公开(公告)号：US20180040856A1

公开(公告)日：2018-02-08

申请号：US15644923

申请日：2017-07-10

申请人： Japan Display Inc.

发明人： Takaaki ISHIKAWA ,  Takaaki KAMIMURA ,  Noriyuki HIRATA

IPC分类号： H01L51/56 ,  H01L27/32 ,  C23C14/24 ,  H01L51/00

CPC分类号： H01L51/56 ,  C23C14/24 ,  C23C14/568 ,  H01L21/67173 ,  H01L21/67184 ,  H01L21/67745 ,  H01L21/67748 ,  H01L21/67751 ,  H01L27/3246 ,  H01L51/0008 ,  H01L51/0021

摘要： Disclosed is a manufacturing apparatus of a light-emitting element including: a main transporting route extending in a first direction, the main transporting route comprising first and second transfer devices connected through a first transporting chamber; a sub-transporting route extending in a second direction intersecting the first direction, the sub-transporting route comprising a second transporting chamber connected to the first or second transfer device and a delivery chamber connected to the second transfer chamber; and a plurality of first treatment chambers connected to the delivery chamber. The main transporting route is configured to transfer a substrate to be treated in a horizontal state, and one of the plurality of treatment chambers is configured to hold the substrate in a vertical state during treatment.

公开(公告)号：US20150303220A1

公开(公告)日：2015-10-22

申请号：US14688339

申请日：2015-04-16

申请人： Japan Display Inc.

发明人： Takaaki KAMIMURA ,  Noriyuki HIRATA

IPC分类号： H01L27/12 ,  H01L29/417 ,  H01L21/3213 ,  H01L29/40 ,  H01L29/66 ,  H01L21/3105

CPC分类号： H01L27/1218 ,  H01L21/02063 ,  H01L21/31111 ,  H01L21/32134 ,  H01L27/1259 ,  H01L29/66757

摘要： According to one embodiment, a substrate for display device includes an insulating substrate and a conductive film formed on at least one main surface of the insulating substrate. As to the substrate in an etching process in which a fluoric acid solution containing 10% or more hydrogen fluoride is used, a first etching rate of the conductive film is substantially the same as a second etching rate of the insulating substrate, or the first etching rate is greater than the second etching rate.

摘要翻译： 根据一个实施例，用于显示装置的基板包括绝缘基板和形成在绝缘基板的至少一个主表面上的导电膜。 对于使用含有10％以上氟化氢的氟酸溶液的蚀刻工序中的基板，导电膜的第一蚀刻速度与绝缘基板的第二蚀刻速度基本相同，或者第一蚀刻 速率大于第二蚀刻速率。

公开(公告)号：US20170229525A1

公开(公告)日：2017-08-10

申请号：US15498203

申请日：2017-04-26

申请人： Japan Display Inc.

发明人： Takaaki KAMIMURA ,  Noriyuki HIRATA

IPC分类号： H01L27/32 ,  H01L51/56 ,  H01L51/00

CPC分类号： H01L27/3223 ,  H01L27/3248 ,  H01L27/3255 ,  H01L51/0097 ,  H01L51/5271 ,  H01L51/529 ,  H01L51/56 ,  H01L2227/323 ,  H01L2251/5338

摘要： According to one embodiment, an organic EL device includes an insulating substrate including a first main surface and a second main surface, a switching element formed on the insulating substrate at the first main surface side, a first electrode electrically connected to the switching element, a second electrode opposed to the first electrode, an organic luminescent layer disposed between the first electrode and the second electrode, a reflective plate disposed between the insulating substrate and the first electrode, and a conductive film covering the second main surface of the insulating substrate.

公开(公告)号：US20150219948A1

公开(公告)日：2015-08-06

申请号：US14614611

申请日：2015-02-05

申请人： Japan Display, Inc.

发明人： Takaaki KAMIMURA ,  Noriyuki HIRATA

IPC分类号： G02F1/1333 ,  G02F1/133 ,  G02F1/1335 ,  G02F1/1339 ,  G02F1/1343 ,  G02F1/1337

CPC分类号： G02F1/13338 ,  G02F1/134336 ,  G06F3/0412 ,  G06F3/044 ,  G06F2203/04103

摘要： According to one embodiment, a display device includes a first substrate including a first insulating substrate, a second substrate including a second insulating substrate, a light modulation layer, a first electrode of a strip shape extending in a first direction, a plurality of conductive wiring lines extending in a second direction crossing the first direction, configured to selectively transmit a desired polarized light component of incident light, a second electrode configured to optically change the light modulation layer in cooperation with the first electrode, and a detection circuit configured to detect a change in capacitance between the first electrode and the conductive wiring lines.

摘要翻译： 根据一个实施例，显示装置包括：第一基板，包括第一绝缘基板;第二基板，包括第二绝缘基板;光调制层;沿第一方向延伸的带状第一电极;多个导电布线 沿与第一方向交叉的第二方向延伸的线，被配置为选择性地透射入射光的所需偏振光分量;配置为与第一电极协作光学地改变光调制层的第二电极;以及检测电路， 第一电极和导电布线之间的电容变化。

公开(公告)号：US20230422583A1

公开(公告)日：2023-12-28

申请号：US18340041

申请日：2023-06-23

申请人： Japan Display Inc.

发明人： Daisuke KATO ,  Hiraaki KOKAME ,  Noriyuki HIRATA

IPC分类号： H10K59/80 ,  H10K59/12

CPC分类号： H10K59/8731 ,  H10K59/1201

摘要： According to one embodiment, a manufacturing method of a display device includes preparing a processing substrate by forming a lower electrode, forming a rib, and forming a partition, forming an organic layer on the lower electrode, forming an upper electrode on the organic layer, forming a cap layer on the upper electrode, forming a sealing layer on the cap layer, forming a patterned resist on the sealing layer, and removing the sealing layer exposed from the resist by dry etching. The sealing layer includes a first high-density layer and a low-density layer. When dry etching is applied to the sealing layer, an etching rate of the low-density layer is greater than an etching rate of the first high-density layer.

公开(公告)号：US20230389355A1

公开(公告)日：2023-11-30

申请号：US18324192

申请日：2023-05-26

申请人： Japan Display Inc.

发明人： Noriyuki HIRATA ,  Hiraaki KOKAME

IPC分类号： H10K59/12 ,  H01J37/32 ,  H10K59/80 ,  C23C16/458 ,  C23C16/455 ,  C23C16/34 ,  C23C16/56 ,  C23C16/50 ,  C23C16/44

CPC分类号： H10K59/1201 ,  H01J37/32357 ,  H01J37/32862 ,  H01J37/32449 ,  H10K59/873 ,  C23C16/4583 ,  C23C16/45565 ,  C23C16/345 ,  C23C16/56 ,  C23C16/50 ,  C23C16/4405 ,  H01J2237/334

摘要： According to one embodiment, a manufacturing method of a display device includes forming a sealing layer. The forming the sealing layer includes a deposition process of introducing a material gas into a chamber, depositing silicon nitride on a processing substrate, stopping introduction of the material gas and evacuating a residual gas of inside of the chamber, and an etching process of introducing a cleaning gas into the chamber through a same route as the material gas, performing anisotropic dry etching for removing part of the silicon nitride deposited on the processing substrate, and evacuating a residual gas of the inside of the chamber. A combination of the deposition process and the etching process is performed at least twice.

公开(公告)号：US20240243017A1

公开(公告)日：2024-07-18

申请号：US18391670

申请日：2023-12-21

申请人： Japan Display Inc.

发明人： Satoru TOMITA ,  Noriyuki HIRATA

IPC分类号： H01L21/66 ,  G06T7/00 ,  G06T7/60 ,  H10K59/12

CPC分类号： H01L22/12 ,  G06T7/0004 ,  G06T7/60 ,  H10K59/1201 ,  H10K59/122

摘要： According to one embodiment, a measuring method includes forming a partition including a lower portion provided on a base and an upper portion which protrudes from a side surface of the lower portion, acquiring a first image generated by applying an electron beam to the partition for each of elements constituting the partition, analyzing the first image for each element, and measuring a protrusion amount of an end portion of the upper portion from the side surface of the lower portion based on the analysis result.

公开(公告)号：US20230284482A1

公开(公告)日：2023-09-07

申请号：US18174660

申请日：2023-02-27

申请人： Japan Display Inc.

发明人： Toshifumi MIMURA ,  Noriyuki HIRATA

IPC分类号： H10K59/122 ,  H10K59/12 ,  H10K59/80

CPC分类号： H10K59/122 ,  H10K59/1201 ,  H10K59/873

摘要： According to one embodiment, a display device includes a first lower electrode and a second lower electrode, a rib, a partition including a lower portion and an upper portion, a first organic layer disposed on the first lower electrode, a second organic layer disposed on the second lower electrode, a first upper electrode disposed on the first organic layer, a second upper electrode disposed on the second organic layer, a first sealing layer disposed above the first upper electrode, and a second sealing layer disposed above the second upper electrode. A thickness of the first sealing layer directly above the first lower electrode is 0.5 times or more, and less than twice a thickness of the lower portion of the partition.

公开(公告)号：US20230269991A1

公开(公告)日：2023-08-24

申请号：US18171762

申请日：2023-02-21

申请人： Japan Display Inc.

发明人： Toshifumi MIMURA ,  Hiraaki KOKAME ,  Kaichi FUKUDA ,  Atsushi TAKEDA ,  Noriyuki HIRATA

IPC分类号： H10K59/80

CPC分类号： H10K59/871

摘要： According to one embodiment, a display device includes first and second lower electrodes, a rib, a partition including a lower portion and an upper portion, a first organic layer disposed on the first lower electrode, a second organic layer disposed on the second lower electrode, a first upper electrode disposed on the first organic layer, a second upper electrode disposed on the second organic layer, a first sealing layer disposed above the first upper electrode, in contact with the lower portion and extending to above the upper portion and a second sealing layer disposed above the second upper electrode, in contact with the lower portion, extending to above the upper portion, and spaced apart from the first sealing layer.