High precision flexure stage
    1.
    发明授权
    High precision flexure stage 失效
    高精度弯曲台

    公开(公告)号:US06555829B1

    公开(公告)日:2003-04-29

    申请号:US09481103

    申请日:2000-01-10

    IPC分类号: G01B902

    摘要: Disclosed is a positioning stage for precisely positioning an object within a limited range of travel (e.g. 100 &mgr;m). By way of example, the stage can be used to position an electron source such as a field emitter in an electron beam microcolumn. The stage includes a block which defines a channel to allow flexure along a first axis. The block also defines another channel to allow flexure along a second axis perpendicular to the first axis. Using actuators in the channels to flex a portion of the block, the object supported by the block can be precisely positioned to a desired location in a horizontal plane defined by the first and second axes.

    摘要翻译: 公开了一种用于在有限的旅行范围内(例如,100mum)精确地定位物体的定位台。 作为示例,该级可用于将诸如场致发射体的电子源定位在电子束微柱中。 舞台包括限定通道以允许沿着第一轴弯曲的块。 该块还限定另一个通道,以允许沿垂直于第一轴线的第二轴线弯曲。 使用通道中的致动器来弯曲块的一部分,由块支撑的物体可精确地定位在由第一和第二轴限定的水平平面中的期望位置。

    MEMS structure with mechanical overdeflection limiter
    8.
    发明授权
    MEMS structure with mechanical overdeflection limiter 有权
    具有机械超限制器件的MEMS结构

    公开(公告)号:US06805454B2

    公开(公告)日:2004-10-19

    申请号:US10625883

    申请日:2003-07-22

    IPC分类号: G02B7182

    摘要: A MEMS device having a fixed element and a movable element wherein one or the other of the fixed element and the movable element has at least one radially-extended stop or overdeflection limiter. A fixed overlayer plate forms an aperture. The aperture is sized to minimize vignetting and may be beveled on the margin. Overdeflection limitation occurs during deflection before the movable element can impinge on an underlying electrode. The overdeflection limiter may be conveniently placed adjacent a gimbaled hinge.

    摘要翻译: 具有固定元件和可移动元件的MEMS器件,其中固定元件和可移动元件中的一个或另一个具有至少一个径向延伸的止动或超限制器。 固定的覆盖板形成孔。 孔径的大小可使晕影最小化,并可在边缘上倾斜。 在可移动元件可能撞击下面的电极之前,在偏转期间发生过度偏差限制。 过度限制器可以方便地放置在万向铰链附近。

    MEMS structure with mechanical overdeflection limiter
    9.
    发明授权
    MEMS structure with mechanical overdeflection limiter 有权
    具有机械超限制器件的MEMS结构

    公开(公告)号:US06641273B1

    公开(公告)日:2003-11-04

    申请号:US10186566

    申请日:2002-06-28

    IPC分类号: G02B7182

    摘要: A MEMS device having a fixed element and a movable element wherein one or the other of the fixed element and the movable element has at least one radially-extended stop or overdeflection limiter. A fixed overlayer plate forms an aperture. The aperture is sized to minimize vignetting and may be beveled on the margin. Overdeflection limitation occurs during deflection before the movable element can impinge on an underlying electrode. The overdeflection limiter may be conveniently placed adjacent a gimbaled hinge.

    摘要翻译: 具有固定元件和可移动元件的MEMS器件,其中固定元件和可移动元件中的一个或另一个具有至少一个径向延伸的止动或超限制器。 固定的覆盖板形成孔。 孔径的大小可使晕影最小化,并可在边缘上倾斜。 在可移动元件可能撞击下面的电极之前,在偏转期间发生过度偏差限制。 过度限制器可以方便地放置在万向铰链附近。

    Silicon tip field emission cathode arrays and fabrication thereof
    10.
    发明授权
    Silicon tip field emission cathode arrays and fabrication thereof 失效
    硅尖端场发射阴极阵列及其制造

    公开(公告)号:US5199917A

    公开(公告)日:1993-04-06

    申请号:US803986

    申请日:1991-12-09

    IPC分类号: H01J9/02

    CPC分类号: B82Y10/00 H01J9/025

    摘要: Through a silicon fabrication process, an emitter tip array is produced by electron beam or other suitable submicrometer scale lithography for precise location of the emitters. The emitter tips are formed by an oxidation process which ensures accurate and precise formation of tips having uniform radii. The process also utilizes the oxidation step to precisely align gate electrode apertures with respect to corresponding emitter tips so that large arrays can be formed with great accuracy and reliability.

    摘要翻译: 通过硅制造工艺,通过电子束或其他合适的亚微米级光刻产生发射极尖端阵列,用于发射器的精确定位。 发射极尖端通过氧化工艺形成,其确保准确且准确地形成具有均匀半径的尖端。 该方法还利用氧化步骤相对于相应的发射极尖端精确对准栅极电极孔,使得可以以高精度和可靠性形成大阵列。