for the dry treatment of metal surfaces
    10.
    发明授权
    Process and apparatus for the dry treatment of metal surfaces 失效
    用于干式处理金属表面的工艺和设备

    公开(公告)号：US6007637A

    公开(公告)日：1999-12-28

    申请号：US746876

    申请日：1996-11-18

    申请人： Thierry Sindzingre ,  Stephane Rabia ,  Daniel Guerin ,  Christian Larquet

    发明人： Thierry Sindzingre ,  Stephane Rabia ,  Daniel Guerin ,  Christian Larquet

    IPC分类号： C23G5/00 ,  B08B7/04

    CPC分类号： C23G5/00

    摘要： The invention relates to a process for the dry surface treatment of at least one metal surface portion, according to which the portion is treated at a pressure close to atmospheric pressure by a gaseous treatment atmosphere comprising excited or unstable species and substantially devoid of electrically charged species, obtained from a primary gaseous mixture and if necessary an adjacent gaseous mixture, the primary gaseous mixture being obtained at the gas outlet of at least one device for the production of excited or unstable gaseous species, in which an initial gaseous mixture comprising an inert gas and/or a reducing gas and/or an oxidizing gas has been converted, the adjacent mixture not having passed through the device.

    摘要翻译： 本发明涉及一种用于干表面处理至少一个金属表面部分的方法，根据该方法，该部分在接近于大气压的压力下通过包含激发或不稳定物质的气体处理气氛进行处理，并且基本上没有带电荷的物质 从主要气体混合物获得，如果需要的话，相邻的气体混合物，在至少一个装置的气体出口处获得主要气体混合物，用于产生激发或不稳定的气态物质，其中包含惰性气体的初始气体混合物 和/或还原气体和/或氧化气体已经被转化，相邻的混合物没有通过该装置。