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公开(公告)号：US06307682B1
公开(公告)日：2001-10-23
申请号：US09504719
申请日：2000-02-16
IPC分类号： G02B1322
CPC分类号： G03F7/70183 , G02B3/005 , G03F7/70075
摘要： The present invention provides an illumination system for varying the size of an illumination field incident to a scattering optical element. The illumination field is subsequently imaged to a reticle in a photolithographic process. The illumination system includes, in series along an optical axis of the illumination system, an optical source, a beam conditioner, a first optical integrator, a first or input collimating lens, a zoom array integrator (ZAI), a second or output collimating lens, the optical scattering element, a relay lens, and the reticle. The ZAI includes an assembly of fixed and moveable lens components arranged to vary the size of the illumination field throughout a zoom range of the ZAI while maintaining telecentric illumination at a substantially fixed numerical aperture. Illumination telecentricity and substantially fixed numerical apertures are maintained at both the scattering optical element and the reticle throughout the zoom range.
摘要翻译： 本发明提供一种用于改变入射到散射光学元件的照明场的尺寸的照明系统。 照射场随后在光刻工艺中成像到掩模版。 照明系统沿照明系统的光轴串联包括光源，光束调节器，第一光学积分器，第一或输入准直透镜，变焦阵列积分器（ZAI），第二或输出准直透镜 ，光散射元件，中继透镜和掩模版。 ZAI包括固定和可移动透镜组件的组件，其被布置成在ZAI的整个变焦范围内改变照明场的大小，同时将远心照明保持在基本上固定的数值孔径。 在整个变焦范围内，散射光学元件和掩模版都保持照明远心度和基本固定的数值孔径。
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公开(公告)号：US20170053094A1
公开(公告)日：2017-02-23
申请号：US14829172
申请日：2015-08-18
CPC分类号： G06F19/3456 , G06K9/00 , G06Q10/083 , G06Q10/10 , G06Q50/22 , G16H20/10
摘要： An electronic image of a paper prescription is received; prescription information is extracted from the image, and a communication is sent to the prescribing physician for approval. If approval is received, delivery of the medication to the patient is approved.
摘要翻译： 收到纸张处方的电子图像; 从图像中提取处方信息，并将通信发送给处方医师进行批准。 如果获得批准，则批准向药物递送药物。
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公开(公告)号：US06947192B2
公开(公告)日：2005-09-20
申请号：US10759699
申请日：2004-01-19
CPC分类号： G03F7/70075 , G02B1/02 , G02B27/0043 , G02B27/28 , G03F7/70216 , G03F7/70241 , G03F7/70966 , Y10S438/942
摘要： An optical system includes multiple cubic crystalline optical elements aligned along a common optical axis and having their crystal lattices oriented with respect to each other to minimize the effects of intrinsic birefringence and produce a system with reduced retardance. The optical system may be a refractive or catadioptric system having a high numerical aperture and using light with a wavelength at or below 248 nanometers. The net retardance of the system is less than the sum of the retardance contributions of the respective optical elements as the elements are oriented such that the intrinsic birefringences of the individual elements cancel each other out. In one embodiment, two [110] cubic crystalline optical elements are clocked with respect to one another and used in conjunction with a [100] cubic crystalline optical element to reduce retardance. Various birefringent elements, wave plates, and combinations thereof provide additional correction for residual retardance and wavefront aberrations. The optical system may be used in a photolithography tool to pattern substrates such as semiconductor substrates and thereby produce semiconductor devices.
摘要翻译： 光学系统包括沿着公共光轴对准的多个立方晶体光学元件，并且使它们的晶格相对于彼此取向以最小化固有双折射的影响并产生具有减小的延迟的系统。 光学系统可以是具有高数值孔径的折射或反射折射系统，并且使用具有或低于248纳米的波长的光。 系统的净延迟小于各个光学元件的延迟贡献的总和，因为元件被定向成使得各个元件的固有双折射彼此抵消。 在一个实施例中，两个[110]立方晶体光学元件相对于彼此计时，并与[100]立方晶体光学元件结合使用以减少延迟。 各种双折射元件，波片及其组合为残余延迟和波前像差提供额外的校正。 光学系统可以用于光刻工具中以图案化诸如半导体衬底的衬底，从而制造半导体器件。
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4.发明授权Semiconductor device and method for forming the same using cubic crystalline optical system with reduced birefringence 有权使用具有降低的双折射的立方晶系的半导体器件及其形成方法公开(公告)号：US06885488B2
公开(公告)日：2005-04-26
申请号：US10371269
申请日：2003-02-20
IPC分类号： G02B13/24 , G02B17/08 , G02B27/28 , G03F7/20 , H01L21/027 , G02F1/07 , H01L21/00 , H01L29/26
CPC分类号： G03F7/70075 , G02B1/02 , G02B27/0043 , G02B27/28 , G03F7/70216 , G03F7/70241 , G03F7/70966 , Y10S438/942
摘要： An optical system includes multiple cubic crystalline optical elements aligned along a common optical axis and having their crystal lattices oriented with respect to each other to minimize the effects of intrinsic birefringence and produce a system with reduced retardance. The optical system may be a refractive or catadioptric system having a high numerical aperture and using light with a wavelength at or below 248 nanometers. The net retardance of the system is less than the sum of the retardance contributions of the respective optical elements as the elements are oriented such that the intrinsic birefringences of the individual elements cancel each other out. In one embodiment, two [110] cubic crystalline optical elements are clocked with respect to one another and used in conjunction with a [100] cubic crystalline optical element to reduce retardance. Various birefringent elements, wave plates, and combinations thereof provide additional correction for residual retardance and wavefront aberrations. The optical system may be used in a photolithography tool to pattern substrates such as semiconductor substrates and thereby produce semiconductor devices.
摘要翻译： 光学系统包括沿着公共光轴对准的多个立方晶体光学元件，并且使它们的晶格相对于彼此取向以最小化固有双折射的影响并产生具有减小的延迟的系统。 光学系统可以是具有高数值孔径的折射或反射折射系统，并且使用具有或低于248纳米的波长的光。 系统的净延迟小于各个光学元件的延迟贡献的总和，因为元件被定向成使得各个元件的固有双折射彼此抵消。 在一个实施例中，两个[110]立方晶体光学元件相对于彼此计时，并与[100]立方晶体光学元件结合使用以减少延迟。 各种双折射元件，波片及其组合为残余延迟和波前像差提供额外的校正。 光学系统可以用于光刻工具中以图案化诸如半导体衬底的衬底，从而制造半导体器件。
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公开(公告)号：US06917458B2
公开(公告)日：2005-07-12
申请号：US10371266
申请日：2003-02-20
CPC分类号： G03F7/70075 , G02B1/02 , G02B27/0043 , G02B27/28 , G03F7/70216 , G03F7/70241 , G03F7/70966 , Y10S438/942
摘要： An optical system includes multiple cubic crystalline optical elements aligned along a common optical axis and having their crystal lattices oriented with respect to each other to minimize the effects of intrinsic birefringence and produce a system with reduced retardance. The optical system may be a refractive or catadioptric system having a high numerical aperture and using light with a wavelength at or below 248 nanometers. The net retardance of the system is less than the sum of the retardance contributions of the respective optical elements as the elements are oriented such that the intrinsic birefringences of the individual elements cancel each other out. In one embodiment, two [110] cubic crystalline optical elements are clocked with respect to one another and used in conjunction with a [100] cubic crystalline optical element to reduce retardance. Various birefringent elements, wave plates, and combinations thereof provide additional correction for residual retardance and wavefront aberrations. The optical system may be used in a photolithography tool to pattern substrates such as semiconductor substrates and thereby produce semiconductor devices.
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6.发明授权Large-area, scan-and-repeat, projection patterning system with unitary stage and magnification control capability 失效大面积，扫描和重复，投影图案化系统具有整体级和放大控制能力
公开(公告)号：US5710619A
公开(公告)日：1998-01-20
申请号：US551134
申请日：1995-10-31
申请人： Kanti Jain , Jeffrey M. Hoffman
发明人： Kanti Jain , Jeffrey M. Hoffman
CPC分类号： G03F7/70241 , G03F7/70358 , G03F7/70791
摘要： In numerous applications of large-area patterning systems, the preferred image magnification is unity. However, in some applications, the size of the substrate may change slightly due to various thermal and/or chemical processing steps. To compensate for scale changes of the substrate, the magnification of the imaging system must vary slightly from unit magnification (typically by a fraction of a percentage) so that a layer already patterned on the substrate will have, after processing, proper image registration with the subsequent layer. This disclosure describes a lithography system for exposing large substrates at high imaging resolution and high exposure throughput, and specifically relates to a scan-and-repeat patterning system that employs a unitary mask-substrate stage and enables projection imaging of a substrate with capability to control the image magnification to compensate for changes of substrate dimensions occurring as a result of previous process steps. A combination of optical and mechanical compensation is used to provide the necessary magnification control, including anamorphic magnification variation in which the fine adjustment is of different magnitudes in x and y dimensions. The optical control is provided by a projection lens with anamorphic magnification adjustment capability. The mechanical compensation is performed by providing a differential relative velocity between the mask and substrate during scanning.
摘要翻译： 在大面积图案化系统的许多应用中，优选的图像放大率是一致的。 然而，在一些应用中，由于各种热和/或化学处理步骤，衬底的尺寸可能略有变化。 为了补偿基板的尺度变化，成像系统的放大率必须从单位放大率（通常为百分比的百分比）稍微变化，使得已经在基板上图案化的层将在处理之后具有适当的图像配准 后续层。 本公开描述了一种用于以高成像分辨率和高曝光生产量暴露大型衬底的光刻系统，具体涉及采用单一掩模衬底级并且能够对具有控制能力的衬底进行投影成像的扫描和重复图案形成系统 图像放大率以补偿由于先前的工艺步骤而发生的衬底尺寸的变化。 使用光学和机械补偿的组合来提供必要的放大率控制，包括在x和y尺寸上精细调节具有不同幅度的变形放大变化。 光学控制由具有变形放大调节能力的投影透镜提供。 通过在扫描期间在掩模和衬底之间提供差分相对速度来执行机械补偿。
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公开(公告)号：US5696631A
公开(公告)日：1997-12-09
申请号：US605426
申请日：1996-02-22
申请人： Jeffrey M. Hoffman
发明人： Jeffrey M. Hoffman
CPC分类号： G03F7/70216 , G02B13/143 , G02B13/22 , G02B13/26
摘要： A unit magnification lens system suitable for imaging of features in photoresist designed for exposure at a wavelength of 248.4 nm using a krypton fluoride excimer laser. This lens system is characterized by a very long working distance in the object and image spaces to allow incorporation of minors in the imaging path. The optical system is refractive, telecentric, and symmetrical about the central aperture stop.
摘要翻译： 适用于使用氪氟化物准分子激光器设计用于在248.4nm的波长下曝光的光致抗蚀剂中的特征成像的单位放大透镜系统。 该透镜系统的特征在于在物体和图像空间中具有非常长的工作距离，以允许将未成年人并入成像路径。 光学系统是围绕中心孔径光阑的折射，远心和对称的。
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公开(公告)号：US07075696B2
公开(公告)日：2006-07-11
申请号：US11251959
申请日：2005-10-18
CPC分类号： G03F7/70075 , G02B1/02 , G02B27/0043 , G02B27/28 , G03F7/70216 , G03F7/70241 , G03F7/70966 , Y10S438/942
摘要： A lithographic apparatus includes a projection system, which includes a plurality of cubic crystalline optical elements that each impart retardance to a beam of radiation. The optical elements are aligned along an optical axis of the projection system and include two adjacent crystalline optical elements having a common crystalline lattice direction oriented along the optical axis. A first of the two adjacent elements is rotated about the optical axis with respect to a second of the adjacent elements with a predetermined rotation angle. The crystalline optical elements are selected and positioned along the optical axis and the rotation angle is selected such that, for each of two substantially perpendicular polarization states of the beam of radiation having a radiation wavelength of about 193 nm, the patterned beam of radiation has less than about 0.012 waves RMS of wavefront aberration across an exit pupil of the projection system.
摘要翻译： 光刻设备包括投影系统，其包括多个立方晶体光学元件，每个立方结晶光学元件赋予辐射束的延迟。 光学元件沿着投影系统的光轴对准，并且包括具有沿着光轴取向的共同晶格方向的两个相邻的晶体光学元件。 两个相邻元件中的第一个以相对于第二相邻元件的光轴以预定的旋转角度旋转。 结晶光学元件被选择并沿着光轴定位，并且选择旋转角度使得对于具有约193nm的辐射波长的辐射束的两个基本垂直的偏振态中的每一个，图案化的辐射束具有较小的 比投影系统的出射光瞳的波前像差大约为0.012波RMS。
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公开(公告)号：US07072124B2
公开(公告)日：2006-07-04
申请号：US10602128
申请日：2003-06-24
CPC分类号： G02B7/002 , G02B23/00 , G02B25/004 , G02C7/088
摘要： A magnification loupe carried by spectacles has a Galilean lens system comprising a single-element eyepiece lens and a two-element objective lens. The loupes may be mounted to eyeglass frames by a flip-up mounting member, or they may be mounted through the eyeglass lenses of the spectacles. The loupes provide high magnification while minimizing weight to thereby reduce strain and discomfort to users. In an exemplary embodiment, the objective lens has a non-circular shape that provides a wide field of view while further minimizing the weight of the loupe. A correction lens may be interchangeably coupled to the loupe housing to permit selective replacement with another correction lens to vary the working distance of the loupe.
摘要翻译： 由眼镜携带的放大倍率放大镜具有包括单元件目镜和双元件物镜的伽利略透镜系统。 放大镜可以通过翻转安装构件安装到眼镜框架上，或者它们可以通过眼镜的眼镜镜片安装。 放大镜提供高放大倍数，同时使重量最小化，从而减轻使用者的紧张和不适。 在示例性实施例中，物镜具有提供宽视场的非圆形形状，同时进一步最小化放大镜的重量。 校正透镜可以可互换地耦合到放大镜壳体，以允许用另一校正透镜选择性地更换以改变放大镜的工作距离。
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公开(公告)号：US07009769B2
公开(公告)日：2006-03-07
申请号：US10921345
申请日：2004-08-19
CPC分类号： G03F7/70075 , G02B1/02 , G02B27/0043 , G02B27/28 , G03F7/70216 , G03F7/70241 , G03F7/70966 , Y10S438/942
摘要： A photolithography tool including an optical system for transmitting a beam of radiation toward a substrate is presented. The optical system includes a plurality of calcium fluoride lens elements, optically transmissive of the beam of radiation, each having respective optical axes and imparting a retardance to the beam. The plurality of calcium fluoride lens elements are aligned along an optical path for propagation of the beam of radiation therethrough. Each of the calcium fluoride lens elements includes a cubic crystalline calcium fluoride that is aligned with its [111] lattice direction, or a lattice direction optically equivalent to the [111] lattice direction, substantially parallel with its optical axis. A first calcium fluoride lens element of the plurality of calcium fluoride lens elements is rotated about its optical axis with respect to a second calcium fluoride lens element. The optical system has less than or about 0.015 waves RMS of wavefront aberration.
摘要翻译： 提出了一种光刻工具，其包括用于将辐射束发射到衬底的光学系统。 光学系统包括多个氟化钙透镜元件，光学透射辐射束，每个具有相应的光轴并赋予光束延迟。 多个氟化钙透镜元件沿着光路对齐，用于辐射束的传播。 每个氟化钙透镜元件包括与其[111]晶格方向对准的立方晶体氟化钙或与[111]晶格方向光学相当的基本平行于其光轴的晶格方向。 多个氟化钙透镜元件的第一个氟化钙透镜元件相对于第二氟化钙透镜元件围绕其光轴旋转。 光学系统具有波前像差小于或约0.015波RMS。
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