公开(公告)号：US08512473B2

公开(公告)日：2013-08-20

申请号：US12881759

申请日：2010-09-14

申请人： Jae-Mork Park ,  You-Min Cha ,  Won-Seok Cho ,  Jae-Hong Ahn ,  Min-Jeong Hwang

发明人： Jae-Mork Park ,  You-Min Cha ,  Won-Seok Cho ,  Jae-Hong Ahn ,  Min-Jeong Hwang

IPC分类号： C23C16/458 ,  H01L21/306 ,  C23F1/00 ,  C23C16/06 ,  C23C16/22

CPC分类号： H01L21/682 ,  C23C14/042 ,  H01L51/001 ,  H01L51/56

摘要： A substrate centering device for an organic material deposition system comprises: a plurality of substrate support holders configured to be reciprocally movable in a facing direction within an organic material deposition chamber and supporting both side portions of a substrate loaded by a robot; a substrate centering unit configured to be reciprocally movable at each of the substrate support holders and centering the substrate by guiding both side portions of the substrate; and a plurality of substrate clampers configured to be reciprocally movable in a vertical direction at each of the substrate support holders, and clamping the substrate that has been centered by the substrate centering unit.

摘要翻译： 一种用于有机材料沉积系统的基板定心装置，包括：多个基板支撑保持器，其构造成可在有机材料沉积室内面向相反方向往复运动，并支撑由机器人装载的基板的两侧部分; 基板定心单元，其构造成在每个基板支撑保持器处可往复运动，并且通过引导基板的两个侧部对准基板; 以及多个基板夹持器，其构造成在每个基板支撑保持器处在垂直方向上往复运动，并且夹持由基板定心单元居中的基板。

公开(公告)号：US20130302134A1

公开(公告)日：2013-11-14

申请号：US13942514

申请日：2013-07-15

申请人： Jae-Mork Park ,  You-Min Cha ,  Won-Seok Cho ,  Jae-Hong Ahn ,  Min-Jeong Hwang

发明人： Jae-Mork Park ,  You-Min Cha ,  Won-Seok Cho ,  Jae-Hong Ahn ,  Min-Jeong Hwang

IPC分类号： H01L21/68

CPC分类号： H01L21/682 ,  C23C14/042 ,  H01L51/001 ,  H01L51/56

摘要： A substrate centering device for an organic material deposition system comprises: a plurality of substrate support holders configured to be reciprocally movable in a facing direction within an organic material deposition chamber and supporting both side portions of a substrate loaded by a robot; a substrate centering unit configured to be reciprocally movable at each of the substrate support holders and centering the substrate by guiding both side portions of the substrate; and a plurality of substrate clampers configured to be reciprocally movable in a vertical direction at each of the substrate support holders, and clamping the substrate that has been centered by the substrate centering unit.

摘要翻译： 一种用于有机材料沉积系统的基板定心装置，包括：多个基板支撑保持器，其构造成可在有机材料沉积室内面向相反方向往复运动，并支撑由机器人装载的基板的两侧部分; 基板定心单元，其构造成在每个基板支撑保持器处可往复运动，并且通过引导基板的两个侧部对准基板; 以及多个基板夹持器，其构造成在每个基板支撑保持器处在垂直方向上往复运动，并且夹持由基板定心单元居中的基板。

公开(公告)号：US08961692B2

公开(公告)日：2015-02-24

申请号：US12659987

申请日：2010-03-26

申请人： Jae-Wan Park ,  You-Min Cha ,  Jae-Hong Ahn ,  Won-Seok Cho ,  Jae-Mork Park ,  Min-Jeong Hwang

发明人： Jae-Wan Park ,  You-Min Cha ,  Jae-Hong Ahn ,  Won-Seok Cho ,  Jae-Mork Park ,  Min-Jeong Hwang

IPC分类号： C23C16/00 ,  C23C14/24 ,  C23C14/04

CPC分类号： C23C14/243 ,  C23C14/044

摘要： Provided is an evaporating apparatus that deposits a deposition material onto a treatment object. The evaporating apparatus includes a base, a deposition source, and first and second correction units. The deposition source deposits the deposition material onto the treatment object. The base is disposed separately from the treatment object. The deposition source is placed on a surface of the base. The first and second correction units located between the deposition source and the treatment object. The first and second correction units are disposed on outer regions of the deposition source and face each other. Each of the first and second correction units rotates to control the thickness of a layer formed by the deposition material deposited on the treatment object.

摘要翻译： 提供了一种将沉积材料沉积到处理物体上的蒸发装置。 蒸发装置包括基座，沉积源以及第一和第二校正单元。 沉积源将沉积材料沉积到处理对象上。 基座与治疗对象分开设置。 沉积源放置在基底的表面上。 位于沉积源和处理对象之间的第一和第二校正单元。 第一和第二校正单元设置在沉积源的外部区域上并且彼此面对。 第一和第二校正单元中的每一个旋转以控制由沉积在处理对象上的沉积材料形成的层的厚度。

公开(公告)号：US20110073042A1

公开(公告)日：2011-03-31

申请号：US12881759

申请日：2010-09-14

申请人： Jae-Mork Park ,  You-Min Cha ,  Won-Seok Cho ,  Jae-Hong Ahn ,  Min-Jeong Hwang

发明人： Jae-Mork Park ,  You-Min Cha ,  Won-Seok Cho ,  Jae-Hong Ahn ,  Min-Jeong Hwang

IPC分类号： C23C16/458 ,  C23C16/00

CPC分类号： H01L21/682 ,  C23C14/042 ,  H01L51/001 ,  H01L51/56

摘要： A substrate centering device for an organic material deposition system comprises: a plurality of substrate support holders configured to be reciprocally movable in a facing direction within an organic material deposition chamber and supporting both side portions of a substrate loaded by a robot; a substrate centering unit configured to be reciprocally movable at each of the substrate support holders and centering the substrate by guiding both side portions of the substrate; and a plurality of substrate clampers configured to be reciprocally movable in a vertical direction at each of the substrate support holders, and clamping the substrate that has been centered by the substrate centering unit.

摘要翻译： 一种用于有机材料沉积系统的基板定心装置，包括：多个基板支撑保持器，其构造成可在有机材料沉积室内面向相反方向往复运动，并支撑由机器人装载的基板的两侧部分; 基板定心单元，其构造成在每个基板支撑保持器处可往复运动，并且通过引导基板的两个侧部对准基板; 以及多个基板夹持器，其构造成在每个基板支撑保持器处在垂直方向上往复运动，并且夹持由基板定心单元居中的基板。

公开(公告)号：US20100275842A1

公开(公告)日：2010-11-04

申请号：US12659987

申请日：2010-03-26

申请人： Jae-Wan Park ,  You-Min Cha ,  Jae-Hong Ahn ,  Won-Seok Cho ,  Jae-Mork Park ,  Min-Jeong Hwang

发明人： Jae-Wan Park ,  You-Min Cha ,  Jae-Hong Ahn ,  Won-Seok Cho ,  Jae-Mork Park ,  Min-Jeong Hwang

IPC分类号： C23C16/00

CPC分类号： C23C14/243 ,  C23C14/044

摘要： Provided is an evaporating apparatus that deposits a deposition material onto a treatment object. The evaporating apparatus includes a base, a deposition source, and first and second correction units. The deposition source deposits the deposition material onto the treatment object. The base is disposed separately from the treatment object. The deposition source is placed on a surface of the base. The first and second correction units located between the deposition source and the treatment object. The first and second correction units are disposed on outer regions of the deposition source and face each other. Each of the first and second correction units rotates to control the thickness of a layer formed by the deposition material deposited on the treatment object.

摘要翻译： 提供了一种将沉积材料沉积到处理物体上的蒸发装置。 蒸发装置包括基座，沉积源以及第一和第二校正单元。 沉积源将沉积材料沉积到处理对象上。 基座与治疗对象分开设置。 沉积源放置在基底的表面上。 位于沉积源和处理对象之间的第一和第二校正单元。 第一和第二校正单元设置在沉积源的外部区域上并且彼此面对。 第一和第二校正单元中的每一个旋转以控制由沉积在处理对象上的沉积材料形成的层的厚度。

公开(公告)号：US20100304025A1

公开(公告)日：2010-12-02

申请号：US12770175

申请日：2010-04-29

申请人： Min-Jeong Hwang ,  You-Min Cha ,  Won-Seok Cho ,  Jae-Mork Park ,  Jae-Wan Park ,  Jae-Hong Ahn

发明人： Min-Jeong Hwang ,  You-Min Cha ,  Won-Seok Cho ,  Jae-Mork Park ,  Jae-Wan Park ,  Jae-Hong Ahn

IPC分类号： C23C16/44 ,  C23C16/00

CPC分类号： C23C16/54 ,  C23C14/568

摘要： A deposition apparatus including a plurality of reaction chambers, and a method of controlling the deposition apparatus. The deposition apparatus includes a first chamber to deposit a first deposition material onto a deposition body, a second chamber to deposit a second and different deposition material onto the deposition body, a third chamber to deposit the first deposition material onto the deposition body, a transfer chamber connected to the first through third chambers, the transfer chamber to transfer the deposition body to ones of the first through third chambers and a control unit to transport the deposition body from the transfer chamber to ones of the first through third chambers.

摘要翻译： 包括多个反应室的沉积设备以及控制该沉积设备的方法。 沉积装置包括：第一室，用于将第一沉积材料沉积到沉积体上;第二室，用于将第二和不同的沉积材料沉积到沉积体上;第三室，将第一沉积材料沉积到沉积体上， 连接到第一至第三腔室的传送室，传送室将沉积体转移到第一至第三腔室中的一个;以及控制单元，用于将沉积体从传送室输送到第一至第三腔室中的一个。

公开(公告)号：US07862855B2

公开(公告)日：2011-01-04

申请号：US11325558

申请日：2006-01-05

申请人： Min-Jeong Hwang ,  Kwan-Seop Song ,  Do-Geun Kim ,  Jae-Hong Ahn ,  Sung-Ho Lee

发明人： Min-Jeong Hwang ,  Kwan-Seop Song ,  Do-Geun Kim ,  Jae-Hong Ahn ,  Sung-Ho Lee

IPC分类号： C23C16/448

CPC分类号： C23C14/243 ,  C23C14/12

摘要： In a method of controlling an effusion cell in a deposition system, including a crucible, a guiding pathway and an injection nozzle, a guiding pathway and an injection nozzle are heated. The crucible is heated after heating the guiding pathway and the injection nozzle. In addition, in cooling the effusion cell including a crucible, a guiding pathway and an injection nozzle, the crucible is cooled. The guiding pathway and the injection nozzle are cooled after cooling the crucible. This method has an advantage of enhancing uniformity of the organic layer formed on the substrate by preventing the clogging of the injection nozzle by deposition material vaporized in the crucible or splashing.

摘要翻译： 在包括坩埚，引导通道和注射喷嘴，引导通道和注射喷嘴的沉积系统中控制渗出池的方法中， 在加热引导通道和注射喷嘴之后加热坩埚。 此外，在冷却包括坩埚，引导通道和注射喷嘴的积液池时，将坩埚冷却。 冷却坩埚后，引导通道和喷嘴被冷却。 该方法具有通过防止在坩埚中蒸发的沉积材料或喷溅而防止喷嘴堵塞而提高形成在基板上的有机层的均匀性的优点。

公开(公告)号：US20060147628A1

公开(公告)日：2006-07-06

申请号：US11325558

申请日：2006-01-05

申请人： Min-Jeong Hwang ,  Kwan-Seop Song ,  Do-Geun Kim ,  Jae-Hong Ahn ,  Sung-Ho Lee

发明人： Min-Jeong Hwang ,  Kwan-Seop Song ,  Do-Geun Kim ,  Jae-Hong Ahn ,  Sung-Ho Lee

IPC分类号： C23C16/00 ,  B05C11/00

CPC分类号： C23C14/243 ,  C23C14/12

摘要： In a method of controlling an effusion cell in a deposition system, including a crucible, a guiding pathway and an injection nozzle, a guiding pathway and an injection nozzle are heated. The crucible is heated after heating the guiding pathway and the injection nozzle. In addition, in cooling the effusion cell including a crucible, a guiding pathway and an injection nozzle, the crucible is cooled. The guiding pathway and the injection nozzle are cooled after cooling the crucible. This method has an advantage of enhancing uniformity of the organic layer formed on the substrate by preventing the clogging of the injection nozzle by deposition material vaporized in the crucible or splashing.

摘要翻译： 在包括坩埚，引导通道和注射喷嘴，引导通道和注射喷嘴的沉积系统中控制渗出池的方法中， 在加热引导通道和注射喷嘴之后加热坩埚。 此外，在冷却包括坩埚，引导通道和注射喷嘴的积液池时，将坩埚冷却。 冷却坩埚后，引导通道和喷嘴被冷却。 该方法具有通过防止在坩埚中蒸发的沉积材料或喷溅而防止喷嘴堵塞而提高形成在基板上的有机层的均匀性的优点。

公开(公告)号：US20060284509A1

公开(公告)日：2006-12-21

申请号：US11339699

申请日：2006-01-26

申请人： Seung-Do Han ,  Seung-Suk Oh ,  Jae-Hong Ahn ,  Hyoun-Jeong Shin

发明人： Seung-Do Han ,  Seung-Suk Oh ,  Jae-Hong Ahn ,  Hyoun-Jeong Shin

IPC分类号： H02K21/38 ,  H02K16/00 ,  H02K16/02 ,  H02K1/22

CPC分类号： H02K16/02 ,  H02K17/16 ,  H02K21/14

摘要： An induction motor includes: a stator in which a plurality of winding coils wound in a central direction of a stator core are arranged; an induction rotor rotatably inserted into the stator; and a synchronous rotor including a magnet and rotatably inserted into an air gap between the stator and the induction rotor, so that the induction motor reduces the size of the whole motor and has a structure of a compact size to thereby reduce installation space and manufacturing cost and increase output power and efficiency.

摘要翻译： 感应电动机包括：定子，其中布置有沿定子芯的中心方向缠绕的多个绕组线圈; 可旋转地插入定子的感应转子; 以及包括磁体并可旋转地插入到定子和感应转子之间的气隙中的同步转子，使得感应电动机减小整个电动机的尺寸，并且具有紧凑尺寸的结构，从而减少安装空间和制造成本 提高输出功率和效率。

公开(公告)号：US07459814B2

公开(公告)日：2008-12-02

申请号：US11325503

申请日：2006-01-05

申请人： Dong-Il Lee ,  Seung-Do Han ,  Hyoun-Jeong Shin ,  Jae-Hong Ahn ,  Seung-Suk Oh

发明人： Dong-Il Lee ,  Seung-Do Han ,  Hyoun-Jeong Shin ,  Jae-Hong Ahn ,  Seung-Suk Oh

IPC分类号： H02K7/10 ,  H02K16/02 ,  H02K17/16 ,  H02K17/30

CPC分类号： H02K16/02 ,  H02K7/1185 ,  H02K11/21 ,  H02K17/30 ,  H02K21/14

摘要： The hybrid induction motor includes a housing; a stator installed in the housing and having a stator core portion and a stator coil portion; a rotor coupling body having a rotary shaft rotatably installed in at the housing, a cage rotor portion rotating integrally with the rotary shaft, and a permanent magnet rotor portion coupled to a circumference of the cage rotor portion with a certain air gap so as to rotate freely with respect to the rotary shaft; and a reverse rotation preventing switch, when the rotary shaft rotates reversibly, coming in contact with the permanent magnet rotor portion which is moved along the shaft by thrust generated by the rotor coupling body and cutting off power being supplied to the stator coil portion.

摘要翻译： 混合感应电动机包括壳体; 定子，其安装在所述壳体中并且具有定子芯部和定子线圈部; 具有可旋转地安装在壳体中的旋转轴的转子联接体，与旋转轴一体旋转的保持架转子部分，以及以一定气隙与保持架转子部分的圆周连接以便旋转的永磁体转子部分 相对于旋转轴自由; 以及反转防止开关，当旋转轴可逆地旋转时，与由转子联接体产生的推力沿着轴移动的永久磁铁转子部分接触，并切断供给定子线圈部分的动力。