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公开(公告)号：US6154284A
公开(公告)日：2000-11-28
申请号：US280989
申请日：1999-03-30
IPC分类号： C23C16/44 , G01J3/433 , G01N21/03 , G01N21/35 , G01N21/39 , H01L21/02 , G01N21/00 , G01R31/00 , G01R31/26
CPC分类号： G01N21/031 , C23C16/4412 , G01J3/433 , G01N21/3504 , G01N21/3554 , G01N21/39
摘要： Provided is a novel chamber effluent monitoring system. The system comprises a chamber having an exhaust line connected thereto. The exhaust line includes a sample region, wherein substantially all of a chamber effluent also passes through the sample region. The system further comprises an absorption spectroscopy measurement system for detecting a gas phase molecular species. The measurement system comprises a light source and a main detector in optical communication with the sample region through one or more light transmissive window. The light source directs a light beam into the sample region through one of the one or more light transmissive window. The light beam passes through the sample region and exits the sample region through one of the one or more light transmissive window. The main detector responds to the light beam exiting the sample region. The system allows for in situ measurement of molecular gas impurities in a chamber effluent, and in particular, in the effluent from a semiconductor processing chamber. Particular applicability is found in semiconductor manufacturing process control and hazardous gas leak detection.
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2.发明授权Chamber effluent monitoring system and semiconductor processing system comprising absorption spectroscopy measurement system, and methods of use 失效室内污水监测系统和半导体处理系统，包括吸收光谱测量系统和使用方法公开(公告)号：US06885452B2
公开(公告)日：2005-04-26
申请号：US10287512
申请日：2002-11-05
IPC分类号： C23C16/44 , G01J3/433 , G01N21/03 , G01N21/35 , G01N21/39 , H01L21/02 , G01N21/00 , G01R31/00 , G01R31/26
CPC分类号： G01N21/031 , C23C16/4412 , G01J3/433 , G01N21/3504 , G01N21/3554 , G01N21/39
摘要： Provided is a novel chamber effluent monitoring system. The system comprises a chamber having an exhaust line connected thereto. The exhaust line includes a sample region, wherein substantially all of a chamber effluent also passes through the sample region. The system further comprises an absorption spectroscopy measurement system for detecting a gas phase molecular species. The measurement system comprises a light source and a main detector in optical communication with the sample region through one or more light transmissive window. The light source directs a light beam into the sample region through one of the one or more light transmissive window. The light beam passes through the sample region and exits the sample region through one of the one or more light transmissive window. The main detector responds to the light beam exiting the sample region. The system allows for in situ measurement of molecular gas impurities in a chamber effluent, and in particular, in the effluent from a semiconductor processing chamber. Particular applicability is found in semiconductor manufacturing process control and hazardous gas leak detection.
摘要翻译： 提供了一种新型室流出物监测系统。 该系统包括具有连接到其上的排气管的室。 排气管线包括样品区域，其中基本上所有的室排出物也通过样品区域。 该系统还包括用于检测气相分子种类的吸收光谱测量系统。 测量系统包括通过一个或多个透光窗与样品区域光通信的光源和主检测器。 光源通过一个或多个透光窗中的一个将光束引导到样品区域中。 光束通过样品区域并通过一个或多个透光窗口之一离开样品区域。 主检测器响应离开样品区域的光束。 该系统允许原位测量室流出物中的分子气体杂质，特别是在来自半导体处理室的流出物中。 在半导体制造过程控制和危险气体泄漏检测中发现了特殊的适用性。
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公开(公告)号：US5963336A
公开(公告)日：1999-10-05
申请号：US711781
申请日：1996-09-10
IPC分类号： C23C16/44 , G01J3/433 , G01N21/03 , G01N21/35 , G01N21/39 , H01L21/02 , G01N15/06 , G01N21/00
CPC分类号： G01N21/031 , C23C16/4412 , G01J3/433 , G01N21/3504 , G01N21/3554 , G01N21/39
摘要： Provided is a novel chamber effluent monitoring system. The system comprises a chamber having an exhaust line connected thereto. The exhaust line includes a sample region, wherein substantially all of a chamber effluent also passes through the sample region. The system further comprises an absorption spectroscopy measurement system for detecting a gas phase molecular species. The measurement system comprises a light source and a main detector in optical communication with the sample region through one or more light transmissive window. The light source directs a light beam into the sample region through one of the one or more light transmissive window. The light beam passes through the sample region and exits the sample region through one of the one or more light transmissive window. The main detector responds to the light beam exiting the sample region. The system allows for in situ measurement of molecular gas impurities in a chamber effluent, and in particular, in the effluent from a semiconductor processing chamber. Particular applicability is found in semiconductor manufacturing process control and hazardous gas leak detection.
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4.发明授权Chamber effluent monitoring system and semiconductor processing system comprising absorption spectroscopy measurement system, and methods of use 失效室内污水监测系统和半导体处理系统，包括吸收光谱测量系统和使用方法公开(公告)号：US06493086B1
公开(公告)日：2002-12-10
申请号：US09722610
申请日：2000-11-28
IPC分类号： G01N2100
CPC分类号： G01N21/031 , C23C16/4412 , G01J3/433 , G01N21/3504 , G01N21/3554 , G01N21/39
摘要： Provided is a novel chamber effluent monitoring system. The system comprises a chamber having an exhaust line connected thereto. The exhaust line includes a sample region, wherein substantially all of a chamber effluent also passes through the sample region. The system further comprises an absorption spectroscopy measurement system for detecting a gas phase molecular species. The measurement system comprises a light source and a main detector in optical communication with the sample region through one or more light transmissive window. The light source directs a light beam into the sample region through one of the one or more light transmissive window. The light beam passes through the sample region and exits the sample region through one of the one or more light transmissive window. The main detector responds to the light beam exiting the sample region. The system allows for in situ measurement of molecular gas impurities in a chamber effluent, and in particular, in the effluent from a semiconductor processing chamber. Particular applicability is found in semiconductor manufacturing process control and hazardous gas leak detection.
摘要翻译： 提供了一种新型室流出物监测系统。 该系统包括具有连接到其上的排气管的室。 排气管线包括样品区域，其中基本上所有的室排出物也通过样品区域。 该系统还包括用于检测气相分子种类的吸收光谱测量系统。 测量系统包括光源和主检测器，其通过一个或多个光透射窗与样品区域光学连通。 光源通过一个或多个透光窗中的一个将光束引导到样品区域中。 光束通过样品区域并通过一个或多个透光窗口之一离开样品区域。 主检测器响应离开样品区域的光束。 该系统允许原位测量室流出物中的分子气体杂质，特别是在来自半导体处理室的流出物中。 在半导体制造过程控制和危险气体泄漏检测中发现了特殊的适用性。
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公开(公告)号：US20050006310A1
公开(公告)日：2005-01-13
申请号：US10860599
申请日：2004-06-04
申请人： Rajat Agrawal , James McAndrew , Ikuo Hirase , Sylvie Lazure , Maurice Rignon , Hwa-Chi Wang , Nigel Betterton , Joseph Paganessi
发明人： Rajat Agrawal , James McAndrew , Ikuo Hirase , Sylvie Lazure , Maurice Rignon , Hwa-Chi Wang , Nigel Betterton , Joseph Paganessi
CPC分类号： B01J3/008 , B08B3/14 , B08B7/0021 , Y02P20/544
摘要： A fluid purification and recovery system includes a buffer section configured to receive a fluid delivered from a process station, where the fluid pressure is maintained within the buffer section within a predetermined range and the fluid is maintained within the buffer section in at least one of a gas state, a liquid state and a supercritical state. The system further includes a purification section disposed downstream from the buffer section to receive the fluid from the buffer section, where the purification section includes at least one purification unit that separates at least a portion of at least one component from the fluid. In one embodiment, the fluid is maintained in at least one of a liquid state and a supercritical state in both the buffer section and the purification section. In addition, the buffer section delivers the fluid to the purification with minimal or substantially no fluctuations in pressure.
摘要翻译： 流体净化和回收系统包括缓冲部分，其构造成接收从处理站传送的流体，其中在预定范围内将流体压力保持在缓冲部分内，并且将流体保持在缓冲部分内的至少一个中 气态，液态和超临界状态。 该系统还包括设置在缓冲部分下游以从缓冲部分接收流体的净化部分，其中净化部分包括至少一个净化单元，该净化单元将至少一部分组分的至少一部分与流体分离。 在一个实施方案中，流体在缓冲部分和净化部分中保持在液体状态和超临界状态中的至少一种状态。 此外，缓冲部分以最小或基本上没有压力波动将流体输送至净化。
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6.发明申请Electrochemical planarization system and method of electrochemical planarization 审中-公开电化学平面化系统及电化学平面化方法公开(公告)号：US20050218009A1
公开(公告)日：2005-10-06
申请号：US11025644
申请日：2004-12-29
申请人： Jinshan Huo , James McAndrew , Rajendra Solanki
发明人： Jinshan Huo , James McAndrew , Rajendra Solanki
摘要： Improved electrochemical planarization of an anode surface is performed by rotating either an anode or a cathode and applying a voltage therebetween. The cathode has a surface facing the anode and is configured such that the surface does not extend over all of the anode surface to be planarized during rotation of the anode or cathode. Preferably, the anode is a patterned or unpatterned semiconductor wafer with electroplated metal thereon, such as copper.
摘要翻译： 通过旋转阳极或阴极并在其间施加电压来进行阳极表面的改进的电化学平面化。 阴极具有面向阳极的表面，并且被配置为使得该表面在阳极或阴极旋转期间不延伸到待平坦化的所有阳极表面上。 优选地，阳极是其上具有电镀金属的图案化或未图案化的半导体晶片，例如铜。
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7.发明授权Process and device for measuring the amount of impurities in a gas sample to be analyzed 失效用于测量要分析的气体样品中的杂质量的方法和装置公开(公告)号：US06341521B1
公开(公告)日：2002-01-29
申请号：US09416758
申请日：1999-10-12
IPC分类号： G01N2111
CPC分类号： G01N21/3504 , G01N2021/3536 , G01N2021/354 , G01N2021/399
摘要： Provided is a process for measuring the amount of impurities in a gas sample filling a laser absorption spectroscopy analysis cell. The process includes calculating the value of a characteristic representative of the absorbance of the gas sample, from a measurement of the gas sample at a single given pressure, and quantifying the impurities on the basis of a predetermined law for the variation of the characteristic as a function of the amount of impurities. The characteristic is the ratio of the difference between the luminous intensity (Iana) of a light beam transmitted through the gas and the luminous intensity (Iref) of the incident beam to the luminous intensity (Iref) of the incident beam. The impurities are quantified on the basis of a value of the coefficient of proportionality between the amount of impurities and the characteristic, determined on the basis of a table of variation of the characteristic as a function of pressure, for a given amount of impurities.
摘要翻译： 提供了一种用于测量填充激光吸收光谱分析单元的气体样品中的杂质量的方法。 该过程包括从单一给定压力下的气体样品的测量值计算代表气体样品的吸光度的特性的值，并根据预定定律对特性的变化量化为杂质 功能量杂质。 特征是透过气体的光束的发光强度（Iana）与入射光束的发光强度（Iref）与入射光束的发光强度（Iref）之间的差值之比。 基于对于给定量的杂质，基于作为压力的函数的特性的变化表确定的杂质量与特性之间的比例系数的值来量化杂质。
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8.发明授权Method for rapidly determining an impurity level in a gas source or a gas distribution system 失效用于快速测定气体源或气体分配系统中的杂质水平的方法
公开(公告)号：US5714678A
公开(公告)日：1998-02-03
申请号：US757752
申请日：1996-11-26
CPC分类号： G01N33/0004
摘要： Provided is a novel method for rapidly determining an impurity level in a gas source. A gas source and a measurement tool are provided for measuring an impurity level in a gas flowing from the gas source. The measurement tool is in communication with the gas source through a sampling line. The sampling line has a gas inlet disposed upstream from a gas outlet. The sampling line is baked according to a baking strategy, such that when baking is terminated, a concentration profile of the impurity in the sampling line contains a first region and a second region. In the first region, extending from the gas inlet to a point downstream from the inlet, the vapor phase concentration of the impurity is less than the vapor phase concentration of the impurity in the gas entering the sampling line. In the second region, located downstream from the first region and extending to the gas outlet, the vapor phase concentration of the impurity is greater than the vapor phase concentration of the impurity in the gas entering the sampling line. A method for rapidly determining an impurity level in a gas distribution system which delivers gas to a point of use is also provided. Particular applicability is found in the semiconductor processing industry to measure impurities in gases delivered to processing tools.
摘要翻译： 提供了一种用于快速测定气源中的杂质水平的新方法。 气源和测量工具用于测量从气源流出的气体中的杂质浓度。 测量工具通过采样管与气源连通。 采样管线具有设置在气体出口上游的气体入口。 根据烘烤策略烘烤采样管，使得当烘烤终止时，采样管线中杂质的浓度分布包含第一区域和第二区域。 在从气体入口延伸到入口下游的第一区域中，杂质的气相浓度小于进入采样管线的气体中的杂质的气相浓度。 在位于第一区域下游并延伸到气体出口的第二区域中，杂质的气相浓度大于进入采样管线的气体中的杂质的气相浓度。 还提供了一种用于快速确定将气体输送到使用点的气体分配系统中的杂质水平的方法。 在半导体加工业中发现了特别适用于测量输送到加工工具中的气体中的杂质。
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公开(公告)号：US06499502B1
公开(公告)日：2002-12-31
申请号：US09584725
申请日：2000-06-01
IPC分类号： B08B500
CPC分类号： F17D1/04 , F17D3/14 , Y02E60/34 , Y10T137/0419 , Y10T137/4259 , Y10T137/87249
摘要： The subject of the present invention is a method and a device for filling a distribution line (20) with corrosive gas. The said method is a method for filling with gas, with passivation, a line (20) for distributing corrosive gas, which line is intended to distribute the said corrosive gas to a system (3) located immediately downstream of the said line (20); the said method comprising: prior conditioning of the said line (20); the actual filling of the said line (20) with the said corrosive gas known as an active gas. Characteristically, the said actual filling with gas comprises: at least one cycle of filling the said line (20) with active gas as far as immediately upstream of the system (3) and of removing the said active gas thus introduced into the said line (20); the said removal being performed without the said active gas passing through the said system (3); followed by the final filling of the said line (20) with gas so as to make the said gas available to the said system (3).
摘要翻译： 本发明的主题是用于用腐蚀性气体填充配电管线（20）的方法和装置。 所述方法是用于填充具有钝化的气体的方法，用于分配腐蚀性气体的管线（20），所述管线旨在将所述腐蚀性气体分配到位于所述管线（20）的紧邻下游的系统（3） ; 所述方法包括：对所述管线（20）进行预先调节;所述管线（20）的实际填充与所述腐蚀性气体称为活性气体。特别地，所述实际填充气体包括：至少一个循环 用活性气体直接在所述系统（3）的上游填充所述管线（20）并且将所述引入所述管线（20）的所述活性气体去除; 在没有所述活性气体通过所述系统（3）的情况下执行所述去除;随后用气体最终填充所述管线（20），以使所述气体可用于所述系统（3）。
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10.发明授权Method and system for sensitive detection of molecular species in a vacuum by harmonic detection spectroscopy 失效通过谐波检测光谱法在真空中敏感检测分子物种的方法和系统
公开(公告)号：US5880850A
公开(公告)日：1999-03-09
申请号：US951301
申请日：1997-10-16
申请人： James McAndrew , Ronald S. Inman
发明人： James McAndrew , Ronald S. Inman
CPC分类号： G01N21/39 , G01J3/4338
摘要： Provided is a novel method and system for harmonic detection spectroscopy. The method comprises providing a cell having a sample region which is circumscribed by at least one wall. The cell has at least one light entry/exit port, with each entry/exit port containing a light transmissive window having a surface facing the sample region and disposed so as to seal the cell in the circumferential direction. A sample gas flows through the sample region in a direction parallel to a cell central axis, and the cell operates at less than atmospheric pressure. A frequency and/or amplitude modulated light source is provided for directing a light beam through one of the at least one light transmissive windows into the cell. The light source modulation amplitude is set to a value which approximately maximizes the value of a harmonic signal at the center of the absorption feature due to the detected gas phase molecular species inside the sample region, and the center frequency of the light source is adjusted so that it is either locked to the center of the absorption feature or repetitively scanned over the frequency range which includes the feature. A spectra is then generated which may be recorded individually or averaged. A detector is provided for measuring the light beam exiting the cell through one of the at least one light transmissive windows. The light source and detector are contained within a chamber which is external to the cell and isolated from the sample region, the chamber and the sample region being placed in optical communication with each other through at least one of the at least one light transmissive windows. The pressure inside the chamber is controlled to a value which is positive relative to atmospheric pressure. The method can be used to detect gas phase molecular species in a sample. Particular applicability is found in semiconductor processing.
摘要翻译： 提供了一种用于谐波检测光谱的新颖方法和系统。 该方法包括提供具有被至少一个壁限定的样品区域的细胞。 电池具有至少一个光入口/出口，每个入口/出口包含透光窗口，该透光窗口具有面向样品区域的表面，并设置成在圆周方向上密封电池。 样品气体在平行于细胞中心轴线的方向上流过样品区域，并且细胞在小于大气压力下操作。 提供了频率和/或幅度调制光源，用于将光束引导通过至少一个透光窗中的一个进入单元。 由于检测到的样品区域内的气相分子种类，光源调制幅度被设定为大致使吸收特征中心处的谐波信号的值最大化的值，并且调整光源的中心频率 它被锁定到吸收特征的中心或在包括该特征的频率范围上重复扫描。 然后产生可以单独记录或平均记录的光谱。 提供了一种检测器，用于通过至少一个透光窗中的一个来测量离开单元的光束。 光源和检测器被包含在室内并且与样品区隔离的腔室中，腔室和样品区域通过至少一个透光窗口中的至少一个彼此光学连通。 室内的压力被控制为相对于大气压力为正的值。 该方法可用于检测样品中的气相分子种类。 在半导体处理中发现了特殊的适用性。
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