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    Erosion resistant yttrium comprising metal with oxidized coating for plasma chamber components
    1.
    发明申请
    Erosion resistant yttrium comprising metal with oxidized coating for plasma chamber components 有权
    防腐蚀钇含有金属氧化涂层，用于等离子体室部件

    公开(公告)号：US20090162647A1

    公开(公告)日：2009-06-25

    申请号：US12004907

    申请日：2007-12-21

    申请人： Jennifer Y. Sun ,  Li Xu ,  Kenneth S. Collins ,  Thomas Graves ,  Ren-Guan Duan ,  Senh Thach

    发明人： Jennifer Y. Sun ,  Li Xu ,  Kenneth S. Collins ,  Thomas Graves ,  Ren-Guan Duan ,  Senh Thach

    IPC分类号： B32B15/04 ,  B05D3/00

    CPC分类号： C23C16/4404 ,  H01J37/32467 ,  H01J37/32477

    摘要： An article which is resistant to corrosion or erosion by chemically active plasmas and a method of making the article are described. The article is comprised of a metal or metal alloy substrate having on its surface a coating which is an oxide of the metal or metal alloy. The structure of the oxide coating is columnar in nature. The grain size of the crystals which make up the oxide is larger at the surface of the oxide coating than at the interface between the oxide coating and the metal or metal alloy substrate, and wherein the oxide coating is in compression at the interface between the oxide coating and the metal or metal alloy substrate. Typically the metal is selected from the group consisting of yttrium, neodymium, samarium, terbium, dysprosium, erbium, ytterbium, scandium, hafnium, niobium or combinations thereof.

    摘要翻译： 描述了耐化学活性等离子体腐蚀或侵蚀的制品以及制造该制品的方法。 该制品由金属或金属合金基材组成，其表面上具有金属或金属合金的氧化物的涂层。 氧化物涂层的结构本质上是柱状的。 构成氧化物的晶体的晶粒尺寸在氧化物涂层的表面比在氧化物涂层和金属或金属合金基底之间的界面处的晶粒尺寸大，并且其中氧化物涂层在氧化物之间的界面处被压缩 涂层和金属或金属合金基材。 通常，金属选自钇，钕，钐，铽，镝，铒，镱，钪，铪，铌或其组合。

    FILLED POLYMER COMPOSITION FOR ETCH CHAMBER COMPONENT
    2.
    发明申请
    FILLED POLYMER COMPOSITION FOR ETCH CHAMBER COMPONENT 审中-公开
    用于蚀刻室组件的填充聚合物组合物

    公开(公告)号：US20100140222A1

    公开(公告)日：2010-06-10

    申请号：US12632712

    申请日：2009-12-07

    申请人： Jennifer Y. Sun ,  Ren-Guan Duan ,  Senh Thach ,  Li Xu

    发明人： Jennifer Y. Sun ,  Ren-Guan Duan ,  Senh Thach ,  Li Xu

    IPC分类号： C08K3/10 ,  C08K3/16 ,  C08K3/28 ,  C08K3/08 ,  C08K3/34 ,  C08K3/22 ,  B32B7/12 ,  C23F1/02 ,  C23F1/08

    CPC分类号： C09K3/10 ,  Y10T428/2857

    摘要： A filled polymer composition having improved plasma resistance is disclosed. The composition includes a particle filler dispersed in a polymer matrix. The particle filler can be Nb2O5, YF3, AlN, SiC or Si3N4 and rare earth oxides. In an embodiment, the composition is utilized as a bonding adhesive for electrostatic chuck, bonding adhesive for shower head, bonding adhesive for liner, sealing material, O-ring, or plastic component.

    摘要翻译： 公开了具有改善的等离子体电阻的填充聚合物组合物。 该组合物包括分散在聚合物基质中的颗粒填料。 颗粒填料可以是Nb2O5，YF3，AlN，SiC或Si3N4和稀土氧化物。 在一个实施方案中，组合物用作静电卡盘的粘合剂，用于喷头的粘合剂，衬垫的粘合剂，密封材料，O形环或塑料组分。

    Method of producing a plasma-resistant thermal oxide coating
    3.
    发明申请
    Method of producing a plasma-resistant thermal oxide coating 有权
    制造耐等离子体热氧化物涂层的方法

    公开(公告)号：US20120125488A1

    公开(公告)日：2012-05-24

    申请号：US13374980

    申请日：2012-01-25

    申请人： Jennifer Y. Sun ,  Li Xu ,  Kenneth S. Collins ,  Thomas Graves ,  Ren-Guan Duan ,  Senh Thach

    发明人： Jennifer Y. Sun ,  Li Xu ,  Kenneth S. Collins ,  Thomas Graves ,  Ren-Guan Duan ,  Senh Thach

    IPC分类号： C23C8/10

    CPC分类号： C23C16/4404 ,  H01J37/32467 ,  H01J37/32477

    摘要： A method of creating a plasma-resistant thermal oxide coating on a surface of an article, where the article is comprised of a metal or metal alloy which is typically selected from the group consisting of yttrium, neodymium, samarium, terbium, dysprosium, erbium, ytterbium, scandium, hafnium, niobium or combinations thereof. The oxide coating is formed using a time-temperature profile which includes an initial rapid heating rage, followed by a gradual decrease in heating rate, to produce an oxide coating structure which is columnar in nature. The grain size of the crystals which make up the oxide coating is larger at the surface of the oxide coating than at the interface between the oxide coating and the metal or metal alloy substrate, and the oxide coating is in compression at the interface between the oxide coating and the metal or metal alloy substrate.

    摘要翻译： 一种在制品的表面上产生耐等离子体热氧化物涂层的方法，其中制品由金属或金属合金组成，金属或金属合金通常选自钇，钕，钐，铽，镝，铒， 镱，钪，铪，铌或其组合。 使用时间 - 温度曲线形成氧化物涂层，其包括初始的快速加热，然后逐渐降低加热速率，以产生本质上为柱状的氧化物涂层结构。 构成氧化物涂层的晶体的晶粒尺寸在氧化物涂层的表面比在氧化物涂层和金属或金属合金衬底之间的界面处大，并且氧化物涂层在氧化物之间的界面处被压缩 涂层和金属或金属合金基材。

    Erosion-resistant plasma chamber components comprising a metal base structure with an overlying thermal oxidation coating
    4.
    发明授权
    Erosion-resistant plasma chamber components comprising a metal base structure with an overlying thermal oxidation coating 有权
    耐侵蚀等离子体室部件包括具有上覆热氧化涂层的金属基底结构

    公开(公告)号：US08129029B2

    公开(公告)日：2012-03-06

    申请号：US12004907

    申请日：2007-12-21

    申请人： Jennifer Y. Sun ,  Li Xu ,  Kenneth S. Collins ,  Thomas Graves ,  Ren-Guan Duan ,  Senh Thach

    发明人： Jennifer Y. Sun ,  Li Xu ,  Kenneth S. Collins ,  Thomas Graves ,  Ren-Guan Duan ,  Senh Thach

    IPC分类号： B32B9/00

    CPC分类号： C23C16/4404 ,  H01J37/32467 ,  H01J37/32477

    摘要： An article which is resistant to corrosion or erosion by chemically active plasmas and a method of making the article are described. The article is comprised of a metal or metal alloy substrate having on its surface a coating which is an oxide of the metal or metal alloy. The structure of the oxide coating is columnar in nature. The grain size of the crystals which make up the oxide is larger at the surface of the oxide coating than at the interface between the oxide coating and the metal or metal alloy substrate, and wherein the oxide coating is in compression at the interface between the oxide coating and the metal or metal alloy substrate. Typically the metal is selected from the group consisting of yttrium, neodymium, samarium, terbium, dysprosium, erbium, ytterbium, scandium, hafnium, niobium or combinations thereof.

    摘要翻译： 描述了耐化学活性等离子体腐蚀或侵蚀的制品以及制造该制品的方法。 该制品由金属或金属合金基材组成，其表面上具有金属或金属合金的氧化物的涂层。 氧化物涂层的结构本质上是柱状的。 构成氧化物的晶体的晶粒尺寸在氧化物涂层的表面比在氧化物涂层和金属或金属合金基底之间的界面处的晶粒尺寸大，并且其中氧化物涂层在氧化物之间的界面处被压缩 涂层和金属或金属合金基材。 通常，金属选自钇，钕，钐，铽，镝，铒，镱，钪，铪，铌或其组合。

    Ceramic coating comprising yttrium which is resistant to a reducing plasma
    5.
    发明申请
    Ceramic coating comprising yttrium which is resistant to a reducing plasma 审中-公开
    包含耐还原性等离子体的钇的陶瓷涂层

    公开(公告)号：US20090214825A1

    公开(公告)日：2009-08-27

    申请号：US12072530

    申请日：2008-02-26

    申请人： Jennifer Y. Sun ,  Xiaoming He ,  Kenneth S. Collins ,  Thomas Graves ,  Senh Thach ,  Jie Yuan ,  Li Xu ,  Ren-Guan Duan

    发明人： Jennifer Y. Sun ,  Xiaoming He ,  Kenneth S. Collins ,  Thomas Graves ,  Senh Thach ,  Jie Yuan ,  Li Xu ,  Ren-Guan Duan

    IPC分类号： B32B7/00 ,  C23C4/00

    CPC分类号： C23C4/11 ,  Y10T428/24355 ,  Y10T428/24997

    摘要： Particulate generation has been a problem in semiconductor device processing in highly corrosive plasma environments. The problem is exacerbated when the plasma is a reducing plasma. Empirically produced data has shown that the formation of a plasma spray coated yttrium-comprising ceramic such as yttrium oxide, Y2O3—ZrO2 solid solution, YAG, and YF3 provides a low porosity coating with smooth and compacted surfaces when such ceramics are spray coated from a powder feed having an average effective diameter ranging from about 22 μm to about 0.1 μm. These spray-coated materials reduce the generation of particulates in corrosive reducing plasma environments.

    摘要翻译： 在高度腐蚀性等离子体环境中的半导体器件加工中，微粒产生是一个问题。 当等离子体是还原等离子体时，问题更加严重。 经验生产的数据显示，等离子体喷涂的包含钇的陶瓷如氧化钇，Y2O3-ZrO2固溶体，YAG和YF3的形成提供了具有光滑和压实表面的低孔隙率涂层，当这种陶瓷从 粉末进料的平均有效直径为约22μm至约0.1μm。 这些喷涂材料减少了腐蚀性还原等离子体环境中的颗粒物的产生。

    Method of producing a plasma-resistant thermal oxide coating
    6.
    发明授权
    Method of producing a plasma-resistant thermal oxide coating 有权
    制造耐等离子体热氧化物涂层的方法

    公开(公告)号：US08758858B2

    公开(公告)日：2014-06-24

    申请号：US13374980

    申请日：2012-01-25

    申请人： Jennifer Y. Sun ,  Li Xu ,  Kenneth S. Collins ,  Thomas Graves ,  Ren-Guan Duan ,  Senh Thach

    发明人： Jennifer Y. Sun ,  Li Xu ,  Kenneth S. Collins ,  Thomas Graves ,  Ren-Guan Duan ,  Senh Thach

    IPC分类号： B05D3/02

    CPC分类号： C23C16/4404 ,  H01J37/32467 ,  H01J37/32477

    摘要： A method of creating a plasma-resistant thermal oxide coating on a surface of an article, where the article is comprised of a metal or metal alloy which is typically selected from the group consisting of yttrium, neodymium, samarium, terbium, dysprosium, erbium, ytterbium, scandium, hafnium, niobium or combinations thereof. The oxide coating is formed using a time-temperature profile which includes an initial rapid heating rage, followed by a gradual decrease in heating rate, to produce an oxide coating structure which is columnar in nature. The grain size of the crystals which make up the oxide coating is larger at the surface of the oxide coating than at the interface between the oxide coating and the metal or metal alloy substrate, and the oxide coating is in compression at the interface between the oxide coating and the metal or metal alloy substrate.

    摘要翻译： 一种在制品的表面上产生耐等离子体热氧化物涂层的方法，其中制品由金属或金属合金组成，金属或金属合金通常选自钇，钕，钐，铽，镝，铒， 镱，钪，铪，铌或其组合。 使用时间 - 温度曲线形成氧化物涂层，其包括初始的快速加热，然后逐渐降低加热速率，以产生本质上为柱状的氧化物涂层结构。 构成氧化物涂层的晶体的晶粒尺寸在氧化物涂层的表面比在氧化物涂层和金属或金属合金衬底之间的界面处大，并且氧化物涂层在氧化物之间的界面处被压缩 涂层和金属或金属合金基材。

    HIGH TEMPERATURE ELECTROSTATIC CHUCK BONDING ADHESIVE
    8.
    发明申请
    HIGH TEMPERATURE ELECTROSTATIC CHUCK BONDING ADHESIVE 有权
    高温静电胶粘剂粘合剂

    公开(公告)号：US20100156054A1

    公开(公告)日：2010-06-24

    申请号：US12640496

    申请日：2009-12-17

    申请人： Jennifer Y. Sun ,  Senh Thach ,  Ren-Guan Duan

    发明人： Jennifer Y. Sun ,  Senh Thach ,  Ren-Guan Duan

    IPC分类号： H01L21/683 ,  C09J5/06 ,  C08L83/06 ,  H02N13/00

    CPC分类号： H01L21/6833 ,  C08K3/22 ,  C08K3/28 ,  C08K2003/2227 ,  C08K2003/282 ,  C09D183/04 ,  C09J11/04 ,  C09J183/04 ,  H01L21/6831 ,  H02N13/00 ,  Y10T279/23 ,  Y10T279/34

    摘要： Methods and apparatus for bonding an electrostatic chuck to a component of a substrate support are provided herein. In some embodiments, an adhesive for bonding components of a substrate support may include a matrix of silicon-based polymeric material having a filler dispersed therein. The silicon based polymeric material may be a polydimethylsiloxane (PDMS) structure having a molecular weight with a low molecular weight (LMW) content Σ D3-D10 of less than about 500 ppm. In some embodiments, the filler may comprise between about 50 to about 70 percent by volume of the adhesive layer. In some embodiments, the filler may comprise particles of aluminum oxide (Al2O3), aluminum nitride (AlN), yttrium oxide (Y2O3), or combinations thereof. In some embodiments, the filler may comprise particles having a diameter of about 10 nanometers to about 10 microns.

    摘要翻译： 本文提供了用于将静电卡盘结合到基板支撑件的部件的方法和装置。 在一些实施例中，用于粘合基底支撑件的部件的粘合剂可以包括其中分散有填料的硅基聚合物材料的基体。 硅基聚合物材料可以是具有低分子量（LMW）含量＆Sgr的分子量的聚二甲基硅氧烷（PDMS）结构。 D3-D10小于约500ppm。 在一些实施方案中，填料可以占粘合剂层的约50至约70体积％。 在一些实施例中，填料可以包括氧化铝（Al 2 O 3），氮化铝（AlN），氧化钇（Y 2 O 3）或其组合的颗粒。 在一些实施方案中，填料可以包含直径为约10纳米至约10微米的颗粒。